DE69534581D1 - Feld-Effekt-Halbleiterbauelement und sein Herstellungsverfahren - Google Patents

Feld-Effekt-Halbleiterbauelement und sein Herstellungsverfahren

Info

Publication number
DE69534581D1
DE69534581D1 DE69534581T DE69534581T DE69534581D1 DE 69534581 D1 DE69534581 D1 DE 69534581D1 DE 69534581 T DE69534581 T DE 69534581T DE 69534581 T DE69534581 T DE 69534581T DE 69534581 D1 DE69534581 D1 DE 69534581D1
Authority
DE
Germany
Prior art keywords
manufacturing
field
semiconductor device
effect semiconductor
effect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69534581T
Other languages
English (en)
Other versions
DE69534581T2 (de
Inventor
Yoshifumi Tomomatsu
Youichi Ishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of DE69534581D1 publication Critical patent/DE69534581D1/de
Publication of DE69534581T2 publication Critical patent/DE69534581T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0266Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/10Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1095Body region, i.e. base region, of DMOS transistors or IGBTs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • H01L29/7395Vertical transistors, e.g. vertical IGBT
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601Structure
    • H01L2224/0603Bonding areas having different sizes, e.g. different heights or widths

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Protection Of Static Devices (AREA)
  • Electronic Switches (AREA)
DE69534581T 1994-02-28 1995-02-24 Feld-Effekt-Halbleiterbauelement und sein Herstellungsverfahren Expired - Lifetime DE69534581T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP02951694A JP3361874B2 (ja) 1994-02-28 1994-02-28 電界効果型半導体装置
JP2951694 1994-02-28

Publications (2)

Publication Number Publication Date
DE69534581D1 true DE69534581D1 (de) 2005-12-15
DE69534581T2 DE69534581T2 (de) 2006-08-10

Family

ID=12278270

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69534581T Expired - Lifetime DE69534581T2 (de) 1994-02-28 1995-02-24 Feld-Effekt-Halbleiterbauelement und sein Herstellungsverfahren

Country Status (5)

Country Link
US (1) US5729032A (de)
EP (1) EP0669658B1 (de)
JP (1) JP3361874B2 (de)
KR (1) KR0169552B1 (de)
DE (1) DE69534581T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6002153A (en) * 1995-12-07 1999-12-14 Kabushiki Kaisha Toshiba MOS type semiconductor device with a current detecting function
JPH10125896A (ja) * 1996-10-16 1998-05-15 Fuji Electric Co Ltd 絶縁ゲート型サイリスタ
JP3480811B2 (ja) 1997-07-15 2003-12-22 株式会社東芝 電圧駆動型電力用半導体装置
JP3382172B2 (ja) * 1999-02-04 2003-03-04 株式会社日立製作所 横型絶縁ゲートバイポーラトランジスタ
US6717785B2 (en) * 2000-03-31 2004-04-06 Denso Corporation Semiconductor switching element driving circuit
JP2003069019A (ja) * 2001-08-29 2003-03-07 Toshiba Corp 半導体装置およびその製造方法
US7135748B2 (en) * 2004-10-26 2006-11-14 Power Integrations, Inc. Integrated circuit with multi-length output transistor segment
US20060086974A1 (en) * 2004-10-26 2006-04-27 Power Integrations, Inc. Integrated circuit with multi-length power transistor segments
DE112009004805B4 (de) * 2009-05-28 2019-03-28 Toyota Jidosha Kabushiki Kaisha Halbleitervorrichtung
JP5369300B2 (ja) * 2009-09-16 2013-12-18 三菱電機株式会社 半導体装置およびその製造方法
JP5779025B2 (ja) * 2010-11-08 2015-09-16 株式会社東芝 半導体装置
JP2013115223A (ja) * 2011-11-29 2013-06-10 Toyota Motor Corp 半導体装置
US20150179758A1 (en) * 2012-07-20 2015-06-25 Mitsubishi Electric Corporation Semiconductor device and method of manufacturing the same
WO2014097739A1 (ja) 2012-12-17 2014-06-26 富士電機株式会社 半導体装置およびその半導体装置を用いた電流検出回路
KR101413294B1 (ko) * 2013-03-28 2014-06-27 메이플세미컨덕터(주) 전력용 센스 모스펫
JP6320808B2 (ja) 2014-03-19 2018-05-09 富士電機株式会社 トレンチmos型半導体装置
JP6510310B2 (ja) 2014-05-12 2019-05-08 ローム株式会社 半導体装置
JP6772328B2 (ja) * 2014-05-12 2020-10-21 ローム株式会社 半導体装置
US10355127B2 (en) * 2015-07-02 2019-07-16 Mitsubishi Electric Corporation Semiconductor device
US10056370B2 (en) 2015-07-16 2018-08-21 Fuji Electric Co., Ltd. Semiconductor device
US10505028B2 (en) 2015-09-16 2019-12-10 Fuji Electric Co., Ltd. Semiconductor device including a shoulder portion and manufacturing method
JP6787348B2 (ja) 2016-02-17 2020-11-18 富士電機株式会社 半導体素子の過電流保護装置
JP2018067621A (ja) * 2016-10-19 2018-04-26 トヨタ自動車株式会社 半導体装置およびその製造方法
JP6825298B2 (ja) * 2016-10-19 2021-02-03 トヨタ自動車株式会社 半導体装置
JP6939059B2 (ja) 2017-04-27 2021-09-22 富士電機株式会社 半導体素子の駆動装置
JP7205091B2 (ja) 2018-07-18 2023-01-17 富士電機株式会社 半導体装置
JP7223543B2 (ja) 2018-10-05 2023-02-16 ローム株式会社 半導体装置
KR102153550B1 (ko) * 2019-05-08 2020-09-08 현대오트론 주식회사 전력 반도체 소자

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53121579A (en) * 1977-03-31 1978-10-24 Toshiba Corp Semiconductor integrated circuit
US4135102A (en) * 1977-07-18 1979-01-16 Mostek Corporation High performance inverter circuits
JPS56162861A (en) * 1980-05-20 1981-12-15 Nec Corp Semiconductor integrated circuit device
JPS60132359A (ja) * 1983-12-20 1985-07-15 Nec Corp 過電圧保護用半導体装置
US4893158A (en) * 1987-06-22 1990-01-09 Nissan Motor Co., Ltd. MOSFET device
US5055721A (en) * 1989-04-13 1991-10-08 Mitsubishi Denki Kabushiki Kaisha Drive circuit for igbt device
JP2892415B2 (ja) * 1990-02-01 1999-05-17 沖電気工業株式会社 半導体素子の製造方法
JPH03235368A (ja) * 1990-02-10 1991-10-21 Toshiba Corp 半導体装置
JP2876694B2 (ja) * 1990-03-20 1999-03-31 富士電機株式会社 電流検出端子を備えたmos型半導体装置
JPH04297039A (ja) * 1991-03-26 1992-10-21 Oki Electric Ind Co Ltd 半導体素子の製造方法
DE4219019B4 (de) * 1991-06-10 2004-12-16 Fuji Electric Co., Ltd., Kawasaki MOS-Halbleiterbauelement
US5321281A (en) * 1992-03-18 1994-06-14 Mitsubishi Denki Kabushiki Kaisha Insulated gate semiconductor device and method of fabricating same
JPH05291913A (ja) * 1992-04-08 1993-11-05 Fuji Electric Co Ltd 半導体スイッチング装置
GB9207849D0 (en) * 1992-04-09 1992-05-27 Philips Electronics Uk Ltd A semiconductor device

Also Published As

Publication number Publication date
US5729032A (en) 1998-03-17
KR950026034A (ko) 1995-09-18
JPH07240516A (ja) 1995-09-12
DE69534581T2 (de) 2006-08-10
JP3361874B2 (ja) 2003-01-07
KR0169552B1 (ko) 1999-01-15
EP0669658A2 (de) 1995-08-30
EP0669658B1 (de) 2005-11-09
EP0669658A3 (de) 1999-10-06

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Legal Events

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8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)