DE69516106D1 - Akustische Oberflächenwellenanordnung - Google Patents
Akustische OberflächenwellenanordnungInfo
- Publication number
- DE69516106D1 DE69516106D1 DE69516106T DE69516106T DE69516106D1 DE 69516106 D1 DE69516106 D1 DE 69516106D1 DE 69516106 T DE69516106 T DE 69516106T DE 69516106 T DE69516106 T DE 69516106T DE 69516106 D1 DE69516106 D1 DE 69516106D1
- Authority
- DE
- Germany
- Prior art keywords
- acoustic wave
- surface acoustic
- wave arrangement
- arrangement
- wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02818—Means for compensation or elimination of undesirable effects
- H03H9/02834—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
- H03H3/10—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/08—Holders with means for regulating temperature
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP00283995A JP3171043B2 (ja) | 1995-01-11 | 1995-01-11 | 弾性表面波装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69516106D1 true DE69516106D1 (de) | 2000-05-11 |
DE69516106T2 DE69516106T2 (de) | 2000-12-14 |
Family
ID=11540588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69516106T Expired - Lifetime DE69516106T2 (de) | 1995-01-11 | 1995-06-27 | Akustische Oberflächenwellenanordnung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5712523A (de) |
EP (1) | EP0722218B1 (de) |
JP (1) | JP3171043B2 (de) |
KR (1) | KR0145232B1 (de) |
DE (1) | DE69516106T2 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5875099A (en) * | 1996-05-09 | 1999-02-23 | Murata Manufacturing Co., Ltd. | Electronic component |
US5955949A (en) * | 1997-08-18 | 1999-09-21 | X-Cyte, Inc. | Layered structure for a transponder tag |
JPH11239037A (ja) * | 1998-02-20 | 1999-08-31 | Nec Corp | 弾性表面波装置 |
JP3339450B2 (ja) * | 1999-03-02 | 2002-10-28 | 株式会社村田製作所 | 表面波装置の製造方法 |
US6426583B1 (en) * | 1999-06-14 | 2002-07-30 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave element, method for producing the same and surface acoustic wave device using the same |
JP2001267881A (ja) * | 2000-03-17 | 2001-09-28 | Fujitsu Media Device Kk | 弾性表面波デバイス及びこれを用いた通信装置、並びにアンテナデュプレクサ |
JP3376994B2 (ja) * | 2000-06-27 | 2003-02-17 | 株式会社村田製作所 | 弾性表面波装置及びその製造方法 |
US7439616B2 (en) * | 2000-11-28 | 2008-10-21 | Knowles Electronics, Llc | Miniature silicon condenser microphone |
US7166910B2 (en) * | 2000-11-28 | 2007-01-23 | Knowles Electronics Llc | Miniature silicon condenser microphone |
US7434305B2 (en) | 2000-11-28 | 2008-10-14 | Knowles Electronics, Llc. | Method of manufacturing a microphone |
US8623709B1 (en) | 2000-11-28 | 2014-01-07 | Knowles Electronics, Llc | Methods of manufacture of top port surface mount silicon condenser microphone packages |
US6930364B2 (en) * | 2001-09-13 | 2005-08-16 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
CN100386005C (zh) * | 2002-01-24 | 2008-04-30 | 三菱麻铁里亚尔株式会社 | 印刷电路板及具有屏蔽结构的电子器件和无线通信装置 |
AU2003251737A1 (en) * | 2002-06-28 | 2004-01-19 | Vectron International | Low profile temperature-compensated low-stress crystal mount structure |
US7154206B2 (en) * | 2002-07-31 | 2006-12-26 | Kyocera Corporation | Surface acoustic wave device and method for manufacturing same |
US6846423B1 (en) | 2002-08-28 | 2005-01-25 | Silicon Light Machines Corporation | Wafer-level seal for non-silicon-based devices |
US6877209B1 (en) | 2002-08-28 | 2005-04-12 | Silicon Light Machines, Inc. | Method for sealing an active area of a surface acoustic wave device on a wafer |
JP2005167969A (ja) * | 2003-11-14 | 2005-06-23 | Fujitsu Media Device Kk | 弾性波素子および弾性波素子の製造方法 |
US7750420B2 (en) * | 2004-03-26 | 2010-07-06 | Cypress Semiconductor Corporation | Integrated circuit having one or more conductive devices formed over a SAW and/or MEMS device |
DE102005008511B4 (de) * | 2005-02-24 | 2019-09-12 | Tdk Corporation | MEMS-Mikrofon |
DE102005008512B4 (de) | 2005-02-24 | 2016-06-23 | Epcos Ag | Elektrisches Modul mit einem MEMS-Mikrofon |
DE102005008514B4 (de) * | 2005-02-24 | 2019-05-16 | Tdk Corporation | Mikrofonmembran und Mikrofon mit der Mikrofonmembran |
SG130158A1 (en) | 2005-08-20 | 2007-03-20 | Bse Co Ltd | Silicon based condenser microphone and packaging method for the same |
DE102005053765B4 (de) * | 2005-11-10 | 2016-04-14 | Epcos Ag | MEMS-Package und Verfahren zur Herstellung |
DE102005053767B4 (de) * | 2005-11-10 | 2014-10-30 | Epcos Ag | MEMS-Mikrofon, Verfahren zur Herstellung und Verfahren zum Einbau |
JP5048471B2 (ja) * | 2007-12-05 | 2012-10-17 | セイコーインスツル株式会社 | パッケージの製造方法、パッケージ、電子デバイス、圧電振動子、発振器、電子機器及び電波時計 |
CN103999484B (zh) | 2011-11-04 | 2017-06-30 | 美商楼氏电子有限公司 | 作为声学设备中的屏障的嵌入式电介质和制造方法 |
US9078063B2 (en) | 2012-08-10 | 2015-07-07 | Knowles Electronics, Llc | Microphone assembly with barrier to prevent contaminant infiltration |
DE102013106353B4 (de) * | 2013-06-18 | 2018-06-28 | Tdk Corporation | Verfahren zum Aufbringen einer strukturierten Beschichtung auf ein Bauelement |
JP2014033467A (ja) * | 2013-10-31 | 2014-02-20 | Murata Mfg Co Ltd | 弾性表面波素子 |
CN104780490A (zh) * | 2015-04-20 | 2015-07-15 | 歌尔声学股份有限公司 | 一种mems麦克风的封装结构及其制造方法 |
US9794661B2 (en) | 2015-08-07 | 2017-10-17 | Knowles Electronics, Llc | Ingress protection for reducing particle infiltration into acoustic chamber of a MEMS microphone package |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3786373A (en) * | 1971-10-01 | 1974-01-15 | Raytheon Co | Temperature compensated acoustic surface wave device |
JPS5213716B2 (de) * | 1971-12-22 | 1977-04-16 | ||
GB1392518A (en) * | 1972-08-25 | 1975-04-30 | Plessey Co Ltd | Temperature compensated resonator |
CA1035461A (en) * | 1974-05-16 | 1978-07-25 | Andrew H. Bobeck | Magnetic bubble, field-access assembly |
GB2064126A (en) * | 1979-11-22 | 1981-06-10 | Philips Electronic Associated | Method of making humidity sensors |
US4454442A (en) * | 1983-07-15 | 1984-06-12 | General Dynamics Electronics Division | Piezoelectric relay using Euler lever |
US4845397A (en) * | 1984-12-19 | 1989-07-04 | Tektronix, Inc. | Constraining mount system for surface acoustic wave devices |
US5030875A (en) * | 1990-01-26 | 1991-07-09 | Motorola, Inc. | Sacrificial quartz crystal mount |
JP2673993B2 (ja) * | 1990-07-02 | 1997-11-05 | 日本無線株式会社 | 表面弾性波装置 |
JPH04170811A (ja) * | 1990-11-05 | 1992-06-18 | Fujitsu Ltd | 弾性表面波デバイス |
US5208504A (en) * | 1990-12-28 | 1993-05-04 | Raytheon Company | Saw device and method of manufacture |
NO173412C (no) * | 1991-06-28 | 1993-12-08 | Ame Space As | Montasjeanordning |
US5237235A (en) * | 1991-09-30 | 1993-08-17 | Motorola, Inc. | Surface acoustic wave device package |
US5453652A (en) * | 1992-12-17 | 1995-09-26 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device with interdigital transducers formed on a holding substrate thereof and a method of producing the same |
US5446330A (en) * | 1993-03-15 | 1995-08-29 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device having a lamination structure |
US5459368A (en) * | 1993-08-06 | 1995-10-17 | Matsushita Electric Industrial Co., Ltd. | Surface acoustic wave device mounted module |
-
1995
- 1995-01-11 JP JP00283995A patent/JP3171043B2/ja not_active Expired - Lifetime
- 1995-06-26 KR KR1019950017605A patent/KR0145232B1/ko not_active IP Right Cessation
- 1995-06-27 EP EP95110005A patent/EP0722218B1/de not_active Expired - Lifetime
- 1995-06-27 DE DE69516106T patent/DE69516106T2/de not_active Expired - Lifetime
- 1995-06-28 US US08/495,895 patent/US5712523A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR960030541A (ko) | 1996-08-17 |
EP0722218B1 (de) | 2000-04-05 |
KR0145232B1 (ko) | 1998-08-17 |
US5712523A (en) | 1998-01-27 |
DE69516106T2 (de) | 2000-12-14 |
JPH08191228A (ja) | 1996-07-23 |
EP0722218A1 (de) | 1996-07-17 |
JP3171043B2 (ja) | 2001-05-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |