CN203579010U - Optical isolation system and optical isolator - Google Patents
Optical isolation system and optical isolator Download PDFInfo
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- CN203579010U CN203579010U CN201320727696.9U CN201320727696U CN203579010U CN 203579010 U CN203579010 U CN 203579010U CN 201320727696 U CN201320727696 U CN 201320727696U CN 203579010 U CN203579010 U CN 203579010U
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Abstract
An optical isolation system is used for isolating reflected lasers of a laser device and comprises a polarizing beam splitter used for transmitting P polarized light, a first half wave plate, a 90-degree phase delay mirror and a beam absorber. The first half wave plate can be perpendicular to the light path of the P polarized light, so that the polarization direction of the P polarized light rotates by 45 degrees. The 90-degree phase delay mirror is used for receiving the P polarized light from the first half wave plate and forming the P polarized light from the first half wave plate to circular polarized light. The circular polarized light can be incident to the 90-degree phase delay mirror at the incidence angle of 45 degrees, the 90-degree phase delay mirror can convert the circular polarized light to linear polarized light, and the first half wave plate can convert the linear polarized light to S polarized light. The polarizing beam splitter is used for reflecting at the angle of 45 degrees. The S polarized light can be incident into the beam absorber, and the S polarized light is absorbed by the beam absorber. The fact that reflected light enters a laser resonator to burn the laser resonator is avoided, so that the laser device is protected. The utility model further provides an optical isolator.
Description
Technical field
The utility model relates to a kind of optical element, particularly relates to a kind of optics shielding system and optical isolator.
Background technology
Aspect industrial production, laser processing mode is a kind of mode of utilizing laser beam and matter interaction characteristic to process material.Laser processing mode mainly contains the multiple technique for applying such as laser cutting, laser weld, laser boring, laser instrument mark, Laser Surface Treatment, part rapid shaping, and has been widely used in the industrial circles such as automobile, electronics, Aero-Space, metallurgy, machine-building.To realizing the production automation, improve the quality of products and labor productivity, minimizing material consumption, reduce environmental pollution etc. and play more and more important effect.
Adopting laser instrument to add man-hour, when the laser beam irradiation of high energy is to those during to the lower material of laser wavelength absorptivity or the higher material of surface smoothness, workpiece can reflect a large amount of laser energies, part reverberation can turn back to laser instrument vibration chamber along original optical path, because the energy density of laser beam is very high, can produce a large amount of heats, cause laser output power to decline, thereby cause decline the service life of laser instrument, when serious, can burn laser instrument.
Utility model content
Based on this, be necessary to provide one can protect laser instrument, extend the optics shielding system in service life of laser instrument.
A kind of optics shielding system, for the reflection laser of isolation laser device, comprising:
Polarization spectroscope, for receiving the polarization direction P polarised light vertical with the plane of incidence, described polarization spectroscope can make described P polarized light transmission;
The first half-wave plate, is located at a side of described polarization spectroscope, and described the first half-wave plate can be vertical with the light path of described P polarised light, makes polarization direction rotation 45 degree of described P polarised light;
90 degree phase delay mirrors, be located at the side of described the first half-wave plate away from described polarization spectroscope, described 90 degree phase delay mirrors and described the first half-wave plate are 45 degree angles, described 90 degree phase delay mirrors are for receiving the P polarised light from described the first half-wave plate with 45 degree incidence angles, and the described P polarised light from the first half-wave plate is formed to circularly polarized light, described circularly polarized light is for processing workpiece, described workpiece can reflect described circularly polarized light, described circularly polarized light can 45 90 degree phase delay mirrors described in the incidents of degree incidence angle, described 90 degree phase delay mirrors can be converted to linearly polarized light by described circularly polarized light, described linearly polarized light reflexes on described the first half-wave plate through described 90 degree phase delay mirrors, described the first half-wave plate can convert described linearly polarized light to S polarised light, described polarization spectroscope can receive described S polarised light, and reflect with 45 degree,
Beam absorption device, is located at a side of described polarization spectroscope, and described S polarised light can incide in described beam absorption device, and described beam absorption device is used for receiving described S polarised light.
In an embodiment, described beam absorption device comprises therein:
Absorbing shell, is circular cylindrical cavity; And
Cone, is contained in the bottom of described absorption shell, the equal diameters of the diameter of described cone and described absorption shell, and described S polarised light can enter in described absorption shell, reflects, and be absorbed between the inwall of described absorption shell and the lateral wall of cone.
Therein in an embodiment, also comprise polarization module, described polarization module is positioned at the side of described polarization spectroscope away from described the first half-wave plate, described polarization module can be located at the light-emitting window place of described laser instrument, described polarization module is for receiving the incident laser that described laser instrument sends, and described incident laser is converted to described P polarised light, described polarization module comprises:
Birefringece crystal, can be oppositely arranged with the light-emitting window of described laser instrument, and described incident laser can be injected from a side of described birefringece crystal, through described birefringece crystal, is decomposed into a P polarised light and S polarised light;
The second half-wave plate, be located at a side of described birefringece crystal, and described the second half-wave plate is coaxial with described incident laser, the angle between the main cross section of described the second half-wave plate and the vibration plane of described S polarised light is 45 degree, and described the second half-wave plate makes described S polarised light be converted to the 2nd P polarised light;
Close bundle shaping lens group, be located at the side of described the second half-wave plate away from described birefringece crystal, a described P polarised light and described the 2nd P polarised light from described close bundle shaping lens group a side inject, described in close bundle shaping lens group make a described P polarised light and described the 2nd P polarised light be shaped to a branch of described P polarised light;
Wherein, described birefringece crystal, described in close bundle shaping lens group optical axis be located along the same line.
Therein in an embodiment, the described bundle shaping lens group of closing comprises planoconvex spotlight and plano-concave lens, the focus of described planoconvex spotlight overlaps with the focus of described plano-concave lens, and the focus that described planoconvex spotlight overlaps with plano-concave lens is between described planoconvex spotlight and described plano-concave lens.
In an embodiment, the focal length of described planoconvex spotlight is 100mm therein, and thickness is 3mm, and the focal length of described plano-concave lens is 20mm, and thickness is 3mm, and the distance between described planoconvex spotlight and described plano-concave lens is 117mm.
Therein in an embodiment, also comprise preposition half-wave plate, described preposition half-wave plate is positioned at the side of described polarization spectroscope away from described the first half-wave plate, described preposition half-wave plate can be positioned at the light-emitting window place of described laser instrument, described preposition half-wave plate is used for receiving the incident ray polarized light that described laser instrument sends, and described incident ray polarized light can be rotated into described P polarised light.
Therein in an embodiment, also comprise that zero phase postpones mirror, described zero phase postpones mirror and described 90 degree phase delay mirror opposing parallel arrange, described zero phase postpones mirror and described circularly polarized light can be reflected with 45 degree angles of reflection, and the direction of propagation of the circularly polarized light reflecting through described zero phase delay mirror is parallel with the direction of propagation of described P polarised light.
A kind of optical isolator is also provided.
A kind of optical isolator, comprising:
Above-mentioned optics shielding system;
Polarization spectro microscope base, for hollow cylinder, described polarization spectroscope and described the first half-wave plate are contained in described polarization spectro microscope base, on the lateral wall of described polarization spectro microscope base, offer through hole, described through hole is relative with described polarization spectroscope, and the photoetching of described S polarization is from described through hole outgoing, and the lateral wall of described polarization spectro microscope base is provided with the first water inlet pipe and the first outlet pipe, described the first water inlet pipe and described the first outlet pipe, for recirculated cooling water, make described polarization spectro microscope base cooling;
90 degree phase delay microscope bases, for entity, described 90 degree phase delay microscope bases have incident optical cavity near a side milling of described polarization spectro microscope base, the opposite side of described 90 degree phase delay microscope bases is milled with reflection optical cavity, described incident optical cavity and described reflection optical cavity vertical connection, described 90 degree phase delay mirrors are located at the intersection point place of described incident optical cavity and described reflection optical cavity, described 90 degree phase delay microscope bases are provided with the second water inlet pipe and the second outlet pipe, described the second water inlet pipe and described the second outlet pipe, for recirculated cooling water, make described 90 degree phase delay microscope bases cooling;
Beam absorption device mount pad, be used for placing described beam absorption device, and described beam absorption device mount pad is fixedly connected with described beam absorption device, described beam absorption device mount pad is located at described through hole, described beam absorption device mount pad is provided with the 3rd water inlet pipe and the 3rd outlet pipe, described the 3rd water inlet pipe and described the 3rd outlet pipe, for recirculated cooling water, make described beam absorption device mount pad cooling.
In an embodiment, also comprise half-wave plate pressure ring therein, described half-wave plate pressure ring between described polarization spectro microscope base and described 90 degree phase delay microscope bases, the first half-wave plate described in the pressure holding of described half-wave plate pressure ring.
Therein in an embodiment, also comprise polarization spectroscope gland, described polarization spectroscope gland comprises lid and is located at the boss on described lid, on described lid and described boss, all offer light hole, the cross section of described boss is identical with the rank street face of described polarization spectroscope, described boss can be contained in described polarization spectro microscope base, polarization spectroscope described in described boss pressure holding, and described gland is fixedly connected with a side of described polarization spectro microscope base.
Therein in an embodiment, described 90 degree phase delay microscope bases have described incident light chamber and reflection optical cavity near a side milling of described polarization spectro microscope base, described incident optical cavity is vertical with described reflection optical cavity, and described 90 degree phase delay mirrors are located at the intersection point place of described incident optical cavity and described reflection optical cavity.
Therein in an embodiment, described 90 degree phase delay microscope bases are milled with outgoing optical cavity, described outgoing optical cavity and described reflection optical cavity vertical conducting, described outgoing optical cavity is parallel with described incident optical cavity, described incident optical cavity, reflection optical cavity, a Z-shaped conducting optical cavity of the common formation of outgoing optical cavity, described zero phase delay mirror is located at the intersection point place of described reflection optical cavity and described outgoing optical cavity.
In an embodiment, also comprise compressing tablet therein, described compressing tablet is L shaped, described in described compressing tablet pressure holding on 90 degree phase delay mirrors, and spacing described 90 degree phase delay mirrors.
In above-mentioned optical isolator, laser is converted to circularly polarized light through optics shielding system, utilizes circularly polarized light to process workpiece.And the circularly polarized light of reflection is converted to S polarised light through optics shielding system, S polarised light can be absorbed by beam absorption device through multiple reflections.S polarised light is absorbed, and has avoided reverberation to enter laserresonator and has been burnt, thereby protected laser instrument, extends its service life.
Accompanying drawing explanation
Fig. 1 is the explosive view of the optical isolator of an embodiment;
Fig. 2 is the index path of the optics shielding system of an embodiment;
Fig. 3 is that the phase difference of S polarised light and P polarised light is the polarization state of 0 o'clock;
Polarization state when Fig. 4 is the phase difference of S polarised light and the P polarised light odd-multiple that is pi/2;
Fig. 5 is the polarization state of the phase difference of S polarised light and P polarised light while being π;
Fig. 6 is the cutaway view of the optical isolator shown in Fig. 1;
Fig. 7 is the index path of the beam absorption device shown in Fig. 1;
Fig. 8 is the explosive view of the optical isolator of another embodiment;
Fig. 9 is the cutaway view of the optical isolator shown in Fig. 8.
The specific embodiment
For the ease of understanding the utility model, below with reference to relevant drawings, the utility model is described more fully.In accompanying drawing, provided preferred embodiments of the present utility model.But the utility model can be realized in many different forms, be not limited to embodiment described herein.On the contrary, providing the object of these embodiments is make the disclosure of the present utility model understand more comprehensively thorough.
It should be noted that, when element is called as " being fixed on " another element, it can be directly on another element or also can have an element placed in the middle.When an element is considered to " connection " another element, it can be directly connected to another element or may have centering elements simultaneously.Term as used herein " vertical ", " level ", " left side ", " right side " and similar statement just for illustrative purposes, do not represent it is unique embodiment.
Unless otherwise defined, all technology of using are herein identical with the implication that belongs to the common understanding of those skilled in the art of the present utility model with scientific terminology.The term using in description of the present utility model herein, just in order to describe the object of concrete embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
Refer to Fig. 1 and Fig. 2, a kind of optical isolator 100 of present embodiment is for the reflection laser of isolation laser device.Optical isolator 100 comprises optics shielding system 200, polarization module mount pad 110, polarization spectro microscope base 120,90 degree phase delay microscope bases 130, beam absorption device mount pad 140, half-wave plate pressure ring 150 and polarization spectroscope gland 160.
Specifically in the present embodiment, optics shielding system 200 comprises polarization module 210, polarization spectroscope 220, the first half-wave plate 230,90 degree phase delay mirror 240 and beam absorption devices 250.Concrete in the present embodiment, optics shielding system 200 can be isolated laser instrument.The laser 10 that laser instrument sends, with polarization mode output, can be linear polarization, circular polarization, elliptical polarization output.And the wave band of laser 10 can be all laser wavelengths, as ultraviolet, green glow, near-infrared, in the laser such as infrared.
Birefringece crystal 211 can be oppositely arranged with the light-emitting window of laser instrument.Incident laser 10 can be injected from a side of birefringece crystal 211, through birefringece crystal 211, is decomposed into a P polarised light 11 and S polarised light.S polarised light refers to the polarised light that polarization direction is vertical with the plane of incidence.The one P polarised light 11 refers to the polarised light that polarization direction is parallel with the plane of incidence.Laser 10 is injected from the below of the optical axis of birefringece crystal 211.The one P polarised light 11 reflects through birefringece crystal 211, and a P polarised light 11 is positioned at the optical axis top of birefringece crystal 211 and propagates.S polarised light is still along the original direction of propagation, and S polarised light is propagated below birefringece crystal 211 optical axises.
The second half-wave plate 212 is located at a side of birefringece crystal 211, and the second half-wave plate 212 is coaxial with incident laser 10.Angle between the vibration plane of the main cross section of the second half-wave plate 212 and S polarised light is 45 degree.The second half-wave plate 212 makes S polarised light be converted to the 2nd P polarised light 12.The second half-wave plate 212 is located at a side of birefringece crystal 211 light-emitting windows, and is located on the direction of propagation of S polarised light.Angle between the vibration plane of the main cross section of the second half-wave plate 212 and S polarised light is 45 degree.S polarised light is through the second half-wave plate 212, and through the second half-wave plate 212 90-degree rotations, S polarised light becomes the 2nd P polarised light 12.Particularly, the second half-wave plate 212 is oppositely arranged with laser 10.That is, only has the S polarizing light irradiation of the original direction of propagation, edge on the second half-wave plate 212.The 2nd P polarised light 12 refers to the polarised light that polarization direction is parallel with the plane of incidence.
Close bundle shaping lens group 213 and be located at the side of the second half-wave plate 212 away from birefringece crystal 211, a P polarised light and the 2nd P polarised light are injected from a side of closing bundle shaping lens group 213.The optical axis of birefringece crystal 211 is located along the same line with the optical axis that closes bundle shaping lens group 213.Closing bundle shaping lens group 213 makes a P polarised light 11 and the 2nd P polarised light 12 be shaped to a branch of P polarised light 13.The one P polarised light 11 is positioned at the top of optical axis, and the 2nd P polarised light 12 is positioned at the below of optical axis.After the one P polarised light 11 and the 2nd P polarised light 12 ECDC bundle shaping lens group 213 shapings, P polarised light 13 is propagated along the optical axis that closes bundle shaping lens group 213.
Specifically in the present embodiment, close bundle shaping lens group 213 and comprise planoconvex spotlight 214 and plano-concave lens 215.The focus of planoconvex spotlight 214 overlaps with the focus of plano-concave lens 215, and the focus of the focus of planoconvex spotlight 214 and plano-concave lens 215 is between planoconvex spotlight 214 and plano-concave lens 215.Planoconvex spotlight 214 is assembled a P polarised light 11 and the 2nd P polarised light 12, and converges to focus place.The one P polarised light 11 and the 2nd P polarised light 12, through the disperse function of plano-concave lens 215, form P polarised light 13.The focal length of planoconvex spotlight 214 is 100mm, and thickness is 3mm.The focal length of plano-concave lens 215 is 20mm, and thickness is 3mm.Distance between planoconvex spotlight 214 and plano-concave lens 215 is 117mm.
The first half-wave plate 230 is provided with the side of polarization spectroscope 220 away from polarization module 210.The first half-wave plate 230 can be vertical with the light path of P polarised light 13, makes polarization direction rotation 45 degree of P polarised light 13.The first half-wave plate 230 is rotated the polarization direction of P polarised light 13, and the main cross section of the first half-wave plate 230 rotates 22.5 degree relative to the direction of vibration of the P of incident polarised light 13.The polarization direction of the P polarised light 14 of transmission has rotated 45 degree.
90 degree phase delay mirrors 240 and the first half-wave plate 230 are 45 degree angles.90 spend phase delay mirrors 240 for receiving the P polarised light 14 from the first half-wave plate 230 with 45 degree incidence angles, and will form circularly polarized light 15 from the P polarised light 14 of the first half-wave plate 230.Workpiece 20 can be positioned at a side of optics shielding system 200, utilizes circularly polarized light 15 to process it.
Specifically in the present embodiment, also comprise that zero phase postpones mirror 260.Zero phase postpones mirror 260 and 90 degree phase delay mirror 240 opposing parallel settings.Zero phase postpones mirror 260 and circularly polarized light 15 can be reflected with 45 degree angles of reflection.The direction of propagation of the circularly polarized light 15 reflecting through zero phase delay mirror 260 is parallel with the direction of propagation of P polarised light 14.The exit portal that workpiece 20 is located at circularly polarized light 15 goes out, and circularly polarized light 15 is for processing workpiece 20.By zero phase, postpone mirror 260 and can make workpiece 20 be positioned at the opposite of laser instrument, in one end of optical isolator 100, process, be conducive to installing and using of optical isolator 100, can be applied to preferably in actual processing.
The s polarised light that circularly polarized light 15 contains equivalent and p polarised light, and s polarised light and p polarised light are orthogonal on direction of vibration, therefore circularly polarized light 15 can not change with the variation of cutting track the joint-cutting of laser cutting, compare the effect of linearly polarized light cutting, after circularly polarized light 15 focuses on, can effectively improve the quality of workpiece laser joint-cutting.
Circularly polarized light 15, through workpiece 20 surface reflections, remains circularly polarized light 15 after reflection.Because of the direction of propagation of 260 change light of zero phase delay mirror, do not change polarisation of light direction.After circularly polarized light 15 postpones the reflection of mirror 260 through zero phase, folded light beam remains circularly polarized light 15.Circularly polarized light 15 incides on 90 degree phase delay mirrors 240 with 45 degree incidence angles, and 90 degree phase delay mirrors 240 reflect circularly polarized light 15 with 45 degree angles of reflection.
After 90 degree phase delay mirrors 240, ordinary light and again produce very much the phase difference of 90 ° between light component.So twice of linearly polarized light after 90 degree phase delay mirrors 240, the phase difference that ordinary light and very light component common property are raw 180 °.The polarization state poor according to the out of phase shown in Fig. 3-5 is linearly polarized light when odd-multiple that the phase difference between S polarised light and P polarised light is π.When S polarised light and P polarised light phase difference are 0 or are linearly polarized light during the even-multiple of π, and these two kinds of linearly polarized lights are orthogonal.When odd-multiple that S polarised light and P polarised light equivalent and phase difference are pi/2, it is circularly polarized light.
Therefore, circularly polarized light 15, through after 90 degree phase delay mirror 240 reflections, becomes linearly polarized light 16.P polarised light 13 is orthogonal with linearly polarized light 16 on direction of vibration.Because the main cross section of the first half-wave plate 230 rotates 22.5 ° relative to the direction of vibration of the P of incident polarised light 13, so the polarization direction of linearly polarized light 16 has rotated 45° angle relative to the direction of vibration of P polarised light.So the main cross section angle of linearly polarized light 16 and the first half-wave plate 230 is 135 °.2*135 ° of formation linearly polarized light 17 of its polarization direction rotation when linearly polarized light 16 passes through the first half-wave plate 230, linearly polarized light 17 has rotated 270 ° relative to P polarised light, and linearly polarized light 17 is S polarised light 18.During S polarised light 18 process polarization spectroscope 220, directly by 90 degree reflections, penetrated.
Refer to Fig. 7, beam absorption device 250 comprises absorption shell 251 and cone 253.
Specifically in the present embodiment, the straight line at S polarised light 18 places is without the cone point of cone 253.S polarised light is engraved on the conical surface of cone 253 and is comparatively easy to multiple reflections occurs, to guarantee the assimilation effect of beam absorption device 250.
In above-mentioned optics shielding system 200, the output mode of laser instrument can be linear polarization, circular polarization, elliptical polarization etc.And; for different laser wavelengths; as ultraviolet, green glow, near-infrared, in the laser instrument such as infrared; can be by the film that sees through of relative set relative wavelength on each optical element; make optics shielding system 200 provide insulation blocking effect to various lasers, above-mentioned optics shielding system 200 has higher versatility.
Polarization module mount pad 110 is for installing polarization module 210.Polarization module mount pad 110 offers host cavity, and polarization module 210 is contained in polarization module mount pad 110.Specifically in the present embodiment, polarization module mount pad 110 comprises birefringece crystal installation portion 111, the second half-wave plate pressure ring 112, closes bundle shaping lens group installation portion 113.
Birefringece crystal installation portion 111 comprises birefringece crystal gland 111a, birefringece crystal chamber 111b.Birefringece crystal 211 is contained in the 111b of birefringece crystal chamber.Birefringece crystal gland 111a is from one end pressure holding birefringece crystal 211 of birefringece crystal chamber 111b, so that birefringece crystal 211 is limited in the 111b of birefringece crystal chamber.
The second half-wave plate 212 is located on birefringence camera lens installation portion 111 one end away from birefringece crystal gland 111a.And the second half-wave plate pressure ring 112 is located at birefringece crystal chamber 111b one end away from birefringece crystal gland 111a, second half-wave plate pressure ring 112 pressure holding the second half-wave plates 212, so that the second half-wave plate 212 is fixing.
Close bundle shaping lens group installation portion 113 and comprise planoconvex spotlight pressure ring 113a, planoconvex spotlight chamber 113b, plano-concave lens pressure ring 113c and warter connection 113d.Planoconvex spotlight 214 and plano-concave lens 215 are contained in the 113b of planoconvex spotlight chamber.Planoconvex spotlight pressure ring 113a pressure holding planoconvex spotlight 214.Plano-concave lens pressure ring 113c pressure holding plano-concave lens 215.Planoconvex spotlight pressure ring 113a and plano-concave lens pressure ring 113c make respectively planoconvex spotlight 214 and plano-concave lens 215 fixedly be limited in the 113b of planoconvex spotlight chamber.Warter connection 113d can pass into recirculated cooling water, so that close bundle shaping lens group installation portion 113, can cool, to prevent can producing a large amount of heats after planoconvex spotlight 214 and plano-concave lens 215 absorbing laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator 100.
Polarization spectro microscope base 120 is hollow cylinder.Polarization spectroscope 220 and the first half-wave plate 230 are contained in polarization spectro microscope base 120.On the lateral wall of polarization spectro microscope base 120, offer through hole.Through hole is relative with beam absorption device 250, and S polarised light 18 can be from through hole outgoing.The lateral wall of polarization spectro microscope base 120 is provided with the first water inlet pipe 121 and the first outlet pipe (figure is mark not), and the first water inlet pipe 121 and the first outlet pipe, for recirculated cooling water, make polarization spectro microscope base 120 cooling.Prevent from can producing a large amount of heats after polarization spectroscope 220 absorbing laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator.
90 degree phase delay microscope bases 130 are entity.90 degree phase delay microscope bases 130 have incident optical cavity 131 near a side milling of polarization spectro microscope base 120.The opposite side of 90 degree phase delay microscope bases 130 is milled with reflection optical cavity 132, incident optical cavity 131 and reflection optical cavity 132 vertical conductings.90 degree phase delay mirrors 240 are located at incident optical cavity 131 and the intersection point place of reflecting optical cavity 132.Specifically in the present embodiment, 90 degree phase delay microscope bases 130 are also milled with outgoing optical cavity 133.Outgoing optical cavity 133 and reflection optical cavity 132 vertical conductings.Outgoing optical cavity 133 is parallel with incident optical cavity 131.Incident optical cavity 131, reflection optical cavity 132, a Z-shaped conducting optical cavity of outgoing optical cavity 133 common formations.Zero phase postpones mirror 260 and is located at the intersection point place of reflecting optical cavity 132 and outgoing optical cavity 133.Circularly polarized light 15 postpones mirror 260 through zero phase and reflects, the side outgoing through outgoing optical cavity 133 from 90 degree phase delay microscope bases 130.
Be appreciated that outgoing optical cavity 133 can omit, circularly polarized light 15 postpones mirror 260 through zero phase and reflects, can be directly from reflecting one end outgoing away from incident optical cavity 131 of optical cavity 132.
90 degree phase delay microscope bases 130 are provided with the second water inlet pipe 134 and the second outlet pipe 135.The second water inlet pipe 134 and the second outlet pipe 135, for recirculated cooling water, make 90 degree phase delay microscope bases 130 cooling.Prevent from can producing a large amount of heats after 90 degree phase delay mirror 240 absorbing laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator 100.
Compressing tablet 139 is two.Compressing tablet is L shaped, and pressure holding is on 90 degree phase delay mirrors 240 and zero phase delay mirror 260 respectively for two compressing tablets 139, and spacing 90 degree phase delay mirrors 240 and zero phase postpone mirror 260.Beam absorption device mount pad 140 is for placing beam absorption device 250.Beam absorption device mount pad 140 is fixedly connected with beam absorption device 250, and beam absorption device mount pad 140 is located at through hole.S polarised light 18 can, from through hole outgoing, incide in beam absorption device 250.Beam absorption device mount pad 140 is provided with the 3rd water inlet pipe 141 and the 3rd outlet pipe 142, the three water inlet pipes 141 and the 3rd outlet pipe 142 for recirculated cooling water, makes beam absorption device mount pad 140 cooling.Because beam absorption device 250 contacts with beam absorption device mount pad 140, when beam absorption device mount pad 140 is cooled water-cooled time, beam absorption device 250 also can be lowered the temperature simultaneously, to prevent that beam absorption device 250 from can produce a large amount of heats after receiving laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator 100.
Half-wave plate pressure ring 150 is spent between phase delay microscope bases 130 at polarization spectro microscope base and 90, half-wave plate pressure ring 150 pressure holding the first half-wave plates 230.Half-wave plate pressure ring 150 can be fixed on the first half-wave plate 230 between polarization spectro microscope base and 90 degree phase delay microscope bases 130, keeps the stability of the first half-wave plate 230.
The light beam of being exported by optical isolator 100 is circularly polarized light 15, the S polarised light and the P polarised light that contain equivalent due to circularly polarized light 15, and S polarised light and P polarised light are orthogonal on direction of vibration, therefore circularly polarized light 15 can not change with the variation of cutting track the joint-cutting of laser cutting, compare the effect of linearly polarized light cutting, after circularly polarized light 15 focuses on, can effectively improve the quality of workpiece laser joint-cutting.
Refer to Fig. 8 and Fig. 9, in other embodiments, when laser instrument send for the linearly polarized light time.Polarization module 210 can be substituted by preposition half-wave plate 300.
Particularly, preposition half-wave plate 300 is positioned at the side of polarization spectroscope away from the first half-wave plate 230.Preposition half-wave plate 300 can be positioned at the light-emitting window place of laser instrument.The incident ray polarized light that preposition half-wave plate 300 sends for receiving laser instrument, and incident ray polarized light can be rotated into P polarised light.
300 of the preposition half-wave plates polarization direction to linearly polarized light is rotated, and as the main cross section of preposition half-wave plate 300 rotates θ angle relative to the polarization direction of incident light, the linear polarization by this preposition half-wave plate 300 is from original direction rotation 2 θ angles.Therefore, the polarization direction of the linearly polarized light sending according to laser instrument and the angle of the plane of incidence, set the main cross section of preposition half-wave plate 300 and the angle of the plane of incidence.Be appreciated that when laser instrument send for the S polarised light time, the main cross section of preposition half-wave plate 300 and the angle of the plane of incidence are 45 degree.Therefore, preposition half-wave plate 300 can make S polarised light be converted to P polarised light.
The P polarised light being converted to, is converted to circularly polarized light 15 through polarization spectroscope, the first half-wave plate 230,90 degree phase delay mirrors 240 equally, utilizes circularly polarized light 15 to process workpiece.The circularly polarized light 15 of workpiece reflection is converted to S polarised light through 90 degree phase delay mirrors 240, the first half-wave plate 230 and polarization spectroscope; and finally by beam absorption device 250, sponged; avoid reverberation to enter laserresonator and burnt, thereby protected laser instrument, extended its service life.
For output polarization pattern, it is only the laser instrument of linear polarization; its outer light path adopts a preposition half-wave plate 300 to substitute the optical isolator 100 that polarization module 210 forms reduced form; reduce the use cost of optical isolator 100, can effectively isolate again reverberation and then protection laser instrument simultaneously.
In other embodiments, when laser instrument send for the linearly polarized light time.Polarization module mount pad 110 can be replaced by preposition half-wave plate mount pad 400.Preposition half-wave plate mount pad 400 is for installing preposition half-wave plate 300.In like manner, preposition half-wave plate mount pad 400 is provided with water receiving pipe 410.Water receiving pipe 410 is for accessing recirculated cooling water.Preposition half-wave plate mount pad 400, by water quench, prevents from can producing a large amount of heats after preposition half-wave plate 300 absorbing laser energy, and appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator 100.
Utilize above-mentioned optical isolator 100 to process workpiece 20, the laser of exporting from optical isolator 100 is circularly polarized light 15 and restraints, the s polarised light and the p polarised light that contain equivalent due to circularly polarized light 15, and s polarised light and p polarised light are orthogonal on direction of vibration, therefore circularly polarized light 15 can not change with the variation of cutting track the joint-cutting of laser cutting, compare the effect of linearly polarized light cutting, after circularly polarized light 15 focuses on, can effectively improve the quality of workpiece laser joint-cutting.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (10)
1. an optics shielding system, for the reflection laser of isolation laser device, is characterized in that, comprising:
Polarization spectroscope, for receiving the polarization direction P polarised light vertical with the plane of incidence, described polarization spectroscope can make described P polarized light transmission;
The first half-wave plate, is located at a side of described polarization spectroscope, and described the first half-wave plate can be vertical with the light path of described P polarised light, makes polarization direction rotation 45 degree of described P polarised light;
90 degree phase delay mirrors, be located at the side of described the first half-wave plate away from described polarization spectroscope, described 90 degree phase delay mirrors and described the first half-wave plate are 45 degree angles, described 90 degree phase delay mirrors are for receiving the P polarised light from described the first half-wave plate with 45 degree incidence angles, and the described P polarised light from the first half-wave plate is formed to circularly polarized light, described circularly polarized light is for processing workpiece, described workpiece can reflect described circularly polarized light, described circularly polarized light can 45 90 degree phase delay mirrors described in the incidents of degree incidence angle, described 90 degree phase delay mirrors can be converted to linearly polarized light by described circularly polarized light, described linearly polarized light reflexes on described the first half-wave plate through described 90 degree phase delay mirrors, described the first half-wave plate can convert described linearly polarized light to S polarised light, described polarization spectroscope can receive described S polarised light, and reflect with 45 degree,
Beam absorption device, is located at a side of described polarization spectroscope, and described S polarised light can incide in described beam absorption device, and described beam absorption device is used for receiving described S polarised light.
2. optics shielding system according to claim 1, is characterized in that, described beam absorption device comprises:
Absorbing shell, is circular cylindrical cavity; And
Cone, is contained in the bottom of described absorption shell, the equal diameters of the diameter of described cone and described absorption shell, and described S polarised light can enter in described absorption shell, reflects, and be absorbed between the inwall of described absorption shell and the lateral wall of cone.
3. optics shielding system according to claim 1, it is characterized in that, also comprise polarization module, described polarization module is positioned at the side of described polarization spectroscope away from described the first half-wave plate, described polarization module can be located at the light-emitting window place of described laser instrument, described polarization module is used for receiving the incident laser that described laser instrument sends, and described incident laser is converted to described P polarised light, and described polarization module comprises:
Birefringece crystal, can be oppositely arranged with the light-emitting window of described laser instrument, and described incident laser can be injected from a side of described birefringece crystal, through described birefringece crystal, is decomposed into a P polarised light and S polarised light;
The second half-wave plate, be located at a side of described birefringece crystal, and described the second half-wave plate is coaxial with described incident laser, the angle between the main cross section of described the second half-wave plate and the vibration plane of described S polarised light is 45 degree, and described the second half-wave plate makes described S polarised light be converted to the 2nd P polarised light;
Close bundle shaping lens group, be located at the side of described the second half-wave plate away from described birefringece crystal, a described P polarised light and described the 2nd P polarised light from described close bundle shaping lens group a side inject, described in close bundle shaping lens group make a described P polarised light and described the 2nd P polarised light be shaped to a branch of described P polarised light;
Wherein, described birefringece crystal, described in close bundle shaping lens group optical axis be located along the same line.
4. optics shielding system according to claim 3, it is characterized in that, the described bundle shaping lens group of closing comprises planoconvex spotlight and plano-concave lens, the focus of described planoconvex spotlight overlaps with the focus of described plano-concave lens, and the focus that described planoconvex spotlight overlaps with plano-concave lens is between described planoconvex spotlight and described plano-concave lens.
5. optics shielding system according to claim 4, is characterized in that, the focal length of described planoconvex spotlight is 100mm, thickness is 3mm, the focal length of described plano-concave lens is 20mm, and thickness is 3mm, and the distance between described planoconvex spotlight and described plano-concave lens is 117mm.
6. optics shielding system according to claim 1, it is characterized in that, also comprise preposition half-wave plate, described preposition half-wave plate is positioned at the side of described polarization spectroscope away from described the first half-wave plate, described preposition half-wave plate can be positioned at the light-emitting window place of described laser instrument, described preposition half-wave plate is used for receiving the incident ray polarized light that described laser instrument sends, and described incident ray polarized light can be rotated into described P polarised light.
7. optics shielding system according to claim 1, it is characterized in that, also comprise that zero phase postpones mirror, described zero phase postpones mirror and described 90 degree phase delay mirror opposing parallel arrange, described zero phase postpones mirror and described circularly polarized light can be reflected with 45 degree angles of reflection, and the direction of propagation of the circularly polarized light reflecting through described zero phase delay mirror is parallel with the direction of propagation of described P polarised light.
8. an optical isolator, is characterized in that, comprising:
Optics shielding system described in claim 1～7 any one;
Polarization spectro microscope base, for hollow cylinder, described polarization spectroscope and described the first half-wave plate are contained in described polarization spectro microscope base, on the lateral wall of described polarization spectro microscope base, offer through hole, described through hole is relative with described polarization spectroscope, and the photoetching of described S polarization is from described through hole outgoing, and the lateral wall of described polarization spectro microscope base is provided with the first water inlet pipe and the first outlet pipe, described the first water inlet pipe and described the first outlet pipe, for recirculated cooling water, make described polarization spectro microscope base cooling;
90 degree phase delay microscope bases, for entity, described 90 degree phase delay microscope bases have incident optical cavity near a side milling of described polarization spectro microscope base, the opposite side of described 90 degree phase delay microscope bases is milled with reflection optical cavity, described incident optical cavity and described reflection optical cavity vertical connection, described 90 degree phase delay mirrors are located at the intersection point place of described incident optical cavity and described reflection optical cavity, described 90 degree phase delay microscope bases are provided with the second water inlet pipe and the second outlet pipe, described the second water inlet pipe and described the second outlet pipe, for recirculated cooling water, make described 90 degree phase delay microscope bases cooling;
Beam absorption device mount pad, be used for placing described beam absorption device, and described beam absorption device mount pad is fixedly connected with described beam absorption device, described beam absorption device mount pad is located at described through hole, described beam absorption device mount pad is provided with the 3rd water inlet pipe and the 3rd outlet pipe, described the 3rd water inlet pipe and described the 3rd outlet pipe, for recirculated cooling water, make described beam absorption device mount pad cooling.
9. optical isolator according to claim 8, is characterized in that, also comprises half-wave plate pressure ring, described half-wave plate pressure ring between described polarization spectro microscope base and described 90 degree phase delay microscope bases, the first half-wave plate described in the pressure holding of described half-wave plate pressure ring.
10. optical isolator according to claim 8, it is characterized in that, also comprise polarization spectroscope gland, described polarization spectroscope gland comprises lid and is located at the boss on described lid, on described lid and described boss, all offer light hole, the cross section of described boss is identical with the rank street face of described polarization spectroscope, and described boss can be contained in described polarization spectro microscope base, polarization spectroscope described in described boss pressure holding, described gland is fixedly connected with a side of described polarization spectro microscope base.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320727696.9U CN203579010U (en) | 2013-11-15 | 2013-11-15 | Optical isolation system and optical isolator |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201320727696.9U CN203579010U (en) | 2013-11-15 | 2013-11-15 | Optical isolation system and optical isolator |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103567631A (en) * | 2013-11-15 | 2014-02-12 | 深圳市大族激光科技股份有限公司 | Optical isolation system and optical isolator |
| CN108345131A (en) * | 2018-03-15 | 2018-07-31 | 中国科学技术大学 | A kind of faraday isolator device |
-
2013
- 2013-11-15 CN CN201320727696.9U patent/CN203579010U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103567631A (en) * | 2013-11-15 | 2014-02-12 | 深圳市大族激光科技股份有限公司 | Optical isolation system and optical isolator |
| CN103567631B (en) * | 2013-11-15 | 2015-09-09 | 大族激光科技产业集团股份有限公司 | Optical isolation systems and optical isolator |
| CN108345131A (en) * | 2018-03-15 | 2018-07-31 | 中国科学技术大学 | A kind of faraday isolator device |
| CN108345131B (en) * | 2018-03-15 | 2023-10-20 | 中国科学技术大学 | Faraday isolator device |
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