DE69612489D1 - Beleuchtungseinheit für eine optische vorrichtung - Google Patents

Beleuchtungseinheit für eine optische vorrichtung

Info

Publication number
DE69612489D1
DE69612489D1 DE69612489T DE69612489T DE69612489D1 DE 69612489 D1 DE69612489 D1 DE 69612489D1 DE 69612489 T DE69612489 T DE 69612489T DE 69612489 T DE69612489 T DE 69612489T DE 69612489 D1 DE69612489 D1 DE 69612489D1
Authority
DE
Germany
Prior art keywords
optical device
lighting unit
lighting
unit
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69612489T
Other languages
English (en)
Other versions
DE69612489T2 (de
Inventor
Der Laan Hans Van
Johannes Catharina Hub Mulkens
Marie Stoeldrayer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69612489D1 publication Critical patent/DE69612489D1/de
Application granted granted Critical
Publication of DE69612489T2 publication Critical patent/DE69612489T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Laser Beam Printer (AREA)
DE69612489T 1996-02-23 1996-07-16 Beleuchtungseinheit für eine optische vorrichtung Expired - Fee Related DE69612489T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP96200468 1996-02-23
PCT/IB1996/000706 WO1997031298A1 (en) 1996-02-23 1996-07-16 Illumination unit for an optical apparatus

Publications (2)

Publication Number Publication Date
DE69612489D1 true DE69612489D1 (de) 2001-05-17
DE69612489T2 DE69612489T2 (de) 2001-08-23

Family

ID=8223709

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69612489T Expired - Fee Related DE69612489T2 (de) 1996-02-23 1996-07-16 Beleuchtungseinheit für eine optische vorrichtung
DE29613089U Expired - Lifetime DE29613089U1 (de) 1996-02-23 1996-07-29 Belichtungseinheit für ein optisches Gerät

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE29613089U Expired - Lifetime DE29613089U1 (de) 1996-02-23 1996-07-29 Belichtungseinheit für ein optisches Gerät

Country Status (7)

Country Link
US (1) US6028660A (de)
EP (1) EP0823073B1 (de)
JP (1) JP3957320B2 (de)
KR (1) KR100472866B1 (de)
CN (1) CN1130602C (de)
DE (2) DE69612489T2 (de)
WO (1) WO1997031298A1 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19724903A1 (de) 1997-06-12 1998-12-17 Zeiss Carl Fa Lichtintensitätsmeßanordnung
KR100499864B1 (ko) * 1997-06-12 2005-09-30 칼 짜이스 에스엠테 아게 광도 측정 장치
DE69704782T2 (de) * 1997-12-16 2002-03-07 Datalogic Spa Optischer Codeabtaster mit sich entlang zwei unterschiedlichen optischen Wegen bewegenden Laserstrahlen
DE19809395A1 (de) * 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
US6396567B1 (en) * 1999-06-02 2002-05-28 Taiwan Semiconductor Manufacturing Company, Ltd Method and apparatus for controlling the dose of radiations applied to a semiconductor wafer during photolithography
EP1133712B1 (de) * 1999-09-29 2003-12-03 Koninklijke Philips Electronics N.V. Bildprojektionssystem
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
DE10136507A1 (de) * 2001-07-17 2003-04-03 Zeiss Carl Geometrischer Strahlteiler und Verfahren zu seiner Herstellung
US20050134825A1 (en) * 2002-02-08 2005-06-23 Carl Zeiss Smt Ag Polarization-optimized illumination system
DE10206061A1 (de) * 2002-02-08 2003-09-04 Carl Zeiss Semiconductor Mfg S Polarisationsoptimiertes Beleuchtungssystem
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
WO2003077011A1 (en) * 2002-03-14 2003-09-18 Carl Zeiss Smt Ag Optical system with birefringent optical elements
DE10251087A1 (de) * 2002-10-29 2004-05-19 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine Mikrolithographie-Projektionsbelichtungsanlage
WO2005024516A2 (de) * 2003-08-14 2005-03-17 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine mikrolithographische projektionsbelichtungsanlage
US7085063B2 (en) * 2004-05-14 2006-08-01 3M Innovative Properties Company Multi-directional optical element and an optical system utilizing the multi-directional optical element
US7573019B2 (en) 2004-06-18 2009-08-11 Nikon Corporation Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method
US7411734B2 (en) * 2005-11-10 2008-08-12 3M Innovative Properties Company Color-splitting optical element and an optical system utilizing the color-splitting optical element
DE102007042984A1 (de) * 2007-09-10 2009-03-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur optischen Navigation
DE102008002247A1 (de) * 2008-06-05 2009-12-10 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Systems
DE102009005092A1 (de) * 2009-01-19 2010-09-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur optischen Navigation und dessen Verwendung
CN102253602A (zh) * 2010-05-18 2011-11-23 上海微电子装备有限公司 一种光刻***中实时控制照明剂量的装置
DE102010039965B4 (de) * 2010-08-31 2019-04-25 Carl Zeiss Smt Gmbh EUV-Kollektor
CN102540752B (zh) * 2010-12-28 2014-02-19 上海微电子装备有限公司 一种光刻照明***
EP3011645B1 (de) 2013-06-18 2019-03-13 ASML Netherlands B.V. Lithografisches verfahren und system
JP6205194B2 (ja) * 2013-07-08 2017-09-27 株式会社エンプラス 光レセプタクルおよび光モジュール
CN105745579B (zh) * 2013-09-25 2019-02-22 Asml荷兰有限公司 束传输设备和方法
EP3109696B1 (de) * 2014-02-17 2020-06-24 Ricoh Company, Ltd. Optische bestrahlungsvorrichtung und bildanzeigevorrichtung damit
CN107966882B (zh) * 2017-08-10 2020-10-16 上海微电子装备（集团）股份有限公司 曝光设备和曝光方法
WO2024104730A1 (en) * 2022-11-14 2024-05-23 Asml Netherlands B.V. Optical system for metrology

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60107835A (ja) * 1983-11-17 1985-06-13 Hitachi Ltd 投影露光装置
JPS636501A (ja) * 1986-06-27 1988-01-12 Komatsu Ltd インテグレ−タプリズム
JPH01155228A (ja) * 1987-12-14 1989-06-19 Anritsu Corp 光方向性結合器
DE9004633U1 (de) * 1990-04-25 1990-06-28 Fa. Carl Zeiss, 7920 Heidenheim Optische Weiche
US5343270A (en) * 1990-10-30 1994-08-30 Nikon Corporation Projection exposure apparatus
US5309198A (en) * 1992-02-25 1994-05-03 Nikon Corporation Light exposure system
JP2946950B2 (ja) * 1992-06-25 1999-09-13 キヤノン株式会社 照明装置及びそれを用いた露光装置
JPH08179237A (ja) * 1994-12-26 1996-07-12 Nikon Corp 照明光学装置

Also Published As

Publication number Publication date
EP0823073A1 (de) 1998-02-11
EP0823073B1 (de) 2001-04-11
JPH11504443A (ja) 1999-04-20
CN1130602C (zh) 2003-12-10
KR19990007965A (ko) 1999-01-25
US6028660A (en) 2000-02-22
WO1997031298A1 (en) 1997-08-28
CN1182486A (zh) 1998-05-20
DE29613089U1 (de) 1996-09-26
JP3957320B2 (ja) 2007-08-15
DE69612489T2 (de) 2001-08-23
KR100472866B1 (ko) 2005-10-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee