DE69610288T2 - Positioniervorrichtung mit kraftantriebssystem für kompensation von schwerpunktsverschiebungen - Google Patents

Positioniervorrichtung mit kraftantriebssystem für kompensation von schwerpunktsverschiebungen

Info

Publication number
DE69610288T2
DE69610288T2 DE69610288T DE69610288T DE69610288T2 DE 69610288 T2 DE69610288 T2 DE 69610288T2 DE 69610288 T DE69610288 T DE 69610288T DE 69610288 T DE69610288 T DE 69610288T DE 69610288 T2 DE69610288 T2 DE 69610288T2
Authority
DE
Germany
Prior art keywords
compensation
drive system
positioning device
power drive
focus points
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69610288T
Other languages
English (en)
Other versions
DE69610288T3 (de
DE69610288D1 (de
Inventor
Kimmenade Mathijs Van
Der Pal Adrianus Van
Eijk Jan Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=8220335&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69610288(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE69610288D1 publication Critical patent/DE69610288D1/de
Application granted granted Critical
Publication of DE69610288T2 publication Critical patent/DE69610288T2/de
Publication of DE69610288T3 publication Critical patent/DE69610288T3/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69610288T 1995-05-30 1996-05-17 Positioniervorrichtung mit kraftantriebssystem für kompensation von schwerpunktsverschiebungen Expired - Lifetime DE69610288T3 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP95201410 1995-05-30
EP95201410 1995-05-30
PCT/IB1996/000469 WO1996038766A1 (en) 1995-05-30 1996-05-17 Positioning device with a force actuator system for compensating centre-of-gravity displacements

Publications (3)

Publication Number Publication Date
DE69610288D1 DE69610288D1 (de) 2000-10-19
DE69610288T2 true DE69610288T2 (de) 2001-01-18
DE69610288T3 DE69610288T3 (de) 2005-03-24

Family

ID=8220335

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69610288T Expired - Lifetime DE69610288T3 (de) 1995-05-30 1996-05-17 Positioniervorrichtung mit kraftantriebssystem für kompensation von schwerpunktsverschiebungen

Country Status (6)

Country Link
US (1) US5844664A (de)
EP (1) EP0799439B2 (de)
JP (1) JP3640971B2 (de)
DE (1) DE69610288T3 (de)
TW (1) TW316874B (de)
WO (1) WO1996038766A1 (de)

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US7365513B1 (en) * 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JPH10209035A (ja) * 1997-01-23 1998-08-07 Nikon Corp 露光装置
KR100522886B1 (ko) 1997-07-22 2005-10-19 에이에스엠엘 네델란즈 비.브이. 가스베어링을 구비한 지지장치
US6144442A (en) * 1997-10-23 2000-11-07 U.S. Philips Corp Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device
AU1051999A (en) * 1997-11-12 1999-05-31 Nikon Corporation Projection exposure apparatus
US6054784A (en) * 1997-12-29 2000-04-25 Asm Lithography B.V. Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6621556B2 (en) * 2000-02-28 2003-09-16 Nikon Corporation Projection exposure apparatus and manufacturing and adjusting methods thereof
TW509823B (en) 2000-04-17 2002-11-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1267213B1 (de) * 2001-06-13 2006-09-20 ASML Netherlands B.V. Lithographischer Projektionsapparat
KR100585465B1 (ko) * 2001-06-13 2006-06-02 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치, 디바이스제조방법, 이것에 의하여제조된 디바이스 및 측정방법
US6983703B2 (en) 2002-11-05 2006-01-10 Asm Technology Singapore Pte Ltd Driving means to position a load
JP2004356222A (ja) * 2003-05-27 2004-12-16 Canon Inc ステージ装置及びその制御方法、露光装置、並びにデバイス製造方法
DE602004026736D1 (de) * 2003-08-07 2010-06-02 Koninkl Philips Electronics Nv Positionierungseinrichtung, einrichtung und verfahren zum ausgleich der schwerkraft
US7168553B2 (en) * 2003-11-13 2007-01-30 Applied Materials, Inc. Dynamically balanced substrate carrier handler
GB0620196D0 (en) * 2006-10-11 2006-11-22 Metryx Ltd Measuring apparatus
CN101709763B (zh) * 2009-12-10 2012-07-04 华中科技大学 一种水平二自由度隔振机构
CN102141733B (zh) * 2010-01-28 2012-11-14 上海微电子装备有限公司 减振装置及应用其的光刻装置
DE102011075393B4 (de) 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
CN102279532B (zh) * 2011-07-27 2013-04-17 中国科学院长春光学精密机械与物理研究所 一种光刻机投影物镜镜头的装调装置
CN102305264B (zh) * 2011-08-24 2013-12-18 华中科技大学 一种超低频精密主动减振器
CN103047356B (zh) * 2012-12-19 2015-02-11 哈尔滨工业大学 柔性膜角度解耦的电磁阻尼零刚度隔振器
CN103062308B (zh) * 2012-12-19 2015-07-29 哈尔滨工业大学 双层气浮正交解耦与滚动关节轴承角度解耦的电涡流阻尼隔振器
CN103047340B (zh) * 2012-12-19 2015-03-25 哈尔滨工业大学 滑动关节轴承角度解耦与磁悬浮平面驱动定位的隔振器
CN103062303B (zh) * 2012-12-19 2015-07-29 哈尔滨工业大学 气浮球轴承角度解耦的磁浮零刚度隔振器与隔振***
CN103047348B (zh) * 2012-12-19 2015-02-11 哈尔滨工业大学 共面气浮正交解耦与滑动关节轴承角度解耦的磁浮隔振器
CN103062301B (zh) * 2012-12-19 2014-04-02 哈尔滨工业大学 双层气浮正交解耦与气浮球轴承角度解耦的磁浮隔振器
CN103062283B (zh) * 2012-12-19 2014-10-29 哈尔滨工业大学 气浮球轴承角度解耦的零刚度隔振器与隔振***
CN103062294B (zh) * 2012-12-19 2015-04-22 哈尔滨工业大学 双层气浮正交解耦与二维柔性铰链角度解耦的磁浮隔振器
CN103062309B (zh) * 2012-12-19 2015-07-29 哈尔滨工业大学 共面气浮正交解耦与滚动关节轴承角度解耦的电涡流阻尼隔振器
CN103047346B (zh) 2012-12-19 2014-06-11 哈尔滨工业大学 滚动关节轴承角度解耦的磁浮零刚度隔振器与隔振***
CN103062287B (zh) * 2012-12-19 2015-02-11 哈尔滨工业大学 共面气浮正交解耦与二维柔性铰链角度解耦的电磁阻尼隔振器
CN103047350B (zh) * 2012-12-19 2015-03-25 哈尔滨工业大学 双层气浮正交解耦与柔性膜角度解耦的磁浮零刚度隔振器
CN103062315B (zh) * 2012-12-19 2015-03-25 哈尔滨工业大学 共面气浮正交解耦与柔性膜角度解耦的电涡流阻尼隔振器
CN103047343B (zh) * 2012-12-19 2015-06-17 哈尔滨工业大学 滑动关节轴承角度解耦的电磁阻尼零刚度隔振器
CN103062304B (zh) * 2012-12-19 2015-04-22 哈尔滨工业大学 柔性膜角度解耦的磁浮零刚度隔振器与隔振***
CN103047353B (zh) * 2012-12-19 2015-02-11 哈尔滨工业大学 滚动关节轴承角度解耦的电涡流阻尼零刚度隔振器
CN103047341B (zh) 2012-12-19 2014-06-11 哈尔滨工业大学 气浮球轴承角度解耦与磁悬浮平面驱动定位的隔振器
CN103047344B (zh) * 2012-12-19 2015-07-08 哈尔滨工业大学 双层气浮正交解耦与滚动关节轴承角度解耦的磁浮隔振器
CN103062313B (zh) * 2012-12-19 2015-03-25 哈尔滨工业大学 气浮球轴承角度解耦的电涡流阻尼零刚度隔振器
CN103047339B (zh) * 2012-12-19 2015-02-11 哈尔滨工业大学 共面气浮正交解耦与滑动关节轴承角度解耦的电磁阻尼隔振器
SG11201407527PA (en) * 2013-01-30 2014-12-30 Akribis Systems Pte Ltd A planar positioning system and method of using the same
CN103775550B (zh) 2014-02-14 2015-09-23 华中科技大学 单自由度磁力隔振装置
CN105094165B (zh) * 2015-08-24 2017-06-16 华中科技大学 一种基于Stewart主动平台的振动抑制方法
WO2018119730A1 (zh) * 2016-12-28 2018-07-05 中国科学院长春光学精密机械与物理研究所 光学集成检测平台

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JPS6032050A (ja) * 1983-08-02 1985-02-19 Canon Inc 露光装置
US4803712A (en) † 1987-01-20 1989-02-07 Hitachi, Ltd. X-ray exposure system
NL8902471A (nl) * 1989-10-05 1991-05-01 Philips Nv Tweetraps positioneerinrichting.
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NL9100202A (nl) * 1991-02-05 1992-09-01 Asm Lithography Bv Lithografische inrichting met een hangende objecttafel.
JP2830492B2 (ja) * 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
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JP3265670B2 (ja) † 1993-01-21 2002-03-11 株式会社ニコン ステージ装置、ステージ駆動方法、及び露光装置
JP3277581B2 (ja) * 1993-02-01 2002-04-22 株式会社ニコン ステージ装置および露光装置
JP3196798B2 (ja) † 1993-10-12 2001-08-06 キヤノン株式会社 自重支持装置

Also Published As

Publication number Publication date
EP0799439B1 (de) 2000-09-13
JPH10503889A (ja) 1998-04-07
EP0799439A1 (de) 1997-10-08
DE69610288T3 (de) 2005-03-24
EP0799439B2 (de) 2003-11-12
US5844664A (en) 1998-12-01
JP3640971B2 (ja) 2005-04-20
TW316874B (de) 1997-10-01
WO1996038766A1 (en) 1996-12-05
DE69610288D1 (de) 2000-10-19

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings