DE602005026375D1 - Projektionsobjektiv und projektionsbelichtungsvorrichtung - Google Patents
Projektionsobjektiv und projektionsbelichtungsvorrichtungInfo
- Publication number
- DE602005026375D1 DE602005026375D1 DE602005026375T DE602005026375T DE602005026375D1 DE 602005026375 D1 DE602005026375 D1 DE 602005026375D1 DE 602005026375 T DE602005026375 T DE 602005026375T DE 602005026375 T DE602005026375 T DE 602005026375T DE 602005026375 D1 DE602005026375 D1 DE 602005026375D1
- Authority
- DE
- Germany
- Prior art keywords
- projection
- exposure device
- objective
- projection exposure
- projection objective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/52—Reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US55738404P | 2004-03-30 | 2004-03-30 | |
PCT/EP2005/002898 WO2005096098A2 (en) | 2004-03-30 | 2005-03-18 | Projection objective, projection exposure apparatus and reflective reticle for microlithography |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005026375D1 true DE602005026375D1 (de) | 2011-03-31 |
Family
ID=34961349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005026375T Active DE602005026375D1 (de) | 2004-03-30 | 2005-03-18 | Projektionsobjektiv und projektionsbelichtungsvorrichtung |
Country Status (6)
Country | Link |
---|---|
US (1) | US8064040B2 (de) |
EP (1) | EP1730596B1 (de) |
JP (1) | JP5106099B2 (de) |
KR (1) | KR101101493B1 (de) |
DE (1) | DE602005026375D1 (de) |
WO (1) | WO2005096098A2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
JP5769356B2 (ja) | 2004-05-17 | 2015-08-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 中間像を有するカタジオプトリック投影対物レンズ |
US7283209B2 (en) | 2004-07-09 | 2007-10-16 | Carl Zeiss Smt Ag | Illumination system for microlithography |
US7511890B2 (en) | 2005-02-04 | 2009-03-31 | Carl Zeiss Smt Ag | Refractive optical imaging system, in particular projection objective for microlithography |
JP4425239B2 (ja) * | 2005-05-16 | 2010-03-03 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置およびデバイス製造方法 |
KR20080068006A (ko) * | 2005-11-15 | 2008-07-22 | 가부시키가이샤 니콘 | 노광 장치와, 노광 방법 및 디바이스 제조 방법 |
EP2115535B9 (de) | 2007-02-06 | 2013-01-09 | Carl Zeiss SMT GmbH | Verfahren und vorrichtung zur überwachung von mehrfachspiegelanordnungen in einem beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage |
DE102007005875A1 (de) | 2007-02-06 | 2008-08-14 | Carl Zeiss Smt Ag | Vorrichtung und Verfahren zur Bestimmung der Ausrichtung von Oberflächen von optischen Elementen |
CN101669071B (zh) | 2007-04-25 | 2012-03-21 | 卡尔蔡司Smt有限责任公司 | 微光刻曝光装置中照明掩模的照明*** |
JP2010537414A (ja) | 2007-08-30 | 2010-12-02 | カール・ツァイス・エスエムティー・アーゲー | マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム |
EP2388649B1 (de) | 2007-12-21 | 2013-06-19 | Carl Zeiss SMT GmbH | Beleuchtungssystem zum Beleuchten einer Maske in einer mikrolithographischen Belichtungsvorrichtung |
CN102279459B (zh) * | 2010-06-09 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影物镜 |
JP5830089B2 (ja) * | 2010-06-15 | 2015-12-09 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Euvリソグラフィ用のマスク、euvリソグラフィシステム、及びマスクの結像を最適化する方法 |
TWI450019B (zh) | 2011-10-06 | 2014-08-21 | Acer Inc | 照明系統與投影裝置 |
KR101961605B1 (ko) * | 2011-12-20 | 2019-03-22 | 가부시키가이샤 니콘 | 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법 |
JP6069941B2 (ja) * | 2012-08-08 | 2017-02-01 | 株式会社ニコン | 投影露光装置及びデバイス製造方法 |
CN105445824B (zh) * | 2014-08-20 | 2017-02-22 | 清华大学 | Led光通信接收透镜及led光通信*** |
US9791786B1 (en) * | 2016-04-08 | 2017-10-17 | Applied Materials, Inc. | Method to reduce line waviness |
KR102650388B1 (ko) * | 2016-11-23 | 2024-03-25 | 삼성전자주식회사 | 검사 장치 및 그를 이용한 반도체 소자의 제조 방법 |
FI128407B (en) * | 2017-06-02 | 2020-04-30 | Dispelix Oy | Projection lens and waveguide display device |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1522285A1 (de) | 1966-03-17 | 1969-08-07 | Telefunken Patent | Verfahren zur Erzeugung von Mikrostrukturen auf einem Substrat |
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
NL8802517A (nl) | 1988-10-13 | 1990-05-01 | Philips Nv | Beeldprojektie-inrichting. |
JPH02160237A (ja) | 1988-12-14 | 1990-06-20 | Nikon Corp | マスク基板及びマスク製造方法、並びに該マスク基板を用いた露光方法 |
US5031976A (en) | 1990-09-24 | 1991-07-16 | Kla Instruments, Corporation | Catadioptric imaging system |
JPH04333011A (ja) | 1991-05-09 | 1992-11-20 | Nikon Corp | 反射縮小投影光学装置 |
US5691541A (en) | 1996-05-14 | 1997-11-25 | The Regents Of The University Of California | Maskless, reticle-free, lithography |
US5870176A (en) | 1996-06-19 | 1999-02-09 | Sandia Corporation | Maskless lithography |
US5717518A (en) | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
US5999310A (en) * | 1996-07-22 | 1999-12-07 | Shafer; David Ross | Ultra-broadband UV microscope imaging system with wide range zoom capability |
US6064517A (en) | 1996-07-22 | 2000-05-16 | Kla-Tencor Corporation | High NA system for multiple mode imaging |
US6312134B1 (en) | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
SE9800665D0 (sv) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
DE19832317C1 (de) | 1998-07-17 | 2000-05-11 | Zeiss Carl Jena Gmbh | Anordnung, bei der von einer Lichtquelle aus Licht auf eine Fläche gerichtet wird |
US6238852B1 (en) | 1999-01-04 | 2001-05-29 | Anvik Corporation | Maskless lithography system and method with doubled throughput |
DE10005189A1 (de) * | 2000-02-05 | 2001-08-09 | Zeiss Carl | Projektionsbelichtungsanlage mit reflektivem Retikel |
WO2001080310A1 (en) | 2000-04-12 | 2001-10-25 | Koninklijke Philips Electronics N.V. | Method of manufacturing a semiconductor device |
JP4016576B2 (ja) * | 2000-07-14 | 2007-12-05 | 株式会社日立製作所 | 投射用レンズ装置および投射型画像表示装置 |
DE10139177A1 (de) | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
BR0214455A (pt) | 2001-11-27 | 2004-11-03 | Hoffmann La Roche | Derivados benzotiazol |
US7511890B2 (en) | 2005-02-04 | 2009-03-31 | Carl Zeiss Smt Ag | Refractive optical imaging system, in particular projection objective for microlithography |
-
2005
- 2005-03-18 KR KR1020067020201A patent/KR101101493B1/ko not_active IP Right Cessation
- 2005-03-18 EP EP05716194A patent/EP1730596B1/de not_active Expired - Fee Related
- 2005-03-18 DE DE602005026375T patent/DE602005026375D1/de active Active
- 2005-03-18 WO PCT/EP2005/002898 patent/WO2005096098A2/en active Application Filing
- 2005-03-18 JP JP2007505428A patent/JP5106099B2/ja not_active Expired - Fee Related
- 2005-03-18 US US11/547,085 patent/US8064040B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR101101493B1 (ko) | 2012-01-03 |
WO2005096098A3 (en) | 2006-07-06 |
WO2005096098A2 (en) | 2005-10-13 |
US8064040B2 (en) | 2011-11-22 |
EP1730596B1 (de) | 2011-02-16 |
EP1730596A2 (de) | 2006-12-13 |
US20080198353A1 (en) | 2008-08-21 |
KR20060130233A (ko) | 2006-12-18 |
JP2007531024A (ja) | 2007-11-01 |
JP5106099B2 (ja) | 2012-12-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |