DE69423858T2 - Positiv-arbeitende Fotolackzusammensetzung - Google Patents

Positiv-arbeitende Fotolackzusammensetzung

Info

Publication number
DE69423858T2
DE69423858T2 DE69423858T DE69423858T DE69423858T2 DE 69423858 T2 DE69423858 T2 DE 69423858T2 DE 69423858 T DE69423858 T DE 69423858T DE 69423858 T DE69423858 T DE 69423858T DE 69423858 T2 DE69423858 T2 DE 69423858T2
Authority
DE
Germany
Prior art keywords
positive
photoresist composition
working photoresist
working
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69423858T
Other languages
English (en)
Other versions
DE69423858D1 (de
Inventor
Kenichiro Sato
Yasumasa Kawabe
Toshiaki Aoai
Shinji Sakaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31819593A external-priority patent/JP3133881B2/ja
Priority claimed from JP6063859A external-priority patent/JPH07225476A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE69423858D1 publication Critical patent/DE69423858D1/de
Publication of DE69423858T2 publication Critical patent/DE69423858T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
DE69423858T 1993-12-17 1994-12-16 Positiv-arbeitende Fotolackzusammensetzung Expired - Fee Related DE69423858T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP31819593A JP3133881B2 (ja) 1993-12-17 1993-12-17 感電離放射線性樹脂組成物
JP31819493 1993-12-17
JP6063859A JPH07225476A (ja) 1993-12-17 1994-03-31 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69423858D1 DE69423858D1 (de) 2000-05-11
DE69423858T2 true DE69423858T2 (de) 2000-07-27

Family

ID=27298308

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69423858T Expired - Fee Related DE69423858T2 (de) 1993-12-17 1994-12-16 Positiv-arbeitende Fotolackzusammensetzung

Country Status (3)

Country Link
US (1) US5609982A (de)
EP (2) EP0886183A1 (de)
DE (1) DE69423858T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3365874B2 (ja) * 1994-10-05 2003-01-14 富士写真フイルム株式会社 キノンジアジドの合成法およびこれを含むポジ型レジスト
KR100334484B1 (ko) * 1994-12-28 2002-12-06 제온 코포레이션 포지티브형레지스트조성물
US5541033A (en) * 1995-02-01 1996-07-30 Ocg Microelectronic Materials, Inc. Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions
US5750310A (en) * 1995-04-27 1998-05-12 Fuji Photo Film Co., Ltd. Positive photoresist composition
US5652081A (en) * 1995-09-20 1997-07-29 Fuji Photo Film Co., Ltd. Positive working photoresist composition
KR0164962B1 (ko) * 1995-10-14 1999-01-15 김흥기 포지티브형 포토레지스트 조성물
US6177226B1 (en) * 1997-05-01 2001-01-23 Tokyo Ohka Kogyo Co., Ltd. Positive photoresist composition and process for forming contact hole
JP3688469B2 (ja) * 1998-06-04 2005-08-31 東京応化工業株式会社 ポジ型ホトレジスト組成物およびこれを用いたレジストパターンの形成方法
US6506831B2 (en) 1998-12-20 2003-01-14 Honeywell International Inc. Novolac polymer planarization films with high temperature stability
JP3901923B2 (ja) * 2000-09-12 2007-04-04 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP4360844B2 (ja) * 2003-06-16 2009-11-11 富士フイルム株式会社 ポジ型レジスト組成物
KR20060071423A (ko) * 2003-09-18 2006-06-26 미츠비시 가스 가가쿠 가부시키가이샤 레지스트용 화합물 및 감방사선성 조성물
WO2008154484A1 (en) 2007-06-08 2008-12-18 Mannkind Corporation Ire-1a inhibitors
JP6118533B2 (ja) * 2012-06-13 2017-04-19 東京応化工業株式会社 化合物、レジスト組成物、レジストパターン形成方法。
JP5899068B2 (ja) * 2012-06-28 2016-04-06 東京応化工業株式会社 厚膜用ポジ型レジスト組成物、厚膜レジストパターンの製造方法、接続端子の製造方法
KR102060012B1 (ko) * 2013-02-15 2019-12-30 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 이용한 패턴 형성 방법
CN116789562B (zh) * 2023-06-27 2024-06-04 安徽觅拓材料科技有限公司 一种重氮萘醌磺酸酯化合物及其制备方法和应用

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3729034A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden und hiermit hergestelltes lichtempfindliches kopiermaterial
JP2629356B2 (ja) * 1988-06-13 1997-07-09 住友化学工業株式会社 ポジ型レジスト組成物
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
JP2571136B2 (ja) * 1989-11-17 1997-01-16 日本ゼオン株式会社 ポジ型レジスト組成物
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH0486665A (ja) * 1990-07-27 1992-03-19 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
JP3094652B2 (ja) * 1992-05-18 2000-10-03 住友化学工業株式会社 ポジ型レジスト組成物
JP3466218B2 (ja) * 1992-06-04 2003-11-10 住友化学工業株式会社 ポジ型レジスト組成物
JPH06148878A (ja) * 1992-11-04 1994-05-27 Sumitomo Chem Co Ltd ポジ型レジスト組成物
KR100277365B1 (ko) * 1992-11-11 2001-09-17 고사이 아끼오 포지티브형레제스트조성물
US5554481A (en) * 1993-09-20 1996-09-10 Fuji Photo Film Co., Ltd. Positive working photoresist composition

Also Published As

Publication number Publication date
EP0886183A1 (de) 1998-12-23
EP0658807A1 (de) 1995-06-21
EP0658807B1 (de) 2000-04-05
DE69423858D1 (de) 2000-05-11
US5609982A (en) 1997-03-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee