CN1816768A - 用在超薄玻璃显示应用中的玻璃产品 - Google Patents
用在超薄玻璃显示应用中的玻璃产品 Download PDFInfo
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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Abstract
本发明涉及用于制造活性基质液晶显示屏的基材产品。所述产品包括适于用作显示屏的显示基材。所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且表面光滑度允许在其上直接形成薄膜晶体管,无需现有的抛光和/或研磨步骤。所述产品也包括至少一种支撑基材,它可连接到显示基材上,且可以从显示器上拆除。
Description
相关申请
本申请要求于2003年7月3日提交的美国专利申请No.10/613972的优先权。
发明背景
1.发明领域
本发明总体上涉及玻璃基材,尤其涉及用在AMLCD显示器制造工艺中的玻璃基材产品。
2.技术背景
液晶显示器(LCD)是使用外部光源的非发射显示器。LCD是可以调节外部光源所发射的入射偏振光束的器件。LCD中的LC材料通过旋转入射偏振光来调节光。旋转的程度对应于LC材料中单个LC分子的机械取向。所述LC材料的机械取向容易通过施加外部电场来控制。通过认识一般的扭转向列(TN)液晶盒容易理解这种现象。
一般的TN液晶盒包括两种基材和置于其间的一层液晶材料。取向相差90°的偏振膜位于所述基材的外表面上。当所入射的偏振光经过偏振膜时,它在第一方向(例如水平或垂直方向)上变成线偏振光。当没有施加电场时,所述LC分子形成90°螺旋。当入射线偏振光横穿所述液晶盒时,它在液晶材料作用下旋转90°,并在第二方向(例如,垂直或水平方向)上偏振。由于光的偏振方向通过螺旋旋转后与第二膜的偏振方向一致,所述第二偏振膜允许所述光通过。当对液晶层施加电场时,LC分子的排列受到干扰,入射偏振光不能旋转。因此,所述光被第二偏振膜阻挡。以上所述液晶盒起光线阀门的作用,所述阀门通过施加电场来控制。本领域那些普通技术人员不难理解根据所施加的电场的性质,所述液晶盒也可以作为可变的光衰减器来操作。
活性基质LCD(AMLCD)的基质中通常包括几百万个上述液晶盒。再看AMLCD的结构,一个基材包括滤色片,相对的基材已知为活动片。所述活动片包括活动薄膜晶体管(TFT),它用于控制各液晶盒或子像素的电场。所述薄膜晶体管使用一般的半导体型工艺如溅射、CVD、光刻和蚀刻来制造。所述滤色片包括一系列置于其上的红色、蓝色和绿色有机染料,精确对应相对活动片的子像素电极区域。这样,颜色片上的各子像素与置于活动片上的晶体管控制电极排列成行,这是因为各子像素必须可以单独控制。一种寻找和控制各子像素的方式是将薄膜晶体管置于各子像素中。
以上所述基材玻璃的性质及其重要。在AMLCD器件制造中所用的玻璃基材的物理尺寸必须严格控制。美国专利No.3338696(Dockerry)和3682609(Dockerty)所述熔合工艺是少数几个能传送基材玻璃的方法之一,它无需高成本的后基材形成磨光操作,如磨合、研磨和抛光。而且,由于活动片使用以上半导体型工艺制造,所述基材必须是热稳定和化学稳定的。热稳定性(也已知为热压缩性或热收缩性)取决于具体玻璃组合物的固有粘度性质(如其应变点所示)以及玻璃片的受热史,它是制造工艺的应变量。化学稳定性是指对TFT制造工艺中所用各种蚀刻溶液的耐受性。
目前需要越来越大的显示尺寸。这种需求以及规模生产带来的利润促使AMLCD制造商制造更大尺寸的基材。但是,这同时导致出现若干问题。第一,较大显示器存在重量增大的问题。虽然消费者需要更大的显示器,但是同时也需要更轻和更薄的显示器。不幸的是,若玻璃的厚度降低,则玻璃基材会出现弹性下垂的问题。当增大玻璃基材的尺寸以制造更大显示器时,这种弹性下垂会更加严重。目前,由于玻璃下垂的存在,TFT制造技术难以制造薄到0.5mm的熔合玻璃。更薄、更大的基材对制造领域的机器人技术在加工站之间装载、收回以及将玻璃分隔置于盒子中来运输玻璃的能力形成不利的影响。在某些条件下,薄的玻璃更容易损坏,增大了在加工过程中破裂的可能性。
在已知的一个方式中,在TFT制造过程中使用厚的显示器玻璃基材。在玻璃基材上放置活动层之后,通过研磨和/或抛光来使所述玻璃基材的相对面变薄。这种方式的一个缺点是它需要额外的研磨/抛光步骤。所述额外步骤的成本将是很高的。
因此,很需要提供一种超薄的熔合玻璃基材,它允许在其上直接形成薄膜晶体管,无需对显示器基材进行额外的抛光和/或研磨。目前的玻璃基材厚度为0.6-0.7mm。通过将基材的厚度降低至0.3mm,可以使重量降低50%。但是,超薄薄膜的下垂程度却不能接受,并且容易破裂。所需要的是可以在目前TFT制造工艺中使用的超薄玻璃基材产品,并且没有上述问题。
发明概述
本发明解决了上述需求。本发明提供一种超薄熔合玻璃基材,它可以用在常规的TFT制造工艺中。本发明所述玻璃基材产品的光滑度允许直接形成薄膜晶体管,无需进行抛光或研磨步骤。本发明提供厚度为0.4-0.1mm之间的超薄薄膜基材。本发明一方面是用于制造活性基质液晶显示屏的基材产品。所述产品包括适于用作显示屏的显示基材。所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。所述产品也包括至少一层支撑基材,它可连接到显示基材上,且可从显示基材上拆卸。
另一方面,本发明包括制造基材产品的方法,所述基材产品用于制造活性基质液晶显示屏。所述方法包括形成适于用作显示屏的显示基材。所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。所述显示基材连接至少一层支撑基材。
另一方面,本发明包括制造活性基质液晶显示屏的方法。所述方法包括形成许多适于用作显示屏的显示基材。各显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。各显示基材连接支撑基材。活性基质液晶显示屏使用第一显示基材和第二显示基材制造。之后,除去连接到各显示基材上的支撑基材。
另一方面,本发明包括具有第一显示基材的活性基质液晶显示屏。所述第一显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。所述显示屏也包括第二显示基材。所述第二显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。液晶材料置于所述第一显示基材和第二显示基材之间。
以下详细说明了本发明的其它特征和优点,通过本说明书(包括以下说明书、权利要求书以及附图)以及按照本文所述实施本发明,这些特征和优点对本领域那些技术人员来说显而易见。
应理解,以上一般描述和以下详细说明仅用于示例性说明本发明,并提供一个理解本发明的性质和特征的总览或框架。所述附图用于进一步理解本发明,并作为一部分归入说明书中。所述附图说明了本发明的各种实施方式,并且和说明书一起用于解释本发明的原理和操作。
附图简要说明
图1是本发明第一实施方式中基材产品的简图;
图2是本发明第二实施方式中基材产品的简图;
图3是本发明第三实施方式中基材产品的简图;
图4是本发明第四实施方式中基材产品的简图;
图5是图1所示基材产品的另一实施方式的简图;
图6是图1所示显示基材上沉积TFT晶体管的详图;
图7A-7B是说明本发明TFT工艺的详图。
详述
现在详细参考本发明的示例性实施方式,其例子在附图中加以说明。无论何处,附图中相同的数字用来表示相同或类似的部件。本发明所述基材产品的示例性实施方式如图1所示,并用数字10表示。
在本发明中,本发明涉及用于制造活性基质液晶显示屏的基材产品。所述产品包括适于用作显示屏的显示基材。所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。所述产品也包括至少一层支撑基材,它可连接到显示基材上,且可从显示基材上拆卸。因此,本发明提供一种超薄熔合玻璃基材,它可以用在目前技术现状下的TFT制造工艺中。所述显示基材的光滑度允许直接形成薄膜晶体管,无需进行抛光或研磨步骤。
在本文和图1中公开了本发明第一实施方式的基材产品10的简图。基材产品10是玻璃-玻璃层压片,其总厚度为0.6-0.7mm。本领域那些技术人员将理解这一范围与常规TFT加工技术相兼容。产品10包括显示基材20和支撑基材30。显示基材20的厚度为0.1-0.4mm。支撑基材30的厚度取决于显示基材的厚度以及产品10的总厚度。
显示基材20可以是任意适于用在LCD显示屏中的基材类型,只要所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤。参考美国专利No.5374595和美国专利No.6060168,其内容整体参考引用于此,用于更详细地说明包括显示基材20的玻璃的组成。
对在相关技术领域中的普通技术人员来说,在完成TFT工艺之后根据用于分离支撑基材30和显示基材20的方法对本发明支撑基材30进行修改或替换是显而易见的。例如,支撑基材30可以包含适于化学分解的牺牲性非显示玻璃组合物(丢弃的玻璃),不会对显示基材产生损伤。在另一实施方式中,支撑基材30可以包含相对较软的非显示玻璃组合物,它可以通过研磨/抛光来除去,并且不会对显示基材产生损伤。本领域那些普通技术人员将意识到可以使用各种相对便宜的玻璃来制造支撑层30。
具有基本上不存在缺陷且光滑度相当于抛光表面的层压基材产品10可通过以下步骤制成。第一,熔合两份不含碱金属的不同组合物批料。用于显示玻璃的批料的应变点必须高于600℃,在酸性溶液中相对不溶。就氧化物中阳离子百分数而言,支撑玻璃基材的批料由以下物质组成:
SiO2 | 27-47 | B2O3 | 0-40 | SrO和/或BaO | 0-10 |
Al2O3 | 15-43 | MgO | 0-4 | ZnO | 0-7 |
CaO | 5-25 | MgO+SrO+BaO+ZnO | 0-15 |
就氧化物中的阳离子百分数而言,一种支撑玻璃基材的候选材料由SiO2 41、Al2O3 18、B2O3 32和CaO 9组成。
参考美国专利No.4102664和美国专利No.5342426,其内容整体参考引用于此,用于更加详细地说明制造层压体的方法。
与显示玻璃基材相比,所述支撑玻璃在同一酸溶液中的可溶性至少高1000倍,并且从其固化点到室温的线性热膨胀系数约为5×10-7/℃。所述支撑玻璃的应变点也高于600℃,相当接近于显示玻璃基材的应变点。所述支撑基材的特征在于,在0-300℃的温度范围内,其线性热膨胀系数为20-60×10-7/℃。
所述熔融的批料同时加在一起,在流体状态下形成层压片,其中,所述显示基材基本上完全包围在支撑玻璃中。所述层在熔融物呈流体形式的温度下熔合,形成其中没有缺陷的界面。冷却所述层压片,固化呈流体状态的玻璃。
如上所述,在完成TFT工艺之后,用酸性溶液来溶解所述支撑玻璃。所得显示玻璃的表面(已经除去支撑玻璃)基本上没有缺陷,其光滑度相当于抛光的玻璃表面。在层压片到达其目的地之后,将所述可溶玻璃(丢弃的玻璃)溶解在酸性浴中。这样,从所述层压片上切下的片便于堆叠,并运送到LCD显示器制造商处。
所述两块玻璃的液相线温度较好低于层压所进行的温度,防止在所选成形工艺过程中变得不透明。
最后在常规实践中,所述层压片可以退火,避免出现任何不利的应变;虽然冷却的层压片可以再次加热,之后进行退火,但是最好是在冷却步骤中进行退火。如上所述,本发明玻璃的应变点足够高,在形成Si器件中无需进行退火。
在本文和图2中公开了本发明基材产品10的另一实施方式。同样,基材产品10的总厚度为0.6-0.7mm,它与目前TFT加工技术兼容。显示基材20的厚度为0.1-0.4mm。支撑基材30的厚度取决于显示基材的厚度以及产品10的总厚度。在这一实施方式中,支撑基材30使用粘合剂40粘到显示基材20上。粘合剂40是一种高温焊剂,能耐受多Si工艺中的高温(达到450℃)。而且,支撑基材30和粘合剂40是一种耐化学、机械和光环境应变(在TFT工艺中出现)的类型。参考美国专利5281560,其内容整体参考引用于此,用于详细说明可能的粘合剂。
在以上第一实施方式的讨论中公开了显示基材20和支撑基材30的组成。显示基材20和支撑基材30均可以使用熔融拉伸工艺制造。参考美国专利No.3338696和美国专利No.3682609,其内容整体参考引用于此,用于更加详细地说明使用熔融拉伸工艺制造玻璃基材的***和方法。使用更高齿数比驱动以及复合拉坯辊,所述熔融拉伸技术可以制造厚度约为100微米(0.1mm)的玻璃基材。使用熔融玻璃作为支撑基材的一个优点就是其平面度好。所述表面的平面度很重要,这是因为它使TFT工艺中光刻步骤中产生的聚焦误差最小。此外,支撑基材30的线性热膨胀系数(CTE)满足这种显示玻璃。若所述基材具有不同的CTE,则产品会卷曲。使用熔融拉伸工艺的另一优点在于能制造弹性模量更高的支撑基材。
上述第二实施方式具有和第一实施方式相同的优点。基材产品10的总厚度、重量以及下垂特征均与目前TFT工艺兼容。使用牺牲性支撑层30能制造更轻和更薄的显示屏。
参见图3,公开了本发明另一实施方式。在该实施方式中,支撑基材30是具有孔32的熔融玻璃片,所述孔垂直钻透基材的表面。该孔的大小和数量取决于用于将产品10从加工站分离的剥离机制。在一个实施方式中,所述剥离机制使用由软的非研磨材料如Teflon制得的顶升杆(lifting pin)。在另一实施方式中,所述剥离机制使用气体或液体来提升基材。所述支撑基材30的物理构造也包括起皱或“蛋篓”图案。支撑基材30也可以包含可回收的玻璃。在加工之后,基材30可以研磨成碎玻璃,并使用以上所述制造技术之一再次形成。基材30也可以重复使用,无需研磨成碎玻璃。
在另一实施方式中,支撑基材30包括围绕显示基材20的边缘。在这一实施方式中,可以通过孔32对显示基材20施加真空,使产品10在加工过程中保持在位。在这一实施方式中,不一定要使用粘合剂。但是,若没有施加粘合剂,在支撑基材30的表面上要施涂类似金刚石的涂层(DLC),在基材30的表面上是显示基材20。所述DLC有助于热量分布,它是防划伤的,并且在加工之后容易剥离显示基材20。在这一实施方式中,可以施加气体或液体来剥离显示基材20。
在本文和图4中公开了本发明的另一种实施方式。基材10包括显示基材20,在其两侧均涂布有丢弃的玻璃基材300和302。这种实施方式提供了对显示基材20的额外保护。在进行TFT加工和配置之前,可以除去一层支撑层。在TFT加工之后,可以除去第二层,并将塑料偏振膜施加到显示基材20的背面。如上所述,所述丢弃玻璃的性质必须和TFT工艺条件相容。
参见图5,公开了基材产品10的另一实施方式。这种实施方式类似于图1所示的实施方式,其中,基材产品10是包括显示基材20和支撑基材30的层压片。但是,产品10可以在其上具有预加工层310时运送到LCD制造商处。层310包括置于显示基材20上的二氧化硅层312。硅层314置于二氧化硅层312上。所述两层均可以使用化学气相沉积(CVD)技术来制得。这一实施方式的优点通过以下讨论将显而易见。
参见图6,公开了活动基材上TFT的截面图。本发明所述活动基材100包括置于支撑基材30上的显示基材20。使用图5中所用的数字标号,绝缘二氧化硅层312置于显示基材20上。由半导体(Si)膜的活动层314置于绝缘层312上。将门绝缘层置于活性层314上。门400置于活性区域中央的门绝缘体320上。源极316和漏极318在活性区域上形成。在操作过程中,当在晶体管处施加电势时,电流从源极316流到漏极318。通过耦联到漏极318的电流控制像素活动。图6所示TFT晶体管100的构型用于说明的目的,并且本发明不应限制于这种类型的晶体管。因此,图6说明了使用牺牲性支撑层30,在更轻和更薄的显示基材(厚度为0.1-0.4mm)上制造TFT的情况。本领域那些技术人员将理解基材产品10的总厚度、重量和下垂特征均与常规TFT工艺相容。因此,可以在不明显改变TFT制造工艺的情况下。一旦TFT工艺完成,所述牺牲层可以使用以上所述技术之一除去。
图7A和7B是说明本发明活性基质液晶显示屏的制造方法的详图。如图7A所示,使用基材产品10和基材产品12制造活性基质液晶显示屏,它们均按照本发明的原理制造。将许多薄膜晶体管置于基材产品10的显示基材200上,制造活性基材。将滤色片置于产品12的显示基材202上,制得滤色片基材。之后,将液晶材料50置于活性基材200和滤色片基材202之间,并用合适的材料密封。如图7B所示,除去连接到各显示基材(200、202)上的支撑基材30。为了说明本发明的优点,注意到若显示基材200和显示基材202的厚度各自为0.3mm,所得显示屏700将比常规AMLCD显示屏轻50%,这是因为常规显示基材的厚度为0.6-0.7mm。若显示基材200和显示基材202的厚度各自为0.1mm,则所得显示屏700将比常规AMLCD显示屏轻约80%。
对本领域那些技术人员来说,在不背离本发明的精神和范围的条件下本发明的各种修改和替换将是显而易见的。因此,本发明包括在权利要求书及其等价内容范围内的修改和替换方式。
Claims (41)
1.一种用于制造活性基质液晶显示屏的基材产品,所述产品包括:
适于用作显示屏的显示基材,所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤;
至少一层支撑基材,它可连接到显示基材上,且可从显示器上拆除。
2.如权利要求1所述的产品,其特征在于,所述显示基材的厚度为0.1-0.4mm。
3.如权利要求1所述的产品,其特征在于,所述产品的总厚度小于或等于0.7mm。
4.如权利要求1所述的产品,其特征在于,所述产品是玻璃-玻璃层压片,所述至少一层支撑基材包含适于化学分解的牺牲性非显示玻璃组合物,之后不会损伤所述显示基材。
5.如权利要求1所述的产品,其特征在于,所述产品是玻璃-玻璃层压片,所述至少一层支撑基材包含可以通过研磨/抛光除去的相对较软的非显示玻璃组合物,之后不会损伤所述显示基材。
6.如权利要求1所述的产品,其特征在于,所述至少一层支撑基材是可回收的玻璃基材,它通过粘合剂连接到显示基材上。
7.如权利要求1所述的产品,其特征在于,所述粘合剂和可回收的玻璃基材是一种在TFT加工步骤中耐热、化学、机械和光环境应变的类型。
8.如权利要求6所述的产品,其特征在于,所述显示基材和可回收的玻璃基材是熔合玻璃基材。
9.如权利要求8所述的产品,其特征在于,所述至少一层支撑基材的特点在于相对显示基材来说具有高弹性模量。
10.如权利要求8所述的产品,其特征在于,所述可回收的玻璃基材包括类似于金刚石的涂层(DLC),所述DLC在可回收的玻璃基材与显示基材之间。
11.如权利要求1所述的产品,其特征在于,所述至少一层支撑基材的特点在于相对显示基材来说密度低。
12.如权利要求1所述的产品,其特征在于,所述至少一层支撑基材包括起皱的表面。
13.如权利要求1所述的产品,其特征在于,所述至少一层支撑基材包括其上具有蛋篓图案的表面。
14.如权利要求1所述的产品,其特征在于,所述至少一层支撑基材包括许多孔。
15.如权利要求1所述的产品,其特征在于,所述至少一层支撑基材包括置于显示基材第一面上的第一支撑基材以及置于显示基材第二面上的第二支撑基材。
16.如权利要求15所述的产品,其特征在于,所述第一支撑基材和第二支撑基材包含可以通过研磨/抛光除去的相对较软的非显示玻璃组合物,之后不会损伤所述显示基材。
17.如权利要求15所述的产品,其特征在于,所述第一支撑基材包含可以通过研磨/抛光除去的相对较软的非显示玻璃组合物,之后不会损伤所述显示基材;第二支撑基材包括硅层。
18.如权利要求17所述的产品,其特征在于,所述第二基材包括置于显示基材上的SiO2层和置于SiO2层上的硅层。
19.一种制造基材产品的方法,所述基材产品用于制造活性基质液晶显示屏,所述方法包括:
形成适于用作显示屏的显示基材,所述显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤;
将至少一层支撑基材连接到显示基材上。
20.如权利要求19所述的方法,其特征在于,所述形成步骤包括熔融第一玻璃组合物,形成第一熔融玻璃材料。
21.如权利要求20所述的方法,其特征在于,所述连接步骤还包括:
熔融至少一种第二玻璃组合物,形成至少一种第二熔融玻璃材料;
将第一熔融玻璃材料和至少一种第二熔融玻璃材料混合,所述第一熔融玻璃材料和所述至少一种第二熔融玻璃材料均处于液态,由此制得显示基材层和至少一层支撑基材层;
在显示基材层和至少一层支撑基材层均为流体的温度下熔融显示基材层和至少一层支撑基材层,在其中形成没有缺陷的界面;
将熔融的显示基材层和至少一层支撑基材层冷却,由此形成玻璃-玻璃层压产品。
22.如权利要求21所述的方法,其特征在于,所述至少一层支撑基材包含置于化学分解的牺牲性非显示玻璃组合物,之后不会损伤所述显示基材。
23.如权利要求21所述的方法,其特征在于,所述至少一层支撑基材包含可以通过研磨/抛光除去的相对较软的非显示玻璃组合物,之后不会损伤所述显示基材。
24.如权利要求19所述的方法,其特征在于,所述至少一层支撑基材包括置于显示基材第一面上的第一支撑基材以及置于显示基材第二面上的第二支撑基材。
25.如权利要求24所述的方法,其特征在于,所述第一支撑基材和第二支撑基材包含可以通过研磨/抛光除去的相对较软的非显示玻璃组合物,之后不会损伤所述显示基材。
26.如权利要求19所述的方法,其特征在于,所述连接步骤还包括:
将粘合剂施加到显示基材上;
用加入其中的粘合剂将至少一层支撑基材连接到显示基材上;和
固化所述粘合剂。
27.如权利要求26所述的方法,其特征在于,所述粘合剂和可回收的玻璃基材是一种在TFT加工步骤中耐热、化学、机械和光环境应变的类型。
28.如权利要求26所述的方法,其特征在于,所述方法还包括在施涂粘合剂的步骤之前将类似于金刚石的涂层置于至少一层支撑基材上。
29.一种制造活性基质液晶显示屏的方法。所述方法包括:
形成许多适于用作显示屏的显示基材,各显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤;
将支撑基材连接到各显示基材上;
使用许多显示基材的第一显示基材和许多显示基材的第二显示基材制造活性基质液晶显示屏;
除去连接到第一显示基材和第二显示基材上的支撑基材。
30.如权利要求29所述的方法,其特征在于,所述制造步骤还包括:
将许多薄膜晶体管置于第一显示基材上;
将滤色片置于第二显示基材上,所述滤色片包括用于第一显示基材上各薄膜晶体管的红色子像素、绿色子像素和蓝色子像素;
密封所述第一显示基材和第二显示基材。
31.如权利要求29所述的方法,其特征在于,所述方法还包括将偏振片施加到活性基质液晶显示屏上。
32.如权利要求29所述的方法,其特征在于,所述连接步骤还包括:
将第一玻璃组合物熔融,形成第一熔融的玻璃材料;
将第二玻璃组合物熔融,形成第二熔融的玻璃材料;
将第一熔融玻璃材料和至少一种第二熔融玻璃材料混合,所述第一熔融玻璃材料和所述至少一种第二熔融玻璃材料均处于液态,由此制得显示基材层和至少一层支撑基材层;
在显示基材层和至少一层支撑基材层均为流体的温度下熔合显示基材层和至少一层支撑基材层,在其中形成没有缺陷的界面;
将熔合的显示基材层和至少一层支撑基材层冷却,由此形成玻璃-玻璃层压产品。
33.如权利要求32所述的方法,其特征在于,所述除去支撑基材的步骤包括在不损伤玻璃显示基材的条件下化学分解支撑基材。
34.如权利要求32所述的方法,其特征在于,所述除去支撑基材的步骤包括在不损伤玻璃显示基材的条件下研磨和/或抛光所述支撑基材。
35.如权利要求29所述的方法,其特征在于,所述连接步骤还包括:
将粘合剂施加到显示基材上;
用加入其中的粘合剂将至少一层支撑基材连接到显示基材上;和
固化所述粘合剂。
36.如权利要求35所述的方法,其特征在于,所述除去支撑基材的步骤包括在不损伤玻璃显示基材的条件下化学分解所述粘合剂。
37.如权利要求35所述的方法,其特征在于,所述除去支撑基材的步骤包括在显示基材和支撑基材之间施加机械力来破坏所述粘合力。
38.一种活性基质液晶显示屏,它包括:
第一显示基材,所述第一显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤;
第二显示基材,所述第二显示基材的厚度小于或等于0.4mm,其组成基本上不含碱,并且其表面光滑度允许在其上直接形成薄膜晶体管,无需在此前进行抛光和/或研磨步骤;
置于所述第一显示基材和第二显示基材之间的液晶材料。
39.如权利要求38所述的显示屏,其特征在于,所述第一显示基材包括置于其上的薄膜晶体管,所述第二显示基材包括置于其上的滤色片,所述滤色片包括用于第一显示基材上各薄膜晶体管的红色子像素、绿色子像素和蓝色子像素
40.如权利要求38所述的显示屏,其特征在于,所述第一显示基材的厚度基本上在0.4-0.1mm之间。
41.如权利要求38所述的显示屏,其特征在于,所述第二显示基材的厚度基本上在0.4-0.1mm之间。
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102637577A (zh) * | 2011-04-02 | 2012-08-15 | 京东方科技集团股份有限公司 | 一种显示器件的制备方法 |
CN102934177A (zh) * | 2009-09-09 | 2013-02-13 | 艾默生电气公司 | 具有加强肋的实芯玻璃绝缘支撑密封件 |
CN103501998A (zh) * | 2011-05-06 | 2014-01-08 | 康宁股份有限公司 | 用于半导体器件的层压结构 |
CN104919591A (zh) * | 2012-08-22 | 2015-09-16 | 康宁股份有限公司 | 挠性玻璃基材和包括挠性玻璃基材与载体基材的基材堆叠件的加工 |
CN105658594A (zh) * | 2013-03-15 | 2016-06-08 | 康宁股份有限公司 | 玻璃片的整体退火 |
Families Citing this family (77)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3555844B2 (ja) * | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
US6969198B2 (en) * | 2002-11-06 | 2005-11-29 | Nissan Motor Co., Ltd. | Low-friction sliding mechanism |
JP3891433B2 (ja) * | 2003-04-15 | 2007-03-14 | 日産自動車株式会社 | 燃料噴射弁 |
EP1479946B1 (en) * | 2003-05-23 | 2012-12-19 | Nissan Motor Co., Ltd. | Piston for internal combustion engine |
EP1482190B1 (en) * | 2003-05-27 | 2012-12-05 | Nissan Motor Company Limited | Rolling element |
JP2005008851A (ja) * | 2003-05-29 | 2005-01-13 | Nissan Motor Co Ltd | 硬質炭素薄膜付き機械加工工具用切削油及び硬質炭素薄膜付き機械加工工具 |
US20060207967A1 (en) | 2003-07-03 | 2006-09-21 | Bocko Peter L | Porous processing carrier for flexible substrates |
JP4863152B2 (ja) * | 2003-07-31 | 2012-01-25 | 日産自動車株式会社 | 歯車 |
WO2005014761A2 (ja) * | 2003-08-06 | 2005-02-17 | Nissan Motor Co., Ltd. | 低摩擦摺動機構、低摩擦剤組成物及び摩擦低減方法 |
JP2005054617A (ja) * | 2003-08-08 | 2005-03-03 | Nissan Motor Co Ltd | 動弁機構 |
JP4973971B2 (ja) * | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
JP4117553B2 (ja) * | 2003-08-13 | 2008-07-16 | 日産自動車株式会社 | チェーン駆動装置 |
US7771821B2 (en) * | 2003-08-21 | 2010-08-10 | Nissan Motor Co., Ltd. | Low-friction sliding member and low-friction sliding mechanism using same |
EP1508611B1 (en) * | 2003-08-22 | 2019-04-17 | Nissan Motor Co., Ltd. | Transmission comprising low-friction sliding members and transmission oil therefor |
US7635521B2 (en) * | 2006-02-10 | 2009-12-22 | Corning Incorporated | Glass compositions for protecting glass and methods of making and using thereof |
US8007913B2 (en) * | 2006-02-10 | 2011-08-30 | Corning Incorporated | Laminated glass articles and methods of making thereof |
TWI319211B (en) * | 2006-12-13 | 2010-01-01 | Univ Nat Taiwan | Mobility enhancement of thin film transistor by strain technology |
KR100889625B1 (ko) | 2007-07-19 | 2009-03-20 | 삼성모바일디스플레이주식회사 | 접합방법 및 그를 이용한 유기전계발광표시장치의 제조방법 |
US20090258187A1 (en) * | 2008-04-10 | 2009-10-15 | Michael Donavon Brady | Protective coating for glass manufacturing and processing into articles |
US8673163B2 (en) * | 2008-06-27 | 2014-03-18 | Apple Inc. | Method for fabricating thin sheets of glass |
KR101285636B1 (ko) * | 2008-06-27 | 2013-07-12 | 엘지디스플레이 주식회사 | 플렉서블 액정표시장치의 제조방법 |
US7810355B2 (en) | 2008-06-30 | 2010-10-12 | Apple Inc. | Full perimeter chemical strengthening of substrates |
US9063605B2 (en) | 2009-01-09 | 2015-06-23 | Apple Inc. | Thin glass processing using a carrier |
US7918019B2 (en) * | 2009-01-09 | 2011-04-05 | Apple Inc. | Method for fabricating thin touch sensor panels |
EP2404228B1 (en) | 2009-03-02 | 2020-01-15 | Apple Inc. | Techniques for strengthening glass covers for portable electronic devices |
EP2422218A4 (en) * | 2009-04-20 | 2013-12-18 | Integrated Sensors Llp | DETECTOR FOR IONIZING PARTICLE RADIATION ON PLASMATE ROBUST |
KR100947706B1 (ko) * | 2009-08-11 | 2010-03-16 | 주식회사 엔티에스 | 본딩 유닛과 연마 유닛을 포함하는 기판 가공 장치 |
US9847243B2 (en) | 2009-08-27 | 2017-12-19 | Corning Incorporated | Debonding a glass substrate from carrier using ultrasonic wave |
US9778685B2 (en) | 2011-05-04 | 2017-10-03 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9213451B2 (en) | 2010-06-04 | 2015-12-15 | Apple Inc. | Thin glass for touch panel sensors and methods therefor |
JP5732987B2 (ja) * | 2010-08-13 | 2015-06-10 | 富士ゼロックス株式会社 | 表示媒体の製造方法、表示媒体、及び表示装置 |
US10189743B2 (en) | 2010-08-18 | 2019-01-29 | Apple Inc. | Enhanced strengthening of glass |
US8824140B2 (en) | 2010-09-17 | 2014-09-02 | Apple Inc. | Glass enclosure |
US8950215B2 (en) | 2010-10-06 | 2015-02-10 | Apple Inc. | Non-contact polishing techniques for reducing roughness on glass surfaces |
US10781135B2 (en) | 2011-03-16 | 2020-09-22 | Apple Inc. | Strengthening variable thickness glass |
US9725359B2 (en) | 2011-03-16 | 2017-08-08 | Apple Inc. | Electronic device having selectively strengthened glass |
US9128666B2 (en) | 2011-05-04 | 2015-09-08 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9315412B2 (en) | 2011-07-07 | 2016-04-19 | Corning Incorporated | Surface flaw modification for strengthening of glass articles |
US9944554B2 (en) | 2011-09-15 | 2018-04-17 | Apple Inc. | Perforated mother sheet for partial edge chemical strengthening and method therefor |
US9516149B2 (en) | 2011-09-29 | 2016-12-06 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US10144669B2 (en) | 2011-11-21 | 2018-12-04 | Apple Inc. | Self-optimizing chemical strengthening bath for glass |
US10133156B2 (en) | 2012-01-10 | 2018-11-20 | Apple Inc. | Fused opaque and clear glass for camera or display window |
US8773848B2 (en) | 2012-01-25 | 2014-07-08 | Apple Inc. | Fused glass device housings |
US10543662B2 (en) | 2012-02-08 | 2020-01-28 | Corning Incorporated | Device modified substrate article and methods for making |
KR102173801B1 (ko) | 2012-07-12 | 2020-11-04 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치, 및 표시 장치의 제작 방법 |
US9946302B2 (en) * | 2012-09-19 | 2018-04-17 | Apple Inc. | Exposed glass article with inner recessed area for portable electronic device housing |
US10086584B2 (en) | 2012-12-13 | 2018-10-02 | Corning Incorporated | Glass articles and methods for controlled bonding of glass sheets with carriers |
TWI617437B (zh) | 2012-12-13 | 2018-03-11 | 康寧公司 | 促進控制薄片與載體間接合之處理 |
US9340443B2 (en) | 2012-12-13 | 2016-05-17 | Corning Incorporated | Bulk annealing of glass sheets |
US10014177B2 (en) | 2012-12-13 | 2018-07-03 | Corning Incorporated | Methods for processing electronic devices |
KR101468881B1 (ko) * | 2013-04-15 | 2014-12-05 | 이엘케이 주식회사 | 캐리어 기판 및 이를 이용한 터치스크린 패널의 제조방법 |
TW201500306A (zh) * | 2013-05-22 | 2015-01-01 | Corning Inc | 利用玻璃載體處理可撓性薄片玻璃基板之方法 |
US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
KR20160023819A (ko) | 2013-06-20 | 2016-03-03 | 쇼오트 글라스 테크놀로지스 (쑤저우) 코퍼레이션 리미티드. | 지지 기판 상의 얇은 유리의 접합된 물품, 그 준비 방법 및 용도 |
KR102087193B1 (ko) | 2013-09-09 | 2020-04-16 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치의 제조 방법 및 터치 패널의 제조 방법 |
US10510576B2 (en) | 2013-10-14 | 2019-12-17 | Corning Incorporated | Carrier-bonding methods and articles for semiconductor and interposer processing |
KR20150057806A (ko) | 2013-11-20 | 2015-05-28 | 삼성디스플레이 주식회사 | 표시 패널의 제조 방법 |
CN108594342B (zh) | 2013-12-19 | 2020-09-25 | 康宁股份有限公司 | 用于显示器应用的织构化表面 |
US9488857B2 (en) | 2014-01-10 | 2016-11-08 | Corning Incorporated | Method of strengthening an edge of a glass substrate |
CN106132688B (zh) | 2014-01-27 | 2020-07-14 | 康宁股份有限公司 | 用于薄片与载体的受控粘结的制品和方法 |
US9886062B2 (en) | 2014-02-28 | 2018-02-06 | Apple Inc. | Exposed glass article with enhanced stiffness for portable electronic device housing |
CN103943033B (zh) | 2014-04-02 | 2017-02-15 | 京东方科技集团股份有限公司 | 一种透明显示设备 |
CN107077802B (zh) | 2014-04-04 | 2019-11-08 | 康宁股份有限公司 | 用于改善粘附的玻璃表面处理 |
CN106457758B (zh) | 2014-04-09 | 2018-11-16 | 康宁股份有限公司 | 装置改性的基材制品及其制备方法 |
KR20170041248A (ko) | 2014-08-12 | 2017-04-14 | 코닝 인코포레이티드 | Esd를 감소시키기 위한 디스플레이 유리를 위한 유기물 표면 처리 |
WO2016044360A1 (en) * | 2014-09-17 | 2016-03-24 | Corning Incorporated | Curved liquid crystal display panel and process of manufacture |
US10562272B2 (en) | 2014-12-08 | 2020-02-18 | Corning Incorporated | Laminated glass article with low compaction and method for forming the same |
EP3297824A1 (en) | 2015-05-19 | 2018-03-28 | Corning Incorporated | Articles and methods for bonding sheets with carriers |
US11905201B2 (en) | 2015-06-26 | 2024-02-20 | Corning Incorporated | Methods and articles including a sheet and a carrier |
TWI551440B (zh) * | 2015-07-17 | 2016-10-01 | 群創光電股份有限公司 | 基板單元、元件基板及顯示裝置的製造方法 |
US20200307173A1 (en) * | 2016-06-07 | 2020-10-01 | Corning Incorporated | Methods for producing laminate glass articles |
TW201825623A (zh) | 2016-08-30 | 2018-07-16 | 美商康寧公司 | 用於片材接合的矽氧烷電漿聚合物 |
TWI810161B (zh) | 2016-08-31 | 2023-08-01 | 美商康寧公司 | 具以可控制式黏結的薄片之製品及製作其之方法 |
WO2018117692A1 (ko) | 2016-12-21 | 2018-06-28 | 주식회사 엘지화학 | 곡면 접합 유리의 제조 방법 및 곡면 접합 유리 |
WO2019036710A1 (en) | 2017-08-18 | 2019-02-21 | Corning Incorporated | TEMPORARY BINDING USING POLYCATIONIC POLYMERS |
CN111615567B (zh) | 2017-12-15 | 2023-04-14 | 康宁股份有限公司 | 用于处理基板的方法和用于制备包括粘合片材的制品的方法 |
JP7006793B2 (ja) | 2018-08-01 | 2022-02-10 | 株式会社ニコン | ミスト成膜装置、並びにミスト成膜方法 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4203750A (en) * | 1979-04-05 | 1980-05-20 | Corning Glass Works | Manufacture of flat glass |
US4824808A (en) * | 1987-11-09 | 1989-04-25 | Corning Glass Works | Substrate glass for liquid crystal displays |
GB8827277D0 (en) * | 1987-12-16 | 1988-12-29 | Ici Plc | Process for producing liquid crystal devices |
JP3112106B2 (ja) * | 1991-10-11 | 2000-11-27 | キヤノン株式会社 | 半導体基材の作製方法 |
JP3378280B2 (ja) * | 1992-11-27 | 2003-02-17 | 株式会社東芝 | 薄膜トランジスタおよびその製造方法 |
US5342426A (en) * | 1993-07-16 | 1994-08-30 | Corning Incorporated | Making glass sheet with defect-free surfaces and alkali metal-free soluble glasses therefor |
JP3081122B2 (ja) * | 1994-07-18 | 2000-08-28 | シャープ株式会社 | 基板搬送用治具及びそれを用いた液晶表示素子の製造方法 |
JPH08309926A (ja) * | 1995-05-17 | 1996-11-26 | Nitto Boseki Co Ltd | 積層板材及びそれから作製した織機の綜絖枠 |
JP3203166B2 (ja) * | 1995-10-13 | 2001-08-27 | シャープ株式会社 | 液晶表示素子製造用治具及びそれを用いた液晶表示素子の製造方法 |
US6060168A (en) * | 1996-12-17 | 2000-05-09 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
US5972152A (en) * | 1997-05-16 | 1999-10-26 | Micron Communications, Inc. | Methods of fixturing flexible circuit substrates and a processing carrier, processing a flexible circuit and processing a flexible circuit substrate relative to a processing carrier |
US6687969B1 (en) * | 1997-05-16 | 2004-02-10 | Micron Technology, Inc. | Methods of fixturing flexible substrates and methods of processing flexible substrates |
US6287674B1 (en) * | 1997-10-24 | 2001-09-11 | Agfa-Gevaert | Laminate comprising a thin borosilicate glass substrate as a constituting layer |
JP3809733B2 (ja) * | 1998-02-25 | 2006-08-16 | セイコーエプソン株式会社 | 薄膜トランジスタの剥離方法 |
TW418539B (en) * | 1998-05-29 | 2001-01-11 | Samsung Electronics Co Ltd | A method for forming TFT in liquid crystal display |
US6555443B1 (en) * | 1998-11-11 | 2003-04-29 | Robert Bosch Gmbh | Method for production of a thin film and a thin-film solar cell, in particular, on a carrier substrate |
US6815239B1 (en) * | 1999-03-05 | 2004-11-09 | Chartered Semiconductor Manufacturing Ltd. | Photolithographic methods for making liquid-crystal-on-silicon displays with alignment posts and optical interference layers |
JP3358606B2 (ja) * | 1999-12-14 | 2002-12-24 | 日本電気株式会社 | 液晶表示パネルの製造方法 |
JP2001185519A (ja) * | 1999-12-24 | 2001-07-06 | Hitachi Ltd | 半導体装置及びその製造方法 |
TW518442B (en) * | 2000-06-29 | 2003-01-21 | Au Optronics Corp | Thin film transistor liquid crystal display and its manufacture method |
JP2002169184A (ja) * | 2000-11-30 | 2002-06-14 | Hitachi Ltd | 液晶表示装置 |
US6485614B2 (en) * | 2000-11-30 | 2002-11-26 | International Business Machines Corporation | Method to stabilize a carbon alignment layer for liquid crystal displays |
KR20020072777A (ko) * | 2001-03-12 | 2002-09-18 | 후지 샤신 필름 가부시기가이샤 | 표시장치용 기판 |
JP2002346505A (ja) * | 2001-05-29 | 2002-12-03 | Densho Engineering Co Ltd | Lcdから環境負荷を低減してガラスを回収する方法 |
US6934001B2 (en) * | 2001-08-13 | 2005-08-23 | Sharp Laboratories Of America, Inc. | Structure and method for supporting a flexible substrate |
JP2003066858A (ja) * | 2001-08-23 | 2003-03-05 | Sony Corp | 薄膜デバイス基板の製造方法 |
US6887733B2 (en) * | 2002-09-11 | 2005-05-03 | Osram Opto Semiconductors (Malaysia) Sdn. Bhd | Method of fabricating electronic devices |
US6964201B2 (en) * | 2003-02-25 | 2005-11-15 | Palo Alto Research Center Incorporated | Large dimension, flexible piezoelectric ceramic tapes |
DE10348946B4 (de) * | 2003-10-18 | 2008-01-31 | Schott Ag | Bearbeitungsverbund für ein Substrat |
-
2003
- 2003-07-03 US US10/613,972 patent/US20050001201A1/en not_active Abandoned
-
2004
- 2004-06-21 JP JP2006518664A patent/JP2007516461A/ja not_active Abandoned
- 2004-06-21 EP EP04755823A patent/EP1644772A4/en not_active Withdrawn
- 2004-06-21 KR KR1020067000033A patent/KR20060041206A/ko not_active Application Discontinuation
- 2004-06-21 CN CNA2004800191658A patent/CN1816768A/zh active Pending
- 2004-06-21 WO PCT/US2004/019914 patent/WO2005010596A2/en active Application Filing
- 2004-06-30 TW TW093119958A patent/TWI240840B/zh not_active IP Right Cessation
-
2006
- 2006-07-12 US US11/485,201 patent/US20060250559A1/en not_active Abandoned
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102934177A (zh) * | 2009-09-09 | 2013-02-13 | 艾默生电气公司 | 具有加强肋的实芯玻璃绝缘支撑密封件 |
CN102934177B (zh) * | 2009-09-09 | 2015-11-25 | 艾默生电气公司 | 具有加强肋的实芯玻璃绝缘支撑密封件 |
CN102637577A (zh) * | 2011-04-02 | 2012-08-15 | 京东方科技集团股份有限公司 | 一种显示器件的制备方法 |
CN103501998A (zh) * | 2011-05-06 | 2014-01-08 | 康宁股份有限公司 | 用于半导体器件的层压结构 |
CN104919591A (zh) * | 2012-08-22 | 2015-09-16 | 康宁股份有限公司 | 挠性玻璃基材和包括挠性玻璃基材与载体基材的基材堆叠件的加工 |
CN105658594A (zh) * | 2013-03-15 | 2016-06-08 | 康宁股份有限公司 | 玻璃片的整体退火 |
CN105658594B (zh) * | 2013-03-15 | 2019-01-04 | 康宁股份有限公司 | 玻璃片的整体退火 |
Also Published As
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WO2005010596A3 (en) | 2005-12-29 |
TW200515076A (en) | 2005-05-01 |
US20060250559A1 (en) | 2006-11-09 |
US20050001201A1 (en) | 2005-01-06 |
EP1644772A2 (en) | 2006-04-12 |
KR20060041206A (ko) | 2006-05-11 |
WO2005010596A2 (en) | 2005-02-03 |
EP1644772A4 (en) | 2007-05-30 |
JP2007516461A (ja) | 2007-06-21 |
TWI240840B (en) | 2005-10-01 |
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