CN210432328U - Double-layer transparent electromagnetic shielding film - Google Patents

Double-layer transparent electromagnetic shielding film Download PDF

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Publication number
CN210432328U
CN210432328U CN201920868928.XU CN201920868928U CN210432328U CN 210432328 U CN210432328 U CN 210432328U CN 201920868928 U CN201920868928 U CN 201920868928U CN 210432328 U CN210432328 U CN 210432328U
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China
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shielding
layer
double
shielding layer
grid
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CN201920868928.XU
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基亮亮
刘麟跃
周小红
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Suzhou Weiyeda Technology Co ltd
SVG Tech Group Co Ltd
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Ivtouch Co ltd
SVG Tech Group Co Ltd
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Abstract

The utility model discloses a double-deck transparent electromagnetic shield membrane, include: a transparent substrate; the first shielding layer is stacked on the upper surface of the transparent substrate or embedded on the upper surface of the transparent substrate and comprises a first grid-shaped groove and a first shielding structure formed by electric shielding materials or magnetic shielding materials filled in the first grid-shaped groove; the second shielding layer is stacked on the upper surface of the first shielding layer and comprises a second latticed groove and a second shielding structure formed by magnetic shielding materials or electric shielding materials filled in the second latticed groove; wherein the first shielding layer and the second shielding layer have different shielding functions. Compared with the prior art, the utility model provides a double-deck transparent electromagnetic shield membrane adopts double-deck shielding layer, when not reducing the luminousness, can reach the dual shielding effect of electric shield and magnetic shield. In addition, the shielding effectiveness is better than that of a single-layer shielding film.

Description

Double-layer transparent electromagnetic shielding film
Technical Field
The utility model relates to a shielding film especially relates to a double-deck transparent electromagnetic shield membrane.
Background
With the rapid development of modern science and technology, electrical appliances and systems such as computers, mobile phones, microwave ovens, mobile communication base stations, communication transmitting stations, televisions, broadcast transmitting systems and the like all generate electromagnetic radiation with various forms, different frequencies and different intensities, invisible and untouchable electromagnetic pollution sources are increasingly concerned by various circles and are called as invisible killers, and the invisible and untouchable electromagnetic pollution sources become the fourth pollution in the lives of people today after water pollution, air pollution and noise pollution.
The electromagnetic shielding film has certain shielding performance and certain light transmittance, and when the electromagnetic wave propagation path meets the electromagnetic shielding film, the electromagnetic shielding film can change the transmission direction of the electromagnetic wave and effectively block the propagation of various electromagnetic waves such as radio waves, infrared waves, ultraviolet waves and the like, so that information leakage can be successfully blocked, the interference of electrons and electromagnetic radiation can be prevented, the normal work of equipment can be ensured, and the harm of electromagnetic radiation to personnel can be avoided. The transparent electromagnetic shielding film can shield electromagnetic waves and meet the requirement of light transmission, and is suitable for various electronic products such as equipment windows, computer displays, instrument and meter displays and the like.
In the prior art, a transparent conductive film of an embedded patterned metal grid is commonly used as a transparent electromagnetic shielding film, the transparent conductive film is formed by stamping a grid-shaped groove on a thermoplastic substrate material, conductive metal is filled in the groove, light transmission is realized by using a grid blank area, and the metal in the grid groove area is used for realizing the functions of electric conduction and electromagnetic shielding. However, the manufacturing of such shielding films is limited by the mold manufacturing and the imprinting process, the aspect ratio of the groove needs to be lower than 1.5, and the depth of the groove is inevitably shallow for the line width refinement (ensuring sufficient light transmittance), which results in a smaller filling amount of the conductive material, thereby reducing the shielding effectiveness.
In addition, the compatibility of electric shielding and magnetic shielding is a difficult problem in the industry, and few materials have the characteristics of good conductivity and high magnetic conductivity.
SUMMERY OF THE UTILITY MODEL
The utility model discloses the purpose is: the defects in the prior art are overcome, at least one problem in the prior art is solved, and the double-layer transparent electromagnetic shielding film is provided. In addition, the shielding effectiveness is better than that of a single-layer shielding film.
The technical scheme of the utility model is that: a double-layered transparent electromagnetic shielding film comprising: a transparent substrate; the first shielding layer is stacked on the transparent substrate or embedded on the upper surface of the transparent substrate and comprises a first latticed groove and a first shielding structure formed by electric shielding materials or magnetic shielding materials filled in the first latticed groove; the second shielding layer is stacked on the first shielding layer and comprises a second latticed groove and a second shielding structure formed by magnetic shielding materials or electric shielding materials filled in the second latticed groove; wherein the first shielding layer and the second shielding layer have different shielding functions.
Preferably, the first latticed groove and the second latticed groove are regular polygonal latticed grooves, and grid lines of the first latticed groove and the second latticed groove are aligned up and down.
Preferably, the grid grooves of the first grid-shaped groove and the second grid-shaped groove are irregular random grid grooves.
Preferably, the electric shielding conductive material is silver, copper or graphene; the magnetic shielding conductive material is iron or nickel.
Preferably, an adhesion promoting layer is arranged between the first shielding layer and the second shielding layer or adhesion promoting treatment is carried out.
Preferably, the groove width of first latticed recess and/or the latticed recess of second is 1 ~ 20um, and the degree of depth is 3 ~ 10um, the thickness of first shielding layer and/or second shielding layer is 3 ~ 20 um.
The utility model has the advantages that:
1. the utility model discloses a double-deck transparent electromagnetic shield membrane adopts the gridlines to accept in the recess to avoid fish tail broken string etc. bad, improve product stability, the basement is flexible transparent material simultaneously, does not influence the shielding effect when crooked. By adopting the double-layer shielding layer, the double shielding effects of electric shielding and magnetic shielding can be achieved while the light transmittance is not reduced. In addition, the shielding effectiveness is better than that of a single-layer shielding film.
Drawings
Fig. 1 is a schematic structural diagram of an embodiment of the double-layer transparent electromagnetic shielding film of the present invention.
Fig. 2 is a schematic structural view of another embodiment of the double-layered transparent electromagnetic shielding film of the present invention.
Fig. 3 is an embodiment of the double-layer transparent electromagnetic shielding film of the present invention, in which the grid-shaped grooves are regular polygonal grid grooves.
Fig. 4 is an embodiment of the double-layer transparent electromagnetic shielding film of the present invention in which the lattice-shaped grooves are irregular random lattice grooves.
Fig. 5 is a method for manufacturing the double-layered transparent electromagnetic shielding film of the present invention.
Detailed Description
The technical solution of the present invention is described in detail below with reference to the accompanying drawings 1-4 and the embodiments, wherein: 1. a transparent substrate; 2. a first shielding layer; 21. a first grid-like groove; 22. a first shielding structure; 3. a second shielding layer; 31. a second grid-shaped groove; 32. a second shielding structure.
As shown in fig. 1 to 4, the utility model discloses a double-layer transparent electromagnetic shielding film, which comprises a transparent substrate 1, a first shielding layer 2 and a second shielding layer 3.
The transparent substrate 1 is used for carrying the first shielding layer 2 and the second shielding layer 3, and may be transparent PET, PC, PMMA, or the like.
The first shielding layer 2 includes a first grid-shaped groove 21, and a first shielding structure 22 formed by an electric shielding material or a magnetic shielding material filled in the first grid-shaped groove 21. As shown in fig. 1, a UV glue layer may be coated on the surface of the transparent substrate 1, and then the first grid-shaped grooves 21 may be formed after the grooves are embossed and cured. The grooves may also be directly embossed, laser or chemically etched into the upper surface of the transparent substrate 1 to form the first grid-like grooves 21, as shown in fig. 2. The first shielding structure 22 may be formed by filling an electric shielding material or a magnetic shielding material in the first mesh-shaped groove 21 by means of a doctor blade coating paste. The electric shielding conductive material can be silver, copper or graphene, and the magnetic shielding conductive material can be iron or nickel, so that the slurry made of the electric shielding material can be silver slurry, copper slurry, graphene slurry and the like, and the slurry made of the magnetic shielding material can be nickel slurry, iron slurry and the like.
The second shielding layer 3 includes a second grid-shaped groove 31 and a second shielding structure 32 formed by a magnetic shielding material or an electric shielding material filled in the second grid-shaped groove 31. A UV glue layer may be coated on the surface of the first shielding layer 2, and then the second grid-shaped grooves 31 may be formed by stamping the grooves and curing. The second shielding structure 32 may be formed with reference to the first shielding structure 22.
The utility model discloses a shielding film adopts double-deck shielding layer, when not reducing the luminousness (not increasing the width of net recess promptly), thereby the conducting material volume of filling of having overcome individual layer shielding film is less shortcoming that shielding effectiveness is lower, and shielding effectiveness is better than the shielding effect of individual layer shielding film. It should be noted that the shielding functions of the first shielding layer 2 and the second shielding layer 3 are different, that is, when the first shielding layer 2 is an electric shielding layer, the second shielding layer 3 is a magnetic shielding layer, and conversely, when the first shielding layer 2 is a magnetic shielding layer, the second shielding layer 3 is an electric shielding layer. Can guarantee like this the utility model provides a double-deck transparent electromagnetic shield membrane adopts the component mode that electric shield and magnetic screen combined together, effectively improves shielding effect, widens shielding range.
In a preferred embodiment, the first grid-like grooves 21 and the second grid-like grooves 31 are regular polygonal grid grooves, as can be seen in fig. 3, which is an embodiment in which the grid-like grooves are regular polygonal grid grooves. The grid lines of the first grid-shaped groove 21 and the second grid-shaped groove 31 are vertically aligned and overlapped, so that the duty ratio of the grid lines is not changed, namely, the light transmittance of the double-layer transparent electromagnetic shielding film is not reduced. The manufacturing process can be as follows: when the first latticed groove 21 and the second latticed groove 31 are imprinted, a mold with a positioning target is used, and because the surface of the first shielding layer 2 is provided with the positioning target, when the second latticed groove is imprinted, the positioning target on the mold is aligned with the positioning target on the surface of the first shielding layer 2, so that the grid lines of the first latticed groove 21 and the second latticed groove 31 can be aligned and overlapped up and down.
In another preferred embodiment, the grid grooves of the first grid-shaped groove 21 and the second grid-shaped groove 31 are irregular random grid grooves, and fig. 4 can be referred to, which is an embodiment of the irregular random grid grooves. The two shielding layers may not be aligned at this time because the grid is a random grid, without interference fringes.
In one embodiment, an adhesion promoting layer is disposed between the first shielding layer 2 and the second shielding layer 3 or an adhesion promoting treatment is performed. The main materials of the conventionally used adhesion promotion layer can be polyacetylene, polyaniline, polythiophene, graphene, polyethylene terephthalate, polyurethane and the like, the adhesion promotion layer is usually coated on the surface of the substrate in a coating mode to achieve the effect of bonding with an upper layer structure, and the coating thickness range is 10-100 nm; the adhesion-promoting treatment may be a surface ionization treatment performed on the surface of the first shielding layer. The above treatment can increase the viscosity between the first shielding layer 2 and the second shielding layer 3, and effectively prevent the occurrence of the interlayer falling-off of the shielding layers.
In a specific embodiment, the groove width of the first grid-shaped groove 21 and/or the second grid-shaped groove 31 is 1-20 um, the depth is 3-10 um, and the thickness of the first shielding layer 2 and/or the second shielding layer 3 is 3-20 um.
It should be noted that, the technical solution of the shielding film of the present invention does not limit only one layer of electric shielding layer and one layer of magnetic shielding layer, and according to different application scenarios, there may also be M layers of shielding layers (M is greater than or equal to 2), wherein N layers of electric shielding layers (N is greater than or equal to 0), and M-N layers of magnetic shielding layers (M-N is greater than or equal to 0). For example, in a scene requiring only electric shielding, the shielding layer may have only two or more electric shielding layers; in the scene only needing magnetic shielding, the shielding layer can only have two or more magnetic shielding layers; for scenes that require both electrical and magnetic shielding but have low transmittance requirements, multiple electrical and magnetic shielding layers can be provided. There are of course other application scenarios, which are not listed here.
Referring to fig. 5, the present invention further provides a method for preparing the double-layer transparent electromagnetic shielding film, including the following steps:
step one, coating a UV adhesive layer on the upper surface of the transparent substrate 1, impressing the first latticed groove 21 and the positioning target by using a mold with the positioning target, and curing.
And step two, scraping and coating conductive silver paste in the first latticed groove 21, and sintering to form the first shielding layer 2.
And step three, coating a UV adhesive layer on the surface of the first shielding layer 2, aligning the UV adhesive layer with the positioning target on the surface of the first shielding layer 2 by using a mold with the positioning target, impressing the second latticed groove 31, and curing.
And fourthly, coating iron powder slurry in the second latticed groove 31 in a scraping mode, and sintering to form the second shielding layer 3.
It should be noted that, between step two and step three, the following steps may be added:
an adhesion promoting layer is coated on the surface of the first shielding layer 2, or the surface of the first shielding layer 2 is subjected to ionization treatment.
The above is only the preferred embodiment of the present invention, and not the scope of the present invention, all the equivalent structures or equivalent flow changes made by the contents of the specification and the drawings or the direct or indirect application in other related technical fields are included in the patent protection scope of the present invention.

Claims (6)

1. A double-layered transparent electromagnetic shielding film, comprising:
a transparent substrate;
the first shielding layer is stacked on the transparent substrate or embedded on the upper surface of the transparent substrate and comprises a first latticed groove and a first shielding structure formed by electric shielding materials or magnetic shielding materials filled in the first latticed groove;
the second shielding layer is stacked on the first shielding layer and comprises a second latticed groove and a second shielding structure formed by magnetic shielding materials or electric shielding materials filled in the second latticed groove;
wherein the first shielding layer and the second shielding layer have different shielding functions.
2. The double-layered transparent electromagnetic shielding film of claim 1, wherein: the first latticed groove and the second latticed groove are regular polygonal latticed grooves, and grid lines of the first latticed groove and the second latticed groove are aligned up and down.
3. The double-layered transparent electromagnetic shielding film of claim 1, wherein: the grid grooves of the first grid-shaped groove and the second grid-shaped groove are irregular random grid grooves.
4. The double-layered transparent electromagnetic shielding film of claim 1, wherein: the electric shielding conductive material is silver, copper or graphene; the magnetic shielding conductive material is iron or nickel.
5. The double-layered transparent electromagnetic shielding film of claim 1, wherein: an adhesion promoting layer is arranged between the first shielding layer and the second shielding layer or adhesion promoting treatment is carried out.
6. The double-layered transparent electromagnetic shielding film of claim 1, wherein: the groove width of first latticed recess and/or the latticed recess of second is 1 ~ 20um, and the degree of depth is 3 ~ 10um, the thickness of first shielding layer and/or second shielding layer is 3 ~ 20 um.
CN201920868928.XU 2019-06-11 2019-06-11 Double-layer transparent electromagnetic shielding film Active CN210432328U (en)

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Application Number Priority Date Filing Date Title
CN201920868928.XU CN210432328U (en) 2019-06-11 2019-06-11 Double-layer transparent electromagnetic shielding film

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020253290A1 (en) * 2019-06-18 2020-12-24 昇印光电(昆山)股份有限公司 Electromagnetic shielding film
CN113825376A (en) * 2021-08-13 2021-12-21 深圳市志凌伟业光电有限公司 Method for producing electromagnetic shielding member and electromagnetic shielding member
CN113992301A (en) * 2021-10-29 2022-01-28 中国人民解放军国防科技大学 Portable electromagnetic signal shielding and acoustic signal interference device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020253290A1 (en) * 2019-06-18 2020-12-24 昇印光电(昆山)股份有限公司 Electromagnetic shielding film
US11716837B2 (en) 2019-06-18 2023-08-01 Shine Optoelectronics (Kunshan) Co., Ltd. Electromagnetic shielding film
CN113825376A (en) * 2021-08-13 2021-12-21 深圳市志凌伟业光电有限公司 Method for producing electromagnetic shielding member and electromagnetic shielding member
CN113825376B (en) * 2021-08-13 2024-04-05 深圳市志凌伟业光电有限公司 Method for producing electromagnetic shielding member and electromagnetic shielding member
CN113992301A (en) * 2021-10-29 2022-01-28 中国人民解放军国防科技大学 Portable electromagnetic signal shielding and acoustic signal interference device

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Address after: No. 478 Zhongnan Street, Industrial Park, Suzhou City, Jiangsu Province, 215000

Patentee after: Suzhou Weiyeda Technology Co.,Ltd.

Patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd.

Address before: No.68 Xinchang Road, Suzhou Industrial Park, Jiangsu Province

Patentee before: IVTOUCH Co.,Ltd.

Patentee before: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd.