DE69304522D1 - Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtung - Google Patents
Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtungInfo
- Publication number
- DE69304522D1 DE69304522D1 DE69304522T DE69304522T DE69304522D1 DE 69304522 D1 DE69304522 D1 DE 69304522D1 DE 69304522 T DE69304522 T DE 69304522T DE 69304522 T DE69304522 T DE 69304522T DE 69304522 D1 DE69304522 D1 DE 69304522D1
- Authority
- DE
- Germany
- Prior art keywords
- stabilizer
- radio frequency
- switching mode
- frequency plasma
- plasma device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
- H02M7/42—Conversion of dc power input into ac power output without possibility of reversal
- H02M7/44—Conversion of dc power input into ac power output without possibility of reversal by static converters
- H02M7/48—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Power Engineering (AREA)
- Amplifiers (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86979492A | 1992-04-16 | 1992-04-16 | |
PCT/US1993/003543 WO1993021685A1 (en) | 1992-04-16 | 1993-04-15 | Stabilizer for switch-mode powered rf plasma processing |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69304522D1 true DE69304522D1 (de) | 1996-10-10 |
DE69304522T2 DE69304522T2 (de) | 1997-01-23 |
Family
ID=25354279
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69304522T Expired - Lifetime DE69304522T2 (de) | 1992-04-16 | 1993-04-15 | Stabilisator fuer schalt-mode geleistet radio-frequenz plasma einrichtung |
Country Status (5)
Country | Link |
---|---|
US (2) | US5747935A (de) |
EP (1) | EP0636285B1 (de) |
JP (1) | JP2710467B2 (de) |
DE (1) | DE69304522T2 (de) |
WO (1) | WO1993021685A1 (de) |
Families Citing this family (80)
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US6150628A (en) * | 1997-06-26 | 2000-11-21 | Applied Science And Technology, Inc. | Toroidal low-field reactive gas source |
US7569790B2 (en) * | 1997-06-26 | 2009-08-04 | Mks Instruments, Inc. | Method and apparatus for processing metal bearing gases |
US6924455B1 (en) | 1997-06-26 | 2005-08-02 | Applied Science & Technology, Inc. | Integrated plasma chamber and inductively-coupled toroidal plasma source |
US6815633B1 (en) | 1997-06-26 | 2004-11-09 | Applied Science & Technology, Inc. | Inductively-coupled toroidal plasma source |
US8779322B2 (en) | 1997-06-26 | 2014-07-15 | Mks Instruments Inc. | Method and apparatus for processing metal bearing gases |
US7166816B1 (en) * | 1997-06-26 | 2007-01-23 | Mks Instruments, Inc. | Inductively-coupled torodial plasma source |
US6442158B1 (en) | 1998-05-27 | 2002-08-27 | 3Com Corporation | Method and system for quality-of-service based data forwarding in a data-over-cable system |
US6579805B1 (en) * | 1999-01-05 | 2003-06-17 | Ronal Systems Corp. | In situ chemical generator and method |
EP1171946B1 (de) * | 1999-03-23 | 2006-08-30 | Advanced Energy Industries, Inc. | Gleichstromgespeistes rechnersystem mit einem hochfrequenzschaltnetzteil |
US6694438B1 (en) | 1999-07-02 | 2004-02-17 | Advanced Energy Industries, Inc. | System for controlling the delivery of power to DC computer components |
US6451389B1 (en) * | 1999-04-17 | 2002-09-17 | Advanced Energy Industries, Inc. | Method for deposition of diamond like carbon |
US6545450B1 (en) | 1999-07-02 | 2003-04-08 | Advanced Energy Industries, Inc. | Multiple power converter system using combining transformers |
EP1272014B1 (de) * | 1999-07-22 | 2009-09-09 | MKS Instruments, Inc. | Plasma-Stromversorgung mit Schutzschaltung |
US7180758B2 (en) * | 1999-07-22 | 2007-02-20 | Mks Instruments, Inc. | Class E amplifier with inductive clamp |
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US6469919B1 (en) * | 1999-07-22 | 2002-10-22 | Eni Technology, Inc. | Power supplies having protection circuits |
US7838842B2 (en) * | 1999-12-13 | 2010-11-23 | Semequip, Inc. | Dual mode ion source for ion implantation |
TW492041B (en) | 2000-02-14 | 2002-06-21 | Tokyo Electron Ltd | Method and device for attenuating harmonics in semiconductor plasma processing systems |
WO2002015649A2 (en) | 2000-08-17 | 2002-02-21 | Tokyo Electron Limited | Close coupled match structure for rf drive electrode |
US6760367B1 (en) | 2000-09-26 | 2004-07-06 | Eni Technology, Inc. | Internal noise immune data communications scheme |
US6631693B2 (en) * | 2001-01-30 | 2003-10-14 | Novellus Systems, Inc. | Absorptive filter for semiconductor processing systems |
US6750711B2 (en) | 2001-04-13 | 2004-06-15 | Eni Technology, Inc. | RF power amplifier stability |
US6920312B1 (en) | 2001-05-31 | 2005-07-19 | Lam Research Corporation | RF generating system with fast loop control |
US20040233690A1 (en) * | 2001-08-17 | 2004-11-25 | Ledenev Anatoli V. | Multiple power converter system using combining transformers |
US7132996B2 (en) * | 2001-10-09 | 2006-11-07 | Plasma Control Systems Llc | Plasma production device and method and RF driver circuit |
US7084832B2 (en) * | 2001-10-09 | 2006-08-01 | Plasma Control Systems, Llc | Plasma production device and method and RF driver circuit with adjustable duty cycle |
US7100532B2 (en) * | 2001-10-09 | 2006-09-05 | Plasma Control Systems, Llc | Plasma production device and method and RF driver circuit with adjustable duty cycle |
TW200300951A (en) * | 2001-12-10 | 2003-06-16 | Tokyo Electron Ltd | Method and device for removing harmonics in semiconductor plasma processing systems |
DE10211609B4 (de) * | 2002-03-12 | 2009-01-08 | Hüttinger Elektronik GmbH & Co. KG | Verfahren und Leistungsverstärker zur Erzeugung von sinusförmigen Hochfrequenzsignalen zum Betreiben einer Last |
US6774569B2 (en) * | 2002-07-11 | 2004-08-10 | Fuji Photo Film B.V. | Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions |
JP3641785B2 (ja) * | 2002-08-09 | 2005-04-27 | 株式会社京三製作所 | プラズマ発生用電源装置 |
DE10252146B4 (de) * | 2002-11-09 | 2012-03-29 | Hüttinger Elektronik Gmbh + Co. Kg | Verfahren zum Erzeugen einer hochfrequenten Wechselspannung sowie Hochfrequenz-Leistungsverstärker dafür |
US8057468B2 (en) | 2002-12-17 | 2011-11-15 | Bovie Medical Corporation | Method to generate a plasma stream for performing electrosurgery |
US7375035B2 (en) | 2003-04-29 | 2008-05-20 | Ronal Systems Corporation | Host and ancillary tool interface methodology for distributed processing |
EP1689907A4 (de) * | 2003-06-19 | 2008-07-23 | Plasma Control Systems Llc | Plasmaherstellungseinrichtung und verfahren und hf-treiberschaltung mit einstellbarem tastverhältnis |
US7429714B2 (en) * | 2003-06-20 | 2008-09-30 | Ronal Systems Corporation | Modular ICP torch assembly |
US7049751B2 (en) * | 2003-07-16 | 2006-05-23 | Advanced Energy Industries, Inc | Termination of secondary frequencies in RF power delivery |
DE10336881B4 (de) * | 2003-08-11 | 2008-05-15 | Hüttinger Elektronik GmbH & Co. KG | Hochfrequenzanregungsanordnung mit einer Begrenzungsschaltung |
US7755300B2 (en) * | 2003-09-22 | 2010-07-13 | Mks Instruments, Inc. | Method and apparatus for preventing instabilities in radio-frequency plasma processing |
US7042311B1 (en) | 2003-10-10 | 2006-05-09 | Novellus Systems, Inc. | RF delivery configuration in a plasma processing system |
US7157857B2 (en) * | 2003-12-19 | 2007-01-02 | Advanced Energy Industries, Inc. | Stabilizing plasma and generator interactions |
JP4668208B2 (ja) * | 2003-12-22 | 2011-04-13 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | 大気圧グロープラズマを用いて基板表面から汚物を除去する方法及び装置 |
EP1548795A1 (de) * | 2003-12-22 | 2005-06-29 | Fuji Photo Film B.V. | Procédé et dispositif de stabilisation d'un plasma à décharge luminescente sous conditions atmosphériques |
EP1626613B8 (de) * | 2004-08-13 | 2007-03-07 | Fuji Film Manufacturing Europe B.V. | Verfahren und Vorrichtung zur Steuerung eines Glühentladungsplasmas unter atmosphärischem Druck |
US7234055B2 (en) * | 2004-08-24 | 2007-06-19 | Inventec Corporation | Computer operating booting system making use of multi-buttons |
JP4344886B2 (ja) * | 2004-09-06 | 2009-10-14 | 東京エレクトロン株式会社 | プラズマ処理装置 |
PL1701376T3 (pl) * | 2005-03-10 | 2007-04-30 | Huettinger Elektronik Gmbh Co Kg | Próżniowy generator plazmowy |
US7780814B2 (en) * | 2005-07-08 | 2010-08-24 | Applied Materials, Inc. | Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products |
US7353771B2 (en) * | 2005-11-07 | 2008-04-08 | Mks Instruments, Inc. | Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
US7459899B2 (en) | 2005-11-21 | 2008-12-02 | Thermo Fisher Scientific Inc. | Inductively-coupled RF power source |
US7777567B2 (en) * | 2007-01-25 | 2010-08-17 | Mks Instruments, Inc. | RF power amplifier stability network |
US7570028B2 (en) * | 2007-04-26 | 2009-08-04 | Advanced Energy Industries, Inc. | Method and apparatus for modifying interactions between an electrical generator and a nonlinear load |
US9479202B2 (en) * | 2008-02-19 | 2016-10-25 | Infineon Technologies Ag | System and method for burst mode amplifier |
US8994270B2 (en) | 2008-05-30 | 2015-03-31 | Colorado State University Research Foundation | System and methods for plasma application |
JP2011521735A (ja) | 2008-05-30 | 2011-07-28 | コロラド ステート ユニバーシティ リサーチ ファンデーション | プラズマを発生させるためのシステム、方法、および装置 |
US9288886B2 (en) | 2008-05-30 | 2016-03-15 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
US8692466B2 (en) * | 2009-02-27 | 2014-04-08 | Mks Instruments Inc. | Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator |
US8674606B2 (en) * | 2009-04-27 | 2014-03-18 | Advanced Energy Industries, Inc. | Detecting and preventing instabilities in plasma processes |
US8716984B2 (en) | 2009-06-29 | 2014-05-06 | Advanced Energy Industries, Inc. | Method and apparatus for modifying the sensitivity of an electrical generator to a nonlinear load |
US9649143B2 (en) * | 2009-09-23 | 2017-05-16 | Bovie Medical Corporation | Electrosurgical system to generate a pulsed plasma stream and method thereof |
US8222822B2 (en) | 2009-10-27 | 2012-07-17 | Tyco Healthcare Group Lp | Inductively-coupled plasma device |
DE102009046754A1 (de) * | 2009-11-17 | 2011-05-19 | Hüttinger Elektronik GmbH + Co.KG | Verfahren zum Betrieb einer Plasmaversorgungseinrichtung |
US8795265B2 (en) | 2010-01-28 | 2014-08-05 | Bovie Medical Corporation | Electrosurgical apparatus to generate a dual plasma stream and method thereof |
CA2794902A1 (en) | 2010-03-31 | 2011-10-06 | Colorado State University Research Foundation | Liquid-gas interface plasma device |
JP2013529352A (ja) | 2010-03-31 | 2013-07-18 | コロラド ステート ユニバーシティー リサーチ ファウンデーション | 液体−気体界面プラズマデバイス |
US8344801B2 (en) | 2010-04-02 | 2013-01-01 | Mks Instruments, Inc. | Variable class characteristic amplifier |
US9387269B2 (en) | 2011-01-28 | 2016-07-12 | Bovie Medical Corporation | Cold plasma jet hand sanitizer |
US8373504B2 (en) * | 2011-05-12 | 2013-02-12 | Texas Instruments Incorporated | Class D power amplifier |
US9279722B2 (en) | 2012-04-30 | 2016-03-08 | Agilent Technologies, Inc. | Optical emission system including dichroic beam combiner |
US9532826B2 (en) | 2013-03-06 | 2017-01-03 | Covidien Lp | System and method for sinus surgery |
US9555145B2 (en) | 2013-03-13 | 2017-01-31 | Covidien Lp | System and method for biofilm remediation |
CA2928376C (en) | 2013-10-23 | 2023-03-07 | Perkinelmer Health Sciences, Inc. | Hybrid generators and methods of using them |
US9635750B2 (en) | 2013-10-23 | 2017-04-25 | Perkinelmer Health Sciences, Inc. | Oscillator generators and methods of using them |
WO2017096112A1 (en) | 2015-12-02 | 2017-06-08 | Bovie Medical Corporation | Mixing cold plasma beam jets with atmosphere |
WO2017189702A1 (en) * | 2016-04-27 | 2017-11-02 | Perkinelmer Health Sciences, Inc. | Oscillator generators and methods of using them |
US10918433B2 (en) | 2016-09-27 | 2021-02-16 | Apyx Medical Corporation | Devices, systems and methods for enhancing physiological effectiveness of medical cold plasma discharges |
KR102603678B1 (ko) * | 2020-10-13 | 2023-11-21 | 세메스 주식회사 | 기판 처리 장치 및 기판 처리 방법 |
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-
1993
- 1993-04-15 WO PCT/US1993/003543 patent/WO1993021685A1/en active IP Right Grant
- 1993-04-15 JP JP5518604A patent/JP2710467B2/ja not_active Expired - Fee Related
- 1993-04-15 DE DE69304522T patent/DE69304522T2/de not_active Expired - Lifetime
- 1993-04-15 EP EP93912253A patent/EP0636285B1/de not_active Expired - Lifetime
-
1994
- 1994-10-14 US US08/318,777 patent/US5747935A/en not_active Expired - Lifetime
-
1998
- 1998-05-05 US US09/072,613 patent/US6046546A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2710467B2 (ja) | 1998-02-10 |
WO1993021685A1 (en) | 1993-10-28 |
US6046546A (en) | 2000-04-04 |
JPH07505974A (ja) | 1995-06-29 |
EP0636285B1 (de) | 1996-09-04 |
DE69304522T2 (de) | 1997-01-23 |
US5747935A (en) | 1998-05-05 |
EP0636285A1 (de) | 1995-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: WITTE, WELLER, GAHLERT, OTTEN & STEIL, 70178 STUTT |
|
8310 | Action for declaration of annulment | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: WITTE, WELLER & PARTNER, 70178 STUTTGART |