DE69637015D1 - Methode zur rekonstruktion von teilchenwellen in einer teilchen-optischen vorrichtung - Google Patents

Methode zur rekonstruktion von teilchenwellen in einer teilchen-optischen vorrichtung

Info

Publication number
DE69637015D1
DE69637015D1 DE69637015T DE69637015T DE69637015D1 DE 69637015 D1 DE69637015 D1 DE 69637015D1 DE 69637015 T DE69637015 T DE 69637015T DE 69637015 T DE69637015 T DE 69637015T DE 69637015 D1 DE69637015 D1 DE 69637015D1
Authority
DE
Germany
Prior art keywords
particle
reconstruction
optical device
waves
particle waves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69637015T
Other languages
English (en)
Other versions
DE69637015T2 (de
Inventor
Willem Marie Coene
Augustus Josephus Janssen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Application granted granted Critical
Publication of DE69637015D1 publication Critical patent/DE69637015D1/de
Publication of DE69637015T2 publication Critical patent/DE69637015T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H01J2237/223—Fourier techniques

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Image Analysis (AREA)
DE69637015T 1995-03-16 1996-02-15 Methode zur rekonstruktion von teilchenwellen in einer teilchen-optischen vorrichtung Expired - Lifetime DE69637015T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP95200630 1995-03-16
EP95200630 1995-03-16
PCT/IB1996/000119 WO1996028751A1 (en) 1995-03-16 1996-02-15 Method for particle wave reconstruction in a particle-optical apparatus

Publications (2)

Publication Number Publication Date
DE69637015D1 true DE69637015D1 (de) 2007-05-24
DE69637015T2 DE69637015T2 (de) 2007-08-16

Family

ID=8220093

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69637015T Expired - Lifetime DE69637015T2 (de) 1995-03-16 1996-02-15 Methode zur rekonstruktion von teilchenwellen in einer teilchen-optischen vorrichtung

Country Status (5)

Country Link
US (1) US5654547A (de)
EP (1) EP0760109B1 (de)
JP (2) JP3973231B2 (de)
DE (1) DE69637015T2 (de)
WO (1) WO1996028751A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020053734A1 (en) * 1993-11-16 2002-05-09 Formfactor, Inc. Probe card assembly and kit, and methods of making same
JP3402868B2 (ja) * 1995-09-14 2003-05-06 株式会社東芝 荷電粒子光学鏡筒における非点収差の補正及び焦点合わせ方法
WO1997013269A1 (en) * 1995-10-03 1997-04-10 Philips Electronics N.V. Method of reconstructing an image in a particle-optical apparatus
US6148120A (en) * 1997-10-30 2000-11-14 Cognex Corporation Warping of focal images to correct correspondence error
US6590209B1 (en) * 1999-03-03 2003-07-08 The Regents Of The University Of California Technique to quantitatively measure magnetic properties of thin structures at <10 NM spatial resolution
DE10003127A1 (de) * 2000-01-26 2001-08-02 Ceos Gmbh Verfahren zur Ermittlung geometrisch optischer Abbildungsfehler
JP3942363B2 (ja) * 2001-02-09 2007-07-11 日本電子株式会社 透過電子顕微鏡の位相板用レンズシステム、および透過電子顕微鏡
TWI285295B (en) * 2001-02-23 2007-08-11 Asml Netherlands Bv Illumination optimization in lithography
JP3645198B2 (ja) * 2001-06-15 2005-05-11 独立行政法人理化学研究所 電子顕微鏡及びその焦点位置制御方法
JP2005538344A (ja) * 2002-07-08 2005-12-15 シデック テクノロジーズ アーベー 画像化装置および方法
EP2518687B1 (de) * 2011-04-26 2013-04-24 FEI Company Verfahren zur Bestimmung eines rekonstruierten Bildes mit Hilfe einer partikel-optischen Vorrichtung
GB2491199A (en) * 2011-05-27 2012-11-28 Univ Antwerpen Methods and systems for material characterization
JP5885405B2 (ja) * 2011-06-13 2016-03-15 キヤノン株式会社 撮像装置、干渉縞解析プログラム及び干渉縞解析方法
US10679763B2 (en) * 2012-10-30 2020-06-09 California Institute Of Technology Fourier ptychographic imaging systems, devices, and methods
US11468557B2 (en) 2014-03-13 2022-10-11 California Institute Of Technology Free orientation fourier camera
CA2966926A1 (en) 2014-12-22 2016-06-30 California Institute Of Technology Epi-illumination fourier ptychographic imaging for thick samples
EP3082150B1 (de) * 2015-04-15 2017-07-19 FEI Company Verfahren und raster-transmissionsmikroskop zur tomografischen bildgebung
US10122946B2 (en) 2015-11-11 2018-11-06 Fei Company Method for detecting particulate radiation
US11092795B2 (en) 2016-06-10 2021-08-17 California Institute Of Technology Systems and methods for coded-aperture-based correction of aberration obtained from Fourier ptychography
US10755891B2 (en) * 2018-04-13 2020-08-25 Colorado School Of Mines Systems and methods of aberration correction for atom probe tomography
DE102019204575B3 (de) 2019-04-01 2020-08-06 Carl Zeiss Smt Gmbh Verfahren, Vorrichtung und Computerprogramm zum Bestimmen einer Wellenfront eines massebehafteten Teilchenstrahls

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3829691A (en) * 1969-09-22 1974-08-13 Perkin Elmer Corp Image signal enhancement system for a scanning electron microscope
DE2655525C3 (de) * 1976-12-08 1979-05-03 Ernst Leitz Wetzlar Gmbh, 6300 Lahn- Wetzlar Verfahren zur Erweiterung des Schärfentiefebereiches fiber die durch die konventionelle Abbildung gegebene Grenze hinaus sowie Einrichtung zur Durchführung dieses Verfahrens
NL9001800A (nl) * 1990-08-10 1992-03-02 Philips Nv Methode voor het direct verkrijgen van amplitude- en fase-informatie van een object met behulp van beelden van een hoge-resolutie elektronenmicroscoop.
US5432347A (en) * 1992-11-12 1995-07-11 U.S. Philips Corporation Method for image reconstruction in a high-resolution electron microscope, and electron microscope suitable for use of such a method
BE1007465A3 (nl) * 1993-09-03 1995-07-04 Philips Electronics Nv Additionele samenstelling van defocusseringsbeelden in een elektronenmicroscoop.

Also Published As

Publication number Publication date
EP0760109B1 (de) 2007-04-11
DE69637015T2 (de) 2007-08-16
JP2007200902A (ja) 2007-08-09
WO1996028751A1 (en) 1996-09-19
US5654547A (en) 1997-08-05
JPH10500532A (ja) 1998-01-13
EP0760109A1 (de) 1997-03-05
JP3973231B2 (ja) 2007-09-12

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