DE69033791D1 - Röntgenbelichtungsvorrichtung - Google Patents

Röntgenbelichtungsvorrichtung

Info

Publication number
DE69033791D1
DE69033791D1 DE69033791T DE69033791T DE69033791D1 DE 69033791 D1 DE69033791 D1 DE 69033791D1 DE 69033791 T DE69033791 T DE 69033791T DE 69033791 T DE69033791 T DE 69033791T DE 69033791 D1 DE69033791 D1 DE 69033791D1
Authority
DE
Germany
Prior art keywords
exposure device
ray exposure
ray
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69033791T
Other languages
English (en)
Other versions
DE69033791T2 (de
Inventor
Yutaka Tanaka
Nobutoshi Mizusawa
Takao Kariya
Shunichi Uzawa
Mitsuaki Amemiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69033791D1 publication Critical patent/DE69033791D1/de
Application granted granted Critical
Publication of DE69033791T2 publication Critical patent/DE69033791T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69033791T 1989-10-20 1990-10-19 Röntgenbelichtungsvorrichtung Expired - Fee Related DE69033791T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1271877A JP2766935B2 (ja) 1989-10-20 1989-10-20 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
DE69033791D1 true DE69033791D1 (de) 2001-10-11
DE69033791T2 DE69033791T2 (de) 2002-05-23

Family

ID=17506148

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69033791T Expired - Fee Related DE69033791T2 (de) 1989-10-20 1990-10-19 Röntgenbelichtungsvorrichtung

Country Status (4)

Country Link
US (1) US5172403A (de)
EP (1) EP0424181B1 (de)
JP (1) JP2766935B2 (de)
DE (1) DE69033791T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3168018B2 (ja) * 1991-03-22 2001-05-21 キヤノン株式会社 基板吸着保持方法
JP3184582B2 (ja) * 1991-11-01 2001-07-09 キヤノン株式会社 Ｘ線露光装置およびｘ線露光方法
US5353323A (en) * 1994-02-02 1994-10-04 Kabushiki Kaisha Toshiba X-ray exposure apparatus
JP3287725B2 (ja) * 1994-06-07 2002-06-04 キヤノン株式会社 露光方法とこれを用いたデバイス製造方法
EP1091256A1 (de) * 1994-11-29 2001-04-11 Canon Kabushiki Kaisha Ausrichtungsverfahren und Halbleiterbelichtungsverfahren
JP3666951B2 (ja) 1995-10-06 2005-06-29 キヤノン株式会社 マーク検出方法、これを用いた位置合わせ方法、露光方法及び装置、ならびにデバイス生産方法
TW341719B (en) * 1996-03-01 1998-10-01 Canon Kk Surface position detecting method and scanning exposure method using the same
JP2907159B2 (ja) * 1996-11-12 1999-06-21 日本電気株式会社 縮小投影露光装置及び露光方法
EP1039509A4 (de) * 1997-04-18 2005-01-12 Nikon Corp Ausrichteinrichtung,belichtungsverfahren unter verwendung der ausrichteinrichtung,und verfahren zur herstellung einer schaltungsanordnung
US6624139B1 (en) * 1998-11-05 2003-09-23 Eden Bioscience Corporation Hypersensitive response elicitor-induced stress resistance
TW480372B (en) * 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
JP4689064B2 (ja) 2000-03-30 2011-05-25 キヤノン株式会社 露光装置およびデバイス製造方法
JP2001345248A (ja) * 2000-05-31 2001-12-14 Canon Inc 露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP4560182B2 (ja) * 2000-07-06 2010-10-13 キヤノン株式会社 減圧処理装置、半導体製造装置およびデバイス製造方法
JP5324251B2 (ja) * 2008-05-16 2013-10-23 キヤノンアネルバ株式会社 基板保持装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4185202A (en) * 1977-12-05 1980-01-22 Bell Telephone Laboratories, Incorporated X-ray lithography
JPS57169242A (en) * 1981-04-13 1982-10-18 Hitachi Ltd X-ray transferring device
JPS59126632A (ja) * 1983-01-11 1984-07-21 Nippon Kogaku Kk <Nikon> Ｘ線露光装置
JPS60175351A (ja) * 1984-02-14 1985-09-09 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置およびｘ線露光法
US4648106A (en) * 1984-11-21 1987-03-03 Micronix Corporation Gas control for X-ray lithographic system
JPH01181521A (ja) * 1988-01-12 1989-07-19 Nec Corp Ｘ線露光装置用ヘリウムチャンバ
JPH01181518A (ja) * 1988-01-12 1989-07-19 Nec Corp Ｘ線露光装置用ヘリウムチャンバ
JPH01225118A (ja) * 1988-03-04 1989-09-08 Canon Inc Ｘ線露光装置

Also Published As

Publication number Publication date
EP0424181A2 (de) 1991-04-24
JPH03135010A (ja) 1991-06-10
JP2766935B2 (ja) 1998-06-18
DE69033791T2 (de) 2002-05-23
US5172403A (en) 1992-12-15
EP0424181A3 (en) 1992-06-10
EP0424181B1 (de) 2001-09-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee