DE60124956D1 - Polymere mit geringem optischem verlust - Google Patents
Polymere mit geringem optischem verlustInfo
- Publication number
- DE60124956D1 DE60124956D1 DE60124956T DE60124956T DE60124956D1 DE 60124956 D1 DE60124956 D1 DE 60124956D1 DE 60124956 T DE60124956 T DE 60124956T DE 60124956 T DE60124956 T DE 60124956T DE 60124956 D1 DE60124956 D1 DE 60124956D1
- Authority
- DE
- Germany
- Prior art keywords
- polymers
- optical loss
- low optical
- low
- loss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
- C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
- C08G65/3322—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof acyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/12—Esters of phenols or saturated alcohols
- C08F22/18—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
- C08F22/12—Esters of phenols or saturated alcohols
- C08F22/20—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/331—Polymers modified by chemical after-treatment with organic compounds containing oxygen
- C08G65/332—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof
- C08G65/3324—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof cyclic
- C08G65/3326—Polymers modified by chemical after-treatment with organic compounds containing oxygen containing carboxyl groups, or halides, or esters thereof cyclic aromatic
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyethers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/747,068 US6496637B2 (en) | 2000-12-21 | 2000-12-21 | Low optical loss polymers |
US747068 | 2000-12-21 | ||
PCT/US2001/046054 WO2002051927A2 (en) | 2000-12-21 | 2001-10-31 | Low optical loss polymers |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60124956D1 true DE60124956D1 (de) | 2007-01-11 |
DE60124956T2 DE60124956T2 (de) | 2007-09-20 |
Family
ID=25003536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60124956T Expired - Lifetime DE60124956T2 (de) | 2000-12-21 | 2001-10-31 | Polymere mit geringem optischem verlust |
Country Status (8)
Country | Link |
---|---|
US (2) | US6496637B2 (de) |
EP (1) | EP1362071B1 (de) |
JP (1) | JP4634004B2 (de) |
KR (1) | KR100832999B1 (de) |
CN (1) | CN1285626C (de) |
AU (1) | AU2002232473A1 (de) |
DE (1) | DE60124956T2 (de) |
WO (1) | WO2002051927A2 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6496637B2 (en) * | 2000-12-21 | 2002-12-17 | Corning Incorporated | Low optical loss polymers |
US7078445B2 (en) * | 2001-02-01 | 2006-07-18 | E. I. Du Pont De Nemours And Company | Photosensitive acrylate composition and waveguide device |
US6778753B2 (en) * | 2001-07-25 | 2004-08-17 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
US7030209B2 (en) | 2002-02-04 | 2006-04-18 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
US20030174424A1 (en) * | 2002-03-15 | 2003-09-18 | Hart Brian T. | Monolithic filter array |
US7268927B2 (en) * | 2002-03-15 | 2007-09-11 | Corning Incorporated | Tunable optical filter array and method of use |
US6912073B2 (en) | 2002-03-15 | 2005-06-28 | Corning Incorporated | Optical filter array and method of use |
US7390854B2 (en) * | 2004-11-05 | 2008-06-24 | E. I. Dupont De Nemours And Company | Low shrinkage, low optical absorbance, low refractive index adhesive composition |
US7629051B2 (en) * | 2005-06-01 | 2009-12-08 | Fujifilm Corporation | Optical film containing fluorinated photopolymerization initiator, antireflective film, polarizing plate and image display unit including same |
US8529993B2 (en) * | 2006-05-01 | 2013-09-10 | Zetta Research andDevelopment LLC—RPO Series | Low volatility polymers for two-stage deposition processes |
US7505651B2 (en) * | 2006-10-06 | 2009-03-17 | Motorola, Inc. | Optical planar wavelength selective filter and method of manufacture |
US8041808B1 (en) | 2007-03-30 | 2011-10-18 | United Services Automobile Association | Managing the performance of an electronic device |
US20110104388A1 (en) * | 2009-11-02 | 2011-05-05 | Harris Corporation | Method for making an optical device including a curable index matching elastomeric solid layer |
JP5820266B2 (ja) * | 2011-12-26 | 2015-11-24 | 日東電工株式会社 | 光導波路形成用樹脂組成物およびそれを用いた光導波路 |
US8872358B2 (en) * | 2012-02-07 | 2014-10-28 | Shin-Etsu Chemical Co., Ltd. | Sealant laminated composite, sealed semiconductor devices mounting substrate, sealed semiconductor devices forming wafer, semiconductor apparatus, and method for manufacturing semiconductor apparatus |
CN104478748B (zh) * | 2014-11-13 | 2016-11-23 | 哈尔滨工业大学无锡新材料研究院 | 光学用含氟聚氨酯型丙烯酸酯uv固化单体及其制造方法 |
JP7151703B2 (ja) * | 2018-02-28 | 2022-10-12 | 東レ株式会社 | 複合半透膜および複合半透膜エレメント |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3845051A (en) * | 1970-09-08 | 1974-10-29 | Minnesota Mining & Mfg | Alpha,omega-di-s-triazinyl perfluoropolyoxa-alkanes |
JPH01278507A (ja) * | 1988-04-28 | 1989-11-08 | Asahi Chem Ind Co Ltd | 酸素透過性樹脂組成物 |
US5484822A (en) * | 1991-06-24 | 1996-01-16 | Polaroid Corporation | Process and composition for cladding optic fibers |
DE69434548T2 (de) * | 1993-03-18 | 2006-08-03 | Nippon Telegraph And Telephone Corp. | Herstellungsverfahren eines polyimiden optischen wellenleiters |
JPH07140336A (ja) * | 1993-09-22 | 1995-06-02 | Shin Etsu Chem Co Ltd | 光導波路 |
JPH11508699A (ja) | 1995-06-28 | 1999-07-27 | アクゾ ノーベル ナムローゼ フェンノートシャップ | 少なくとも5層の光デバイス |
SE508067C2 (sv) * | 1996-10-18 | 1998-08-24 | Ericsson Telefon Ab L M | Optisk ledare tillverkad av ett polymert material innefattande glycidylakrylat och pentafluorstyren |
US6144795A (en) * | 1996-12-13 | 2000-11-07 | Corning Incorporated | Hybrid organic-inorganic planar optical waveguide device |
US6335149B1 (en) * | 1997-04-08 | 2002-01-01 | Corning Incorporated | High performance acrylate materials for optical interconnects |
US6323361B1 (en) * | 1997-04-17 | 2001-11-27 | Corning Inc. | Photocurable halofluorinated acrylates |
JP4267088B2 (ja) * | 1997-09-05 | 2009-05-27 | パナソニック株式会社 | 反射防止膜用塗料及び該反射防止膜用塗料を用いた低反射材 |
JP4768127B2 (ja) * | 1998-11-10 | 2011-09-07 | ネオフォトニクス・コーポレイション | 熱光学ポリマーを含むフォトニックデバイス |
US6306563B1 (en) * | 1999-06-21 | 2001-10-23 | Corning Inc. | Optical devices made from radiation curable fluorinated compositions |
US6389209B1 (en) * | 1999-09-07 | 2002-05-14 | Agere Systems Optoelectronics Guardian Corp. | Strain free planar optical waveguides |
JP4590703B2 (ja) * | 2000-08-31 | 2010-12-01 | ユニマテック株式会社 | 含フッ素ポリエーテルカルボン酸エステル |
US6496637B2 (en) * | 2000-12-21 | 2002-12-17 | Corning Incorporated | Low optical loss polymers |
US6778753B2 (en) * | 2001-07-25 | 2004-08-17 | E. I. Du Pont De Nemours And Company | Halogenated optical polymer composition |
-
2000
- 2000-12-21 US US09/747,068 patent/US6496637B2/en not_active Expired - Fee Related
-
2001
- 2001-10-31 AU AU2002232473A patent/AU2002232473A1/en not_active Abandoned
- 2001-10-31 WO PCT/US2001/046054 patent/WO2002051927A2/en active IP Right Grant
- 2001-10-31 CN CNB018228011A patent/CN1285626C/zh not_active Expired - Fee Related
- 2001-10-31 DE DE60124956T patent/DE60124956T2/de not_active Expired - Lifetime
- 2001-10-31 JP JP2002553412A patent/JP4634004B2/ja not_active Expired - Fee Related
- 2001-10-31 EP EP01991999A patent/EP1362071B1/de not_active Expired - Lifetime
- 2001-10-31 KR KR1020037008315A patent/KR100832999B1/ko not_active IP Right Cessation
-
2002
- 2002-10-29 US US10/283,394 patent/US6711336B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2002051927A2 (en) | 2002-07-04 |
US20020122647A1 (en) | 2002-09-05 |
WO2002051927A3 (en) | 2003-01-23 |
JP4634004B2 (ja) | 2011-02-16 |
US6496637B2 (en) | 2002-12-17 |
KR100832999B1 (ko) | 2008-05-27 |
US20030108326A1 (en) | 2003-06-12 |
EP1362071B1 (de) | 2006-11-29 |
DE60124956T2 (de) | 2007-09-20 |
CN1543477A (zh) | 2004-11-03 |
JP2004523610A (ja) | 2004-08-05 |
AU2002232473A1 (en) | 2002-07-08 |
CN1285626C (zh) | 2006-11-22 |
US6711336B2 (en) | 2004-03-23 |
KR20030090615A (ko) | 2003-11-28 |
EP1362071A2 (de) | 2003-11-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |