DE60016245D1 - Halbleiterlaservorrichtung für elektro-optische verwendungen und herstellungsverfahren - Google Patents

Halbleiterlaservorrichtung für elektro-optische verwendungen und herstellungsverfahren

Info

Publication number
DE60016245D1
DE60016245D1 DE60016245T DE60016245T DE60016245D1 DE 60016245 D1 DE60016245 D1 DE 60016245D1 DE 60016245 T DE60016245 T DE 60016245T DE 60016245 T DE60016245 T DE 60016245T DE 60016245 D1 DE60016245 D1 DE 60016245D1
Authority
DE
Germany
Prior art keywords
electro
semiconductor laser
laser device
production methods
optical uses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60016245T
Other languages
English (en)
Inventor
Salvatore Coffa
Sebania Libertino
Mario Saggio
Ferruccio Frisina
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SRL
Original Assignee
STMicroelectronics SRL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SRL filed Critical STMicroelectronics SRL
Application granted granted Critical
Publication of DE60016245D1 publication Critical patent/DE60016245D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/0632—Thin film lasers in which light propagates in the plane of the thin film
    • H01S3/0637—Integrated lateral waveguide, e.g. the active waveguide is integrated on a substrate made by Si on insulator technology (Si/SiO2)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1628—Solid materials characterised by a semiconducting matrix
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/3004—Structure or shape of the active region; Materials used for the active region employing a field effect structure for inducing charge-carriers, e.g. FET
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3068—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure deep levels

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Semiconductor Lasers (AREA)
  • Lasers (AREA)
DE60016245T 1999-09-02 2000-09-01 Halbleiterlaservorrichtung für elektro-optische verwendungen und herstellungsverfahren Expired - Lifetime DE60016245D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP99830544A EP1081812A1 (de) 1999-09-02 1999-09-02 Halbleitervorrichtung für elektro-optische Verwendung, Herstellungsverfahren und Halbleiterlaservorrichtung
PCT/EP2000/008555 WO2001017074A1 (en) 1999-09-02 2000-09-01 Semiconductor device for electro-optic applications, method for manufacturing said device and corresponding semiconductor laser device

Publications (1)

Publication Number Publication Date
DE60016245D1 true DE60016245D1 (de) 2004-12-30

Family

ID=8243562

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60016245T Expired - Lifetime DE60016245D1 (de) 1999-09-02 2000-09-01 Halbleiterlaservorrichtung für elektro-optische verwendungen und herstellungsverfahren

Country Status (5)

Country Link
US (1) US6828598B1 (de)
EP (2) EP1081812A1 (de)
AU (1) AU1383501A (de)
DE (1) DE60016245D1 (de)
WO (1) WO2001017074A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1258927B1 (de) * 2001-05-15 2005-08-17 STMicroelectronics S.r.l. Halbleiter-Photodetektor mit hoher Verstärkung und Herstellungsverfahren
AUPR534201A0 (en) * 2001-05-30 2001-06-21 Unisearch Limited High efficiency silicon light emitting device
KR100450749B1 (ko) * 2001-12-28 2004-10-01 한국전자통신연구원 어븀이 도핑된 실리콘 나노 점 어레이 제조 방법 및 이에이용되는 레이저 기화 증착 장비
US7242027B2 (en) 2004-08-13 2007-07-10 Paul Steven Schranz Light emitting and image sensing device and apparatus
JP2008526003A (ja) * 2004-12-24 2008-07-17 ピレリ・アンド・チ・ソチエタ・ペル・アツィオーニ ゲルマニウムオンシリコンの光検出器
US7528403B1 (en) * 2005-04-25 2009-05-05 California Institute Of Technology Hybrid silicon-on-insulator waveguide devices
WO2007137157A2 (en) * 2006-05-18 2007-11-29 Massachusetts Institute Of Technology Extrinsic gain laser and optical amplification device
US20080002929A1 (en) 2006-06-30 2008-01-03 Bowers John E Electrically pumped semiconductor evanescent laser
US8111729B2 (en) * 2008-03-25 2012-02-07 Intel Corporation Multi-wavelength hybrid silicon laser array
DE102009003544B4 (de) * 2009-02-26 2012-10-18 Q-Cells Se Verfahren zur Überprüfung von Solarzellenoberflächen
CN102254818B (zh) * 2010-05-19 2013-05-01 中国科学院微电子研究所 一种半导体结型二极管器件及其制造方法
US9450381B1 (en) 2015-03-19 2016-09-20 International Business Machines Corporation Monolithic integrated photonics with lateral bipolar and BiCMOS
US9372307B1 (en) 2015-03-30 2016-06-21 International Business Machines Corporation Monolithically integrated III-V optoelectronics with SI CMOS

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6474783A (en) * 1987-09-17 1989-03-20 Fujitsu Ltd Semiconductor light-emitting device
US5045498A (en) * 1990-08-10 1991-09-03 Hewlett-Packard Company Method of fabricating an atomic element doped semiconductor injection laser using ion implantation and epitaxial growth on the implanted surface
US5107538A (en) * 1991-06-06 1992-04-21 At&T Bell Laboratories Optical waveguide system comprising a rare-earth Si-based optical device

Also Published As

Publication number Publication date
AU1383501A (en) 2001-03-26
EP1081812A1 (de) 2001-03-07
EP1210752B9 (de) 2005-08-31
US6828598B1 (en) 2004-12-07
EP1210752A1 (de) 2002-06-05
WO2001017074A1 (en) 2001-03-08
EP1210752B1 (de) 2004-11-24
WO2001017074A9 (en) 2002-09-06

Similar Documents

Publication Publication Date Title
DE60233840D1 (de) Elektrooptische Vorrichtung und zugehöriges Herstellungsverfahren
DE60030931D1 (de) Halbleiteranordnung und Herstellungsverfahren dafür
DE60035144D1 (de) MOS-Gate-Leistungsbauelement hoher Dichte und dessen Herstellungsverfahren
DE60045088D1 (de) Halbleitervorrichtung und deren Herstellungsverfahren
DE60033901D1 (de) Verpackung für Halbleitervorrichtung und deren Herstellungsverfahren
DE60120315D1 (de) Elektroforetische Vorrichtung und deren Herstellungsverfahren
DE60120044D1 (de) Flüssigkristallvorrichtung und ihr Herstellungsverfahren
DE60019913D1 (de) Halbleiterbauelement und Herstellungsverfahren
DE60038323D1 (de) Halbleiterkristall, dessen Herstellungsverfahren und Halbleiterbauelement
ITMI20010731A0 (it) Dispositivo semiconduttore e metodo per la produzione dello stesso
DE60029865D1 (de) Einmodiger Halbleiterlaser
DE60235858D1 (de) Transflektive elektrooptische Vorrichtung
DE60225221D1 (de) Faseroptische Schneideeinrichtung und zugehöriges Schneideverfahren
DE60016245D1 (de) Halbleiterlaservorrichtung für elektro-optische verwendungen und herstellungsverfahren
DE60040128D1 (de) Optischer mikro-ausleger, herstellungsverfahren für einen solchen und mikro-ausleger-halter
DE69920653D1 (de) Halbleiterlaservorrichtung
DE60230840D1 (de) Halbleiteranordnung und Herstellungsverfahren dafür
DE60042912D1 (de) Kühlvorrichtung für v-motor
DE19983891T1 (de) Navigationsvorrichtung und Navigationsverfahren
DE60001565D1 (de) Laser-klemmvorrichtung und herstellungsverfahren
DE60012592D1 (de) Halbleiterlaser und zugehöriges Herstellungsverfahren
DE60234805D1 (de) Halbleiterlaser Vorrichtung und Faseroptischer Verstärker
DE60034265D1 (de) Halbleiterbauelement mit SOI-Struktur und dessen Herstellungsverfahren
DE69925054D1 (de) Giessform und Markierungsmethode für Halbleitervorrichtungen
DE60010837D1 (de) Optische Halbleitervorrichtung und zugehöriges Herstellungsverfahren

Legal Events

Date Code Title Description
8332 No legal effect for de