DE69423641T2 - Reflexionsvermindernde oberflächenbeschichtungen - Google Patents

Reflexionsvermindernde oberflächenbeschichtungen

Info

Publication number
DE69423641T2
DE69423641T2 DE69423641T DE69423641T DE69423641T2 DE 69423641 T2 DE69423641 T2 DE 69423641T2 DE 69423641 T DE69423641 T DE 69423641T DE 69423641 T DE69423641 T DE 69423641T DE 69423641 T2 DE69423641 T2 DE 69423641T2
Authority
DE
Germany
Prior art keywords
reflective
surface coatings
reducing surface
reducing
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69423641T
Other languages
English (en)
Other versions
DE69423641D1 (de
Inventor
Sangya Jain
Rudiger Funk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EMD Performance Materials Corp
Original Assignee
Clariant Finance BVI Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd
Application granted granted Critical
Publication of DE69423641D1 publication Critical patent/DE69423641D1/de
Publication of DE69423641T2 publication Critical patent/DE69423641T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69423641T 1993-10-12 1994-10-12 Reflexionsvermindernde oberflächenbeschichtungen Expired - Fee Related DE69423641T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13503693A 1993-10-12 1993-10-12
PCT/US1994/011570 WO1995010798A1 (en) 1993-10-12 1994-10-12 Top anti-reflective coating films

Publications (2)

Publication Number Publication Date
DE69423641D1 DE69423641D1 (de) 2000-04-27
DE69423641T2 true DE69423641T2 (de) 2000-10-19

Family

ID=22466206

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69423641T Expired - Fee Related DE69423641T2 (de) 1993-10-12 1994-10-12 Reflexionsvermindernde oberflächenbeschichtungen

Country Status (7)

Country Link
EP (1) EP0723677B1 (de)
JP (1) JP3492375B2 (de)
KR (1) KR100399848B1 (de)
CN (1) CN1041243C (de)
DE (1) DE69423641T2 (de)
SG (1) SG52630A1 (de)
WO (1) WO1995010798A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5830990A (en) * 1992-07-10 1998-11-03 Clariant Finance (Bvi) Limited Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists
WO1997033201A1 (en) * 1996-03-07 1997-09-12 Clariant International, Ltd. Bottom antireflective coatings through refractive index modification by anomalous dispersion
JP3694703B2 (ja) * 1996-04-25 2005-09-14 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物
US5733714A (en) * 1996-09-30 1998-03-31 Clariant Finance (Bvi) Limited Antireflective coating for photoresist compositions
US5994430A (en) * 1997-04-30 1999-11-30 Clariant Finance Bvi) Limited Antireflective coating compositions for photoresist compositions and use thereof
US5981145A (en) * 1997-04-30 1999-11-09 Clariant Finance (Bvi) Limited Light absorbing polymers
JPH1184640A (ja) * 1997-09-05 1999-03-26 Tokyo Ohka Kogyo Co Ltd 反射防止膜形成用塗布液
KR20020038283A (ko) * 2000-11-17 2002-05-23 박종섭 포토레지스트 단량체, 그의 중합체 및 이를 함유하는포토레지스트 조성물
JP3851594B2 (ja) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物およびパターン形成方法
JP4355944B2 (ja) 2004-04-16 2009-11-04 信越化学工業株式会社 パターン形成方法及びこれに用いるレジスト上層膜材料
KR100574993B1 (ko) 2004-11-19 2006-05-02 삼성전자주식회사 포토레지스트용 탑 코팅 조성물과 이를 이용한포토레지스트 패턴 형성 방법
KR100574496B1 (ko) * 2004-12-15 2006-04-27 주식회사 하이닉스반도체 상부반사방지막 중합체, 그 제조방법 및 이를 함유하는상부반사방지막 조성물
KR100574495B1 (ko) * 2004-12-15 2006-04-27 주식회사 하이닉스반도체 광산발생제 중합체, 그 제조방법 및 이를 함유하는상부반사방지막 조성물
JP4322205B2 (ja) * 2004-12-27 2009-08-26 東京応化工業株式会社 レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法
US7544750B2 (en) * 2005-10-13 2009-06-09 International Business Machines Corporation Top antireflective coating composition with low refractive index at 193nm radiation wavelength
JP4553146B2 (ja) * 2006-01-31 2010-09-29 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法
US11479627B2 (en) 2014-02-12 2022-10-25 Nissan Chemical Industries, Ltd. Film forming composition containing fluorine-containing surfactant

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69214035T2 (de) * 1991-06-28 1997-04-10 Ibm Reflexionsverminderde Überzüge
US5139879A (en) * 1991-09-20 1992-08-18 Allied-Signal Inc. Fluoropolymer blend anti-reflection coatings and coated articles
EP0583918B1 (de) * 1992-08-14 1999-03-10 Japan Synthetic Rubber Co., Ltd. Reflexionsverhindernder Film und Verfahren zur Herstellung von Resistmustern

Also Published As

Publication number Publication date
EP0723677A1 (de) 1996-07-31
SG52630A1 (en) 1998-09-28
WO1995010798A1 (en) 1995-04-20
CN1133096A (zh) 1996-10-09
EP0723677B1 (de) 2000-03-22
DE69423641D1 (de) 2000-04-27
JPH09506185A (ja) 1997-06-17
KR100399848B1 (ko) 2004-06-16
CN1041243C (zh) 1998-12-16
JP3492375B2 (ja) 2004-02-03
KR960705260A (ko) 1996-10-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA

8328 Change in the person/name/address of the agent

Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU

8339 Ceased/non-payment of the annual fee