DE69409480T2 - Einrichtung zur PCVD-Beschichtung geeignet zur Unterdrückung von Polysilanpulver - Google Patents

Einrichtung zur PCVD-Beschichtung geeignet zur Unterdrückung von Polysilanpulver

Info

Publication number
DE69409480T2
DE69409480T2 DE69409480T DE69409480T DE69409480T2 DE 69409480 T2 DE69409480 T2 DE 69409480T2 DE 69409480 T DE69409480 T DE 69409480T DE 69409480 T DE69409480 T DE 69409480T DE 69409480 T2 DE69409480 T2 DE 69409480T2
Authority
DE
Germany
Prior art keywords
suppressing
coating device
device suitable
polysilane powder
pcvd coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69409480T
Other languages
English (en)
Other versions
DE69409480D1 (de
Inventor
Atsushi Chida
Katsuhiko Nomoto
Yoshihiro Yamamoto
Hitoshi Sannomiya
Hiroshi Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Publication of DE69409480D1 publication Critical patent/DE69409480D1/de
Application granted granted Critical
Publication of DE69409480T2 publication Critical patent/DE69409480T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
DE69409480T 1993-12-24 1994-12-22 Einrichtung zur PCVD-Beschichtung geeignet zur Unterdrückung von Polysilanpulver Expired - Lifetime DE69409480T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32663993 1993-12-24
JP18326594A JP3146112B2 (ja) 1993-12-24 1994-08-04 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
DE69409480D1 DE69409480D1 (de) 1998-05-14
DE69409480T2 true DE69409480T2 (de) 1998-10-08

Family

ID=26501778

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69409480T Expired - Lifetime DE69409480T2 (de) 1993-12-24 1994-12-22 Einrichtung zur PCVD-Beschichtung geeignet zur Unterdrückung von Polysilanpulver

Country Status (4)

Country Link
US (1) US5487786A (de)
EP (1) EP0659905B1 (de)
JP (1) JP3146112B2 (de)
DE (1) DE69409480T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5618758A (en) * 1995-02-17 1997-04-08 Sharp Kabushiki Kaisha Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method
JP3983831B2 (ja) * 1995-05-30 2007-09-26 シグマメルテック株式会社 基板ベーキング装置及び基板ベーキング方法
US6337224B1 (en) * 1997-11-10 2002-01-08 Kaneka Corporation Method of producing silicon thin-film photoelectric transducer and plasma CVD apparatus used for the method
AUPP055497A0 (en) * 1997-11-26 1997-12-18 Pacific Solar Pty Limited High rate deposition of amorphous silicon films
JP3189780B2 (ja) * 1998-03-24 2001-07-16 日本電気株式会社 半導体装置の製造装置及びその製造方法
AU2002212963A1 (en) * 2000-10-25 2002-05-06 Tokyo Electron Limited Method of and structure for controlling electrode temperature
US7032536B2 (en) * 2002-10-11 2006-04-25 Sharp Kabushiki Kaisha Thin film formation apparatus including engagement members for support during thermal expansion
US8317968B2 (en) * 2004-04-30 2012-11-27 Lam Research Corporation Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
US7712434B2 (en) * 2004-04-30 2010-05-11 Lam Research Corporation Apparatus including showerhead electrode and heater for plasma processing
CN101164156A (zh) * 2005-08-05 2008-04-16 东京毅力科创株式会社 基板处理装置和用于该基板处理装置的基板载置台
CN101283455B (zh) * 2005-10-03 2010-04-21 夏普株式会社 硅基薄膜光电转换装置、及其制造方法和制造设备
WO2008030047A1 (en) * 2006-09-06 2008-03-13 Seoul National University Industry Foundation Apparatus and method of depositing films using bias and charging behavior of nanoparticles formed during chemical vapor deposition
JP5010235B2 (ja) * 2006-10-26 2012-08-29 株式会社ニューフレアテクノロジー 気相成長方法
CN101548365B (zh) 2007-02-23 2011-01-26 三菱重工业株式会社 真空处理方法以及真空处理装置
CN107123639B (zh) * 2017-05-16 2019-07-05 京东方科技集团股份有限公司 一种待成膜基板及等离子体设备

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS591671A (ja) * 1982-05-28 1984-01-07 Fujitsu Ltd プラズマｃｖｄ装置
JPS58209110A (ja) * 1982-05-31 1983-12-06 Hitachi Ltd プラズマ気相成長装置
DE3587369D1 (de) * 1984-01-28 1993-07-01 Philips Patentverwaltung Vorrichtung zur beschichtung eines substrates mittels plasma-chemical vapour deposition oder kathodenzerstaeubung und damit ausgefuehrtes verfahren.
JPS6113616A (ja) * 1984-06-28 1986-01-21 Fujitsu Ltd アモルフアスシリコン膜の成長装置
FR2589168B1 (fr) * 1985-10-25 1992-07-17 Solems Sa Appareil et son procede d'utilisation pour la formation de films minces assistee par plasma
FR2621930B1 (fr) * 1987-10-15 1990-02-02 Solems Sa Procede et appareil pour la production par plasma de couches minces a usage electronique et/ou optoelectronique
JP2512783B2 (ja) * 1988-04-20 1996-07-03 株式会社日立製作所 プラズマエッチング方法及び装置
JPH0254922A (ja) * 1988-08-19 1990-02-23 Fuji Electric Co Ltd プラズマｃｖｄ装置
US5071670A (en) * 1990-06-11 1991-12-10 Kelly Michael A Method for chemical vapor deposition under a single reactor vessel divided into separate reaction chambers each with its own depositing and exhausting means
DE4029268C2 (de) * 1990-09-14 1995-07-06 Balzers Hochvakuum Verfahren zur gleichspannungs-bogenentladungs-unterstützten, reaktiven Behandlung von Gut und Vakuumbehandlungsanlage zur Durchführung
DE4108001C1 (de) * 1991-03-13 1992-07-09 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
US5324360A (en) * 1991-05-21 1994-06-28 Canon Kabushiki Kaisha Method for producing non-monocrystalline semiconductor device and apparatus therefor
DE4324320B4 (de) * 1992-07-24 2006-08-31 Fuji Electric Co., Ltd., Kawasaki Verfahren und Vorrichtung zur Herstellung einer als dünne Schicht ausgebildeten fotovoltaischen Umwandlungsvorrichtung
DE4235064A1 (de) * 1992-10-17 1994-04-21 Leybold Ag Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung
US5271963A (en) * 1992-11-16 1993-12-21 Materials Research Corporation Elimination of low temperature ammonia salt in TiCl4 NH3 CVD reaction

Also Published As

Publication number Publication date
DE69409480D1 (de) 1998-05-14
US5487786A (en) 1996-01-30
JPH07230960A (ja) 1995-08-29
JP3146112B2 (ja) 2001-03-12
EP0659905A1 (de) 1995-06-28
EP0659905B1 (de) 1998-04-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition