CN200969352Y - 横向dmos结构 - Google Patents
横向dmos结构 Download PDFInfo
- Publication number
- CN200969352Y CN200969352Y CNU2006201148365U CN200620114836U CN200969352Y CN 200969352 Y CN200969352 Y CN 200969352Y CN U2006201148365 U CNU2006201148365 U CN U2006201148365U CN 200620114836 U CN200620114836 U CN 200620114836U CN 200969352 Y CN200969352 Y CN 200969352Y
- Authority
- CN
- China
- Prior art keywords
- dmos
- well
- type
- lateral dmos
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000009792 diffusion process Methods 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 13
- 238000002955 isolation Methods 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 238000005468 ion implantation Methods 0.000 claims description 4
- 230000005684 electric field Effects 0.000 abstract description 12
- 230000007774 longterm Effects 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 description 6
- -1 boron ions Chemical class 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7816—Lateral DMOS transistors, i.e. LDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66681—Lateral DMOS transistors, i.e. LDMOS transistors
- H01L29/66689—Lateral DMOS transistors, i.e. LDMOS transistors with a step of forming an insulating sidewall spacer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0856—Source regions
- H01L29/086—Impurity concentration or distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0843—Source or drain regions of field-effect devices
- H01L29/0847—Source or drain regions of field-effect devices of field-effect transistors with insulated gate
- H01L29/0852—Source or drain regions of field-effect devices of field-effect transistors with insulated gate of DMOS transistors
- H01L29/0873—Drain regions
- H01L29/0878—Impurity concentration or distribution
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
Claims (7)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2006201148365U CN200969352Y (zh) | 2006-04-24 | 2006-04-24 | 横向dmos结构 |
US11/785,867 US7535058B2 (en) | 2006-04-24 | 2007-04-20 | Lateral DMOS structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNU2006201148365U CN200969352Y (zh) | 2006-04-24 | 2006-04-24 | 横向dmos结构 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN200969352Y true CN200969352Y (zh) | 2007-10-31 |
Family
ID=38789106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNU2006201148365U Expired - Lifetime CN200969352Y (zh) | 2006-04-24 | 2006-04-24 | 横向dmos结构 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7535058B2 (zh) |
CN (1) | CN200969352Y (zh) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102738215A (zh) * | 2011-08-18 | 2012-10-17 | 成都芯源***有限公司 | 横向双扩散金属氧化物半导体场效应晶体管及其制造方法 |
CN104882479A (zh) * | 2014-02-28 | 2015-09-02 | 无锡华润上华半导体有限公司 | 一种hvpmos器件及其制造方法 |
CN105140303A (zh) * | 2014-05-30 | 2015-12-09 | 无锡华润上华半导体有限公司 | 结型场效应晶体管及其制备方法 |
CN107017305A (zh) * | 2016-01-28 | 2017-08-04 | 德州仪器公司 | Soi电力ldmos装置 |
CN112510093A (zh) * | 2020-12-01 | 2021-03-16 | 无锡先瞳半导体科技有限公司 | 一种生产nldmos器件的方法及nldmos器件 |
CN115084298A (zh) * | 2022-06-10 | 2022-09-20 | 电子科技大学 | 一种cmos图像传感器及其制备方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7851856B2 (en) * | 2008-12-29 | 2010-12-14 | Alpha & Omega Semiconductor, Ltd | True CSP power MOSFET based on bottom-source LDMOS |
US8853780B2 (en) * | 2012-05-07 | 2014-10-07 | Freescale Semiconductor, Inc. | Semiconductor device with drain-end drift diminution |
US9490322B2 (en) | 2013-01-23 | 2016-11-08 | Freescale Semiconductor, Inc. | Semiconductor device with enhanced 3D resurf |
JP6252022B2 (ja) * | 2013-08-05 | 2017-12-27 | セイコーエプソン株式会社 | 半導体装置 |
US9543379B2 (en) | 2014-03-18 | 2017-01-10 | Nxp Usa, Inc. | Semiconductor device with peripheral breakdown protection |
US9871135B2 (en) | 2016-06-02 | 2018-01-16 | Nxp Usa, Inc. | Semiconductor device and method of making |
US9905687B1 (en) | 2017-02-17 | 2018-02-27 | Nxp Usa, Inc. | Semiconductor device and method of making |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5242841A (en) * | 1992-03-25 | 1993-09-07 | Texas Instruments Incorporated | Method of making LDMOS transistor with self-aligned source/backgate and photo-aligned gate |
US5559044A (en) * | 1992-09-21 | 1996-09-24 | Siliconix Incorporated | BiCDMOS process technology |
US7365402B2 (en) * | 2005-01-06 | 2008-04-29 | Infineon Technologies Ag | LDMOS transistor |
-
2006
- 2006-04-24 CN CNU2006201148365U patent/CN200969352Y/zh not_active Expired - Lifetime
-
2007
- 2007-04-20 US US11/785,867 patent/US7535058B2/en not_active Expired - Fee Related
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102738215A (zh) * | 2011-08-18 | 2012-10-17 | 成都芯源***有限公司 | 横向双扩散金属氧化物半导体场效应晶体管及其制造方法 |
CN104882479A (zh) * | 2014-02-28 | 2015-09-02 | 无锡华润上华半导体有限公司 | 一种hvpmos器件及其制造方法 |
CN104882479B (zh) * | 2014-02-28 | 2018-02-27 | 无锡华润上华科技有限公司 | 一种hvpmos器件及其制造方法 |
CN105140303A (zh) * | 2014-05-30 | 2015-12-09 | 无锡华润上华半导体有限公司 | 结型场效应晶体管及其制备方法 |
CN105140303B (zh) * | 2014-05-30 | 2017-12-12 | 无锡华润上华科技有限公司 | 结型场效应晶体管及其制备方法 |
CN107017305A (zh) * | 2016-01-28 | 2017-08-04 | 德州仪器公司 | Soi电力ldmos装置 |
CN107017305B (zh) * | 2016-01-28 | 2021-10-01 | 德州仪器公司 | Soi电力ldmos装置 |
CN112510093A (zh) * | 2020-12-01 | 2021-03-16 | 无锡先瞳半导体科技有限公司 | 一种生产nldmos器件的方法及nldmos器件 |
CN115084298A (zh) * | 2022-06-10 | 2022-09-20 | 电子科技大学 | 一种cmos图像传感器及其制备方法 |
CN115084298B (zh) * | 2022-06-10 | 2024-02-02 | 电子科技大学 | 一种cmos图像传感器及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
US20070278569A1 (en) | 2007-12-06 |
US7535058B2 (en) | 2009-05-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: BCD Semiconductor Manufacturing Corporation Limited Assignor: BCD Semiconductor Manufacturing Ltd. Contract fulfillment period: 2008.5.27 to 2016.4.23 Contract record no.: 2008990000126 Denomination of utility model: Lateral DMOS structure Granted publication date: 20071031 License type: Exclusive license Record date: 20080613 |
|
LIC | Patent licence contract for exploitation submitted for record |
Free format text: EXCLUSIVE LICENCE; TIME LIMIT OF IMPLEMENTING CONTACT: 2008.5.27 TO 2016.4.23 Name of requester: SHANGHAI XINJIN SEMICONDUCTOR MANUFACTURING CO., Effective date: 20080613 |
|
EE01 | Entry into force of recordation of patent licensing contract |
Assignee: BCD Semiconductor Manufacturing Corporation Limited Assignor: BCD Semiconductor Manufacturing Ltd. Contract fulfillment period: 2007.11.30 to 2013.11.30 Contract record no.: 2008990000590 Denomination of utility model: Lateral DMOS structure Granted publication date: 20071031 License type: Exclusive license Record date: 20081008 |
|
LIC | Patent licence contract for exploitation submitted for record |
Free format text: EXCLUSIVE LICENSE; TIME LIMIT OF IMPLEMENTING CONTACT: 2007.11.30 TO 2013.11.30; CHANGE OF CONTRACT Name of requester: SHANGHAI XINJIN SEMICONDUCTOR MANUFACTURING CO., L Effective date: 20081008 |
|
CX01 | Expiry of patent term |
Granted publication date: 20071031 |
|
EXPY | Termination of patent right or utility model |