Photoresistance coating process and photoresistance coating apparatus thereof
Invention field
The present invention relates to a kind of photoresistance coating apparatus and method, particularly, relate to a kind of photoresistance coating apparatus and method of may command particle number.
Technical background
Generally being applied at present the photoresistance coating apparatus of large scale liquid crystal panel manufacturing process, as shown in Fig. 1 a, is to utilize a photoresistance apparatus for coating 10, move towards a first direction x in the mode of scanning, with photoresistance 2 even spray coating in the surface of substrate 1.With reference to Fig. 1 b, photoresistance apparatus for coating 10 comprises shower nozzle 11, and shower nozzle 11 central authorities have a slit 12, and photoresistance (agent) 2 promptly sprays out between this slit 12.Such design has seen Tokyo and has answered among the chemical industry photoresistance coating apparatus that company provided such as (TOK).
In photoresistance coating manufacturing process, the particulate that substrate and transmission equipment are entrained, and the particulate that produced of photoresistance coating apparatus itself all can be along with the time be accumulated in the photoresistance coating apparatus gradually, and may pollute substrate, the quality of reduction product.
Summary of the invention
The present invention promptly solves above-mentioned prior art problems for desire, and a kind of photoresistance coating apparatus is provided, and comprises a photoresistance apparatus for coating, a cleaning device and a platform.Wherein, this cleaning device comprises an insufflation unit and a suction unit, and this insufflation unit blows out a gas towards this substrate, so that described a plurality of particulate breaks away from this substrate, this suction unit is removed described a plurality of particulates of this substrate surface with pull of vacuum.Wherein, this insufflation unit comprises an inflatable mouth, and this inflatable mouth is a slit, and the width of this inflatable mouth is about 1~2 millimeter.Substrate is placed on the platform.When the coating photoresistance, cleaning device is removed the particulate of substrate surface earlier, and then, the photoresistance apparatus for coating evenly is sprayed on photoresistance the surface of substrate.
The present invention can clean substrate before the photoresistance coating in advance, therefore can reduce the particulate of substrate surface, promoted the quality of product.In addition, the present invention cleans the platform that is used to put substrate simultaneously, with the particulate in the further removing photoresistance coating apparatus, therefore, can effectively control the particle number within the photoresistance coating apparatus.
The accompanying drawing summary
Fig. 1 a is the synoptic diagram that shows the photoresistance coating apparatus of prior art;
Fig. 1 b is the synoptic diagram that shows the thin portion structure of photoresistance apparatus for coating;
Fig. 2 is the synoptic diagram that shows photoresistance coating apparatus of the present invention;
Fig. 3 a is the A-A direction sectional view of cleaning device in the displayed map 2;
Fig. 3 b is the upward view that shows cleaning device;
Fig. 3 c is the synoptic diagram that shows the cleaning situation of cleaning device;
Fig. 3 d is the synoptic diagram that shows the variation of cleaning device of the present invention;
Fig. 3 e is the synoptic diagram of the cleaning situation of the cleaning device among the displayed map 3d; And
Fig. 4 a, 4b, 4c and 4d are the synoptic diagram that shows cleaning of the present invention.
Symbol description
1~substrate, 2~photoresistance
3~particulate, 10~photoresistance apparatus for coating
11~shower nozzle, 12~slit
20~cleaning device 21,21 '~suction unit
22,22 '~insufflation unit, 23~air entry
24~inflatable mouth, 30~platform
40~manufacturing process cavity, 100~photoresistance coating apparatus
Detailed Description Of The Invention
With reference to Fig. 2, it has shown photoresistance coating apparatus 100 of the present invention, comprises a photoresistance apparatus for coating 10, a cleaning device 20, a platform 30 and a manufacturing process cavity 40.Photoresistance apparatus for coating 10, cleaning device 20 and platform 30 all are located among the manufacturing process cavity 40.Substrate 1 is placed on the platform 30.When coating photoresistance 2, cleaning device 20 is removed the particulate on substrate 1 surface earlier, and then, photoresistance apparatus for coating 10 evenly is sprayed on photoresistance 2 surface of substrate 1.
With reference to Fig. 3 a, it has shown the A-A direction sectional view of cleaning device 20 among Fig. 2.Cleaning device 20 comprises 21 and two insufflation unit of a suction unit (air-breathing cavity) (air blowing cavity) 22, and insufflation unit 22 is positioned at the both sides of suction unit 21.Suction unit 21 has air entry 23, and insufflation unit 22 has inflatable mouth 24.With reference to Fig. 3 b, it has shown the upward view of cleaning device 20, and air entry 23 and inflatable mouth 24 are the slit of strip, and its width is about 1~2 millimeter.With reference to Fig. 3 c, insufflation unit 22 connects an air blowing pipeline (not shown), when cleaning, insufflation unit 22 is from suction unit 21 both sides, blow out a gas (air) towards substrate 1, so that the particulate 3 on substrate 1 surface breaks away from these substrates 1, simultaneously, suction unit 21 with pull of vacuum with among the particulate 3 inhale unit 21.Suction unit 21 connects a vacuum line (not icon), and particulate 3 enters after the suction unit 21, can discharge this photoresistance coating apparatus 100 by this vacuum line.The blow gas pressure of this insufflation unit 22 is about 12~14 kPas.The pressure of inspiration(Pi) of this suction unit 21 is about-12~-14 kPas.Do the time spent when cleaning device 20, the pressure of inspiration(Pi) of suction unit 21 can be slightly larger than the blow gas pressure of insufflation unit 22.
With reference to Fig. 3 d, it has shown the variation of cleaning device of the present invention, and its characteristics are that suction unit 21 ' is positioned at the both sides of insufflation unit 22 '.With reference to Fig. 3 e, insufflation unit 22 ' connects an air blowing pipeline (not shown), when cleaning, insufflation unit 22 ' blows out a gas (air) towards substrate 1, so that the particulate 3 on substrate 1 surface breaks away from this substrate 1, simultaneously, suction unit 21 ' is in the both sides of this insufflation unit 22 ', with pull of vacuum with among the particulate 3 inhale unit 21 '.Suction unit 21 ' connects a vacuum line (not shown), and particulate 3 enters suction unit 21 ' afterwards, can discharge this photoresistance coating apparatus 100 by this vacuum line.
Though in the present invention's embodiment, suction unit and insufflation unit are cavity body structure, air entry and inflatable mouth are the slit of strip.Yet it does not limit embodiments of the present invention, and suction unit and insufflation unit also can be pipeline structure, and air entry and inflatable mouth also can be cavernous structure.Perhaps utilize suction unit to remove particulate merely, and omit this insufflation unit.
The operational scenario of photoresistance coating apparatus 100 of the present invention below is described.With reference to Fig. 4 a, at first, among this manufacturing process cavity 40, this photoresistance apparatus for coating 10 is positioned at a primary importance, and this cleaning device 20 is positioned at a second place.Then, as shown in Fig. 4 b, this cleaning device 20 moves to this primary importance along one second direction-x from this second place, and removes the particulate on this platform 30 simultaneously.With reference to Fig. 4 c, after cleaning device 20 had cleaned this platform 30 and has been positioned at this primary importance, substrate 1 was transferred and is placed on this platform 30.Then, as shown in Fig. 4 d, this photoresistance apparatus for coating 10 and this cleaning device 20 are simultaneously towards this first direction x, move to this second place from this primary importance, at this moment, this cleaning device 20 is positioned at the place ahead of this photoresistance apparatus for coating 10, and this cleaning device 20 is removed the particulate on this substrate 1 in advance, and this photoresistance apparatus for coating 10 sprays photoresistance 2 to this substrate 1 subsequently.After the photoresistance coating is finished, remove this substrate, this cleaning device 20 rests on this second place, and this photoresistance apparatus for coating 10 is got back to this primary importance along this second direction-x from this second place, and recovers the state of Fig. 4 a.
The present invention can clean substrate before the photoresistance coating in advance, therefore can reduce the particulate of substrate surface, promoted the quality of product.In addition, the present invention cleans the platform that is used to put substrate simultaneously, with the particulate in the further removing photoresistance coating apparatus, therefore, can effectively control the particle number within the photoresistance coating apparatus.
Though the present invention discloses as above with concrete preferred embodiment; right its is not in order to limit the present invention; any those of ordinary skills without departing from the spirit and scope of the present invention; still can make many changes and retouching, so protection scope of the present invention is as the criterion with the appended scope that claim was defined.