DE69629686D1 - Fotohärtbare epoxyzusammensetzung - Google Patents
Fotohärtbare epoxyzusammensetzungInfo
- Publication number
- DE69629686D1 DE69629686D1 DE69629686T DE69629686T DE69629686D1 DE 69629686 D1 DE69629686 D1 DE 69629686D1 DE 69629686 T DE69629686 T DE 69629686T DE 69629686 T DE69629686 T DE 69629686T DE 69629686 D1 DE69629686 D1 DE 69629686D1
- Authority
- DE
- Germany
- Prior art keywords
- epoxy composition
- photocurable epoxy
- photocurable
- composition
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004593 Epoxy Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/003—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2995/00—Properties of moulding materials, reinforcements, fillers, preformed parts or moulds
- B29K2995/0037—Other properties
- B29K2995/0072—Roughness, e.g. anti-slip
- B29K2995/0073—Roughness, e.g. anti-slip smooth
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47648295A | 1995-06-07 | 1995-06-07 | |
US476482 | 1995-06-07 | ||
PCT/US1996/008488 WO1996041239A1 (en) | 1995-06-07 | 1996-06-04 | Photohardenable epoxy composition |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69629686D1 true DE69629686D1 (de) | 2003-10-02 |
DE69629686T2 DE69629686T2 (de) | 2004-06-17 |
Family
ID=23892033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69629686T Expired - Lifetime DE69629686T2 (de) | 1995-06-07 | 1996-06-04 | Fotohärtbare epoxyzusammensetzung |
Country Status (5)
Country | Link |
---|---|
US (2) | US5707780A (de) |
EP (1) | EP0830641B1 (de) |
JP (1) | JPH11507090A (de) |
DE (1) | DE69629686T2 (de) |
WO (1) | WO1996041239A1 (de) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2146070C (en) * | 1995-03-15 | 2002-01-29 | Kees Jonckers | Improved reactor for the synthesis of urea |
AU2653497A (en) | 1996-05-09 | 1997-11-26 | Dsm N.V. | Photosensitive resin composition for rapid prototyping and process for the manufacture of 3-dimensional objects |
ES2144836T3 (es) * | 1996-07-29 | 2000-06-16 | Ciba Sc Holding Ag | Composicion liquida reticulable por radiacion, en especial para estereolitografia. |
US7332537B2 (en) * | 1996-09-04 | 2008-02-19 | Z Corporation | Three dimensional printing material system and method |
JP3786480B2 (ja) * | 1996-10-14 | 2006-06-14 | Jsr株式会社 | 光硬化性樹脂組成物 |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
US6203871B1 (en) * | 1998-10-14 | 2001-03-20 | Lexmark International, Inc. | Encapsulant for leads in an aqueous environment |
CA2388046A1 (en) * | 1999-11-05 | 2001-05-17 | Z Corporation | Material systems and methods of three-dimensional printing |
KR100696412B1 (ko) | 1999-12-22 | 2007-03-20 | 타이요 잉크 메뉴펙츄어링 컴퍼니, 리미티드 | 활성 에너지선 경화성 수지조성물 |
JP4713704B2 (ja) * | 2000-02-29 | 2011-06-29 | 太陽ホールディングス株式会社 | 活性エネルギー線硬化性樹脂組成物 |
JP4497610B2 (ja) * | 1999-12-22 | 2010-07-07 | 太陽インキ製造株式会社 | 光硬化性樹脂組成物 |
US20030207959A1 (en) * | 2000-03-13 | 2003-11-06 | Eduardo Napadensky | Compositions and methods for use in three dimensional model printing |
US6569373B2 (en) * | 2000-03-13 | 2003-05-27 | Object Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
US7300619B2 (en) * | 2000-03-13 | 2007-11-27 | Objet Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
US8481241B2 (en) | 2000-03-13 | 2013-07-09 | Stratasys Ltd. | Compositions and methods for use in three dimensional model printing |
US7555542B1 (en) | 2000-05-22 | 2009-06-30 | Internap Network Services Corporation | Method and system for directing requests for content to a content server based on network performance |
US6981055B1 (en) | 2000-08-22 | 2005-12-27 | Internap Network Services Corporation | Method and system for optimizing routing through multiple available internet route providers |
US6811937B2 (en) | 2001-06-21 | 2004-11-02 | Dsm Desotech, Inc. | Radiation-curable resin composition and rapid prototyping process using the same |
US20030198824A1 (en) * | 2002-04-19 | 2003-10-23 | Fong John W. | Photocurable compositions containing reactive polysiloxane particles |
US20040054025A1 (en) * | 2002-06-20 | 2004-03-18 | Lawton John A. | Compositions comprising a benzophenone photoinitiator |
US7087109B2 (en) * | 2002-09-25 | 2006-08-08 | Z Corporation | Three dimensional printing material system and method |
WO2004029567A1 (en) * | 2002-09-26 | 2004-04-08 | Rensselaer Polytechnic Institute | Analytical instruments for monitoring photopolymerization |
US20040077745A1 (en) * | 2002-10-18 | 2004-04-22 | Jigeng Xu | Curable compositions and rapid prototyping process using the same |
US20040087687A1 (en) * | 2002-10-30 | 2004-05-06 | Vantico A&T Us Inc. | Photocurable compositions with phosphite viscosity stabilizers |
ES2376237T3 (es) * | 2003-05-21 | 2012-03-12 | Z Corporation | Sistema de material en polvo termopl�?stico para modelos de apariencia a partir de sistemas de impresión en 3d. |
US7232850B2 (en) * | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
US20070149667A1 (en) * | 2003-10-16 | 2007-06-28 | Dsm Ip Assets B.V. | Curable compositions and rapid prototyping process using the same |
US20050101684A1 (en) * | 2003-11-06 | 2005-05-12 | Xiaorong You | Curable compositions and rapid prototyping process using the same |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
KR101031693B1 (ko) * | 2004-06-18 | 2011-04-29 | 엘지디스플레이 주식회사 | 패턴형성용 레지스트 및 이를 이용한 패턴형성방법 |
US20060172230A1 (en) * | 2005-02-02 | 2006-08-03 | Dsm Ip Assets B.V. | Method and composition for reducing waste in photo-imaging applications |
US20070241482A1 (en) * | 2006-04-06 | 2007-10-18 | Z Corporation | Production of three-dimensional objects by use of electromagnetic radiation |
EP2089215B1 (de) * | 2006-12-08 | 2015-02-18 | 3D Systems Incorporated | Dreidimensionales druckmaterialsystem |
JP5129267B2 (ja) * | 2007-01-10 | 2013-01-30 | スリーディー システムズ インコーポレーテッド | 改良された色、物品性能及び使用の容易さ、を持つ3次元印刷材料システム |
US7968626B2 (en) | 2007-02-22 | 2011-06-28 | Z Corporation | Three dimensional printing material system and method using plasticizer-assisted sintering |
JP2014055241A (ja) * | 2012-09-12 | 2014-03-27 | Sanyo Chem Ind Ltd | 感光性組成物 |
KR20170018067A (ko) | 2014-06-23 | 2017-02-15 | 카본, 인크. | 다중 경화 메커니즘을 갖는 물질로부터 폴리우레탄 3차원 물체를 제조하는 방법 |
CN107438513B (zh) | 2015-02-05 | 2020-12-29 | 卡本有限公司 | 通过间歇曝光的增材制造方法 |
US10391711B2 (en) | 2015-03-05 | 2019-08-27 | Carbon, Inc. | Fabrication of three dimensional objects with multiple operating modes |
US10471655B2 (en) | 2015-09-04 | 2019-11-12 | Carbon, Inc. | Cyanate ester dual resins for additive manufacturing |
CN108291011B (zh) | 2015-09-09 | 2021-03-02 | 卡本有限公司 | 用于增材制造的环氧双重固化树脂 |
WO2017048710A1 (en) * | 2015-09-14 | 2017-03-23 | Carbon, Inc. | Light-curable article of manufacture with portions of differing solubility |
US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
WO2017079502A1 (en) | 2015-11-05 | 2017-05-11 | Carbon, Inc. | Silicone dual cure resins for additive manufacturing |
US10501572B2 (en) | 2015-12-22 | 2019-12-10 | Carbon, Inc. | Cyclic ester dual cure resins for additive manufacturing |
JP7189015B2 (ja) | 2015-12-22 | 2022-12-13 | カーボン,インコーポレイテッド | 二重硬化樹脂を用いた積層造形のための二重前駆体樹脂システム |
US10343331B2 (en) | 2015-12-22 | 2019-07-09 | Carbon, Inc. | Wash liquids for use in additive manufacturing with dual cure resins |
US10787583B2 (en) | 2015-12-22 | 2020-09-29 | Carbon, Inc. | Method of forming a three-dimensional object comprised of a silicone polymer or co-polymer |
EP3394673A1 (de) | 2015-12-22 | 2018-10-31 | Carbon, Inc. | Herstellung von verbundprodukten aus mehreren zwischenprodukten durch generative fertigung mit zweifachhärtungsharzen |
WO2017112571A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
US10647054B2 (en) | 2015-12-22 | 2020-05-12 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
US10500786B2 (en) | 2016-06-22 | 2019-12-10 | Carbon, Inc. | Dual cure resins containing microwave absorbing materials and methods of using the same |
WO2018094131A1 (en) | 2016-11-21 | 2018-05-24 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
US11535686B2 (en) | 2017-03-09 | 2022-12-27 | Carbon, Inc. | Tough, high temperature polymers produced by stereolithography |
US10316213B1 (en) | 2017-05-01 | 2019-06-11 | Formlabs, Inc. | Dual-cure resins and related methods |
JP6894015B2 (ja) | 2017-06-21 | 2021-06-23 | カーボン,インコーポレイテッド | 積層造形の方法 |
CN112074395A (zh) * | 2018-03-02 | 2020-12-11 | 福姆实验室公司 | 潜伏性固化树脂及相关方法 |
US11504903B2 (en) | 2018-08-28 | 2022-11-22 | Carbon, Inc. | 1K alcohol dual cure resins for additive manufacturing |
US20220064367A1 (en) | 2018-12-10 | 2022-03-03 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Cationically curable composition and method for the joining, casting and coating of substrates using the composition |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3450613A (en) * | 1964-03-09 | 1969-06-17 | Bausch & Lomb | Epoxy adhesive containing acrylic acid-epoxy reaction products and photosensitizers |
US3640718A (en) | 1968-04-10 | 1972-02-08 | Minnesota Mining & Mfg | Spectral sentization of photosensitive compositions |
US3700643A (en) * | 1970-09-02 | 1972-10-24 | Union Carbide Corp | Radiation-curable acrylate-capped polycaprolactone compositions |
US3742086A (en) * | 1971-05-28 | 1973-06-26 | J Epel | Thermosetting composition |
US4026705A (en) * | 1975-05-02 | 1977-05-31 | General Electric Company | Photocurable compositions and methods |
US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
US4113895A (en) * | 1976-11-19 | 1978-09-12 | American Can Company | Method for producing multilayered coated substrate |
US4138255A (en) * | 1977-06-27 | 1979-02-06 | General Electric Company | Photo-curing method for epoxy resin using group VIa onium salt |
US4169732A (en) * | 1978-01-09 | 1979-10-02 | International Business Machines Corporation | Photosensitive coating composition and use thereof |
US4173476A (en) * | 1978-02-08 | 1979-11-06 | Minnesota Mining And Manufacturing Company | Complex salt photoinitiator |
US4156035A (en) * | 1978-05-09 | 1979-05-22 | W. R. Grace & Co. | Photocurable epoxy-acrylate compositions |
US4291114A (en) * | 1978-10-18 | 1981-09-22 | Minnesota Mining And Manufacturing Co. | Imageable, composite-dry transfer sheet and process of using same |
US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
US4245029A (en) * | 1979-08-20 | 1981-01-13 | General Electric Company | Photocurable compositions using triarylsulfonium salts |
US4442197A (en) * | 1982-01-11 | 1984-04-10 | General Electric Company | Photocurable compositions |
US4504374A (en) * | 1983-03-09 | 1985-03-12 | Desoto, Inc. | Ultraviolet cured coating method to provide stone chip resistance |
DE3565013D1 (en) * | 1984-02-10 | 1988-10-20 | Ciba Geigy Ag | Process for the preparation of a protection layer or a relief pattern |
US4603182A (en) * | 1984-10-05 | 1986-07-29 | General Electric Company | Low viscosity epoxy resin compositions |
US4668601A (en) * | 1985-01-18 | 1987-05-26 | Minnesota Mining And Manufacturing Company | Protective coating for phototools |
US4694029A (en) * | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
GB8515475D0 (en) * | 1985-06-19 | 1985-07-24 | Ciba Geigy Ag | Forming images |
US4657779A (en) | 1986-03-19 | 1987-04-14 | Desoto, Inc. | Shrinkage-resistant ultraviolet-curing coatings |
ATE161860T1 (de) * | 1988-02-19 | 1998-01-15 | Asahi Denka Kogyo Kk | Kunststoffzusammensetzung für optisches modellieren |
US5182056A (en) * | 1988-04-18 | 1993-01-26 | 3D Systems, Inc. | Stereolithography method and apparatus employing various penetration depths |
JPH04500929A (ja) * | 1988-08-08 | 1992-02-20 | デソート インコーポレイテッド | 光硬化性コンパウンドおよびインベストメント鋳造法 |
US5223584A (en) * | 1989-07-11 | 1993-06-29 | Gencorp Inc. | In situ thermoset molecular composites |
US5059512A (en) * | 1989-10-10 | 1991-10-22 | International Business Machines Corporation | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
DE59007720D1 (de) * | 1989-10-27 | 1994-12-22 | Ciba Geigy Ag | Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen. |
US5055439A (en) * | 1989-12-27 | 1991-10-08 | International Business Machines Corporation | Photoacid generating composition and sensitizer therefor |
US5236812A (en) | 1989-12-29 | 1993-08-17 | E. I. Du Pont De Nemours And Company | Solid imaging method and apparatus |
JP2667934B2 (ja) | 1991-05-01 | 1997-10-27 | アライド−シグナル・インコーポレーテッド | ビニルエーテル−エポキシドポリマー類を用いた立体リソグラフィー |
JPH0586149A (ja) * | 1991-09-30 | 1993-04-06 | I C I Japan Kk | 光立体成形用樹脂組成物並びに立体成形体の形成方法 |
TW269017B (de) * | 1992-12-21 | 1996-01-21 | Ciba Geigy Ag | |
US5384339A (en) * | 1993-03-09 | 1995-01-24 | Starkey; Donn R. | Epoxy based balancing compound and method for balancing a rotor utilizing an ultraviolet-curable epoxy resin composition |
US6117536A (en) * | 1998-09-10 | 2000-09-12 | Ga-Tek Inc. | Adhesion promoting layer for use with epoxy prepregs |
-
1996
- 1996-03-07 US US08/612,509 patent/US5707780A/en not_active Ceased
- 1996-06-04 JP JP9501074A patent/JPH11507090A/ja not_active Ceased
- 1996-06-04 EP EP96919045A patent/EP0830641B1/de not_active Revoked
- 1996-06-04 DE DE69629686T patent/DE69629686T2/de not_active Expired - Lifetime
- 1996-06-04 WO PCT/US1996/008488 patent/WO1996041239A1/en active IP Right Grant
-
2000
- 2000-01-11 US US09/481,654 patent/USRE39106E1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO1996041239A1 (en) | 1996-12-19 |
JPH11507090A (ja) | 1999-06-22 |
DE69629686T2 (de) | 2004-06-17 |
EP0830641A1 (de) | 1998-03-25 |
USRE39106E1 (en) | 2006-05-23 |
EP0830641B1 (de) | 2003-08-27 |
US5707780A (en) | 1998-01-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69629686D1 (de) | Fotohärtbare epoxyzusammensetzung | |
DE69618854D1 (de) | Fotopolymerisierbare Zusammensetzung | |
BR9605176A (pt) | Composição fotocurável | |
DE69503861T2 (de) | Laserbeschriftbare Harzzusammensetzung | |
NO973095D0 (no) | Tiksotropiske materialer | |
DE69504942D1 (de) | Lichtempfindliche Harzzusammensetzung | |
BR9607058A (pt) | Composição | |
DE69400062D1 (de) | Photopolymerisierbare Zusammensetzung | |
BR9606809A (pt) | Composição inseticidamente ativa | |
DE69706041D1 (de) | Photohärtbare harzzusammensetzung | |
DE69609242D1 (de) | Fotopolymerisierbare Zusammensetzungen | |
DE69605381D1 (de) | Fotoresistzusammensetzung | |
DE69621500D1 (de) | Polymerisierbare Zusammensetzung | |
DE69604601D1 (de) | Fotopolymerisierbare Zusammensetzung | |
DE69501378T2 (de) | Harzzusammensetzung | |
DE69607855T2 (de) | Flüssige photohärtbare harzzusammensetzung | |
DE69503738T2 (de) | Fotopolymerisierbare Zusammensetzung | |
DE69610690T2 (de) | Epoxidharzzusammensetzung | |
PT728814E (pt) | Composicao betuminosa | |
DE69620575T2 (de) | Härtbare polymethylsilsesquioxanzusammensetzung | |
BR9609903A (pt) | ComposiçÃo inseticidamente ativa | |
ID16180A (id) | Komposisi resin fotosensitif | |
DE69616374T2 (de) | Germizide zusammensetzung | |
DE69713726T2 (de) | Photohärtbare Harzzusammensetzung | |
DE69605543T2 (de) | Epoxidharzzusammensetzung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: DSM IP ASSETS B.V., HEERLEN, NL |
|
8363 | Opposition against the patent |