DE602004011458D1 - Substratverarbeitungsverfahren - Google Patents

Substratverarbeitungsverfahren

Info

Publication number
DE602004011458D1
DE602004011458D1 DE602004011458T DE602004011458T DE602004011458D1 DE 602004011458 D1 DE602004011458 D1 DE 602004011458D1 DE 602004011458 T DE602004011458 T DE 602004011458T DE 602004011458 T DE602004011458 T DE 602004011458T DE 602004011458 D1 DE602004011458 D1 DE 602004011458D1
Authority
DE
Germany
Prior art keywords
processing method
substrate processing
substrate
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602004011458T
Other languages
English (en)
Other versions
DE602004011458T2 (de
Inventor
Joseph J Consolini
Keith Frank Best
Alexander Friz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602004011458D1 publication Critical patent/DE602004011458D1/de
Application granted granted Critical
Publication of DE602004011458T2 publication Critical patent/DE602004011458T2/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE602004011458T 2003-12-24 2004-12-15 Substratverarbeitungsverfahren Expired - Fee Related DE602004011458T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US744091 2003-12-24
US10/744,091 US7130049B2 (en) 2003-12-24 2003-12-24 Method of measurement, method for providing alignment marks, and device manufacturing method

Publications (2)

Publication Number Publication Date
DE602004011458D1 true DE602004011458D1 (de) 2008-03-13
DE602004011458T2 DE602004011458T2 (de) 2009-01-15

Family

ID=34552842

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004011458T Expired - Fee Related DE602004011458T2 (de) 2003-12-24 2004-12-15 Substratverarbeitungsverfahren

Country Status (8)

Country Link
US (1) US7130049B2 (de)
EP (1) EP1548507B1 (de)
JP (1) JP4230991B2 (de)
KR (1) KR20050065390A (de)
CN (1) CN100480862C (de)
DE (1) DE602004011458T2 (de)
SG (1) SG113012A1 (de)
TW (1) TWI304162B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050118532A1 (en) * 2003-11-14 2005-06-02 International Business Machines Corporation Back to Front Alignment with Latent Imaging
JP4845880B2 (ja) * 2004-06-04 2011-12-28 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学結像系の像品質測定システム
US7292339B2 (en) * 2004-07-09 2007-11-06 Asml Netherlands B.V. Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool
US7573574B2 (en) * 2004-07-13 2009-08-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2006024908A2 (en) * 2004-08-10 2006-03-09 Asml Netherlands B.V. Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
KR100718094B1 (ko) * 2005-09-21 2007-05-16 삼성전자주식회사 무선 센서 네트워크에서의 이상 데이터 처리 방법
US20080083818A1 (en) * 2006-10-06 2008-04-10 Asml Netherlands B.V. Measuring the bonding of bonded substrates
SG153747A1 (en) * 2007-12-13 2009-07-29 Asml Netherlands Bv Alignment method, alignment system and product with alignment mark
US20100092599A1 (en) * 2008-10-10 2010-04-15 Molecular Imprints, Inc. Complementary Alignment Marks for Imprint Lithography
JP5126370B2 (ja) * 2008-12-16 2013-01-23 株式会社村田製作所 回路モジュール
WO2011097514A2 (en) * 2010-02-05 2011-08-11 Molecular Imprints, Inc. Templates having high contrast alignment marks
JP2011203156A (ja) * 2010-03-26 2011-10-13 Dainippon Screen Mfg Co Ltd 距離測定装置
US8431946B2 (en) * 2010-05-26 2013-04-30 Hsin-Chih CHIU Chip package and method for forming the same
KR101232611B1 (ko) * 2010-08-11 2013-02-13 삼성전자주식회사 정렬계를 이용한 계측 시스템 및 위치 계측 방법
KR101202320B1 (ko) * 2010-08-11 2012-11-16 삼성전자주식회사 정렬계를 이용한 계측 시스템과 정렬계의 시스템 변수 결정 방법
JP5743958B2 (ja) * 2012-05-30 2015-07-01 キヤノン株式会社 計測方法、露光方法および装置
CN103839923B (zh) * 2014-02-25 2016-03-30 京东方科技集团股份有限公司 一种对位标记的制作方法及基板
US10283456B2 (en) 2015-10-26 2019-05-07 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography engraving machine for forming water identification marks and aligment marks
JP6617928B2 (ja) * 2016-11-18 2019-12-11 株式会社村田製作所 圧電振動素子の製造方法
CN113168110B (zh) * 2018-11-26 2024-04-16 Asml荷兰有限公司 确定整个图案形成装置或衬底上的标记布局
US11980965B2 (en) * 2019-04-23 2024-05-14 General Electric Company Systems and methods for multi-laser head alignment in additive manufacturing systems
US10685883B1 (en) * 2019-05-02 2020-06-16 Winbond Electronics Corp. Method of wafer dicing and die
CN113219797B (zh) * 2021-03-25 2023-11-17 北海惠科半导体科技有限公司 晶圆半导体产品及其制作方法
US12002765B2 (en) * 2022-01-04 2024-06-04 Nanya Technology Corporation Marks for overlay measurement and overlay error correction

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0543361B1 (de) * 1991-11-20 2002-02-27 Canon Kabushiki Kaisha Verfahren zur Herstellung einer Halbleiteranordnung
US5298988A (en) * 1992-06-02 1994-03-29 Massachusetts Institute Of Technology Technique for aligning features on opposite surfaces of a substrate
US5361132A (en) * 1992-11-24 1994-11-01 Massachussetts Institute Of Technology Back to front alignment of elements on a substrate
US5545593A (en) 1993-09-30 1996-08-13 Texas Instruments Incorporated Method of aligning layers in an integrated circuit device
US6376329B1 (en) 1997-08-04 2002-04-23 Nikon Corporation Semiconductor wafer alignment using backside illumination
WO1999056308A1 (fr) 1998-04-28 1999-11-04 Nikon Corporation Systeme d'exposition et procede de production d'un microdispositif
EP1223469A1 (de) 2001-01-15 2002-07-17 ASML Netherlands B.V. Lithographischer Apparat
US6768539B2 (en) * 2001-01-15 2004-07-27 Asml Netherlands B.V. Lithographic apparatus

Also Published As

Publication number Publication date
US7130049B2 (en) 2006-10-31
TW200540574A (en) 2005-12-16
DE602004011458T2 (de) 2009-01-15
JP4230991B2 (ja) 2009-02-25
SG113012A1 (en) 2005-07-28
KR20050065390A (ko) 2005-06-29
EP1548507A1 (de) 2005-06-29
US20050146721A1 (en) 2005-07-07
EP1548507B1 (de) 2008-01-23
CN1641484A (zh) 2005-07-20
CN100480862C (zh) 2009-04-22
TWI304162B (en) 2008-12-11
JP2005191570A (ja) 2005-07-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee