CN203471144U - Optical isolator and laser processing system - Google Patents
Optical isolator and laser processing system Download PDFInfo
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- CN203471144U CN203471144U CN201320537824.3U CN201320537824U CN203471144U CN 203471144 U CN203471144 U CN 203471144U CN 201320537824 U CN201320537824 U CN 201320537824U CN 203471144 U CN203471144 U CN 203471144U
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Abstract
The utility model is applicable to the field of laser processing, and provides an optical isolator and a laser processing system. The optical isolator is used for the laser processing system, and comprises a film absorption mirror, a half-wave plate and a 90-degree phase-shift delay mirror which are arranged sequentially along a laser transmission path; the film absorption mirror is used for absorbing P-polarized light and reflecting S-polarized light; the half-wave plate is used for rotating a polarization direction of linearly polarized light; the 90-degree phase-shift delay mirror, with a rotation angle twice of an included angle between the polarization direction of the linearly polarized light and a principal section of the half-wave plate, is used for converting the linearly polarized light transmitted by the half-wave plate into circularly polarized light and converting the circularly polarized light reflected by a processed part into linearly polarized light. By the aid of polarization direction rotation effect of the half-wave plate and phase-shift delay effect of the 90-degree phase-shift delay mirror, the linearly polarized light is converted into the circularly polarized light, so that laser-processed gaps cannot change with cutting tracks, and kerfs are smooth. Meanwhile, the circularly polarized light reflected back by the processed part is converted into the P-polarized light which is totally absorbed by the film absorption mirror, and further a laser is protected.
Description
Technical field
The utility model belongs to technical field of laser processing, particularly a kind of optical isolator and laser-processing system.
Background technology
Since realizing Laser output first the sixties in last century, due to laser, there is the advantages such as high brightness, monochromaticjty, directionality, coherence, be subject to extensive concern, and in various aspects extensive uses such as national defense and military, industrial production, scientific researches.Aspect industrial production, Laser Processing is a kind of mode of utilizing laser beam and matter interaction characteristic to process material.Compare with traditional diamond-making technique, Laser Processing has contactless, stressless deformation, heat-affected zone is little, machinable material is extensive, can realize flexibly various complicated processing, the advantages such as the high and steady quality of efficiency, have therefore formed the multiple technique for applying such as laser cutting, laser weld, laser boring, laser instrument mark, Laser Surface Treatment, part rapid shaping, and have been widely used in the industrial circles such as automobile, electronics, Aero-Space, metallurgy, machine-building.To realizing the production automation, improve the quality of products and labor productivity, minimizing material consumption, reduce environmental pollution etc. and play more and more important effect.
Laser processing technology is that energy is focused on to small space, focus place reaches very high energy density, at this moment the heat of Laser output is much larger than the part that is reflected, conducts by material, material is heated to vapourizing temperature very soon, evaporation forms hole, along with light beam Linear-moving relative to material, make hole form continuously the joint-cutting of narrower in width.In industrial production, laser cutting is most widely used a kind of laser processing.Laser cutting can be processed various metals, nonmetal, composite, hard material etc.The evaluation of Quality of Laser Cutting mainly contains: cut surface roughness, width of slit, three parameters of otch tapering.
Along with technological progress and industrial products upgrading, also more and more higher to the requirement of laser cutting effect.For example, along with the development of electron trade and information industry, electronics and the more and more miniaturization of information equipment product, more and more higher to the required precision of laser cutting.The most typical demand is exactly the requirement to width of slit, a lot of application at present not only wants width of slit very narrow, and need to control within limits, the width of laser lancing is controlled in real time, adjusted to the application requirements even having in cutting process, to meet the process requirements of different parts and the different parts of parts.
The laser of laser instrument output is linearly polarized light normally, CO2 laser instrument (polarization direction of the CO2 laser instrument Output of laser of producing as U.S. Coherent company is parallel with laser base) for example, Metal Cutting and other Laser Processings high-accuracy or ultrahigh precision workpiece are all very sensitive to any variation of width of slit and cross section generation.The quality of laser cutting depends on the polarization direction of the relative cut direction of laser.
As shown in Figure 1, take CO2 laser instrument as example, the polarization direction of CO2 Laser Output Beam is linear polarization, in whole outer light path conductive process, polarization state is not processed, be take that on workpiece, to cut character " CT " be example, when the polarization direction of laser cutting course bearing and laser is parallel, can cut out best joint-cutting, be that otch is narrow and level and smooth, good with machining object surface perpendicularity, as the A part in Fig. 1; When the polarization direction of cutting track direction and laser is vertical, its joint-cutting is wider, and smoothness is still better, as the B part in Fig. 1; When cutting track aspect and laser polarization direction have certain angle, width of slit is larger, and otch is crooked, and unsmooth, as the C part in Fig. 1.
In addition, adopting CO2 laser instrument to add man-hour, when high energy CO2 laser beam irradiation is to those during to the lower material of 10.6 mu m waveband absorptivities or the higher material of surface smoothness, workpiece can reflect a large amount of laser energies, and part reverberation can turn back to CO2 laser oscillation cavity along original optical path, because the energy density of laser beam is very high, can produce a large amount of heats, cause laser output power to decline, thereby cause decline the service life of laser instrument, when serious, also can burn laser instrument.
Utility model content
The purpose of this utility model is to provide a kind of optical isolator, is intended to improve Laser Processing quality, and protects laser instrument to avoid the damage of machined surface folded light beam, extends the service life of laser instrument.
The utility model is to realize like this, a kind of optical isolator, for laser-processing system, comprise and setting gradually along the transmission path of laser: for absorbing P polarised light and reflecting the film absorption speculum of S polarised light, for the half-wave plate that the polarization direction of the linearly polarized light of vertical incidence is rotated, the anglec of rotation is the twice of the angle between the polarization direction of described linearly polarized light and the main cross section of described half-wave plate, and be converted to circularly polarized light for the linearly polarized light that described half-wave plate is seen through, and the circularly polarized light that workpiece is reflected is converted to 90 degree phase-shift delay mirrors of linearly polarized light.
As optimal technical scheme of the present utility model:
Optical isolator also comprises:
The first zero phase-shift speculum, is arranged between described film absorption speculum and half-wave plate;
The second zero phase-shift speculum, is arranged between described half-wave plate and 90 degree phase-shift delay mirrors.
Described film absorption speculum is fixed by the first mirror unit, described half-wave plate is fixed by adpting flange, described 90 degree phase-shift delay mirrors are fixed by the second mirror unit, and described the first zero phase-shift speculum is fixed by the 3rd mirror unit, and described the second zero phase-shift speculum is fixed by the 4th mirror unit.
Described the first mirror unit, adpting flange, the second mirror unit, the 3rd mirror unit and the 4th mirror unit all have water pipe to pass.
The main cross section of described half-wave plate and be 22.5 ° from the angle between the S polarised light of described film absorption speculum.
The angle of described 90 degree phase-shift delay mirrors and its surperficial linearly polarized light of incident is 45 °.
Another object of the present utility model is to provide a kind of laser-processing system, comprises laser output device and is positioned at the optical isolator on described laser output device output light path, and described optical isolator adopts described optical isolator.
Further,
Described laser output device comprises that industrial computer, laser driver, laser oscillator, laser power take into account spectroscope;
Described industrial computer is connected with described laser driver, described laser driver is connected with described laser oscillator again, described spectroscope is positioned on the output light path of described laser oscillator, described optical isolator is positioned on described spectroscopical transmitted light path, described laser power meter is positioned on described spectroscopical reflected light path, and described laser power meter is connected with described laser driver.
It is the CO2 laser oscillator of S polarised light that described laser oscillator adopts Output of laser.
On the output light path of described optical isolator, be provided with successively beam expanding lens group, zero phase-shift completely reflecting mirror, condenser lens and protection eyeglass, the fixture of described beam expanding lens group, zero phase-shift completely reflecting mirror, condenser lens and protection eyeglass all has water pipe to pass.
The utility model carries out the rotation of polarization direction to incident ray polarized light by half-wave plate, phase delay effect in conjunction with 90 degree phase-shift delay mirrors, can make the processing laser of linear polarization be converted to circularly polarized light, the S polarised light that circularly polarized light contains equivalent and P polarised light, and S polarised light and P polarised light are quadratures on direction of vibration, therefore circularly polarized light can not change with the variation of cutting track the gap of laser cutting, compare the effect of linearly polarized light cutting, circularly polarized light can be improved the quality of workpiece laser joint-cutting after focusing on effectively.Meanwhile, half-wave plate makes the circularly polarized light that workpiece is reflected back become P polarised light with 90 coordinating of degree phase-shift delay mirror, is all absorbed, and then isolated reflection laser by film absorption speculum, has protected laser instrument, has extended the service life of laser instrument.
Accompanying drawing explanation
Fig. 1 shows the joint-cutting design sketch of existing laser cutting technique;
Fig. 2 shows the inside index path of the utility model embodiment optical isolator;
Fig. 3 shows the part index path of the utility model embodiment optical isolator;
Fig. 4 shows the laser cutting design sketch that adopts the utility model embodiment optical isolator;
Fig. 5 shows the generation principle of linearly polarized light and circularly polarized light;
Fig. 6 shows the surface structure schematic diagram of the utility model embodiment optical isolator;
Fig. 7 shows the cross-sectional view of the utility model embodiment optical isolator;
Fig. 8 shows the explosive view of the utility model embodiment optical isolator;
Fig. 9 shows structure and the index path of the utility model embodiment laser-processing system.
The specific embodiment
In order to make the purpose of this utility model, technical scheme and advantage clearer, below in conjunction with drawings and Examples, the utility model is further elaborated.Should be appreciated that specific embodiment described herein is only in order to explain the utility model, and be not used in restriction the utility model.
Below in conjunction with specific embodiment, specific implementation of the present utility model is described in detail:
Fig. 2 shows the inside index path of the utility model embodiment optical isolator, and Fig. 3 shows the part index path of the utility model embodiment optical isolator, for convenience of explanation, only shows the part relevant to the present embodiment.
This optical isolator is mainly used in the light of isolation processing object plane reflection in Laser Processing (as laser cutting, laser boring, laser weld etc.), avoid reverberation to enter laser instrument, by the polarization state to incident laser, change, to improve Laser Processing quality simultaneously.As Fig. 2, this optical isolator comprises film absorption speculum 01, half-wave plate 02 and the 90 degree phase-shift delay mirrors 03 that set gradually along the transmission path of laser.Wherein, film absorption speculum 01 can be the plated surface deielectric-coating formation at bronze mirror, and this deielectric-coating only reflects S polarised light, absorb P polarised light, and film absorption speculum 01 does not change catoptrical polarization state.After the incident of S polarised light, its reverberation is still S polarised light.So-called S polarised light refers to the polarised light vertical with the plane of incidence, and P polarised light refers to the polarised light parallel with the plane of incidence.In the present embodiment, take CO2 laser instrument 101 as example, and laser polarization direction is parallel with the base of CO2 laser instrument 101, vertical with the plane of incidence, is S polarised light, and S polarised light L1 is still S polarised light L1 after the reflection of film absorption speculum 01.
The effect of half-wave plate 02 is that polarisation of light direction is rotated, when linearly polarized light vertical incidence half-wave plate, as the main cross section of half-wave plate rotates θ angle relative to the polarization direction of incident light, the polarization direction of the linearly polarized light by this half-wave plate is from original direction rotation 2 θ angles.In the present embodiment, S polarised light L1 vertical incidence half-wave plate 02 from 01 reflection of film absorption speculum, the main cross section of half-wave plate 02 rotates 22.5 ° relative to the polarization direction of incident S polarised light L1,45 ° of the polarization direction rotations of the linearly polarized light L2 of transmission, with the base angle at 45 ° of CO2 laser instrument LS.
90 degree phase-shift delay mirrors 03 and its surperficial linearly polarized light L2 angles at 45 ° of incident, can make to produce 90 ° of phase differences between the ordinary light component of incident ray polarized light and extraordinary ray component, for the linearly polarized light with 45 ° of incidents, can obtain circularly polarized light.In the present embodiment, from the linearly polarized light L2 of half-wave plate 02 transmission, with 45 ° of incidents, 90 degree phase-shift delay mirrors 03, the light of reflection is circularly polarized light L3, and this circularly polarized light L3 penetrates after optical isolator through suitable adjustment operations such as workpiece 102 cut.
The S polarised light and the P polarised light that contain equivalent due to circularly polarized light L3, and S polarised light and P polarised light are quadratures on direction of vibration, therefore circularly polarized light can not change with the variation of cutting track the gap of laser cutting, compare the effect of linearly polarized light cutting, circularly polarized light can be improved the quality of workpiece laser joint-cutting after focusing on effectively, and processing effect is C part as shown in Figure 4.
The propagation path of the light of workpiece reflection is below described: processing laser is still circularly polarized light L4 after work piece surface reflection, after 90 degree phase-shift delay mirrors 03, ordinary light and extraordinary ray produce 90 ° of phase differences again, twice of linearly polarized light is after 90 degree phase-shift delay mirrors, the raw 180 ° of phase differences of ordinary light and extraordinary ray common property, therefore, light from 90 degree phase-shift delay mirror 03 reflections is linearly polarized light L5, vertical with original linearly polarized light L2 polarization direction, the base angle of this linearly polarized light L5 and laser instrument is 135 °.Fig. 5 shows the generation principle of linearly polarized light and circularly polarized light, when odd-multiple that the phase difference δ between ordinary light and extraordinary ray is π, it is linearly polarized light, phase difference δ is 0 or is linearly polarized light during the even-multiple of π, these two kinds of linearly polarized light quadratures are circularly polarized light when odd-multiple that ordinary light and extraordinary ray equivalent and phase difference δ are pi/2.
Linearly polarized light L5 is again vertical oppositely through half-wave plate 02, because its main cross section has rotated 22.5 degree, so the polarization direction of folded light beam counter-rotates 45 degree on the basis of linearly polarized light L5, the base angle of polarization direction and CO2 laser instrument is 90 degree, polarization vector is in the plane of incidence, and the light seeing through through half-wave plate 02 is P polarised light L6.
P polarised light L6 incident film absorption speculum 01, is all absorbed by film absorption speculum 01, can not enter in the resonator of CO2 laser instrument LS, thereby isolate reflection laser, has protected CO2 laser instrument, has extended the service life of CO2 laser instrument.
As further improvement of this embodiment, as Fig. 2, this optical isolator can also comprise the first zero phase-shift speculum 04 and the second zero phase-shift speculum 05, for changing light path.Wherein, the first zero phase-shift speculum 04 is positioned on the reflected light path of film absorption speculum 01,02 of half-wave plate is positioned on the reflected light path of the first zero phase-shift speculum 04, the second zero phase-shift speculum 05 is positioned on the transmitted light path of half-wave plate 02, and 90 degree phase-shift delay mirrors 03 are positioned on the reflected light path of the second zero phase-shift speculum 05.Film absorption speculum 01 and incident laser angle at 45 °, the first zero phase-shift speculum 04 is parallel with film absorption speculum 01, make S polarised light L1 with 45° angle incident the first zero phase-shift speculum 04, the second zero phase-shift speculum 05 is vertical with the first zero phase-shift speculum 04, S polarised light L1 is vertically seen through after half-wave plate 02 with 45° angle incident the second zero phase-shift speculum 05,90 degree phase-shift delay mirrors 03 are parallel with the second zero phase-shift speculum 05, make laser with 45° angle incident 90 degree phase-shift delay mirrors 03.By introducing the first zero phase-shift speculum 04 and the second zero phase-shift speculum 05, make laser entrance with outlet on same straight line, under the prerequisite of its isolation performance, accomplished compactness rational in infrastructure realizing; Processing and installation are easy, good looking appearance.
With further reference to Fig. 6,7, optical isolator is except having above-mentioned internal optics assembly, also there is following structure, the light flange 061 that enters of isolator is directly connected with the outlet of CO2 laser instrument, some tube connectors and water pipe play a part cooling isolator interior lens, avoid it by powerful laser beam, to be damaged, the circularly polarized light reflecting through 90 degree phase-shift delay mirrors 03 penetrates through bright dipping flange 062, after adjusting, focuses on workpiece.
With reference to figure 8, film absorption speculum 01 is fixing by the first mirror unit 011, and half-wave plate 02 is fixed by adpting flange 021, and 90 degree phase-shift delay mirrors 03 are fixing by the second mirror unit 031.The first zero phase-shift speculum 04 is fixing by the 3rd mirror unit 041, and the second zero phase-shift speculum 05 is fixing by the 4th mirror unit 051.
Further, the first mirror unit 011, adpting flange 021, the second mirror unit 031, the 3rd mirror unit 041 and the 4th mirror unit 051 all have water pipe 07 to pass, for cooling respective optical part, whole isolator has a water inlet pipe 081 and an outlet pipe 082.
Above-mentioned optical isolator can be isolated the light of workpiece reflection, avoids it to inject laser instrument, and processing laser can be become to circularly polarized light, improves joint-cutting quality.The present invention further provides a kind of laser cutting system that comprises this optical isolator.As Fig. 9, this system comprises laser output device 1 and is positioned at the optical isolator 2 on laser output device 1 output light path, and this optical isolator 2 has said structure.
Concrete, laser output device 1 comprises industrial computer 11, laser driver 12, laser oscillator 13, laser power meter 14 and spectroscope 15.Wherein, industrial computer 11 is connected with laser driver 12, for laser parameter is set; Laser driver 12 is connected with laser oscillator 13 again, controls the laser beam of laser oscillator 13 Output of laser cutting power demands; Spectroscope 15 is positioned on the output light path of laser oscillator 13, its transmissive portion laser enters optical isolator 2 for Laser Processing, and reflecting part laser enters laser power meter 14 for the power output of laser power meter 14 real-time monitoring laser oscillators 13, simultaneously, laser power meter 14 feeds back to laser driver 12 by monitor message, and laser driver 12 regulates the power output of laser oscillator 13 according to feedback information.
Further, on the output light path of optical isolator 2, be provided with beam expanding lens group 3, the propagation angle of divergence of laser beam is reduced, make focal beam spot less, thereby make the power density of Laser Focusing hot spot enough high, be greater than the Laser Processing threshold value of workpiece, to cut out needed effect.
Further, after the zero phase-shift completely reflecting mirror 4 of the laser beam after expanding through one 45 ° of placements, enter condenser lens 5, focus on workpiece planarization.Between condenser lens 5 and workpiece, be also provided with protection eyeglass 6, avoid the fused mass producing when Laser Processing to be splashed on condenser lens 5, avoid eyeglass to pollute the eyeglass directly causing and burst.
Further, condenser lens 5 and protection eyeglass 6 are installed in a fixture 7, on fixture 7 and below protection eyeglass 6, are arranged with the first air valve 71 and the second air valve 72, connect respectively nitrogen or argon gas as protective gas.Protective gas forms coaxial gas by the valve 73 of fixture 7 ends respectively, and the fused mass that Laser Processing is produced blows away.
With further reference to Fig. 9; if employing high-power co2 laser; optical mirror slip can absorption portion laser energy in the reflection of laser beam or transmission; produce heat; for fear of optical mirror slip, cause coming off of plated film on eyeglass cracking or eyeglass because of thermal stress; can in this system, adopt water cooling mode to protect optical mirror slip, in the fixture of each device, water pipe is set.As water inlet pipe 81 and outlet pipe 82 are set on the fixture 8 in beam expanding lens group 3, water inlet pipe 74 and outlet pipe 75 are set on the fixture 7 of condenser lens 5, water inlet pipe 91 and outlet pipe 92 are set on the fixture 9 of zero phase-shift completely reflecting mirror 4, and each eyeglass place arranges water inlet 071 and delivery port 072 in optical isolator 2.
Native system preferably adopts powerful CO2 laser instrument; it is a kind of high-power CO2 laser accurate system of processing; its outer light path is owing to having adopted above-mentioned optical isolator; effectively avoided reverberation in laser processing procedure to enter laser oscillator; effectively protect laser instrument, extended its service life.Simultaneously, this optical isolator can be converted into circularly polarized light by linearly polarized light, circularly polarized light is containing S polarised light and the P polarised light of equivalent, therefore circularly polarized light can not change with the variation of cutting track the gap of laser cutting, compare the cutting effect of linearly polarized light, circularly polarized laser light beam can be improved Laser Processing quality after focusing on effectively.
The foregoing is only preferred embodiment of the present utility model; not in order to limit the utility model; all any modifications of doing within spirit of the present utility model and principle, be equal to and replace and improvement etc., within all should being included in protection domain of the present utility model.
Claims (10)
1. an optical isolator, for laser-processing system, it is characterized in that, comprise and setting gradually along the transmission path of laser: for absorbing P polarised light and reflecting the film absorption speculum of S polarised light, for the half-wave plate that the polarization direction of the linearly polarized light of vertical incidence is rotated, the anglec of rotation is the twice of the angle between the polarization direction of described linearly polarized light and the main cross section of described half-wave plate, and be converted to circularly polarized light for the linearly polarized light that described half-wave plate is seen through, and the circularly polarized light that workpiece is reflected is converted to 90 degree phase-shift delay mirrors of linearly polarized light.
2. optical isolator as claimed in claim 1, is characterized in that, also comprises:
The first zero phase-shift speculum, is arranged between described film absorption speculum and half-wave plate;
The second zero phase-shift speculum, is arranged between described half-wave plate and 90 degree phase-shift delay mirrors.
3. optical isolator as claimed in claim 2, it is characterized in that, described film absorption speculum is fixed by the first mirror unit, described half-wave plate is fixed by adpting flange, described 90 degree phase-shift delay mirrors are fixed by the second mirror unit, described the first zero phase-shift speculum is fixed by the 3rd mirror unit, and described the second zero phase-shift speculum is fixed by the 4th mirror unit.
4. optical isolator as claimed in claim 3, is characterized in that, described the first mirror unit, adpting flange, the second mirror unit, the 3rd mirror unit and the 4th mirror unit all have water pipe to pass.
5. the optical isolator as described in claim 1 to 4 any one, is characterized in that, the main cross section of described half-wave plate and be 22.5 ° from the angle between the S polarised light of described film absorption speculum.
6. the optical isolator as described in claim 1 to 4 any one, is characterized in that, the angle of described 90 degree phase-shift delay mirrors and its surperficial linearly polarized light of incident is 45 °.
7. a laser-processing system, is characterized in that, comprises laser output device and is positioned at the optical isolator on described laser output device output light path, and described optical isolator adopts the optical isolator described in claim 1 to 6 any one.
8. laser-processing system as claimed in claim 7, is characterized in that, described laser output device comprises that industrial computer, laser driver, laser oscillator, laser power take into account spectroscope;
Described industrial computer is connected with described laser driver, described laser driver is connected with described laser oscillator again, described spectroscope is positioned on the output light path of described laser oscillator, described optical isolator is positioned on described spectroscopical transmitted light path, described laser power meter is positioned on described spectroscopical reflected light path, and described laser power meter is connected with described laser driver.
9. laser-processing system as claimed in claim 7, is characterized in that, it is the CO2 laser oscillator of S polarised light that described laser oscillator adopts Output of laser.
10. the laser-processing system as described in claim 7,8 or 9; it is characterized in that; on the output light path of described optical isolator, be provided with successively beam expanding lens group, zero phase-shift completely reflecting mirror, condenser lens and protection eyeglass, the fixture of described beam expanding lens group, zero phase-shift completely reflecting mirror, condenser lens and protection eyeglass all has water pipe to pass.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201320537824.3U CN203471144U (en) | 2013-08-30 | 2013-08-30 | Optical isolator and laser processing system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201320537824.3U CN203471144U (en) | 2013-08-30 | 2013-08-30 | Optical isolator and laser processing system |
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| CN203471144U true CN203471144U (en) | 2014-03-12 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103984112A (en) * | 2014-04-23 | 2014-08-13 | 深圳市大族激光科技股份有限公司 | Reflecting type optical isolator and laser machining equipment with the same |
| CN104416284A (en) * | 2013-08-30 | 2015-03-18 | 大族激光科技产业集团股份有限公司 | Optical isolator and laser processing system |
| CN105328330A (en) * | 2015-10-29 | 2016-02-17 | 广东正业科技股份有限公司 | CO2 laser and outer optical path transmission method and system of CO2 laser |
-
2013
- 2013-08-30 CN CN201320537824.3U patent/CN203471144U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104416284A (en) * | 2013-08-30 | 2015-03-18 | 大族激光科技产业集团股份有限公司 | Optical isolator and laser processing system |
| CN104416284B (en) * | 2013-08-30 | 2016-08-10 | 大族激光科技产业集团股份有限公司 | A kind of laser-processing system |
| CN103984112A (en) * | 2014-04-23 | 2014-08-13 | 深圳市大族激光科技股份有限公司 | Reflecting type optical isolator and laser machining equipment with the same |
| CN105328330A (en) * | 2015-10-29 | 2016-02-17 | 广东正业科技股份有限公司 | CO2 laser and outer optical path transmission method and system of CO2 laser |
| CN105328330B (en) * | 2015-10-29 | 2017-05-10 | 广东正业科技股份有限公司 | CO2 laser and outer optical path transmission method and system of CO2 laser |
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Granted publication date: 20140312 Termination date: 20200830 |