DE69426298T2 - Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte - Google Patents

Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte

Info

Publication number
DE69426298T2
DE69426298T2 DE69426298T DE69426298T DE69426298T2 DE 69426298 T2 DE69426298 T2 DE 69426298T2 DE 69426298 T DE69426298 T DE 69426298T DE 69426298 T DE69426298 T DE 69426298T DE 69426298 T2 DE69426298 T2 DE 69426298T2
Authority
DE
Germany
Prior art keywords
plate
producing
light sensitive
flexographic
sensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69426298T
Other languages
English (en)
Other versions
DE69426298D1 (de
Inventor
Takao Suzuki
Fusayoshi Sakurai
Haruo Ueno
Ichiro Konishi
Tatsuo Usui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5097026A external-priority patent/JP2792388B2/ja
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Application granted granted Critical
Publication of DE69426298D1 publication Critical patent/DE69426298D1/de
Publication of DE69426298T2 publication Critical patent/DE69426298T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE69426298T 1993-03-31 1994-03-31 Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte Expired - Lifetime DE69426298T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP5097026A JP2792388B2 (ja) 1993-03-31 1993-03-31 水現像用親水性共重合体の製造方法及び該共重合体を用いた水現像用感光性重合体組成物、感光性フレキソ版
JP9714793 1993-03-31
JP13291193 1993-05-11
PCT/JP1994/000543 WO1994023342A1 (en) 1993-03-31 1994-03-31 Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate

Publications (2)

Publication Number Publication Date
DE69426298D1 DE69426298D1 (de) 2000-12-21
DE69426298T2 true DE69426298T2 (de) 2001-07-12

Family

ID=27308287

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69426298T Expired - Lifetime DE69426298T2 (de) 1993-03-31 1994-03-31 Lichtempfindliche zusammensetzung, lichtempfindliche kautschukplatte und verfahren zur herstellung dieser platte, flexografische platte und verfahren zur herstellung dieser platte

Country Status (4)

Country Link
US (1) US5679485A (de)
EP (1) EP0699961B1 (de)
DE (1) DE69426298T2 (de)
WO (1) WO1994023342A1 (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版
JP3044689B2 (ja) * 1994-10-14 2000-05-22 日本ゼオン株式会社 感光性エラストマー組成物及び感光性ゴム版
TW406214B (en) * 1995-03-16 2000-09-21 Hitachi Chemical Co Ltd Production of color filter
US5863704A (en) * 1995-04-26 1999-01-26 Nippon Zeon Company, Ltd. Photosensitive composition and photosensitive rubber plate
US5889116A (en) * 1995-12-06 1999-03-30 Nippon Zeon Co., Ltd. Photosensitive composition from copolymers of ethylenic phosphorous monomer(s) and elastomer
EP0916480A4 (de) * 1996-07-30 2001-10-10 Hitachi Chemical Co Ltd Herstellung eines verbandfilmes und leiterplatte
DE19711696C1 (de) * 1997-03-20 1998-11-12 Basf Drucksysteme Gmbh Verfahren zum Herstellen eines photopolymerisierbaren Aufzeichungsmaterials
US5902714A (en) * 1997-07-30 1999-05-11 Polyfibron Technologies, Inc. Latex-based, aqueous developable photopolymers and use thereof in printing plates
DE19811331A1 (de) * 1998-03-16 1999-09-23 Du Pont Deutschland Entwickler und Verfahren zur Herstellung von flexographischen Druckformen
EP1091998B1 (de) * 1998-06-29 2004-08-04 KRATON Polymers Research B.V. Photohärtbare polymerzusammensetzung und diese enthaltende flexodruckplatten
US6326127B1 (en) 1998-12-31 2001-12-04 Kraton Polymers U.S. Llc Photo-curable polymer composition and flexographic printing plates containing the same
US6506542B1 (en) 1999-03-16 2003-01-14 E.I. Du Pont De Nemours And Company Developer and process for preparing flexographic printing forms
JP3353885B2 (ja) * 1999-12-28 2002-12-03 日本電気株式会社 化学増幅型レジスト
JP4230085B2 (ja) * 2000-03-16 2009-02-25 旭化成ケミカルズ株式会社 改良されたフレキソ印刷版用感光性構成体
US7517636B2 (en) * 2000-05-29 2009-04-14 Hitachi Chemical Co., Ltd. Photosensitive resin composition, photosensitive element, production method of resist pattern and production method for printed circuit board
DE10227188A1 (de) * 2002-06-18 2004-01-08 Basf Drucksysteme Gmbh Verfahren zur Herstellung von Flexodruckformen mittels Laser-Direktgravur
US7285376B2 (en) * 2003-10-07 2007-10-23 Konica Minolta Medical & Graphic Inc. Correction process of planographic printing plate
US7736836B2 (en) * 2004-09-22 2010-06-15 Jonghan Choi Slip film compositions containing layered silicates
US20060154180A1 (en) 2005-01-07 2006-07-13 Kannurpatti Anandkumar R Imaging element for use as a recording element and process of using the imaging element
JP2008076674A (ja) * 2006-09-20 2008-04-03 Fujifilm Corp ホログラム記録媒体用組成物、並びにホログラム記録媒体及びその製造方法
EP2026132B1 (de) 2007-08-16 2013-03-13 E. I. Du Pont de Nemours and Company Verfahren zur Herstellung eines zylindrisch geformten lichtempfindlichen Elements zur Verwendung als Druckform
US8470518B2 (en) 2007-09-14 2013-06-25 E I Du Pont De Nemours And Company Photosensitive element having reinforcing particles and method for preparing a printing form from the element
US8236479B2 (en) 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
EP2085820B1 (de) 2008-01-30 2015-02-25 E. I. du Pont de Nemours and Company Vorrichtung und Verfahren zur Herstellung einer Reliefdruckform
US8739701B2 (en) * 2008-07-31 2014-06-03 Ryan Vest Method and apparatus for thermal processing of photosensitive printing elements
EP2154572B1 (de) 2008-08-15 2017-05-03 E. I. du Pont de Nemours and Company Verfahren zur Herstellung eines zylinderförmigen lichtempfindlichen Elements zur Verwendung als Druckform
US8883399B2 (en) 2008-12-18 2014-11-11 Asahi Kasei E-Materials Corporation Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
US20100173135A1 (en) * 2009-01-06 2010-07-08 Jonghan Choi Method of Controlling Surface Roughness of a Flexographic Printing Plate
WO2011002967A1 (en) 2009-07-02 2011-01-06 E. I. Du Pont De Nemours And Company Method for printing a material onto a substrate
US9069252B2 (en) 2011-08-26 2015-06-30 E I Du Pont De Nemours And Company Method for preparing a relief printing form
US20130139714A1 (en) 2011-12-02 2013-06-06 E.I. Du Pont De Nemours And Company Method for making flexographic printing forms by welding edges of photosensitive elements with microwave energy
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form
JP6735205B2 (ja) * 2016-10-06 2020-08-05 東京応化工業株式会社 レジストパターンのラフネスを低減させるために用いられる被覆剤、及びラフネスが低減されたレジストパターンの製造方法

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
CA1101586A (en) * 1971-05-17 1981-05-19 Arnel D. Potter Photosensitive compositions
DE2720228B2 (de) * 1976-05-06 1979-10-18 Japan Synthetic Rubber Co., Ltd., Tokio Photopolymerisierbares Gemisch und seine Verwendung
US4248960A (en) * 1978-01-23 1981-02-03 W. R. Grace & Co. Radiation responsive relief imageable plastic laminate
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
DE2942183A1 (de) * 1979-10-18 1981-05-07 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
GB2064151A (en) * 1979-11-21 1981-06-10 Uniroyal Inc Photopolymerisable composition
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
CA1203107A (en) * 1982-08-31 1986-04-15 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent
NZ212161A (en) * 1984-06-08 1988-06-30 Ishikawa Katsukiyo Photo-polymerisable composition and printing plate prepared therefrom
JPS62138845A (ja) * 1985-12-12 1987-06-22 Asahi Chem Ind Co Ltd 感光性エラストマ−組成物
JPH027055A (ja) * 1988-06-27 1990-01-11 Konica Corp 感光性平版印刷版の処理方法
JPH0315071A (ja) * 1989-03-15 1991-01-23 Toray Ind Inc 感光性樹脂組成物
US5240808A (en) * 1989-04-27 1993-08-31 Fuji Photo Film Co., Ltd. Light-sensitive compositions containing photosensitive polymeric compound having both photocross-linkable groups capable of cycloaddition, and functional groups carrying P--OH bonds
DE4004512A1 (de) * 1990-02-14 1991-08-22 Hoechst Ag Verfahren zur herstellung von photopolymerplatten
CA2041023C (en) * 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
JP2900075B2 (ja) * 1990-07-05 1999-06-02 日本ゼオン株式会社 感光性樹脂組成物
US5135837A (en) * 1990-09-05 1992-08-04 E. I. Du Pont De Nemours And Company Photosensitive elastomeric element having improved solvent resistance
DE9016662U1 (de) * 1990-10-11 1991-05-16 Hoechst Ag, 65929 Frankfurt Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
US5348844A (en) * 1990-12-03 1994-09-20 Napp Systems, Inc. Photosensitive polymeric printing medium and water developable printing plates
JP2910257B2 (ja) * 1991-01-31 1999-06-23 東レ株式会社 水なし平版印刷版用現像液
JPH05232698A (ja) * 1991-12-26 1993-09-10 Nippon Zeon Co Ltd リン含有親水性共重合体の製造方法及び該共重合体を用いた水現像用感光性組成物
JPH0763524B2 (ja) * 1992-03-03 1995-07-12 株式会社スダックス ゲームカード

Also Published As

Publication number Publication date
WO1994023342A1 (en) 1994-10-13
EP0699961A4 (de) 1998-03-18
US5679485A (en) 1997-10-21
EP0699961B1 (de) 2000-11-15
EP0699961A1 (de) 1996-03-06
DE69426298D1 (de) 2000-12-21

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Legal Events

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8364 No opposition during term of opposition