DE69219631T2 - Lithographische Vorrichtung mit einem aufgehängten Objekttisch - Google Patents

Lithographische Vorrichtung mit einem aufgehängten Objekttisch

Info

Publication number
DE69219631T2
DE69219631T2 DE69219631T DE69219631T DE69219631T2 DE 69219631 T2 DE69219631 T2 DE 69219631T2 DE 69219631 T DE69219631 T DE 69219631T DE 69219631 T DE69219631 T DE 69219631T DE 69219631 T2 DE69219631 T2 DE 69219631T2
Authority
DE
Germany
Prior art keywords
lithographic device
suspended stage
suspended
stage
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69219631T
Other languages
English (en)
Other versions
DE69219631D1 (de
Inventor
Dominicus Jacobus Franken
Franciscus Mathijs Jacobs
Kimmenade Johannes Mathijs Van
Dijk Cornelis Dionysius Van
Eijk Jan Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV, Philips Electronics NV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE69219631D1 publication Critical patent/DE69219631D1/de
Publication of DE69219631T2 publication Critical patent/DE69219631T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/04—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using elastic means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/022—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using dampers and springs in combination
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/0232—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means with at least one gas spring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69219631T 1991-02-05 1992-01-29 Lithographische Vorrichtung mit einem aufgehängten Objekttisch Expired - Fee Related DE69219631T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9100202A NL9100202A (nl) 1991-02-05 1991-02-05 Lithografische inrichting met een hangende objecttafel.

Publications (2)

Publication Number Publication Date
DE69219631D1 DE69219631D1 (de) 1997-06-19
DE69219631T2 true DE69219631T2 (de) 1997-11-06

Family

ID=19858831

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69219631T Expired - Fee Related DE69219631T2 (de) 1991-02-05 1992-01-29 Lithographische Vorrichtung mit einem aufgehängten Objekttisch

Country Status (6)

Country Link
US (1) US5150153A (de)
EP (1) EP0498496B1 (de)
JP (1) JP3254233B2 (de)
KR (1) KR100210324B1 (de)
DE (1) DE69219631T2 (de)
NL (1) NL9100202A (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6989647B1 (en) 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US7365513B1 (en) 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
JP3484684B2 (ja) * 1994-11-01 2004-01-06 株式会社ニコン ステージ装置及び走査型露光装置
US6721034B1 (en) 1994-06-16 2004-04-13 Nikon Corporation Stage unit, drive table, and scanning exposure apparatus using the same
US5850280A (en) 1994-06-16 1998-12-15 Nikon Corporation Stage unit, drive table, and scanning exposure and apparatus using same
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
US6008500A (en) * 1995-04-04 1999-12-28 Nikon Corporation Exposure apparatus having dynamically isolated reaction frame
JP3506158B2 (ja) 1995-04-14 2004-03-15 株式会社ニコン 露光装置及び走査型露光装置、並びに走査露光方法
TW318255B (de) 1995-05-30 1997-10-21 Philips Electronics Nv
TW316874B (de) * 1995-05-30 1997-10-01 Philips Electronics Nv
EP0772800B1 (de) * 1995-05-30 2000-05-10 Asm Lithography B.V. Lithographisches gerät mit einem sowie horizontal als auch vertikal justierbaren maskenhalter
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
JP2000505958A (ja) * 1996-12-24 2000-05-16 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ ２個の物品ホルダを有する二次元バランス位置決め装置及びこの位置決め装置を有するリソグラフ装置
US5815246A (en) * 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
JPH10209035A (ja) * 1997-01-23 1998-08-07 Nikon Corp 露光装置
WO1998040791A1 (en) 1997-03-10 1998-09-17 Koninklijke Philips Electronics N.V. Positioning device having two object holders
KR100522886B1 (ko) * 1997-07-22 2005-10-19 에이에스엠엘 네델란즈 비.브이. 가스베어링을 구비한 지지장치
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
TW509823B (en) 2000-04-17 2002-11-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6774981B1 (en) 2000-09-08 2004-08-10 Nikon Corporation Modular exposure apparatus with removable optical device and improved isolation of the optical device
JP2002289515A (ja) * 2000-12-28 2002-10-04 Nikon Corp 製品の製造方法、露光装置の製造方法、露光装置、及びデバイス製造方法
US6646719B2 (en) * 2001-01-31 2003-11-11 Nikon Corporation Support assembly for an exposure apparatus
JP5109661B2 (ja) * 2005-10-05 2012-12-26 株式会社ニコン 露光装置及び露光方法
KR100745371B1 (ko) * 2006-10-23 2007-08-02 삼성전자주식회사 자기부상형 웨이퍼 스테이지
NL2004752A (en) * 2009-06-19 2010-12-20 Asml Netherlands Bv Coil, positioning device, actuator, and lithographic apparatus.
CN107327665A (zh) * 2017-08-17 2017-11-07 刘兵 一种机电设备减震装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
US4431304A (en) * 1981-11-25 1984-02-14 Mayer Herbert E Apparatus for the projection copying of mask patterns on a workpiece
US4937618A (en) * 1984-10-18 1990-06-26 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
US4676630A (en) * 1985-04-25 1987-06-30 Canon Kabushiki Kaisha Exposure apparatus
US4676649A (en) * 1985-11-27 1987-06-30 Compact Spindle Bearing Corp. Multi-axis gas bearing stage assembly
JPS62200726A (ja) * 1986-02-28 1987-09-04 Canon Inc 露光装置
JPH0658410B2 (ja) * 1986-05-23 1994-08-03 株式会社ニコン ステ−ジ装置
NL8601547A (nl) * 1986-06-16 1988-01-18 Philips Nv Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.
JPH0812843B2 (ja) * 1989-03-15 1996-02-07 日本精工株式会社 光学結像装置及び方法

Also Published As

Publication number Publication date
EP0498496A1 (de) 1992-08-12
JPH04319956A (ja) 1992-11-10
JP3254233B2 (ja) 2002-02-04
KR920016897A (ko) 1992-09-25
EP0498496B1 (de) 1997-05-14
NL9100202A (nl) 1992-09-01
KR100210324B1 (ko) 1999-07-15
US5150153A (en) 1992-09-22
DE69219631D1 (de) 1997-06-19

Similar Documents

Publication Publication Date Title
DE69219631T2 (de) Lithographische Vorrichtung mit einem aufgehängten Objekttisch
DE69131879D1 (de) Lichtventil Vorrichtung
DE69227343D1 (de) Vorrichtung zur Kontrolle einer Entwicklerlösung
DE69314669T2 (de) Verbesserungen an einem spielzeug oder einer edukativen vorrichtung
DE69421668T2 (de) Vorrichtung zum beleuchten einer fläche
DE69405587D1 (de) Tracheostoma vorrichtung
DE69212387T2 (de) Intravenöse Vorrichtung
DE69211181T2 (de) Selbstschmierende Vorrichtung
FI921040A0 (fi) Muodon mukaan lajitteleva laite
DE69122875T2 (de) Vorrichtung zur höheneinstellung einer plattform
DE69327281T2 (de) Künstliche endokrine vorrichtung
DE9411987U1 (de) Vorrichtung zum lösbaren Verbinden eines fotografischen oder optischen Gerätes mit einem Stativ o.dgl.
DE69129218T2 (de) Lichtemittierende Vorrichtung
DE69127484T2 (de) Vorrichtung zur Durchführung einer y/c-Trennung
DE69223478T2 (de) Photovoltaische Vorrichtung
DE69207974D1 (de) Lichtemittierende Vorrichtung
DE69221664T2 (de) Optoelektronischen Vorrichtung
DE69122111T2 (de) Vorrichtung zum Sammeln von bodenbedeckender Plastikfolie
DE69427771D1 (de) Vorrichtung mit kurzwelliger Lichtquelle
DE69230886D1 (de) Vorrichtung mit optischem gitter
DE69226049D1 (de) Vorrichtung eines Plattenspielers
DE69219186D1 (de) Elektrooptische Vorrichtung
DE69029181T2 (de) Vorrichtung zur Belichtungssteuerung in einer Kamera
DE69112038T2 (de) Vorrichtung zum orientieren einer speicherleuchtschirmkassette.
DE69228931T2 (de) Rückstrahlende Vorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8327 Change in the person/name/address of the patent owner

Owner name: ASM LITHOGRAPHY B.V., VELDHOVEN, NL

8339 Ceased/non-payment of the annual fee