DE3854238T2 - Verfahren zur Herstellung eines supraleitenden Elements. - Google Patents

Verfahren zur Herstellung eines supraleitenden Elements.

Info

Publication number
DE3854238T2
DE3854238T2 DE3854238T DE3854238T DE3854238T2 DE 3854238 T2 DE3854238 T2 DE 3854238T2 DE 3854238 T DE3854238 T DE 3854238T DE 3854238 T DE3854238 T DE 3854238T DE 3854238 T2 DE3854238 T2 DE 3854238T2
Authority
DE
Germany
Prior art keywords
producing
superconducting element
superconducting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3854238T
Other languages
English (en)
Other versions
DE3854238D1 (de
Inventor
Takahiko Kato
Katsuzo Aihara
Jiro Kuniya
Yutaka Misawa
Yoshihide Wadayama
Masahiro Ogihara
Toshikazu Nishino
Ushio Kawabe
Haruhiro Hitachi Dain Hasegawa
Kazumasa Takagi
Tokuumi Fukazawa
Katsuki Miyauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE3854238D1 publication Critical patent/DE3854238D1/de
Application granted granted Critical
Publication of DE3854238T2 publication Critical patent/DE3854238T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/048—Superconductive coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F6/00—Superconducting magnets; Superconducting coils
    • H01F6/06—Coils, e.g. winding, insulating, terminating or casing arrangements therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0884—Treatment of superconductor layers by irradiation, e.g. ion-beam, electron-beam, laser beam or X-rays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/20—Permanent superconducting devices
    • H10N60/203—Permanent superconducting devices comprising high-Tc ceramic materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices
    • H10N60/0941—Manufacture or treatment of Josephson-effect devices comprising high-Tc ceramic materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
DE3854238T 1987-04-08 1988-04-07 Verfahren zur Herstellung eines supraleitenden Elements. Expired - Fee Related DE3854238T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP8477087 1987-04-08
JP9076287 1987-04-15
JP9302587 1987-04-17
JP10428387 1987-04-30

Publications (2)

Publication Number Publication Date
DE3854238D1 DE3854238D1 (de) 1995-09-07
DE3854238T2 true DE3854238T2 (de) 1996-03-21

Family

ID=27467007

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3854238T Expired - Fee Related DE3854238T2 (de) 1987-04-08 1988-04-07 Verfahren zur Herstellung eines supraleitenden Elements.

Country Status (5)

Country Link
US (1) US5096882A (de)
EP (1) EP0286106B1 (de)
JP (1) JP2876211B2 (de)
KR (1) KR880013187A (de)
DE (1) DE3854238T2 (de)

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DE3854626T2 (de) * 1987-03-12 1996-07-04 Semiconductor Energy Lab Verfahren zur Herstellung von Komponenten aus supraleitenden oxidkeramischen Materialien.
JP2855614B2 (ja) * 1987-03-30 1999-02-10 住友電気工業株式会社 超電導回路の形成方法
DE3853316T2 (de) * 1987-05-08 1995-08-03 Fujitsu Ltd Supraleitende Schaltungskarte und Verfahren zu ihrer Herstellung.
CN1035087C (zh) * 1987-05-18 1997-06-04 住友电气工业株式会社 制作超导电路图形的方法
JPH079905B2 (ja) * 1987-07-15 1995-02-01 シャープ株式会社 半導体装置の配線方法
JPS6451685A (en) * 1987-08-22 1989-02-27 Sumitomo Electric Industries Formation of superconducting circuit
GB8723516D0 (en) * 1987-10-07 1987-11-11 Atomic Energy Authority Uk Superconducting ceramic circuit elements
US5143894A (en) * 1987-10-14 1992-09-01 Mordechai Rothschild Formation and high resolution patterning of superconductors
JPH01111702A (ja) * 1987-10-24 1989-04-28 Hiroyuki Yoshida 複合酸化物から放射線照射を利用して室温超伝導体を製造する方法
FR2647266A1 (fr) * 1989-05-17 1990-11-23 Ecole Cle Arts Manufactures Element de circuit electrique ou electronique comportant un supraconducteur sur lequel sont fixes des elements conducteurs
JPH0355889A (ja) * 1989-07-25 1991-03-11 Furukawa Electric Co Ltd:The 超電導多層回路の製造方法
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JP2767298B2 (ja) * 1989-09-05 1998-06-18 財団法人生産開発科学研究所 積層薄膜体及びその製造法
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CA2054470C (en) * 1990-10-30 1997-07-01 Takao Nakamura Method for manufacturing superconducting device having a reduced thickness of oxide superconducting layer and superconducting device manufactured thereby
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CA2054795C (en) * 1990-11-01 1996-08-06 Hiroshi Inada Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same
CA2054796C (en) * 1990-11-01 1999-01-19 Hiroshi Inada Superconducting wiring lines and process for fabricating the same
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JPH06219736A (ja) * 1993-01-27 1994-08-09 Hitachi Ltd 超電導体
AU8070294A (en) * 1993-07-15 1995-02-13 President And Fellows Of Harvard College Extended nitride material comprising beta -c3n4
FR2714205A1 (fr) * 1993-12-17 1995-06-23 Atg Sa Matériau composite pour l'enregistrement magnéto-optique, sa préparation et son utilisation.
JPH07263767A (ja) 1994-01-14 1995-10-13 Trw Inc イオンインプランテーションを用いたプレーナ型の高温超伝導集積回路
US5593918A (en) * 1994-04-22 1997-01-14 Lsi Logic Corporation Techniques for forming superconductive lines
US6153561A (en) * 1996-09-13 2000-11-28 The Ohio State University Method for oxygenating oxide superconductive materials
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US6188919B1 (en) 1999-05-19 2001-02-13 Trw Inc. Using ion implantation to create normal layers in superconducting-normal-superconducting Josephson junctions
US6638895B1 (en) * 1999-10-27 2003-10-28 The University Of Chicago Method for fabricating high aspect ratio structures in perovskite material
DE10047625A1 (de) 2000-09-26 2002-04-11 Max Planck Gesellschaft Stöchiometrieänderung eines ionisch aufgebauten Feststoffes
GB0120697D0 (en) 2001-08-24 2001-10-17 Coated Conductors Consultancy Superconducting coil fabrication
JP4859165B2 (ja) * 2004-06-07 2012-01-25 独立行政法人物質・材料研究機構 高臨界電流特性を有する超伝導材料及びその製造方法
WO2006013819A1 (ja) * 2004-08-02 2006-02-09 Matsushita Electric Industrial Co., Ltd. 抵抗変化素子とそれを用いた抵抗変化型メモリ
JP4431891B2 (ja) * 2004-12-28 2010-03-17 セイコーエプソン株式会社 圧電素子、圧電アクチュエーター、圧電ポンプ、インクジェット式記録ヘッド、インクジェットプリンター、表面弾性波素子、薄膜圧電共振子、周波数フィルタ、発振器、電子回路、および電子機器
US7888290B2 (en) * 2005-09-12 2011-02-15 Armen Gulian Material exhibiting superconductivity characteristics and method of manufacture thereof
JP4984466B2 (ja) * 2005-09-21 2012-07-25 住友電気工業株式会社 超電導テープ線材の製造方法
JP2007224747A (ja) * 2006-02-21 2007-09-06 Mitsubishi Motors Corp ディーゼルエンジンの排ガス浄化用フィルタおよび排ガス浄化装置
CN100440388C (zh) * 2006-09-01 2008-12-03 天津理工大学 一种制作abo3型钙钛矿结构复氧化物离子导体的激光熔凝合成方法
US7615385B2 (en) 2006-09-20 2009-11-10 Hypres, Inc Double-masking technique for increasing fabrication yield in superconducting electronics
US20080146449A1 (en) * 2006-12-14 2008-06-19 Jerome Lesueur Electrical device and method of manufacturing same
US8741158B2 (en) 2010-10-08 2014-06-03 Ut-Battelle, Llc Superhydrophobic transparent glass (STG) thin film articles
FI126113B (fi) * 2009-06-24 2016-06-30 Johannes Frantti Korkean lämpötilan suprajohteet
US20110034336A1 (en) * 2009-08-04 2011-02-10 Amit Goyal CRITICAL CURRENT DENSITY ENHANCEMENT VIA INCORPORATION OF NANOSCALE Ba2(Y,RE)NbO6 IN REBCO FILMS
US20110034338A1 (en) * 2009-08-04 2011-02-10 Amit Goyal CRITICAL CURRENT DENSITY ENHANCEMENT VIA INCORPORATION OF NANOSCALE Ba2(Y,RE)TaO6 IN REBCO FILMS
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CN102071424B (zh) * 2010-02-26 2012-05-09 比亚迪股份有限公司 一种塑料制品的制备方法及一种塑料制品
US8685549B2 (en) 2010-08-04 2014-04-01 Ut-Battelle, Llc Nanocomposites for ultra high density information storage, devices including the same, and methods of making the same
CN102071411B (zh) 2010-08-19 2012-05-30 比亚迪股份有限公司 一种塑料制品的制备方法及一种塑料制品
US11292919B2 (en) 2010-10-08 2022-04-05 Ut-Battelle, Llc Anti-fingerprint coatings
US9221076B2 (en) 2010-11-02 2015-12-29 Ut-Battelle, Llc Composition for forming an optically transparent, superhydrophobic coating
US8748350B2 (en) 2011-04-15 2014-06-10 Ut-Battelle Chemical solution seed layer for rabits tapes
US8748349B2 (en) 2011-04-15 2014-06-10 Ut-Battelle, Llc Buffer layers for REBCO films for use in superconducting devices
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CN103317240B (zh) * 2013-07-12 2015-09-30 东明兴业科技股份有限公司 镁合金表面氧化层的激光蚀刻加工方法
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US9543496B2 (en) * 2014-03-17 2017-01-10 Uchicago Argonne, Llc Creation of high-pinning microstructures in post production YBCO coated conductors
US10283695B1 (en) * 2016-02-29 2019-05-07 The United States Of America As Represented By Secretary Of The Navy Method for creating high-resolution micro- to nano-scale structures in high-temperature superconductor films
KR102145354B1 (ko) * 2018-05-31 2020-08-18 경기대학교 산학협력단 양성자 빔 조사에 의한 산화 환원 사이클을 갖는 수소 생성 방법 및 이를 이용한 수소 생성 장치
KR102149059B1 (ko) * 2018-06-01 2020-08-28 경기대학교 산학협력단 제논광 또는 마이크로웨이브 조사에 의한 산화 환원 사이클을 갖는 수소 생성 방법 및 이를 이용한 수소 생성 장치
US11783953B2 (en) * 2018-10-02 2023-10-10 Massachusetts Institute Of Technology Cryogenic radiation enhancement of superconductors
CN111825444B (zh) * 2020-08-04 2022-08-19 上海上创超导科技有限公司 在异位法高温超导薄膜中引入柱状缺陷的方法
CN113470883B (zh) * 2021-06-29 2022-11-11 南京大学 具有高临界参数无毒铜氧化物超导体及其制备方法

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Also Published As

Publication number Publication date
EP0286106B1 (de) 1995-08-02
EP0286106A2 (de) 1988-10-12
JP2876211B2 (ja) 1999-03-31
KR880013187A (ko) 1988-11-30
JPS6433006A (en) 1989-02-02
US5096882A (en) 1992-03-17
DE3854238D1 (de) 1995-09-07
EP0286106A3 (en) 1990-03-28

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