DE68928661D1 - Positiv arbeitende Photolack-Zusammensetzung - Google Patents

Positiv arbeitende Photolack-Zusammensetzung

Info

Publication number
DE68928661D1
DE68928661D1 DE68928661T DE68928661T DE68928661D1 DE 68928661 D1 DE68928661 D1 DE 68928661D1 DE 68928661 T DE68928661 T DE 68928661T DE 68928661 T DE68928661 T DE 68928661T DE 68928661 D1 DE68928661 D1 DE 68928661D1
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68928661T
Other languages
English (en)
Other versions
DE68928661T2 (de
Inventor
Kazuya C O Fuji Photo Uenishi
Shinji C O Fuji Phot Sakaguchi
Tadayoshi C O Fuji Phot Kokubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE68928661D1 publication Critical patent/DE68928661D1/de
Publication of DE68928661T2 publication Critical patent/DE68928661T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE1989628661 1988-09-07 1989-09-06 Positiv arbeitende Photolack-Zusammensetzung Expired - Fee Related DE68928661T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22374088A JP2574692B2 (ja) 1988-09-07 1988-09-07 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
DE68928661D1 true DE68928661D1 (de) 1998-06-10
DE68928661T2 DE68928661T2 (de) 1998-11-26

Family

ID=16802949

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989628661 Expired - Fee Related DE68928661T2 (de) 1988-09-07 1989-09-06 Positiv arbeitende Photolack-Zusammensetzung

Country Status (3)

Country Link
EP (1) EP0358194B1 (de)
JP (1) JP2574692B2 (de)
DE (1) DE68928661T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2919142B2 (ja) * 1990-12-27 1999-07-12 株式会社東芝 感光性組成物およびそれを用いたパターン形成方法
JP2655384B2 (ja) * 1991-11-08 1997-09-17 富士写真フイルム株式会社 ポジ型レジスト組成物
US5221592A (en) * 1992-03-06 1993-06-22 Hoechst Celanese Corporation Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1304424A (fr) * 1961-10-24 1962-09-21 Ciba Geigy Procédé d'obtention de colorants au soufre
JPS5338621B1 (de) * 1971-03-08 1978-10-17
JPS5657035A (en) * 1979-10-15 1981-05-19 Fuji Yakuhin Kogyo Kk Positive type photosensitive composition
JPS61245154A (ja) * 1985-04-23 1986-10-31 Dainippon Ink & Chem Inc 感光性組成物

Also Published As

Publication number Publication date
DE68928661T2 (de) 1998-11-26
EP0358194A3 (de) 1990-10-17
JPH0272363A (ja) 1990-03-12
EP0358194A2 (de) 1990-03-14
EP0358194B1 (de) 1998-05-06
JP2574692B2 (ja) 1997-01-22

Similar Documents

Publication Publication Date Title
DE69027099D1 (de) Positiv arbeitende Photolackzusammensetzung
DE69126834D1 (de) Positiv arbeitende Photoresistzusammensetzung
DE68926019D1 (de) Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
DE69033212D1 (de) Positiv arbeitende Photolack-Zusammensetzung
DE69329408D1 (de) Positiv arbeitende Photolackzusammensetzung
DE69130125D1 (de) Positiv arbeitende Photolackzusammensetzung
DE69019706D1 (de) Positiv-arbeitende Photolackzusammensetzung.
DE3751743D1 (de) Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
DE68926516D1 (de) Lichtempfindliche Zusammensetzung
DE69423800D1 (de) Positiv arbeitende fotoempfindliche Zusammensetzung
BR8906955A (pt) Composicao detergente
DE69327678D1 (de) Positiv arbeitende Resistzusammensetzung
DE69232042D1 (de) Positiv-arbeitende lichtempfindliche Zusammensetzung
DE68927140D1 (de) Photolackzusammensetzung
DK2796A (da) Detergent sammensætning
DE69031933D1 (de) Positiv arbeitende photoempfindliche Polyimidharzzusammensetzung
DE68929184D1 (de) Detergenszusammensetzung
BR8904489A (pt) Composicao detergente
DE69421982D1 (de) Positiv arbeitende Photoresistzusammensetzung
DE69031785D1 (de) Lichtempfindliche Zusammensetzung
DE69028476D1 (de) Positive arbeitende Fotolackzusammensetzungen
DE69424884D1 (de) Positiv arbeitende Photoresistzusammensetzung
DE69220612D1 (de) Positivarbeitende Photoresistzusammensetzung
BR8906958A (pt) Composicao detergente
DE69032715D1 (de) Lichtempfindliche Zusammensetzung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee