CN2832836Y - Anode metal plate structure for electrophoretic deposition - Google Patents
Anode metal plate structure for electrophoretic deposition Download PDFInfo
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- CN2832836Y CN2832836Y CN 200520110044 CN200520110044U CN2832836Y CN 2832836 Y CN2832836 Y CN 2832836Y CN 200520110044 CN200520110044 CN 200520110044 CN 200520110044 U CN200520110044 U CN 200520110044U CN 2832836 Y CN2832836 Y CN 2832836Y
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- metal plate
- anode metal
- electrophoretic deposition
- shielding layer
- plate structure
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Abstract
The utility model relates to an anode metal plate structure for electrophoretic deposition. The anode metal plate structure for electrophoretic deposition uses a material not easy to generate electrochemical reaction in an electrophoretic process to be provided with a shielding layer on the surface of an anode metal plate through totem; the shielding layer corresponding to a cathode structure is hollowed out by the regions of the electronic emitting sources of carbon nanotubes to be carried out with electrophoretic deposition to form hollow holes, and other ineffective regions corresponding to the cathode structure are all shielded by the shielding layer. When the anode metal plate and the cathode structure are connected and embedded in an electrophoresis tank to be carried out with the electrophoretic deposition, the carbon nanotubes of the electrophoresis tank correspond to a cathode electrode layer of the cathode structure through the hollow holes of the shielding layer to form an electric field so as to deposit the electron emitting sources.
Description
Technical field
The utility model relates to a kind of anode metal plate structure that is used for electrophoretic deposition, relate in particular to and a kind ofly on the electrophoresis anode metal plate of electrophoretic deposition CNT (carbon nano-tube), be formed with shielding layer, the corresponding cathode construction of this shielding layer is desired to be hollow hole by the zone of electrophoretic deposition CNT (carbon nano-tube) formation electron emission source, and the CNT (carbon nano-tube) of electrophoresis chamber is passed through the hollow hole of this shielding layer corresponding to forming the anode metal plate of electric field with the deposition electron emission source on the cathode construction.
Background technology
Known three-electrode field transmitting display device, its structure mainly comprises anode construction and cathode construction, between anode construction and cathode construction, be provided with cover keep lever (spacer), provide the interval of vacuum area between anode construction and cathode construction and as the support between anode construction and cathode construction.This anode construction comprises anode substrate, anode electrode layer and fluorescent powder coating (phosphors layer); This cathode construction comprises cathode base, negative electrode layer, electron emission source layer, dielectric layer and gate layer; Wherein, this gate layer is provided potential difference to attract the electron ejection of electron emission source layer, the high-voltage that utilizes this anode electrode layer to provide so that the acceleration of electron beam to be provided, to make electronics have fluorescent powder coating on enough kinetic energy bump (impinge) anode construction to excite and makes it luminous.In view of the above, for electronics is moved in Field Emission Display, need indicating meter to be kept the following vacuum tightness of 10-5 holder (torr) at least with vacuum apparatus, make electronics obtain good mean free path (mean free path), should avoid the pollution in electron emission source and fluorescent material district simultaneously and poison.In addition, there are enough energy to remove to clash into fluorescent material, between two plates, appropriate gap need be arranged, make electronics have enough accelerating spaces to clash into fluorescent powder, reach and make the fluorescent material physical efficiency fully produce luminescent effect for making electronics.
Wherein, this electron emission source layer is main component with the CNT (carbon nano-tube).CNT (carbon nano-tube) (Carbonnanotubes) was proposed back (Nature 354,56 (1991)) from 1991 by Iijima, because it possesses high characteristic electron, was therefore used by multiple electronic package.CNT (carbon nano-tube) can have very high long-width ratio (aspect ratio), greater than more than 500; And high rigidity, its young's modulus is many more than 1000GPn, and the tip of CNT (carbon nano-tube) or fault location are exposing of atom level scale, more than these characteristics therefore be considered to a kind of ideal field electron emission source (electron fieldemitter) material, for example electron emission source on a kind of cathode construction of Field Emission Display.Because CNT (carbon nano-tube) possesses above-described physical property, therefore also can by multiple manufacturing process as, wire mark or thin film fabrication etc. uses at electronic package with totemization.
This cathode construction manufacture craft is that CNT (carbon nano-tube) is implemented to be produced on the negative electrode layer as the electronics material that rises.Its making method can be chemical vacuum deposition (CVD) on the negative electrode layer in this cathode pixels respectively direct growth CNT (carbon nano-tube), or on a kind of negative electrode layer that can photosensitive type CNT (carbon nano-tube) solution totemization be made in this pixel respectively, also can be spraying CNT (carbon nano-tube) solution collocation guard and make.But according to the electron emission source structure of above-mentioned three-electrode field transmitting display device, desire is with on the cathode electrode structure in each pixel of CNT (carbon nano-tube) enforcement making, above-mentioned respectively this making method still has the obstruction restriction of cost of manufacture and three-dimensional arrangement, and the homogeneity of especially large-sized electron emission source will more be difficult to realize.
Recent a kind of electrophoretic deposition EPD (Electrophoresis Deposition) technology is suggested successively, make " the nano structural material deposition method " that patent application discloses US2003/0102222A1 number as U.S.'s invention, this method is for to be formulated as the alcohols aaerosol solution with CNT (carbon nano-tube), and utilize magnesium, lanthanum, yttrium, aluminium plasma salt is as auxiliary salt (Charger), be made as electrophoresis solution, sedimentary cathode construction of desire and electrode are attached in this electrophoresis solution, utilize direct current or voltage of alternating current in solution, to form electric field, utilize auxiliary salt in solution, to be dissociated into ion with attached to the CNT (carbon nano-tube) powder, form electrophoresis moving (Electrophoresis force) by electric field, be deposited on special electrodes to assist CNT (carbon nano-tube); Thus can be on electrode with the CNT (carbon nano-tube) deposition patternsization, utilize above-mentioned electrophoretic deposition technique easily CNT (carbon nano-tube) to be deposited on the electrode layer, and can avoid because of the restriction of three-electrode field transmitting display device on cathode construction, so this technology extensively is used in the making on the cathode construction.
In known electrophoretic deposition technique; for CNT (carbon nano-tube) can only be deposited on the cathode construction; and be not deposited on the gate and cause gate and the conducting of cathodic electricity interpolar; be to form sacrifice layer or protective layer mostly at gate and dielectric layer; the cathode electrode layer region of desiring by totem is exposed; carry out electrophoretic deposition again, again this protective layer is removed afterwards, residual or cause conducting to remove CNT (carbon nano-tube) in the inessential zone.Another kind of known technology, go out to be willing to open designation as Japanese Patent Laid, the spy opens 2001-20093 (P2001-20093A), form projection at electrophoretic anode electrode corresponding to the specific region of negative electrode, owing to be provided with this projection, therefore pairing cathode electrode is cloudy to form specific electric field, and the CNT (carbon nano-tube) that helps in the solution is deposited in this specific region, and the CNT (carbon nano-tube) that is deposited is easy to cohesion and concentrates on the specific electrodes layer region.But the making processes of this Japanese Patent is complicated, and is unfavorable for the making and the trend of large size panel.
The utility model content
Main purpose of the present utility model is to solve the defective that exists in the above-mentioned prior art.The utility model redesigns the anode metal plate structure, make this anode metal plate simpler and easy, can realize with totemization the cathode construction sediment-filled phase with effect, make the demand that the electrophoretic deposition of cathode electronics emissive source is made for following large size and the high pixel of resolving.
To achieve these goals, a kind of anode metal plate structure that is used for electrophoretic deposition that the utility model provides includes: anode metal plate is formed on the lip-deep shielding layer of this anode metal plate.On this shielding layer, be formed with a plurality of hollow holes, this cathode construction be connected with anode metal plate finish after, utilize fixed mechanism that this cathode construction and anode metal plate are fixed, after allowing the shielding layer of cathode construction one side and anode metal plate keep secured in parallel distance, again this cathode construction and anode metal plate are inserted simultaneously the electrophoresis chamber of CNT (carbon nano-tube) solution, after applying electric field again, allow the CNT (carbon nano-tube) of this electrophoresis chamber pass through the hollow hole of this shielding layer corresponding to forming electric field on the negative electrode layer of cathode construction with the deposition electron emission source.
Because the shielding layer of anode metal plate of the present utility model can the making of yellow optical micro-image totem, therefore, can cooperate the change of cathode construction design at any time, changes corresponding displacement design.But also can make high shielding layer of resolving the small pixel totem.With respect to the protruding point-like anode plate structure in the known technology, but the utility model elasticity is used.In addition, because the cathode construction of the utility model anode metal plate correspondence does not have the zone of electron emission source, cover with shielding layer, make uncovered zone and corresponding cathode construction specific region formation electric field, therefore the formed electric field of pixel deposition is more concentrated, the sedimentary density of CNT (carbon nano-tube) powder that produces is higher, the carbon pipe deposition on cathode construction outside the pixel or residual less.
Description of drawings
Fig. 1 is the schematic side view of anode metal plate of the present utility model and shielding layer structure;
Fig. 2 is the stereoscopic synoptic diagram of Fig. 1;
Fig. 3 is cathode construction of the present utility model and anode metal plate connection diagram;
Fig. 4 for cathode construction of the present utility model with carry out the electrophoretic deposition technique synoptic diagram after anode metal plate is connected;
Fig. 5 finishes synoptic diagram for CNT (carbon nano-tube) electrophoretic deposition of the present utility model forms electron emission source.
In the accompanying drawing, the list of parts of each label representative is as follows:
1-anode metal plate 2-shielding layer 21-hollow hole 3-cathode construction 31-lead
4-iontophoretic electrode 41-negative electrode 42-anode 5-electrophoresis chamber 6-electron emission source
Embodiment
Relevant technology contents of the present utility model and detailed description, existing conjunction with figs. is described as follows:
Fig. 1 is the schematic side view of anode metal plate of the present utility model and shielding layer structure; Fig. 2 is the stereoscopic synoptic diagram of Fig. 1.As shown in Figure 1 and Figure 2: the utility model provides a kind of anode metal plate structure that is used for electrophoretic deposition, can be applicable to the electrophoresis anode metal plate structure of electrophoretic deposition CNT (carbon nano-tube), it makes simple, and can satisfy following large size and high making demand of resolving the electrophoretic deposition of the cathode electronics emissive source that pixel makes.
Anode metal plate 1 is a kind of platinum or metal titanium material that is difficult for producing electrochemical reaction in electrophoretic deposition process.
Fig. 3, Fig. 4 carry out the electrophoretic deposition technique synoptic diagram after anode metal plate of the present utility model is connected and connects with cathode construction.As shown in Figure 3, Figure 4: when carrying out electrophoretic deposition, the negative electrode 41 of the lead 31 and the iontophoretic electrode (power supply unit) 4 of cathode construction 3 is connected, and the anode 42 of iontophoretic electrode 4 is connected with anode metal plate 1; Cathode construction 3 can be three extremely above Field Emission Displays.
Treat cathode construction 3 be connected with anode metal plate 1 finish after, utilize the fixed mechanism (not shown) that cathode construction 3 is fixing with anode metal plate 1, and after allowing the shielding layer 2 of cathode construction 3 one sides and anode metal plate 1 keep secured in parallel distance, again cathode construction 3 and anode metal plate 1 are inserted in the electrophoresis chamber 5 of CNT (carbon nano-tube) solution simultaneously, after applying electric field again, allow the CNT (carbon nano-tube) of electrophoresis chamber 5 pass through the hollow hole 21 of shielding layer 2 corresponding to forming electric field on the negative electrode layer of cathode construction 3 with deposition electron emission source 6 (as shown in Figure 5).
Because therefore the shielding layer 2 of anode metal plate 1 of the present utility model can cooperate the change of cathode construction 3 designs, and be easy to change the displacement design, and more can make high shielding layer 3 of resolving the small pixel totem at any time by the making of yellow optical micro-image totem.Because the zone of the cathode construction 3 no electron emission sources of anode metal plate 1 correspondence, cover with shielding layer 2, make uncovered zone and corresponding cathode construction 3 specific regions (forming the zone of electron emission source for the cathode electrode laminar surface) formation electric field, allow easily electrophoretic deposition in this specific region of CNT (carbon nano-tube), make it be easy to be deposited in this specific region.
The above only is a preferred embodiment of the present utility model, be not so promptly limit claim of the present utility model, the equivalent structure transformation that every utilization the utility model specification sheets and accompanying drawing content are done, directly or indirectly be used in other relevant technical field, all in like manner be included in the claim of the present utility model.
Claims (8)
1. an anode metal plate structure that is used for electrophoretic deposition is characterized in that, comprising:
Anode metal plate;
Be formed on the lip-deep shielding layer of described anode metal plate, on described shielding layer, be formed with a plurality of hollow holes.
2. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 1 is characterized in that described anode metal plate is a kind of metal sheet that is difficult for the material of generation electrochemical reaction in electrophoretic deposition process.
3. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 2 is characterized in that described material is a platinum.
4. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 2 is characterized in that described material is the metal titanium material.
5. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 1 is characterized in that described shielding layer is the shielding layer that a kind of high-molecular photosensitive material constitutes.
6. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 5 is characterized in that having any material in four oxygen ethyl silicon or the insulating material in the shielding layer of described high-molecular photosensitive material.
7. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 1 is characterized in that described shielding layer is the shielding layer that a kind of epoxy material constitutes.
8. a kind of anode metal plate structure that is used for electrophoretic deposition as claimed in claim 7 is characterized in that having any material in four oxygen ethyl silicon or the insulating material in the shielding layer of described use epoxy material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520110044 CN2832836Y (en) | 2005-06-14 | 2005-06-14 | Anode metal plate structure for electrophoretic deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200520110044 CN2832836Y (en) | 2005-06-14 | 2005-06-14 | Anode metal plate structure for electrophoretic deposition |
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| Publication Number | Publication Date |
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| CN2832836Y true CN2832836Y (en) | 2006-11-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200520110044 Expired - Fee Related CN2832836Y (en) | 2005-06-14 | 2005-06-14 | Anode metal plate structure for electrophoretic deposition |
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| CN (1) | CN2832836Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103946428A (en) * | 2011-11-24 | 2014-07-23 | 德诺拉工业有限公司 | Anodic structure for horizontal cells for processes of metal electrodeposition |
-
2005
- 2005-06-14 CN CN 200520110044 patent/CN2832836Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103946428A (en) * | 2011-11-24 | 2014-07-23 | 德诺拉工业有限公司 | Anodic structure for horizontal cells for processes of metal electrodeposition |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20061101 |