DE602005011346D1 - Vorrichtung mit einer Ausrichtungsträgerplatte - Google Patents

Vorrichtung mit einer Ausrichtungsträgerplatte

Info

Publication number
DE602005011346D1
DE602005011346D1 DE602005011346T DE602005011346T DE602005011346D1 DE 602005011346 D1 DE602005011346 D1 DE 602005011346D1 DE 602005011346 T DE602005011346 T DE 602005011346T DE 602005011346 T DE602005011346 T DE 602005011346T DE 602005011346 D1 DE602005011346 D1 DE 602005011346D1
Authority
DE
Germany
Prior art keywords
carrier plate
alignment carrier
alignment
plate
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005011346T
Other languages
English (en)
Inventor
Shinji Ohishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE602005011346D1 publication Critical patent/DE602005011346D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
    • D—TEXTILES; PAPER
    • D05—SEWING; EMBROIDERING; TUFTING
    • D05C—EMBROIDERING; TUFTING
    • D05C7/00—Special-purpose or automatic embroidering machines
    • D05C7/08—Special-purpose or automatic embroidering machines for attaching cords, tapes, bands, or the like
    • D—TEXTILES; PAPER
    • D05—SEWING; EMBROIDERING; TUFTING
    • D05B—SEWING
    • D05B35/00—Work-feeding or -handling elements not otherwise provided for
    • D05B35/06—Work-feeding or -handling elements not otherwise provided for for attaching bands, ribbons, strips, or tapes or for binding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Textile Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Secondary Cells (AREA)
DE602005011346T 2004-01-26 2005-01-19 Vorrichtung mit einer Ausrichtungsträgerplatte Active DE602005011346D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004016857A JP4478470B2 (ja) 2004-01-26 2004-01-26 位置決めステージ装置

Publications (1)

Publication Number Publication Date
DE602005011346D1 true DE602005011346D1 (de) 2009-01-15

Family

ID=34545143

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005011346T Active DE602005011346D1 (de) 2004-01-26 2005-01-19 Vorrichtung mit einer Ausrichtungsträgerplatte

Country Status (7)

Country Link
US (2) US7084534B2 (de)
EP (1) EP1557723B1 (de)
JP (1) JP4478470B2 (de)
KR (1) KR100670898B1 (de)
CN (1) CN100390956C (de)
DE (1) DE602005011346D1 (de)
TW (1) TWI273638B (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060022786A1 (en) * 2004-07-27 2006-02-02 Baker Hughes Incorporated Armored flat cable signalling and instrument power acquisition
WO2006059634A1 (ja) * 2004-12-01 2006-06-08 Nikon Corporation ステージ装置及び露光装置
JP2007115879A (ja) * 2005-10-20 2007-05-10 Nikon Corp 露光装置及び露光システム並びにデバイス製造方法
JP2007123332A (ja) * 2005-10-25 2007-05-17 Nikon Corp ステージ装置、露光装置、デバイスの製造方法
JP2007123334A (ja) * 2005-10-25 2007-05-17 Nikon Corp ステージ装置、露光装置、デバイスの製造方法
DE102005053111B4 (de) * 2005-11-08 2020-08-20 Nejila Parspour Vorrichtung und Verfahren zur kontaktlosen Energieübertragung
US7626681B2 (en) * 2005-12-28 2009-12-01 Asml Netherlands B.V. Lithographic apparatus and method
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
JP4722066B2 (ja) * 2007-03-02 2011-07-13 株式会社オリンピア 遊技機
US8013981B2 (en) * 2007-06-14 2011-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8421994B2 (en) * 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
US7717178B2 (en) * 2008-01-03 2010-05-18 Baker Hughes Incorporated Screen coupler for modular screen packs
FR2928030B1 (fr) * 2008-02-22 2010-03-26 Commissariat Energie Atomique Procede d'alignement de deux substrats par des microbobines.
JP2009253090A (ja) * 2008-04-08 2009-10-29 Canon Inc 位置決めステージ装置、露光装置およびデバイス製造方法
JP5381011B2 (ja) * 2008-10-20 2014-01-08 トヨタ自動車株式会社 給電システム
JP5078840B2 (ja) * 2008-10-30 2012-11-21 富士フイルム株式会社 レンズ位置検出装置及びレンズ装置
DE102009013694A1 (de) * 2009-03-20 2010-09-23 Paul Vahle Gmbh & Co. Kg Energieübertragungssystem mit mehreren Primärspulen
JP5454455B2 (ja) * 2010-11-02 2014-03-26 東京エレクトロン株式会社 基板搬送装置、基板搬送方法及び記憶媒体
US20120293109A1 (en) * 2011-05-19 2012-11-22 Yariv Glazer Method and System for Efficiently Exploiting Renewable Electrical Energy Sources
KR20140084238A (ko) 2011-10-27 2014-07-04 더 유니버시티 오브 브리티쉬 콜롬비아 변위 장치 및 변위 장치의 제조, 사용 그리고 제어를 위한 방법
CN104364881A (zh) * 2012-04-13 2015-02-18 株式会社尼康 移动体装置、曝光装置以及器件制造方法
EP3014219B1 (de) 2013-08-06 2017-10-11 The University Of British Columbia Verschiebungsvorrichtungen und verfahren sowie vorrichtung zur erkennung und schätzung von damit zusammenhängender bewegung
DE102014005897B3 (de) * 2014-04-25 2015-09-17 Mecatronix Ag Vorrichtung zum Halten, Positionieren und/oder Bewegen eines Objekts
WO2015179962A1 (en) 2014-05-30 2015-12-03 The University Of British Columbia Displacement devices and methods for fabrication, use and control of same
EP3584913B1 (de) 2014-06-07 2023-08-02 The University of British Columbia Systeme zur kontrollierten bewegung von mehrerer beweglicher stufen in einer verdrängervorrichtung
EP3155712A4 (de) 2014-06-14 2018-02-21 The University Of British Columbia Verdrängungsvorrichtungen, beweglichen stufen für verdrängungsvorrichtungen und verfahren zur herstellung, verwendung und steuerung davon
US9904178B2 (en) * 2015-04-09 2018-02-27 Nikon Corporation On-board supply system for a stage assembly
CN107852082B (zh) 2015-07-06 2020-05-26 不列颠哥伦比亚大学 用于在位移装置上可控制地移动一个或多个可移动台的方法和***
US10418863B1 (en) 2015-09-28 2019-09-17 Apple Inc. Charging system
DE102016202934A1 (de) * 2016-02-25 2017-08-31 Robert Bosch Gmbh Vorrichtung und Verfahren zur Bestimmung einer Position und/oder Orientierung wenigstens eines levitierten Transportkörpers relativ zu einer Levitationsbeförderungseinheit
JP6889534B2 (ja) * 2016-09-28 2021-06-18 国立大学法人 東京大学 移動体装置、露光装置、フラットパネルディスプレイの製造方法、およびデバイス製造方法
JP2019193516A (ja) * 2018-04-27 2019-10-31 ソニーモバイルコミュニケーションズ株式会社 駆動装置および駆動制御方法
TW202137866A (zh) 2020-02-20 2021-10-01 美商布魯克斯自動機械公司 基板處理裝置
EP3883103A1 (de) * 2020-03-19 2021-09-22 Beckhoff Automation GmbH Planarantriebssystem, verfahren zum betreiben eines planarantriebssystems und stator zum antreiben eines läufers
AT523640B1 (de) * 2020-04-27 2021-10-15 B & R Ind Automation Gmbh Stützstruktur für einen Planarmotor
CN113478665A (zh) * 2021-07-14 2021-10-08 山西汇智博科科技发展有限公司 一种高精度半导体加工用单线切割机

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4810941A (en) * 1986-04-17 1989-03-07 Canon Kabushiki Kaisha Control system for a servomotor
US4836344A (en) * 1987-05-08 1989-06-06 Inductran Corporation Roadway power and control system for inductively coupled transportation system
JP2649578B2 (ja) * 1989-06-01 1997-09-03 株式会社ダイフク リニアモーター駆動の搬送装置
US5184055A (en) * 1989-10-06 1993-02-02 Canon Kabushiki Kaisha Device for positioning control
US5994798A (en) * 1998-02-26 1999-11-30 Anorad Corporation Closed-path linear motor
US5293308A (en) * 1991-03-26 1994-03-08 Auckland Uniservices Limited Inductive power distribution system
DE4126453A1 (de) * 1991-08-09 1993-02-11 Withold Richert Spurgefuehrtes transportfahrzeug
JP2714502B2 (ja) * 1991-09-18 1998-02-16 キヤノン株式会社 移動ステージ装置
DE4236340C2 (de) * 1992-10-28 1994-11-10 Daimler Benz Ag Anordnung zur induktiven Übertragung von Energie
JP3247186B2 (ja) * 1993-03-29 2002-01-15 江藤電気株式会社 可動体側電動駆動手段への給電装置
DE69412719T2 (de) * 1993-06-24 1999-02-18 Canon K.K., Tokio/Tokyo Steuerung für einen mehrphasigen Motor
JP3295938B2 (ja) * 1994-02-21 2002-06-24 株式会社安川電機 直動型無接触給電装置
JPH0851137A (ja) * 1994-08-08 1996-02-20 Shinko Electric Co Ltd 半導体製造装置における搬送装置
US6089512A (en) * 1995-04-03 2000-07-18 Daimler-Benz Aktiengesellschaft Track-guided transport system with power and data transmission
US5821728A (en) * 1996-07-22 1998-10-13 Schwind; John P. Armature induction charging of moving electric vehicle batteries
JPH10270535A (ja) * 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法
ES2278417T3 (es) * 1997-08-08 2007-08-01 Jurgen G. Meins Metodo y aparato para suministrar energia sin contacto.
DE19746919A1 (de) * 1997-10-24 1999-05-06 Daimler Chrysler Ag Elektrische Übertragungsvorrichtung
US6408045B1 (en) * 1997-11-11 2002-06-18 Canon Kabushiki Kaisha Stage system and exposure apparatus with the same
JPH11214482A (ja) * 1998-01-28 1999-08-06 Canon Inc ステージ装置および露光装置ならびにディバイス製造方法
US6175124B1 (en) * 1998-06-30 2001-01-16 Lsi Logic Corporation Method and apparatus for a wafer level system
JP2000286318A (ja) * 1999-01-27 2000-10-13 Shinko Electric Co Ltd 搬送システム
DE29908095U1 (de) * 1999-05-06 2000-09-14 Cooper Power Tools GmbH & Co., 73463 Westhausen Transportsystem
JP2001119916A (ja) * 1999-10-12 2001-04-27 Nikon Corp リニアモータ装置、これを用いたステージ装置、露光装置、リニアモータの駆動方法、ステージ装置の駆動方法、露光方法、及び、デバイスの製造方法。
US6931304B1 (en) * 2000-03-28 2005-08-16 Storage Technology Corporation Scalable means of supplying power to a remotely controlled, semi-autonomous robot
US6307766B1 (en) * 2000-11-22 2001-10-23 Bayside Controls, Inc. Contactless power system
JP2002199782A (ja) * 2000-12-27 2002-07-12 Nikon Corp リニアモータ装置、これを用いたステージ装置、露光装置、これを用いて製造されたデバイス、リニアモータの駆動方法、ステージ装置の駆動方法、露光方法、及び、デバイスの製造方法。
KR100392308B1 (ko) * 2000-12-29 2003-07-23 한국전기연구원 영구자석 여자 동기형 전동기와 비접촉 전원공급기의 결합장치
JP3679767B2 (ja) * 2002-02-26 2005-08-03 キヤノン株式会社 ステージ位置決め装置及びその制御方法、露光装置、半導体デバイスの製造方法
US7057370B2 (en) * 2003-06-21 2006-06-06 Igor Victorovich Touzov Ultra-fast precision motor with X, Y and Theta motion and ultra-fast optical decoding and absolute position detector
JP2005086029A (ja) * 2003-09-09 2005-03-31 Canon Inc 位置決めステージ装置及び露光装置並びに半導体デバイスの製造方法
JP4314091B2 (ja) * 2003-10-03 2009-08-12 キヤノン株式会社 露光装置及びデバイス製造方法
US20050128449A1 (en) * 2003-12-12 2005-06-16 Nikon Corporation, A Japanese Corporation Utilities transfer system in a lithography system

Also Published As

Publication number Publication date
EP1557723A2 (de) 2005-07-27
US7084534B2 (en) 2006-08-01
US20050093378A1 (en) 2005-05-05
US7199493B2 (en) 2007-04-03
TWI273638B (en) 2007-02-11
KR20050077019A (ko) 2005-07-29
EP1557723B1 (de) 2008-12-03
CN1649121A (zh) 2005-08-03
EP1557723A3 (de) 2006-11-02
CN100390956C (zh) 2008-05-28
JP2005209997A (ja) 2005-08-04
US20060214518A1 (en) 2006-09-28
TW200525606A (en) 2005-08-01
KR100670898B1 (ko) 2007-01-19
JP4478470B2 (ja) 2010-06-09

Similar Documents

Publication Publication Date Title
DE602005011346D1 (de) Vorrichtung mit einer Ausrichtungsträgerplatte
DE202005000768U1 (de) Gerät mit universell verstellbarer Halteplatte
DE602006016782D1 (de) Vorrichtung mit ziehlaschenaktivierung
DE602006009585D1 (de) Pfadselektion in einer OFDM Vorrichtung
DE602005018881D1 (de) Lichtemittierende Vorrichtung mit optischer Resonanzschicht
DE60305550D1 (de) Vorrichtung mit austauschbaren Modulen
DE502005009290D1 (de) Beleuchtungseinrichtung mit optoelektronischem Bauelement mit drahtloser Kontaktierung
DE502005011242D1 (de) Interferometrische messvorrichtung mit einer adaptionsvorrichtung zur lichtintensitätsanpassung
GB2447173B (en) Polymer compound and polymer light emitting device using the same
GB2437213B (en) Polymer compound and polymer light emitting device using the same
DE502005005952D1 (de) Vorrichtung zur unterbrechungsfreien stromversorgung
DE502004006911D1 (de) Rahmengestell mit einer elektrifiziereinrichtung
DE502005003875D1 (de) Elektronische vorrichtung
DE602007003918D1 (de) Vorrichtung mit einer Zünderanordnung
DE502005011174D1 (de) Vorrichtung zur mukosaresektion
DE602005008034D1 (de) Schlittenführungsvorrichtung
HK1140537A1 (en) Method for manufacturing light guide plate, light guide plate, and light emitting sign using the light guide plate
DE502005000967D1 (de) Vorrichtung zum Fixieren von beweglich gelagerten Teilen
DE602006018569D1 (de) Mikroskopsystem mit einer Beleuchtungsvorrichtung
DE602005027857D1 (de) Empfangsvorrichtung mit antenneneinheit
FR2899309B1 (fr) Dispositif porteur
DE60305745D1 (de) Vorrichtung mit photonischer Kristallstruktur
DE50304102D1 (de) Vorrichtung zum bestücken von substraten mit elektronischen bauelementen
DE602005015852D1 (de) Mikrofluidvorrichtung mit mindestens einer haltevorrichtung
DE502005007947D1 (de) Vorrichtung zur richtungsumkehr von flachen sendungen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition