DE69223062T2 - Verfahren zur überwachung eines atmosphärendruckglimmentladungsplasma - Google Patents

Verfahren zur überwachung eines atmosphärendruckglimmentladungsplasma

Info

Publication number
DE69223062T2
DE69223062T2 DE69223062T DE69223062T DE69223062T2 DE 69223062 T2 DE69223062 T2 DE 69223062T2 DE 69223062 T DE69223062 T DE 69223062T DE 69223062 T DE69223062 T DE 69223062T DE 69223062 T2 DE69223062 T2 DE 69223062T2
Authority
DE
Germany
Prior art keywords
glowing
monitoring
atmospheric pressure
plasma
charging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69223062T
Other languages
English (en)
Other versions
DE69223062D1 (de
Inventor
Satiko Okazaki
Masuhiro Ogoma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of DE69223062D1 publication Critical patent/DE69223062D1/de
Publication of DE69223062T2 publication Critical patent/DE69223062T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0081—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Vapour Deposition (AREA)
DE69223062T 1991-12-10 1992-12-09 Verfahren zur überwachung eines atmosphärendruckglimmentladungsplasma Expired - Fee Related DE69223062T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP32620991 1991-12-10
JP18927492A JP3149272B2 (ja) 1991-12-10 1992-07-16 大気圧グロー放電プラズマのモニター方法
PCT/JP1992/001606 WO1993012632A1 (en) 1991-12-10 1992-12-09 Method of monitoring atmospheric pressure glow discharge plasma

Publications (2)

Publication Number Publication Date
DE69223062D1 DE69223062D1 (de) 1997-12-11
DE69223062T2 true DE69223062T2 (de) 1998-02-26

Family

ID=26505386

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69223062T Expired - Fee Related DE69223062T2 (de) 1991-12-10 1992-12-09 Verfahren zur überwachung eines atmosphärendruckglimmentladungsplasma

Country Status (5)

Country Link
US (1) US5539303A (de)
EP (1) EP0619694B1 (de)
JP (1) JP3149272B2 (de)
DE (1) DE69223062T2 (de)
WO (1) WO1993012632A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019204818A1 (de) * 2019-04-04 2020-10-08 Robert Bosch Gmbh Verfahren zur Überwachung eines plasmagestützten Prozesses zur Beschichtung eines Bauteils und Vorrichtung zur Beschichtung eines Bauteils

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3040358B2 (ja) * 1996-05-24 2000-05-15 積水化学工業株式会社 グロー放電プラズマ処理方法及びその装置
US5968377A (en) * 1996-05-24 1999-10-19 Sekisui Chemical Co., Ltd. Treatment method in glow-discharge plasma and apparatus thereof
FR2782837B1 (fr) * 1998-08-28 2000-09-29 Air Liquide Procede et dispositif de traitement de surface par plasma a pression atmospherique
DE19848636C2 (de) * 1998-10-22 2001-07-26 Fraunhofer Ges Forschung Verfahren zur Überwachung einer Wechselspannungs-Entladung an einer Doppelelektrode
CA2395156A1 (en) 1999-12-20 2001-06-28 Henry Moncrieff O'connor Method for generating and displaying complex data utilizing color-coded signals
WO2002075332A1 (en) * 2001-03-16 2002-09-26 Tokyo Electron Limited Impedance monitoring system and method
KR100615962B1 (ko) * 2001-10-22 2006-08-28 시바우라 메카트로닉스 가부시키가이샤 글로 방전 장치의 아크 판정 방법 및 고주파 아크 방전억제 장치
WO2005057202A1 (de) * 2003-12-15 2005-06-23 Swiss E-Technik Ag Verfahren und vorrichtung zur elektrischen prüfung von kraftstoffen und brennstoffen unter eines plasmas
EP1548795A1 (de) * 2003-12-22 2005-06-29 Fuji Photo Film B.V. Procédé et dispositif de stabilisation d'un plasma à décharge luminescente sous conditions atmosphériques
EP1924861A2 (de) * 2005-09-15 2008-05-28 Honeywell International Inc. Lichtbögenfehlererkennung und -bestätigung durch spannungs- und stromanalyse
WO2013077126A1 (ja) * 2011-11-22 2013-05-30 独立行政法人産業技術総合研究所 プラズマ評価装置
JP6704641B2 (ja) * 2016-02-26 2020-06-03 ダイハツ工業株式会社 プラズマリアクタ用制御装置
JP6511998B2 (ja) * 2015-07-03 2019-05-15 Ｊｆｅスチール株式会社 絶縁劣化測定方法及び絶縁劣化測定装置
JP6858441B2 (ja) * 2016-07-29 2021-04-14 ダイハツ工業株式会社 プラズマリアクタの異常検出装置
CN111725091A (zh) * 2019-03-22 2020-09-29 北京北方华创微电子装备有限公司 优化工艺流程的方法及装置、存储介质和半导体处理设备
JP7067516B2 (ja) * 2019-03-26 2022-05-16 日本電産株式会社 プラズマ処理装置
JP2021026811A (ja) * 2019-07-31 2021-02-22 日本電産株式会社 プラズマ処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3833851A (en) * 1971-10-15 1974-09-03 Mobil Oil Corp Systems for measuring the properties of plasma with an ion probe
US4207137A (en) * 1979-04-13 1980-06-10 Bell Telephone Laboratories, Incorporated Method of controlling a plasma etching process by monitoring the impedance changes of the RF power
JPS5769324A (en) * 1980-10-11 1982-04-28 Daiwa Dengiyou Kk Monitor device of dc power supply
JPS62122188A (ja) * 1985-11-21 1987-06-03 Komatsu Ltd 無声放電式レ−ザの放電電力測定方法
JPH0719771B2 (ja) * 1986-09-22 1995-03-06 株式会社日立製作所 放電異常検出装置
JPH0672308B2 (ja) * 1988-07-04 1994-09-14 新技術事業団 大気圧プラズマ反応方法
JPH02122188A (ja) * 1988-10-31 1990-05-09 Matsushita Refrig Co Ltd 生鮮物貯蔵装置
US5359282A (en) * 1990-11-16 1994-10-25 Nichimen Kabushiki Kaisha Plasma diagnosing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102019204818A1 (de) * 2019-04-04 2020-10-08 Robert Bosch Gmbh Verfahren zur Überwachung eines plasmagestützten Prozesses zur Beschichtung eines Bauteils und Vorrichtung zur Beschichtung eines Bauteils

Also Published As

Publication number Publication date
JP3149272B2 (ja) 2001-03-26
WO1993012632A1 (en) 1993-06-24
JPH05217690A (ja) 1993-08-27
US5539303A (en) 1996-07-23
EP0619694B1 (de) 1997-11-05
EP0619694A1 (de) 1994-10-12
DE69223062D1 (de) 1997-12-11
EP0619694A4 (de) 1995-02-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee