DE3474378D1 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
DE3474378D1
DE3474378D1 DE8484201109T DE3474378T DE3474378D1 DE 3474378 D1 DE3474378 D1 DE 3474378D1 DE 8484201109 T DE8484201109 T DE 8484201109T DE 3474378 T DE3474378 T DE 3474378T DE 3474378 D1 DE3474378 D1 DE 3474378D1
Authority
DE
Germany
Prior art keywords
voltage
semiconductor device
small
sourceigate
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484201109T
Other languages
English (en)
Inventor
Marcellinus Johannes M Pelgrom
Hendrik Anne Harwig
Jan Willem Slotboom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3474378D1 publication Critical patent/DE3474378D1/de
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1025Channel region of field-effect devices
    • H01L29/1029Channel region of field-effect devices of field-effect transistors
    • H01L29/1033Channel region of field-effect devices of field-effect transistors with insulated gate, e.g. characterised by the length, the width, the geometric contour or the doping structure
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05FSYSTEMS FOR REGULATING ELECTRIC OR MAGNETIC VARIABLES
    • G05F3/00Non-retroactive systems for regulating electric variables by using an uncontrolled element, or an uncontrolled combination of elements, such element or such combination having self-regulating properties
    • G05F3/02Regulating voltage or current
    • G05F3/08Regulating voltage or current wherein the variable is dc
    • G05F3/10Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics
    • G05F3/16Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics being semiconductor devices
    • G05F3/20Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations
    • G05F3/24Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations wherein the transistors are of the field-effect type only
    • G05F3/242Regulating voltage or current wherein the variable is dc using uncontrolled devices with non-linear characteristics being semiconductor devices using diode- transistor combinations wherein the transistors are of the field-effect type only with compensation for device parameters, e.g. channel width modulation, threshold voltage, processing, or external variations, e.g. temperature, loading, supply voltage
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76808Input structures

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Nonlinear Science (AREA)
  • Electromagnetism (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Automation & Control Theory (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Bipolar Transistors (AREA)
  • Networks Using Active Elements (AREA)
  • Noodles (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Junction Field-Effect Transistors (AREA)
DE8484201109T 1983-08-02 1984-07-30 Semiconductor device Expired DE3474378D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8302731A NL8302731A (nl) 1983-08-02 1983-08-02 Halfgeleiderinrichting.

Publications (1)

Publication Number Publication Date
DE3474378D1 true DE3474378D1 (en) 1988-11-03

Family

ID=19842221

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484201109T Expired DE3474378D1 (en) 1983-08-02 1984-07-30 Semiconductor device

Country Status (8)

Country Link
US (1) US4627082A (de)
EP (1) EP0133721B1 (de)
JP (1) JPS6065571A (de)
AT (1) ATE37630T1 (de)
AU (1) AU3137784A (de)
CA (1) CA1216967A (de)
DE (1) DE3474378D1 (de)
NL (1) NL8302731A (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6155971A (ja) * 1984-08-27 1986-03-20 Sumitomo Electric Ind Ltd シヨツトキ−ゲ−ト電界効果トランジスタ
NL8501542A (nl) * 1985-05-30 1986-12-16 Philips Nv Ladingsgekoppelde inrichting.
NL8600890A (nl) * 1986-04-09 1987-11-02 Philips Nv Halfgeleiderinrichting.
US4712124A (en) * 1986-12-22 1987-12-08 North American Philips Corporation Complementary lateral insulated gate rectifiers with matched "on" resistances
NL8800851A (nl) * 1988-04-05 1989-11-01 Philips Nv Halfgeleidergeheugeninrichting.
JPH0831791B2 (ja) * 1988-12-28 1996-03-27 三菱電機株式会社 半導体装置
US5440749A (en) * 1989-08-03 1995-08-08 Nanotronics Corporation High performance, low cost microprocessor architecture
JP3189327B2 (ja) * 1991-10-08 2001-07-16 ソニー株式会社 電荷検出装置
US6674470B1 (en) 1996-09-19 2004-01-06 Kabushiki Kaisha Toshiba MOS-type solid state imaging device with high sensitivity
US7408754B1 (en) * 2004-11-18 2008-08-05 Altera Corporation Fast trigger ESD device for protection of integrated circuits
JP4934302B2 (ja) * 2005-09-09 2012-05-16 ホシザキ電機株式会社 冷却貯蔵庫
CN101611274B (zh) 2007-02-26 2011-04-20 星崎电机株式会社 冷却贮藏库及其压缩机的控制方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191896A (en) * 1976-07-26 1980-03-04 Rca Corporation Low noise CCD input circuit
US4068140A (en) * 1976-12-27 1978-01-10 Texas Instruments Incorporated MOS source follower circuit
US4096430A (en) * 1977-04-04 1978-06-20 General Electric Company Metal-oxide-semiconductor voltage reference
IT1099381B (it) * 1978-01-09 1985-09-18 Rca Corp Specchi di corrente a transistori mos, con scarichi allungati
JPS54126479A (en) * 1978-03-25 1979-10-01 Toshiba Corp Signal charge injection system of charge coupled device
CH628462A5 (fr) * 1978-12-22 1982-02-26 Centre Electron Horloger Source de tension de reference.
FR2447610A1 (fr) * 1979-01-26 1980-08-22 Commissariat Energie Atomique Generateur de tension de reference et circuit de mesure de la tension de seuil d'un transistor mos, applicable a ce generateur de tension de reference
JPS562017A (en) * 1979-06-19 1981-01-10 Toshiba Corp Constant electric current circuit
US4453094A (en) * 1982-06-30 1984-06-05 General Electric Company Threshold amplifier for IC fabrication using CMOS technology
US4477782A (en) * 1983-05-13 1984-10-16 At&T Bell Laboratories Compound current mirror

Also Published As

Publication number Publication date
JPS6065571A (ja) 1985-04-15
EP0133721B1 (de) 1988-09-28
EP0133721A1 (de) 1985-03-06
NL8302731A (nl) 1985-03-01
ATE37630T1 (de) 1988-10-15
US4627082A (en) 1986-12-02
CA1216967A (en) 1987-01-20
AU3137784A (en) 1985-02-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee