DE60215090D1 - Verfahren und Vorrichtung zum Testen von Halbleiterwafern - Google Patents
Verfahren und Vorrichtung zum Testen von HalbleiterwafernInfo
- Publication number
- DE60215090D1 DE60215090D1 DE60215090T DE60215090T DE60215090D1 DE 60215090 D1 DE60215090 D1 DE 60215090D1 DE 60215090 T DE60215090 T DE 60215090T DE 60215090 T DE60215090 T DE 60215090T DE 60215090 D1 DE60215090 D1 DE 60215090D1
- Authority
- DE
- Germany
- Prior art keywords
- location
- semiconductor layer
- base structure
- sample chuck
- semiconductor wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30105—Capacitance
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US31406501P | 2001-08-22 | 2001-08-22 | |
US10/215,383 US6851096B2 (en) | 2001-08-22 | 2002-08-08 | Method and apparatus for testing semiconductor wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60215090D1 true DE60215090D1 (de) | 2006-11-16 |
Family
ID=26909979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60215090T Expired - Lifetime DE60215090D1 (de) | 2001-08-22 | 2002-08-22 | Verfahren und Vorrichtung zum Testen von Halbleiterwafern |
Country Status (6)
Country | Link |
---|---|
US (1) | US6851096B2 (de) |
EP (1) | EP1286389B1 (de) |
JP (1) | JP4163911B2 (de) |
AT (1) | ATE341834T1 (de) |
DE (1) | DE60215090D1 (de) |
TW (1) | TWI276190B (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6445202B1 (en) | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
JP4051418B2 (ja) * | 2003-05-29 | 2008-02-27 | Tdk株式会社 | 磁気ヘッドのスメア検出方法及び装置 |
US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
JP2007059704A (ja) * | 2005-08-25 | 2007-03-08 | Sumco Corp | 貼合せ基板の製造方法及び貼合せ基板 |
US7733106B2 (en) * | 2005-09-19 | 2010-06-08 | Formfactor, Inc. | Apparatus and method of testing singulated dies |
US7511510B2 (en) * | 2005-11-30 | 2009-03-31 | International Business Machines Corporation | Nanoscale fault isolation and measurement system |
KR100763532B1 (ko) * | 2006-08-17 | 2007-10-05 | 삼성전자주식회사 | 웨이퍼 지지장치, 웨이퍼 노광 장치 및 웨이퍼 지지방법 |
US7999563B2 (en) | 2008-06-24 | 2011-08-16 | Cascade Microtech, Inc. | Chuck for supporting and retaining a test substrate and a calibration substrate |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
KR101520457B1 (ko) * | 2009-02-12 | 2015-05-18 | 삼성전자주식회사 | 웨이퍼 검사 방법 및 웨이퍼 검사 장비 |
WO2010140642A1 (en) * | 2009-06-02 | 2010-12-09 | Tokyo Electron Limited | Probe card |
US8581217B2 (en) | 2010-10-08 | 2013-11-12 | Advanced Ion Beam Technology, Inc. | Method for monitoring ion implantation |
WO2012057991A2 (en) * | 2010-10-29 | 2012-05-03 | Applied Materials, Inc. | Apparatus and method for testing back-contact solar cells |
US9136243B2 (en) * | 2013-12-03 | 2015-09-15 | Kulicke And Soffa Industries, Inc. | Systems and methods for determining and adjusting a level of parallelism related to bonding of semiconductor elements |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE759342A (fr) * | 1969-11-24 | 1971-05-24 | Westinghouse Electric Corp | Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs |
US4931962A (en) * | 1988-05-13 | 1990-06-05 | Ade Corporation | Fixture and nonrepeatable error compensation system |
DE69133413D1 (de) * | 1990-05-07 | 2004-10-21 | Canon Kk | Substratträger des Vakuumtyps |
US5798286A (en) * | 1995-09-22 | 1998-08-25 | Tessera, Inc. | Connecting multiple microelectronic elements with lead deformation |
US6057171A (en) * | 1997-09-25 | 2000-05-02 | Frequency Technology, Inc. | Methods for determining on-chip interconnect process parameters |
US6741093B2 (en) * | 2000-10-19 | 2004-05-25 | Solid State Measurements, Inc. | Method of determining one or more properties of a semiconductor wafer |
US6429145B1 (en) * | 2001-01-26 | 2002-08-06 | International Business Machines Corporation | Method of determining electrical properties of silicon-on-insulator wafers |
-
2002
- 2002-08-08 US US10/215,383 patent/US6851096B2/en not_active Expired - Fee Related
- 2002-08-13 TW TW091118227A patent/TWI276190B/zh not_active IP Right Cessation
- 2002-08-22 DE DE60215090T patent/DE60215090D1/de not_active Expired - Lifetime
- 2002-08-22 JP JP2002241809A patent/JP4163911B2/ja not_active Expired - Fee Related
- 2002-08-22 AT AT02078482T patent/ATE341834T1/de not_active IP Right Cessation
- 2002-08-22 EP EP02078482A patent/EP1286389B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20030071631A1 (en) | 2003-04-17 |
TWI276190B (en) | 2007-03-11 |
EP1286389A3 (de) | 2005-01-12 |
US6851096B2 (en) | 2005-02-01 |
ATE341834T1 (de) | 2006-10-15 |
EP1286389A2 (de) | 2003-02-26 |
JP2003100822A (ja) | 2003-04-04 |
JP4163911B2 (ja) | 2008-10-08 |
EP1286389B1 (de) | 2006-10-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |