DE602005009603D1 - Funktionssteuerbare Prüfnadel zur Messung von Halbleiterwafern und Benutzungsverfahren - Google Patents

Funktionssteuerbare Prüfnadel zur Messung von Halbleiterwafern und Benutzungsverfahren

Info

Publication number
DE602005009603D1
DE602005009603D1 DE602005009603T DE602005009603T DE602005009603D1 DE 602005009603 D1 DE602005009603 D1 DE 602005009603D1 DE 602005009603 T DE602005009603 T DE 602005009603T DE 602005009603 T DE602005009603 T DE 602005009603T DE 602005009603 D1 DE602005009603 D1 DE 602005009603D1
Authority
DE
Germany
Prior art keywords
semiconductor wafer
electrical
measurement
methods
semiconductor wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602005009603T
Other languages
English (en)
Inventor
William H Howland Jr
Robert J Hillard
Hung Steven Chi-Shin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Solid State Measurements Inc
Original Assignee
Applied Materials Inc
Solid State Measurements Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc, Solid State Measurements Inc filed Critical Applied Materials Inc
Publication of DE602005009603D1 publication Critical patent/DE602005009603D1/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • G01R31/2648—Characterising semiconductor materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
DE602005009603T 2004-05-14 2005-05-13 Funktionssteuerbare Prüfnadel zur Messung von Halbleiterwafern und Benutzungsverfahren Expired - Fee Related DE602005009603D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/845,815 US7023231B2 (en) 2004-05-14 2004-05-14 Work function controlled probe for measuring properties of a semiconductor wafer and method of use thereof

Publications (1)

Publication Number Publication Date
DE602005009603D1 true DE602005009603D1 (de) 2008-10-23

Family

ID=34939824

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005009603T Expired - Fee Related DE602005009603D1 (de) 2004-05-14 2005-05-13 Funktionssteuerbare Prüfnadel zur Messung von Halbleiterwafern und Benutzungsverfahren

Country Status (6)

Country Link
US (1) US7023231B2 (de)
EP (1) EP1596212B1 (de)
JP (1) JP2005333148A (de)
AT (1) ATE408154T1 (de)
DE (1) DE602005009603D1 (de)
TW (1) TWI391686B (de)

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US5345170A (en) * 1992-06-11 1994-09-06 Cascade Microtech, Inc. Wafer probe station having integrated guarding, Kelvin connection and shielding systems
US6232789B1 (en) 1997-05-28 2001-05-15 Cascade Microtech, Inc. Probe holder for low current measurements
US5729150A (en) * 1995-12-01 1998-03-17 Cascade Microtech, Inc. Low-current probe card with reduced triboelectric current generating cables
US5914613A (en) * 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
US6002263A (en) * 1997-06-06 1999-12-14 Cascade Microtech, Inc. Probe station having inner and outer shielding
US6034533A (en) * 1997-06-10 2000-03-07 Tervo; Paul A. Low-current pogo probe card
US6256882B1 (en) 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
US6578264B1 (en) * 1999-06-04 2003-06-17 Cascade Microtech, Inc. Method for constructing a membrane probe using a depression
US6838890B2 (en) * 2000-02-25 2005-01-04 Cascade Microtech, Inc. Membrane probing system
US6965226B2 (en) 2000-09-05 2005-11-15 Cascade Microtech, Inc. Chuck for holding a device under test
US6914423B2 (en) 2000-09-05 2005-07-05 Cascade Microtech, Inc. Probe station
DE20114544U1 (de) 2000-12-04 2002-02-21 Cascade Microtech Inc Wafersonde
US7355420B2 (en) 2001-08-21 2008-04-08 Cascade Microtech, Inc. Membrane probing system
US6951846B2 (en) * 2002-03-07 2005-10-04 The United States Of America As Represented By The Secretary Of The Army Artemisinins with improved stability and bioavailability for therapeutic drug development and application
US6861856B2 (en) * 2002-12-13 2005-03-01 Cascade Microtech, Inc. Guarded tub enclosure
US7492172B2 (en) 2003-05-23 2009-02-17 Cascade Microtech, Inc. Chuck for holding a device under test
US7057404B2 (en) * 2003-05-23 2006-06-06 Sharp Laboratories Of America, Inc. Shielded probe for testing a device under test
US7250626B2 (en) 2003-10-22 2007-07-31 Cascade Microtech, Inc. Probe testing structure
US7321234B2 (en) * 2003-12-18 2008-01-22 Lecroy Corporation Resistive test probe tips and applications therefor
DE202004021093U1 (de) 2003-12-24 2006-09-28 Cascade Microtech, Inc., Beaverton Aktiver Halbleiterscheibenmessfühler
US7187188B2 (en) 2003-12-24 2007-03-06 Cascade Microtech, Inc. Chuck with integrated wafer support
DE202005021435U1 (de) 2004-09-13 2008-02-28 Cascade Microtech, Inc., Beaverton Doppelseitige Prüfaufbauten
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
US7282941B2 (en) * 2005-04-05 2007-10-16 Solid State Measurements, Inc. Method of measuring semiconductor wafers with an oxide enhanced probe
US20070294047A1 (en) * 2005-06-11 2007-12-20 Leonard Hayden Calibration system
US7637009B2 (en) * 2006-02-27 2009-12-29 Sv Probe Pte. Ltd. Approach for fabricating probe elements for probe card assemblies using a reusable substrate
US7723999B2 (en) 2006-06-12 2010-05-25 Cascade Microtech, Inc. Calibration structures for differential signal probing
US7764072B2 (en) 2006-06-12 2010-07-27 Cascade Microtech, Inc. Differential signal probing system
US7403028B2 (en) 2006-06-12 2008-07-22 Cascade Microtech, Inc. Test structure and probe for differential signals
US20080290889A1 (en) * 2007-05-24 2008-11-27 Solid State Measurements, Inc. Method of destructive testing the dielectric layer of a semiconductor wafer or sample
US7876114B2 (en) 2007-08-08 2011-01-25 Cascade Microtech, Inc. Differential waveguide probe
JP5053788B2 (ja) * 2007-10-10 2012-10-17 株式会社アルバック 導電性プローブ、導電性プローブの製造方法、及び磁気特性測定方法
US7888957B2 (en) 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
US8410806B2 (en) 2008-11-21 2013-04-02 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
US8319503B2 (en) 2008-11-24 2012-11-27 Cascade Microtech, Inc. Test apparatus for measuring a characteristic of a device under test
DE102012205352B4 (de) * 2012-02-24 2022-12-08 Rohde & Schwarz GmbH & Co. Kommanditgesellschaft Adapter für einen Tastkopf zur Messung eines differenziellen Signals
JP6301680B2 (ja) * 2014-02-25 2018-03-28 エイブリック株式会社 弾性プローブ
US20200233033A1 (en) * 2019-01-17 2020-07-23 Intel Corporation Test probe for wafer-level and panel-level testing

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US4463060A (en) * 1983-11-15 1984-07-31 E. I. Du Pont De Nemours And Company Solderable palladium-nickel coatings and method of making said coatings
US5378971A (en) * 1990-11-30 1995-01-03 Tokyo Electron Limited Probe and a method of manufacturing the same
JP2917674B2 (ja) * 1992-06-03 1999-07-12 松下電器産業株式会社 走査トンネル顕微鏡用探針およびその製造方法
JP2900764B2 (ja) * 1993-08-30 1999-06-02 住友金属工業株式会社 半導体表面薄膜の評価方法
US5500607A (en) * 1993-12-22 1996-03-19 International Business Machines Corporation Probe-oxide-semiconductor method and apparatus for measuring oxide charge on a semiconductor wafer
JPH10185878A (ja) * 1996-12-26 1998-07-14 Mitsubishi Electric Corp 絶縁破壊測定方法
US5796121A (en) * 1997-03-25 1998-08-18 International Business Machines Corporation Thin film transistors fabricated on plastic substrates
US6139759A (en) * 1997-07-08 2000-10-31 International Business Machines Corporation Method of manufacturing silicided silicon microtips for scanning probe microscopy
US6891360B1 (en) * 1997-10-02 2005-05-10 International Business Machines Corporation Plated probe structure
US6181144B1 (en) * 1998-02-25 2001-01-30 Micron Technology, Inc. Semiconductor probe card having resistance measuring circuitry and method fabrication
DE60029483T2 (de) * 1999-10-19 2007-02-15 Solid State Measurements, Inc. Nicht-invasive elektrische messung von halbleiterscheiben
US6741093B2 (en) * 2000-10-19 2004-05-25 Solid State Measurements, Inc. Method of determining one or more properties of a semiconductor wafer
JP2002131334A (ja) * 2000-10-24 2002-05-09 Nec Yamaguchi Ltd プローブ針、プローブカード、及びプローブカードの作製方法
CN1643741A (zh) * 2002-03-18 2005-07-20 纳米纳克斯公司 一种微型接触弹簧
US6894519B2 (en) * 2002-04-11 2005-05-17 Solid State Measurements, Inc. Apparatus and method for determining electrical properties of a semiconductor wafer
US6842029B2 (en) * 2002-04-11 2005-01-11 Solid State Measurements, Inc. Non-invasive electrical measurement of semiconductor wafers
US6632691B1 (en) * 2002-04-11 2003-10-14 Solid State Measurements, Inc. Apparatus and method for determining doping concentration of a semiconductor wafer
US6612161B1 (en) * 2002-07-23 2003-09-02 Fidelica Microsystems, Inc. Atomic force microscopy measurements of contact resistance and current-dependent stiction
US6836139B2 (en) * 2002-10-22 2004-12-28 Solid State Measurments, Inc. Method and apparatus for determining defect and impurity concentration in semiconducting material of a semiconductor wafer
US6879176B1 (en) * 2003-11-04 2005-04-12 Solid State Measurements, Inc. Conductance-voltage (GV) based method for determining leakage current in dielectrics

Also Published As

Publication number Publication date
TW200538748A (en) 2005-12-01
ATE408154T1 (de) 2008-09-15
US7023231B2 (en) 2006-04-04
US20050253618A1 (en) 2005-11-17
TWI391686B (zh) 2013-04-01
EP1596212A1 (de) 2005-11-16
EP1596212B1 (de) 2008-09-10
JP2005333148A (ja) 2005-12-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee