The object of the invention is, the thermo-sensitive material that the wafer-type thermosensitive oxide resistor of development is made up of cobalt oxide, manganese oxide, through the Mechanical Method ball milling, mix, give sintering, ball milling is made powder again, or adopts the method for chemistry to prepare powder body material, again powder is pressed into disk and makes; Be applicable to automobile, motorcycle, large-scale engineering machinery, agricultural machinery, the measuring disk thermistor spare of naval vessel equitemperature, its outside need not insulated enclosure, and mechanical strength height, vibration strength are good, stable and reliable for performance.
Wafer-type thermosensitive oxide resistor of the present invention, the thermo-sensitive material that this thermistor is made up of cobalt oxide, manganese oxide, nickel oxide, through ball milling mix, give sintering, ball milling is made powder again, powder is pressed into disk makes; Wherein each set of dispense ratio is: the metallic atom ratio
Cobalt: manganese: nickel=1-5: 5-1: 1-5
The preparation method of wafer-type thermistor follows these steps to carry out:
A, at first with cobalt oxide, manganese oxide, nickel oxide raw material by proportioning through Mechanical Method ball milling, mixing, 1000-1100 ℃ is given sintering, gives after the burning ball milling again and makes powder body material; The making of same powder body material also can be adopted chemical method preparations such as slaine thermal decomposition method or coprecipitation or sol-gel process;
B, the powder body material that makes is added the granulation of 5-15% poly (vinyl alcohol) binder then, the siccative after the granulation is pressed into disk parison body with tablet press machine, sinters porcelain into through high temperature 1100-1400 ℃ again;
C, will be on two planes of the disk behind the sintering apply silver or nickel or aluminium conductor slurry, burning infiltration silver or nickel or aluminium conductor metal level are as two electrodes; The making of electrode layer also can plate conductor metal layer on two planes of disk with the method for chemical plating.
Embodiment 1 (metallic atom ratio)
A, at first with cobalt oxide: manganese oxide: 1: 4: 1 raw material of nickel oxide are through Mechanical Method ball milling, mixing, and 1000 ℃ are given sintering, give after the burning ball milling again and make powder body material;
B and then the powder body material that makes added 5% poly (vinyl alcohol) binder granulation, the siccative after the granulation is pressed into disk parison body with tablet press machine, is sintering porcelain into for 1150 ℃ through high temperature;
Apply silver conductive paste on c, two planes with the disk behind the sintering, burning infiltration silver conductor metal level is as two electrodes; The making of electrode layer also can plate conductor metal layer on two planes of disk with the method for chemical plating.Its B value is 3100K, 25 ℃ of 90 Ω of resistance value.
Embodiment 2 (metallic atom ratio)
A, at first with cobalt oxide: manganese oxide: 2: 3: 1 raw material of nickel oxide are made powder body material through chemical method slaine thermal decomposition method;
B and then the powder body material that makes added 10% poly (vinyl alcohol) binder granulation, the siccative after the granulation is pressed into disk parison body with tablet press machine, is sintering porcelain into for 1250 ℃ through high temperature;
C, with nickel coating conductor paste on two planes of the disk behind the sintering, the heating-up nickel conductor metal layer is as two electrodes; The making of electrode layer also can plate conductor metal layer on two planes of disk with the method for chemical plating.Its B value is 3900K, 25 ℃ of 450 Ω of resistance value.
Embodiment 3 (metallic atom ratio)
A, at first with cobalt oxide: manganese oxide: 3: 1: 2 raw material of nickel oxide are made powder body material through the chemical method coprecipitation;
B and then the powder body material that makes added 15% poly (vinyl alcohol) binder granulation, the siccative after the granulation is pressed into disk parison body with tablet press machine, is sintering porcelain into for 1250 ℃ through high temperature;
C, with coated with aluminum conductor paste on two planes of the disk behind the sintering, burning infiltration aluminium conductor metal level is as two electrodes; The making of electrode layer also can plate conductor metal layer on two planes of disk with the method for chemical plating.Its B value is 3300,25 ℃ of 1300 Ω of resistance value.
Embodiment 4 (metallic atom ratio)
A, at first with cobalt oxide: manganese oxide: 4: 1: 1 raw material of nickel oxide are through Mechanical Method ball milling, mixing, and 1050 ℃ are given sintering, give after the burning ball milling again and make powder body material;
B and then the powder body material that makes added 8% poly (vinyl alcohol) binder granulation, the siccative after the granulation is pressed into disk parison body with tablet press machine, is sintering porcelain into for 1300 ℃ through high temperature;
Apply silver conductive paste on c, two planes with the disk behind the sintering, burning infiltration silver conductor metal level is as two electrodes; The making of electrode layer also can plate conductor metal layer on two planes of disk with the method for chemical plating.Its B value is 3500K, 25 ℃ of 220 Ω of resistance value.
Embodiment 5 (metallic atom ratio)
A, at first with cobalt oxide: 1: 4: 1 raw material of manganese oxide nickel oxide are made powder body material through the chemical method sol-gel process;
B and then the powder body material that makes added 12% poly (vinyl alcohol) binder granulation, the siccative after the granulation is pressed into disk parison body with tablet press machine, is sintering porcelain into for 1300 ℃ through high temperature;
C, with nickel coating conductor paste on two planes of the disk behind the sintering, the heating-up nickel conductor metal layer is as two electrodes; The making of electrode layer also can plate conductor metal layer on two planes of disk with the method for chemical plating.Its B value is 3650K, 25 ℃ of 350 Ω of resistance value.