CN203579009U - Optical isolation system and optical isolator - Google Patents
Optical isolation system and optical isolator Download PDFInfo
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- CN203579009U CN203579009U CN201320722994.9U CN201320722994U CN203579009U CN 203579009 U CN203579009 U CN 203579009U CN 201320722994 U CN201320722994 U CN 201320722994U CN 203579009 U CN203579009 U CN 203579009U
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Abstract
An optical isolation system is used for isolating reflected lasers of a laser device. The optical isolation system comprises a membrane absorption reflector and a 90-degree phase delay mirror, wherein the membrane absorption reflector can reflect linearly polarized light with the included angle of the polarization direction and a reference face being 45 degrees at the reflecting angle of 45 degrees and emit S polarized light. The 90-degree phase delay mirror is arranged to be relatively parallel to the membrane absorption reflector, and can convert the S polarized light to circular polarized light which is emitted by the reflecting angle of 45 degrees, and the circular polarized light is used for processing workpieces. According to the optical isolator, the linear polarized light is converted to circular polarized light through the membrane absorption reflector and the 90-degree phase delay mirror. The circular polarized light is reflected by the workpieces to be converted to P polarized light which is finally absorbed by the membrane absorption reflector. Thus, the laser can be prevented from being reflected into the laser device, and the purpose of isolation is achieved. The utility model further provides an optical isolator with the optical isolation system.
Description
Technical field
The utility model relates to a kind of optical element, particularly relates to a kind of optics shielding system and optical isolator.
Background technology
Aspect industrial production, laser processing mode is a kind of mode of utilizing laser beam and matter interaction characteristic to process material.Laser processing mode mainly contains the multiple technique for applying such as laser cutting, laser weld, laser boring, laser instrument mark, Laser Surface Treatment, part rapid shaping, and has been widely used in the industrial circles such as automobile, electronics, Aero-Space, metallurgy, machine-building.To realizing the production automation, improve the quality of products and labor productivity, minimizing material consumption, reduce environmental pollution etc. and play more and more important effect.
Carbon dioxide laser is the gas laser using carbon dioxide as operation material, sends wavelength and be the laser beam of 10.6 microns.Adopting high-power carbon dioxide laser to add man-hour, when high energy laser beam is irradiated to those to the lower material of 10.6 micron waveband absorptivities or the higher material of surface smoothness, can reflect a large amount of laser energies, part reverberation can turn back to carbon dioxide laser vibration chamber along original optical path, because the energy density of laser beam is very high, can produce a large amount of heats, cause laser output power to decline, thereby cause decline the service life of carbon dioxide laser, when serious, can burn carbon dioxide laser.
Utility model content
Based on this, be necessary to provide one can protect carbon dioxide laser, extend the optical isolator in service life of carbon dioxide laser.The linear polarization of laser beam is converted into circular polarization simultaneously, while making this laser system cut workpiece, can significantly improves laser lancing quality.
A kind of optics shielding system, for the reflection laser of isolation laser device, comprising:
Film absorption speculum, can be that the linearly polarized light of 45 degree reflects with 45 degree angles of reflection by the angle of polarization direction and datum level, and outgoing S polarised light, and described datum level is parallel with described linearly polarized light and vertical with the plane of incidence of described linearly polarized light plane;
90 degree phase delay mirrors, arrange with described film absorption speculum opposing parallel, and described 90 degree phase delay mirrors can be changed the circularly polarized light with 45 degree angle of reflection outgoing by described S polarised light, and described circularly polarized light is for processing workpiece;
Wherein, described circularly polarized light reflects through described surface of the work, and described 90 degree phase delay mirrors can convert described circularly polarized light to P polarised light, and described P polarised light incides on described film absorption speculum, and described film absorption speculum can absorb described P polarised light.
A kind of optics shielding system, for the isolation reflection laser to laser instrument, comprising:
Film absorption speculum, can be located at the light-emitting window place of described laser instrument, described film absorption speculum can reflect linearly polarized light parallel with described datum level polarization direction with 45 degree angles of reflection, and outgoing S polarised light, described datum level is parallel with described linearly polarized light and vertical with the plane of incidence of described linearly polarized light plane;
Half-wave plate, perpendicular with the direction of propagation of described S polarised light, angle between the vibration plane of the main cross section of described half-wave plate and described S polarised light is 22.5 degree, and the angle that described half-wave plate can be deflected into described S polarised light between vibration plane and the main cross section of described half-wave plate is the S ' polarised light of 45 degree; And
90 degree phase delay mirrors, be located at the side of described half-wave plate away from described film absorption speculum, and described 90 degree phase delay mirrors can make described S ' polarised light with 45 degree incidence angle incidents, described 90 degree phase delay mirrors can be reflected into circularly polarized light by described S ' polarised light, and described circularly polarized light is for processing workpiece;
Wherein, described circularly polarized light reflects through described surface of the work, described 90 degree phase delay mirrors and described half-wave plate can convert described circularly polarized light to P polarised light, and described P polarised light incides on described film absorption speculum, and described film absorption speculum can absorb described P polarised light.
A kind of optics shielding system, for the isolation reflection laser to laser instrument, comprising:
Half-wave plate, main cross section and described datum level angle be 22.5 degree, take form polarization direction and described datum level angle as the linearly polarized light of 45 degree, described datum level is parallel with described linearly polarized light and vertical with the plane of incidence of described linearly polarized light plane;
Film absorption speculum, is located on the direction of propagation of described linearly polarized light, and described film absorption speculum can reflect linearly polarized light with 45 degree angles of reflection, and outgoing S ' polarised light;
90 degree phase delay mirrors, be located at the side of described film absorption speculum away from described half-wave plate, and described 90 degree phase delay mirrors can make described S ' polarised light with 45 degree incidence angle incidents, described 90 degree phase delay mirrors can be reflected into circularly polarized light by described S ' polarised light, and described circularly polarized light is for processing workpiece;
Wherein, described circularly polarized light reflects through described surface of the work, and described 90 degree phase delay mirrors can convert described circularly polarized light to P polarised light, and described P polarised light incides on described film absorption speculum, and described film absorption speculum can absorb described P polarised light.
A kind of optical isolator is also provided.
A kind of optical isolator, comprising:
Above-mentioned optics shielding system; And
Film absorption speculum mount pad, for block entity, in described film absorption speculum mount pad, be milled with the first tank, two openends of described the first tank are all positioned at the surface of described film absorption speculum mount pad, described film absorption speculum mount pad is provided with the first water inlet pipe in an openend of described the first tank, another openend is provided with the first outlet pipe, described film absorption speculum mount pad is provided with the first inclined-plane, the inclination angle on described the first inclined-plane is 45 degree, on described the first inclined-plane, offer the first accepting groove, the shape of the shape of described the first accepting groove and described film absorption speculum matches, described film absorption speculum is contained in described the first accepting groove, and described film absorption speculum is 45 degree and tilts.
Therein in an embodiment, described the first tank includes water portion, kink and outlet part, described enter water portion and described outlet part be positioned at respectively the relative both sides of described film absorption speculum mount pad, described enter water portion and described first water inlet pipe connect, described kink enters between water portion and described outlet part described in conducting, to enter water portion and described outlet part described in being located at, and described outlet part and described the first outlet pipe are connected.
In an embodiment, a side of described film absorption speculum mount pad is provided with the breach of wedge shape therein, and described film absorption speculum mount pad inwardly mills out described kink in described indentation, there.
In an embodiment, also comprise half-wave plate mount pad therein, described half-wave plate mount pad comprises:
Body, for the parallelepiped structure of hollow, described body comprises the first side, second side adjacent with described the first side, described the first side opening is provided with the first through hole, described the first through hole is relative with the light-emitting window of laser instrument, the inclination angle of described the second side is 45 degree, described body is located on the first inclined-plane of described film absorption speculum mount pad, described the second side and described the first inclined-plane connect, on described the second side, offer the second through hole, described the second through hole and described the first accepting groove are oppositely arranged, described linearly polarized light enters described half-wave plate mount pad from described the first through hole, through described the second through hole, incide on described film absorption speculum, described S polarised light enters described body through described the second through hole, and
Stage portion, be located on the madial wall of described body, described stage portion offers the second tank, and described the second tank two ends are respectively equipped with the second oral siphon and the second outlet pipe, the lateral wall of described half-wave plate and described stage portion connects, and the angle of described half-wave plate and described the second side is 45 degree.
In an embodiment, described half-wave plate mount pad also comprises tube connector therein, and described stage portion is two, and two described stage portion are positioned at respectively on two relative madial walls of described body, and the second tank of two described stage portion is communicated with by described tube connector.
Therein in an embodiment, described body also comprises the 3rd side paralleling with described the second side, the 4th side paralleling with described the first side, on described the 3rd side, offer third through-hole, on described the 4th side, offer fourth hole, described S ' polarised light incides on described 90 degree phase delay mirrors through described third through-hole, and described circularly polarized light penetrates through described fourth hole.
Therein in an embodiment, also comprise 90 degree phase delay mirror mount pads, for block entity, in described 90 degree phase delay mirror mount pads, be milled with the 3rd tank, two openends of described the 3rd tank are all positioned at the surface of described 90 degree phase delay mirror mount pads, described 90 degree phase delay mirror mount pads are provided with the 3rd water inlet pipe in an openend of described the 3rd tank, another openend is provided with the 3rd outlet pipe, described 90 degree phase delay mirror mount pads are provided with the second inclined-plane, the inclination angle on described the second inclined-plane is 45 degree, on described the second inclined-plane, offer the second accepting groove, the shape of the shape of described the second accepting groove and described 90 degree phase delay mirrors matches, described 90 degree phase delay mirrors are contained in described the second accepting groove, and described 90 degree phase delay mirrors are 45 degree and tilt.
The optical isolator that contains above-mentioned optics shielding system, is converted to circularly polarized light by film absorption speculum and 90 degree phase delay mirrors by linearly polarized light.And, because film absorption speculum can only reflect S polarised light, absorb P polarised light; make to be converted to P polarised light through the circularly polarized light of workpiece reflection, and finally by film absorption speculum, absorbed, therefore can prevent that laser reflection from returning in laser instrument; reach the object of isolation, thus protection laser instrument.
Accompanying drawing explanation
Fig. 1 is the stereogram of the optical isolator of an embodiment;
Fig. 2 is the index path of the optics shielding system of optical isolator shown in Fig. 1;
Fig. 3 is that the phase difference of S polarised light and P polarised light is the polarization state of 0 o'clock;
Polarization state when Fig. 4 is the phase difference of S polarised light and the P polarised light odd-multiple that is pi/2;
Fig. 5 is the polarization state of the phase difference of S polarised light and P polarised light while being π;
Fig. 6 is the cutaway view of the optical isolator shown in Fig. 1;
Fig. 7 is the explosive view of the optical isolator shown in Fig. 1;
Fig. 8 is the stereogram of another angle of the optical isolator shown in Fig. 1.
The specific embodiment
For the ease of understanding the utility model, below with reference to relevant drawings, the utility model is described more fully.In accompanying drawing, provided preferred embodiments of the present utility model.But the utility model can be realized in many different forms, be not limited to embodiment described herein.On the contrary, providing the object of these embodiments is make the disclosure of the present utility model understand more comprehensively thorough.
It should be noted that, when element is called as " being fixed on " another element, it can be directly on another element or also can have an element placed in the middle.When an element is considered to " connection " another element, it can be directly connected to another element or may have centering elements simultaneously.Term as used herein " vertical ", " level ", " left side ", " right side " and similar statement just for illustrative purposes, do not represent it is unique embodiment.
Unless otherwise defined, all technology of using are herein identical with the implication that belongs to the common understanding of those skilled in the art of the present utility model with scientific terminology.The term using in description of the present utility model herein, just in order to describe the object of concrete embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise one or more relevant Listed Items arbitrarily with all combinations.
Refer to Fig. 1 and Fig. 2, a kind of optical isolator 100 of present embodiment comprises optics shielding system 200, film absorption speculum mount pad 110, half-wave plate mount pad 120,90 degree phase delay mirror mount pad 130 and focus module (not shown).
The optics shielding system 200 of present embodiment comprises film absorption speculum 210, half-wave plate 220,90 degree phase delay mirrors 230.Light shielding system is for isolating reflection laser to laser instrument 10.Specifically in the present embodiment, the carbon dioxide laser that laser instrument 10 is produced for U.S. Coherent.The laser that this kind of laser instrument 10 exported is linearly polarized light 11, and the polarization direction of this linearly polarized light 11 is parallel with datum level.Datum level is parallel with linearly polarized light and vertical with the plane of incidence of linearly polarized light plane.For convenience of description, herein, take the plane at the base place of laser instrument 10 as datum level, the angular relationship between all directions and datum level is described.
Film absorption speculum 210(Absorbing Thin Film Reflector) abbreviation ATFR.Film absorption speculum 210 has reflection S polarised light, absorbs the function of P polarised light.S polarised light refers to the polarised light that polarization direction is vertical with the plane of incidence, and P polarised light refers to the polarised light that polarization direction is parallel with the plane of incidence.
Film absorption speculum 210 can be located at the light-emitting window place of laser instrument 10.Angle between the linearly polarized light 11 that film absorption speculum 210 and laser instrument 10 send is 45 degree.Film absorption speculum 210 can reflect polarization direction and the laser instrument 10 parallel plane linearly polarized lights 11 in base place with 45 degree angles of reflection.The polarization direction of linearly polarized light 11 is parallel with the base of laser instrument, is vertical with the plane of incidence, is S polarised light.The light beam of S polarised light after the reflection of film absorption speculum 210 is still S polarised light.Linearly polarized light 11 reflects S polarised light 12 through film absorption speculum 210.The plane of incidence of the polarization direction vertical light of S polarised light 12, and the plane of incidence is vertical with base, the polarization direction of S polarised light 12 is parallel with base.
Half-wave plate 220 is located on the direction of propagation of S polarised light 12.Half-wave plate 220 is perpendicular with the direction of propagation of S polarised light 12.Angle between the vibration plane of the main cross section of half-wave plate 220 and S polarised light 12 is 22.5 degree.S polarised light 12 is through half-wave plate 220 transmissions, and the angle forming between vibration plane and the main cross section of half-wave plate 220 is the S ' polarised light 13 of 45 degree.S polarised light 12 vertical incidence half-wave plates 220, the function of half-wave plate 220 is that polarization direction is rotated.When linearly polarized light 11 vertical incidence half-wave plate 220, as the main cross section of half-wave plate 220 rotates θ angle relative to the polarization direction of incident light, the polarization direction of the linearly polarized light 11 by this half-wave plate 220 is from original direction rotation 2 θ angles.Specifically in the present embodiment, the main cross section of half-wave plate 220 rotates 22.5 degree angles relative to the polarization direction of S polarised light 12, and transmission can be rotated miter angle through the polarization direction of the S ' polarised light 13 of half-wave plate 220.S ' polarised light 13 is the linearly polarized light that the polarization direction of polarization direction and S polarised light is 45 degree angles.
90 degree phase delay mirrors 230 are located at the side of half-wave plate 220 away from film absorption speculum 210.90 degree phase delay mirrors 230 are 45 degree with the angle of the direction of propagation of S ' polarised light 13.S ' polarised light 13, with miter angle incident, is reflected into circularly polarized light 14 through 90 degree phase delay mirrors 230, and circularly polarized light 14 is for processing workpiece 20.
S ' polarised light 13 and circularly polarized light 14 have formed the plane of incidence of 90 degree phase delay mirrors 230, this plane of incidence vertical reference face.So, the polarization direction of S ' polarised light 13 and this plane of incidence be angle miter angle.And S ' polarised light 13 is spent phase delay mirror 230 with miter angle incident 90, its folded light beam is circularly polarized light 14.When polarization direction and the plane of incidence angle of polarised light are miter angle, and spend phase delay mirror 230 with miter angle incident 90, linearly polarized light 11 just can be converted to circularly polarized light 14.
Specifically in the present embodiment, 90 degree phase delay mirrors 230 and the 210 opposing parallel settings of film absorption speculum.Linearly polarized light 11, from a side incident of optics shielding system 200, from the opposite side outgoing of optics shielding system 200, is conducive to process operation.
Focus module is located in the direction that circularly polarized light 14 propagates, and circularly polarized light 14 is assembled.Focus module can be convex lens, planoconvex spotlight, compound lens or non-spherical lens.
Circularly polarized light 14 is containing s polarised light and the p polarised light of equivalent, therefore circularly polarized light 14 can not change with the variation of cutting track the gap of laser cutting, compare the cutting effect of linearly polarized light, circularly polarized laser light beam can be improved the crudy of workpiece laser joint-cutting effectively after focusing on.
When circularly polarized light 14 is radiated on workpiece 20, circularly polarized light 14 is through workpiece 20 surface reflections, and polarization state does not change, and is still circularly polarized light 15.The S polarised light and the P polarised light that contain equivalent due to circularly polarized light 14.90 degree phase delay mirrors 230 and half-wave plate 220 can convert circularly polarized light 15 to P polarised light 17.P polarised light 17 incides on film absorption speculum 210, and film absorption speculum 210 can absorb P polarised light 17.
Particularly, circularly polarized light 15 is through 90 degree phase delay mirrors 230, and the S polarised light of equivalent and P polarised light produce the phase difference of an angle of 90 degrees again.Polarised light through 90 degree phase delay mirrors 230 has produced 180 phase differences of spending with respect to S ' polarised light 13.According to the poor polarization state of the out of phase shown in Fig. 3-5, be linearly polarized light when the odd-multiple that the phase difference between S polarised light and P polarised light is π.When S polarised light and P polarised light phase difference are 0 or are linearly polarized light during the even-multiple of π, and these two kinds of linearly polarized lights are orthogonal.When odd-multiple that S polarised light and P polarised light equivalent and phase difference are pi/2, it is circularly polarized light.
When circularly polarized light 15 is linearly polarized light 16 through 90 degree phase delay mirror 230 polarization states, and the polarization direction of the polarization direction of this linearly polarized light 16 and S ' polarised light 13 is orthogonal.So the polarization direction of this linearly polarized light 16 and datum level are that the angle of the plane at the base place of laser instrument 10 is 135 degree angles.Because S polarised light is parallel with base, and the angle of the main cross section of the polarization direction of S polarised light and half-wave plate 220 is 22.5 degree angles, therefore the angle of the main cross section of half-wave plate 220 and laser instrument 10 bases is 22.5 degree angles.Therefore, the angle 112.5 of the polarization direction of linearly polarized light 16 and half-wave plate 220 main cross sections is spent, and linearly polarized light 16 has rotated 2*112.5 degree angle through half-wave plate 220 polarization directions, i.e. 225 degree angles.Due to, the angle of the plane at the base place of the polarization direction of this linearly polarized light 16 and laser instrument 10 is 135 degree angles, therefore, through the polarization direction of linearly polarized light and the angle of base of half-wave plate 220, is an angle of 90 degrees.Pass through polarization direction vertical laser 10 bases of the linearly polarized light of half-wave plate 220, the plane of incidence of the parallel film absorption speculum 210 in polarization direction of the linearly polarized light of process half-wave plate 220, so the linearly polarized light through half-wave plate 220 is P polarised light 17, P polarised light 17 is absorbed by film absorption speculum 210, thereby realizes the isolation of light.Therefore above-mentioned optics shielding system 200, can protect carbon dioxide laser, extends the optical isolator in service life of carbon dioxide laser.
In another embodiment, in light path, before half-wave plate 220 is located at film absorption speculum 210.Be that half-wave plate 220 can also be located between the light-emitting window and film absorption speculum 210 of laser instrument 10.
Particularly, the carbon dioxide laser that laser instrument 10 is produced for U.S. Coherent.The polarization direction of the linearly polarized light that this kind of laser instrument 10 exported is parallel with the base of laser instrument 10.
The angle of the main cross section of half-wave plate 220 and laser instrument 10 base place planes is 22.5 degree, to form the angle of polarization direction and laser instrument 10 base place planes as the linearly polarized light of 45 degree.
Film absorption speculum 210 is located on the direction of propagation of linearly polarized light.Film absorption speculum 210 can reflect linearly polarized light with 45 degree angles of reflection, and outgoing S ' polarised light 13.
90 degree phase delay mirrors 230 are located at the side of film absorption speculum 210 away from half-wave plate 220, and 90 degree phase delay mirrors 230 can make S ' polarised light 13 with 45 degree incidence angle incidents, 90 degree phase delay mirrors 230 can be reflected into circularly polarized light 14 by S ' polarised light 13, and circularly polarized light 14 is for processing workpiece 20.
Circularly polarized light 14 is through workpiece 20 surface reflections, and 90 degree phase delay mirrors 230 can convert circularly polarized light 14 to P polarised light 17.P polarised light 17 incides on film absorption speculum 210, and film absorption speculum 210 can absorb P polarised light 17, thereby realizes the isolation of light.Therefore above-mentioned optics shielding system 200, can protect carbon dioxide laser, extends the optical isolator in service life of carbon dioxide laser.
That in the separation principle of present embodiment and a upper embodiment, says is roughly the same, does not repeat them here.
In another embodiment, laser instrument 10 is the carbon dioxide laser 10 that German Rofin-Sinar produces.This laser instrument 10 polarization light output, the polarization direction of this linearly polarized light becomes 45 degree with the base of laser instrument 10.The optics shielding system 200 of present embodiment comprises film absorption speculum 210 and 90 degree phase delay mirrors 230.Half-wave plate 220 can omit, and by film absorption speculum 210 and 90 degree phase delay mirrors 230, just can realize optoisolated function.
Particularly, film absorption speculum 210 can be that the linearly polarized light of 45 degree reflects with 45 degree angles of reflection by polarization direction and laser instrument 10 plane included angles, base place, and outgoing S polarised light.Angle between the polarization direction of linearly polarized light and the plane at the base place of laser instrument 10 of sending due to laser instrument 10 is 45 degree.The angle between the polarization direction of the S polarised light of outgoing and the plane at the base place of laser instrument 10 is also 45 degree.Therefore, the S ' polarised light 13 in S polarised light and first embodiment of present embodiment is same polarised light.
90 degree phase delay mirrors 230 and the 210 opposing parallel settings of film absorption speculum.90 degree phase delay mirrors 230 can be changed the circularly polarized light 14 with 45 degree angle of reflection outgoing by S polarised light.
Wherein, circularly polarized light 14 is still circularly polarized light 15 through workpiece 20 surface reflections.90 degree phase delay mirrors 230 can convert circularly polarized light 15 to P polarised light 17.P polarised light 17 incides on film absorption speculum 210, and film absorption speculum 210 can absorb P polarised light 17, thereby realizes the isolation of light.Therefore above-mentioned optics shielding system 200, can protect carbon dioxide laser, extends the optical isolator in service life of carbon dioxide laser 10.
Please refer to Fig. 6 and Fig. 7, film absorption speculum mount pad 110 is block entity.Film absorption speculum mount pad 110 can be aluminium block or copper billet.Aluminium has lighter quality.Copper has good thermal conductivity.Specifically in the present embodiment, for guaranteeing the heat-sinking capability of optical isolator, film absorption speculum mount pad 110 is copper billet.In film absorption speculum mount pad 110, be milled with the first tank 111.Two openends of the first tank 111 are all positioned at the surface of film absorption speculum mount pad 110.Film absorption speculum mount pad 110 is provided with the first water inlet pipe 112 in an openend of the first tank 111, and another openend is provided with the first outlet pipe 113.
Particularly, the first tank 111 includes the 111a of water portion, kink 111b and outlet part 111c.Enter the relative both sides that water portion and outlet part are positioned at respectively film absorption speculum mount pad 110.One side of film absorption speculum mount pad 110 is provided with the breach 114 of wedge shape.Film absorption speculum mount pad 110 inwardly mills out kink 111b in breach 114 places.Kink 111b is two.Two kink 111b all can conducting enter the 111a of water portion and outlet part 111c.Enter the 111a of water portion and the first water inlet pipe 112 is connected.Kink 111b is located between the 111a of water portion and outlet part 111c, and conducting enters the 111a of water portion and outlet part 111c, and outlet part 111c and the first outlet pipe 113 are connected.The inclination angle that film absorption speculum mount pad 110 is provided with 115, the first inclined-planes 115, the first inclined-plane is 45 degree.On the first inclined-plane 115, offering first shape of accepting groove 116, the first accepting grooves 116 and the shape of film absorption speculum matches.Film absorption speculum 210 is contained in the first accepting groove 116, and film absorption speculum 210 is 45 degree inclinations.
Film absorption speculum mount pad 110 is for cooling film absorption speculum 210.Avoid can producing a large amount of heats after film absorption speculum absorbing laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator.
Please refer to Fig. 8, half-wave plate mount pad 120, comprise body 121, stage portion 123, the second oral siphon 125, the second outlet pipe 127, tube connector 129.
The parallelepiped structure that body 121 is hollow.Body 121 comprises the first side 121a, the second side 121b adjacent with the first side.The first side 121a offers the first through hole 121c.The first through hole 121c is relative with the light-emitting window of laser instrument 10.The inclination angle of the second side 121b is 45 degree.Body 121 is located on the first inclined-plane 115 of film absorption speculum mount pad 110.The second side 121b and the first inclined-plane 115 connect, and offer the second through hole 121c on the second side 121b.The second through hole 121c and the first accepting groove 111 are oppositely arranged.Linearly polarized light enters half-wave plate mount pad 120 from the first through hole 121c, through the second through hole 121c, incides on film absorption speculum 210, and S polarised light enters body 121 through the second through hole 121c.Body 121 also comprises the 3rd side 122 paralleling with the second side 121b, the 4th side paralleling with the first side 121a (figure is mark not).On the 3rd side 122, offer third through-hole 122a, on the 4th side, offer fourth hole 122b.S ' polarised light 13 incides on 90 degree phase delay mirrors 230 through third through-hole 122a, and circularly polarized light 14 penetrates through fourth hole 122b.Stage portion 123 is located on the madial wall of body 121.Stage portion 123 offers the second tank 124.Stage portion 123 is two.Two stage portion 123 lay respectively on two relative madial walls of body 121.The second tank 124 two ends are respectively equipped with the second oral siphon 125 and the second outlet pipe 127.The second tank 124 of two stage portion 123 is communicated with by tube connector 129.Half-wave plate 220 connects with the lateral wall of stage portion 123, and the angle of half-wave plate 220 and the second side is 45 degree.Half-wave plate 220 mount pads 120 are for cooling half-wave plate 220.Avoid can producing a large amount of heats after half-wave plate 220 absorbing laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator 100.
90 degree phase delay mirror mount pads 130 are block entity.Two openends that are milled with the 3rd tank 131, the three tanks 131 in 90 degree phase delay mirror mount pads 130 are all positioned at the surface of 90 degree phase delay mirror mount pads 130.90 degree phase delay mirror mount pads 130 are provided with the 3rd water inlet pipe 132 in an openend of the 3rd tank 131, and another openend is provided with the 3rd outlet pipe 133.90 degree phase delay mirror mount pads 130 are provided with the second inclined-plane 134.The inclination angle on the second inclined-plane 134 is 45 degree.On the second inclined-plane 134, offer the second accepting groove 135.The shape of the shape of the second accepting groove 135 and 90 degree phase delay mirrors 230 matches.90 degree phase delay mirrors 230 are contained in the second accepting groove 135, and 90 degree phase delay mirrors 230 are 45 degree inclinations.
Specifically in the present embodiment, the structural similarity of the structure of the 3rd tank 131 and the first tank 111, operation principle is identical, does not repeat them here.
90 degree phase delay mirror mount pads 130 are for cooling 90 degree phase delay mirrors 230.Avoid can producing a large amount of heats after 90 degree phase delay mirror 230 absorbing laser energy, appearance is ftractureed, being heated bursts the generation of phenomenon, strengthens the security of optical isolator 100.
Film absorption speculum mount pad 110, half-wave plate mount pad 120 and 90 degree phase delay mirror mount pads 130 stack rectangular successively.And film absorption speculum mount pad 110 offers stud bolt hole (not shown) on a side near half-wave plate mount pad 120.90 degree phase delay mirror mount pads 130 are near also offering stud bolt hole 139 on the side of half-wave plate mount pad 120.On two relative sides of half-wave plate mount pad 120, be equipped with bolt (not shown).Two relative sides of half-wave plate mount pad 120 are threaded with film absorption speculum mount pad 110 and 90 degree phase delay mirror mount pads 130 respectively, realizing film absorption speculum mount pad 110, half-wave plate mount pad 120 and 90 degree phase delay mirror mount pads 130 fixedly mount.The optical isolator 100 of rectangle can be conveniently laying, install, and can comparatively firm being fixed on work top.
And film absorption speculum mount pad 110, half-wave plate the mount pad 120 and 90 degree phase delay mirror mount pads 130 of above-mentioned optical isolator 100 are closely to connect.And the distance between film absorption speculum 210, half-wave plate 220 and 90 degree phase delay mirrors 230 is less, can make the structure of above-mentioned optical isolator 100 comparatively compact, can reduce the loss of laser in communication process, to improve the utilization rate of laser.
The above embodiment has only expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (10)
1. an optics shielding system, for the reflection laser of isolation laser device, is characterized in that, comprising:
Film absorption speculum, can be that the linearly polarized light of 45 degree reflects with 45 degree angles of reflection by the angle of polarization direction and datum level, and outgoing S polarised light, and described datum level is parallel with described linearly polarized light and vertical with the plane of incidence of described linearly polarized light plane;
90 degree phase delay mirrors, arrange with described film absorption speculum opposing parallel, and described 90 degree phase delay mirrors can be changed the circularly polarized light with 45 degree angle of reflection outgoing by described S polarised light, and described circularly polarized light is for processing workpiece;
Wherein, described circularly polarized light reflects through described surface of the work, and described 90 degree phase delay mirrors can convert described circularly polarized light to P polarised light, and described P polarised light incides on described film absorption speculum, and described film absorption speculum can absorb described P polarised light.
2. an optics shielding system, for the isolation reflection laser to laser instrument, is characterized in that, comprising:
Film absorption speculum, can be located at the light-emitting window place of described laser instrument, described film absorption speculum can reflect linearly polarized light parallel with described datum level polarization direction with 45 degree angles of reflection, and outgoing S polarised light, described datum level is parallel with described linearly polarized light and vertical with the plane of incidence of described linearly polarized light plane;
Half-wave plate, perpendicular with the direction of propagation of described S polarised light, angle between the vibration plane of the main cross section of described half-wave plate and described S polarised light is 22.5 degree, and the angle that described half-wave plate can be deflected into described S polarised light between vibration plane and the main cross section of described half-wave plate is the S ' polarised light of 45 degree; And
90 degree phase delay mirrors, be located at the side of described half-wave plate away from described film absorption speculum, and described 90 degree phase delay mirrors can make described S ' polarised light with 45 degree incidence angle incidents, described 90 degree phase delay mirrors can be reflected into circularly polarized light by described S ' polarised light, and described circularly polarized light is for processing workpiece;
Wherein, described circularly polarized light reflects through described surface of the work, described 90 degree phase delay mirrors and described half-wave plate can convert described circularly polarized light to P polarised light, and described P polarised light incides on described film absorption speculum, and described film absorption speculum can absorb described P polarised light.
3. an optics shielding system, for the isolation reflection laser to laser instrument, is characterized in that, comprising:
Half-wave plate, the angle of main cross section and described datum level is 22.5 degree, to form the angle of polarization direction and described datum level as the linearly polarized light of 45 degree, described datum level is parallel with described linearly polarized light and vertical with the plane of incidence of described linearly polarized light plane;
Film absorption speculum, is located on the direction of propagation of described linearly polarized light, and described film absorption speculum can reflect linearly polarized light with 45 degree angles of reflection, and outgoing S ' polarised light;
90 degree phase delay mirrors, be located at the side of described film absorption speculum away from described half-wave plate, and described 90 degree phase delay mirrors can make described S ' polarised light with 45 degree incidence angle incidents, described 90 degree phase delay mirrors can be reflected into circularly polarized light by described S ' polarised light, and described circularly polarized light is for processing workpiece;
Wherein, described circularly polarized light reflects through described surface of the work, and described 90 degree phase delay mirrors can convert described circularly polarized light to P polarised light, and described P polarised light incides on described film absorption speculum, and described film absorption speculum can absorb described P polarised light.
4. an optical isolator, is characterized in that, comprising:
Optics shielding system as described in claim 1～3 any one; And
Film absorption speculum mount pad, for block entity, in described film absorption speculum mount pad, be milled with the first tank, two openends of described the first tank are all positioned at the surface of described film absorption speculum mount pad, described film absorption speculum mount pad is provided with the first water inlet pipe in an openend of described the first tank, another openend is provided with the first outlet pipe, described film absorption speculum mount pad is provided with the first inclined-plane, the inclination angle on described the first inclined-plane is 45 degree, on described the first inclined-plane, offer the first accepting groove, the shape of the shape of described the first accepting groove and described film absorption speculum matches, described film absorption speculum is contained in described the first accepting groove, and described film absorption speculum is 45 degree and tilts.
5. optical isolator according to claim 4, it is characterized in that, described the first tank includes water portion, kink and outlet part, described enter water portion and described outlet part be positioned at respectively the relative both sides of described film absorption speculum mount pad, described enter water portion and described first water inlet pipe connect, described kink enters between water portion and described outlet part described in conducting, to enter water portion and described outlet part described in being located at, and described outlet part and described the first outlet pipe are connected.
6. optical isolator according to claim 5, is characterized in that, a side of described film absorption speculum mount pad is provided with the breach of wedge shape, and described film absorption speculum mount pad inwardly mills out described kink in described indentation, there.
7. optical isolator according to claim 4, is characterized in that, also comprises half-wave plate mount pad, and described half-wave plate mount pad comprises:
Body, for the parallelepiped structure of hollow, described body comprises the first side, second side adjacent with described the first side, described the first side opening is provided with the first through hole, described the first through hole is relative with the light-emitting window of laser instrument, the inclination angle of described the second side is 45 degree, described body is located on the first inclined-plane of described film absorption speculum mount pad, described the second side and described the first inclined-plane connect, on described the second side, offer the second through hole, described the second through hole and described the first accepting groove are oppositely arranged, described linearly polarized light enters described half-wave plate mount pad from described the first through hole, through described the second through hole, incide on described film absorption speculum, described S polarised light enters described body through described the second through hole, and
Stage portion, be located on the madial wall of described body, described stage portion offers the second tank, and described the second tank two ends are respectively equipped with the second oral siphon and the second outlet pipe, the lateral wall of described half-wave plate and described stage portion connects, and the angle of described half-wave plate and described the second side is 45 degree.
8. optical isolator according to claim 7, it is characterized in that, described half-wave plate mount pad also comprises tube connector, described stage portion is two, two described stage portion are positioned at respectively on two relative madial walls of described body, and the second tank of two described stage portion is communicated with by described tube connector.
9. optical isolator according to claim 7, it is characterized in that, described body also comprises the 3rd side paralleling with described the second side, the 4th side paralleling with described the first side, on described the 3rd side, offer third through-hole, on described the 4th side, offer fourth hole, described S ' polarised light incides on described 90 degree phase delay mirrors through described third through-hole, and described circularly polarized light penetrates through described fourth hole.
10. optical isolator according to claim 5, it is characterized in that, also comprise 90 degree phase delay mirror mount pads, for block entity, in described 90 degree phase delay mirror mount pads, be milled with the 3rd tank, two openends of described the 3rd tank are all positioned at the surface of described 90 degree phase delay mirror mount pads, described 90 degree phase delay mirror mount pads are provided with the 3rd water inlet pipe in an openend of described the 3rd tank, another openend is provided with the 3rd outlet pipe, described 90 degree phase delay mirror mount pads are provided with the second inclined-plane, the inclination angle on described the second inclined-plane is 45 degree, on described the second inclined-plane, offer the second accepting groove, the shape of the shape of described the second accepting groove and described 90 degree phase delay mirrors matches, described 90 degree phase delay mirrors are contained in described the second accepting groove, and described 90 degree phase delay mirrors are 45 degree and tilt.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201320722994.9U CN203579009U (en) | 2013-11-15 | 2013-11-15 | Optical isolation system and optical isolator |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201320722994.9U CN203579009U (en) | 2013-11-15 | 2013-11-15 | Optical isolation system and optical isolator |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103592775A (en) * | 2013-11-15 | 2014-02-19 | 深圳市大族激光科技股份有限公司 | Optical isolation system and optical isolator |
| CN108188598A (en) * | 2017-12-27 | 2018-06-22 | 武汉华星光电半导体显示技术有限公司 | Quasi-molecule laser annealing equipment |
| CN109891301A (en) * | 2016-10-13 | 2019-06-14 | 株式会社Lg化学 | Polarization conversion device and optic isolator device |
| CN111570410A (en) * | 2020-05-07 | 2020-08-25 | 武汉锐科光纤激光技术股份有限公司 | Laser cleaning gun head and laser cleaning machine |
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2013
- 2013-11-15 CN CN201320722994.9U patent/CN203579009U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103592775A (en) * | 2013-11-15 | 2014-02-19 | 深圳市大族激光科技股份有限公司 | Optical isolation system and optical isolator |
| CN103592775B (en) * | 2013-11-15 | 2016-07-06 | 大族激光科技产业集团股份有限公司 | Optical isolator |
| CN109891301A (en) * | 2016-10-13 | 2019-06-14 | 株式会社Lg化学 | Polarization conversion device and optic isolator device |
| CN108188598A (en) * | 2017-12-27 | 2018-06-22 | 武汉华星光电半导体显示技术有限公司 | Quasi-molecule laser annealing equipment |
| CN111570410A (en) * | 2020-05-07 | 2020-08-25 | 武汉锐科光纤激光技术股份有限公司 | Laser cleaning gun head and laser cleaning machine |
| CN111570410B (en) * | 2020-05-07 | 2021-08-31 | 武汉锐科光纤激光技术股份有限公司 | Laser cleaning gun head and laser cleaning machine |
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