CN1181371A - 2-羟基萘-6-羧酸的精制方法 - Google Patents
2-羟基萘-6-羧酸的精制方法 Download PDFInfo
- Publication number
- CN1181371A CN1181371A CN 97122794 CN97122794A CN1181371A CN 1181371 A CN1181371 A CN 1181371A CN 97122794 CN97122794 CN 97122794 CN 97122794 A CN97122794 A CN 97122794A CN 1181371 A CN1181371 A CN 1181371A
- Authority
- CN
- China
- Prior art keywords
- acid
- rough
- carboxylic acid
- weight
- hydroxy naphthalene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP297136/1996 | 1996-10-18 | ||
JP29713696A JPH10120624A (ja) | 1996-10-18 | 1996-10-18 | 2−ヒドロキシナフタレン−6−カルボン酸の精製方法 |
JP297136/96 | 1996-10-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1181371A true CN1181371A (zh) | 1998-05-13 |
CN1070470C CN1070470C (zh) | 2001-09-05 |
Family
ID=17842683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN97122794A Expired - Fee Related CN1070470C (zh) | 1996-10-18 | 1997-10-18 | 2-羟基萘-6-羧酸的精制方法 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH10120624A (zh) |
CN (1) | CN1070470C (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102173988A (zh) * | 2011-03-25 | 2011-09-07 | 衢州英特高分子材料有限公司 | 一种6-羟基-2-萘甲酸的纯化方法 |
CN103360242A (zh) * | 2012-04-09 | 2013-10-23 | 盐城拜克化学工业有限公司 | 一种6-羟基-2-萘甲酸的制备方法 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW527451B (en) * | 1999-08-24 | 2003-04-11 | Ueno Seiyaku Oyo Kenkyujo Kk | Columnar crystals of 6-hydroxy-2-naphthoic acid and process for manufacturing the same |
JP4507486B2 (ja) * | 2002-09-02 | 2010-07-21 | エア・ウォーター株式会社 | カルボン酸の精製方法 |
JP5236274B2 (ja) * | 2007-12-25 | 2013-07-17 | 上野製薬株式会社 | 6−ヒドロキシ−2−ナフトエ酸再生品の製造方法 |
JP5236275B2 (ja) * | 2007-12-25 | 2013-07-17 | 上野製薬株式会社 | 6−ヒドロキシ−2−ナフトエ酸の回収方法 |
CN113880709A (zh) * | 2021-11-15 | 2022-01-04 | 宁夏清研高分子新材料有限公司 | 一种高纯度2-羟基-6-萘甲酸的制备方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3800989A1 (de) * | 1988-01-15 | 1989-07-27 | Hoechst Ag | Verfahren zur reinigung von 2-hydroxy-naphthalin-6-carbonsaeure |
WO1997018182A1 (fr) * | 1995-11-13 | 1997-05-22 | Kabushiki Kaisha Ueno Seiyaku Oyo Kenkyujo | Procede de separation et de purification d'acides hydroxynaphtalenecarboxyliques |
-
1996
- 1996-10-18 JP JP29713696A patent/JPH10120624A/ja active Pending
-
1997
- 1997-10-18 CN CN97122794A patent/CN1070470C/zh not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102173988A (zh) * | 2011-03-25 | 2011-09-07 | 衢州英特高分子材料有限公司 | 一种6-羟基-2-萘甲酸的纯化方法 |
CN102173988B (zh) * | 2011-03-25 | 2013-05-01 | 衢州英特高分子材料有限公司 | 一种6-羟基-2-萘甲酸的纯化方法 |
CN103360242A (zh) * | 2012-04-09 | 2013-10-23 | 盐城拜克化学工业有限公司 | 一种6-羟基-2-萘甲酸的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1070470C (zh) | 2001-09-05 |
JPH10120624A (ja) | 1998-05-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
CI01 | Correction of invention patent gazette |
Correction item: Description Correct: Sulfuric acid, formic acid False: Formic acid Number: 19 Page: P2 page P7 line Volume: 14 Correction item: Description Correct: Drop 35% hydrochloric acid False: Drop 5% hydrochloric acid Number: 19 Page: P5 page P11 line Volume: 14 Correction item: Description Correct: 0.05 (wt%) below False: 0.05 (wt%) Number: 19 Page: P5 page P22 line Volume: 14 Correction item: Description Correct: 0.05 (wt%) below False: 0.05 (wt%) Number: 19 Page: P6 page P19 line Volume: 14 Correction item: Description Correct: 0.05 (wt%) below False: 0.05 (wt%) Number: 19 Page: P6 page P7 line Volume: 14 Correction item: Description Correct: 0.05 (wt%) below False: 0.05 (wt%) Number: 19 Page: P6 page P9 line Volume: 14 |
|
ERR | Gazette correction |
Free format text: CORRECT: DESCRIPTION Free format text: CORRECT: DESCRIPTION; FROM: 0.05(WEIGHT %) TO: 0.05(WEIGHT % )LOWER Free format text: CORRECT: DESCRIPTION; FROM: SULFATE FORMIC ACID TO: SULFATE, FORMIC ACID Free format text: CORRECT: DESCRIPTION; FROM: DROPWISE 5 % HYDROCHLORIDE TO: DROPWISE 35 % HYDROCHLORIDE |
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C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |