CN115026060B - Mask cleaning apparatus and mask cleaning method - Google Patents
Mask cleaning apparatus and mask cleaning method Download PDFInfo
- Publication number
- CN115026060B CN115026060B CN202110614930.6A CN202110614930A CN115026060B CN 115026060 B CN115026060 B CN 115026060B CN 202110614930 A CN202110614930 A CN 202110614930A CN 115026060 B CN115026060 B CN 115026060B
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- mask
- photomask
- chassis
- reticle
- air knife
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- 238000004140 cleaning Methods 0.000 title claims abstract description 64
- 238000000034 method Methods 0.000 title claims description 28
- 239000002245 particle Substances 0.000 claims description 37
- 239000000356 contaminant Substances 0.000 claims description 19
- 238000006386 neutralization reaction Methods 0.000 claims description 16
- 238000001914 filtration Methods 0.000 claims description 5
- 238000012806 monitoring device Methods 0.000 claims description 5
- 230000010355 oscillation Effects 0.000 claims description 5
- 238000012544 monitoring process Methods 0.000 claims description 2
- 238000004378 air conditioning Methods 0.000 claims 6
- 239000000428 dust Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 230000003472 neutralizing effect Effects 0.000 description 9
- 230000003068 static effect Effects 0.000 description 8
- 230000005611 electricity Effects 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning In General (AREA)
Abstract
The invention relates to a photomask cleaning device which is applied to a photomask box, wherein the photomask box comprises an upper cover and a chassis, a photomask is accommodated on the chassis, the photomask is provided with a photomask protecting film, the photomask cleaning device comprises a main shell, a primary shell, a photomask uncapping device, a conveying device and at least one air knife device, and the secondary shell is connected with the main shell. The photomask uncapping device comprises a lifting element and a uncapping element, wherein the uncapping element comprises a back connecting part and a cover part, and the lifting element is used for lifting the back connecting part. The cover part is embedded in the secondary shell, the cover part and the back connecting part form a photomask inlet, and the upper cover is propped against the cover part. The conveying device comprises a sliding rail and a photomask box carrying platform. The reticle pod carrier is moved to the reticle entrance via a slide rail. When the lifting element lifts the cover opening element, the upper cover, the cover cap part, the main shell and the secondary shell form a closed space.
Description
Technical Field
The present invention relates to a photomask cleaning apparatus and a photomask cleaning method, and more particularly, to a photomask cleaning apparatus and a photomask cleaning method for cleaning contaminants on a photomask.
Background
In the semiconductor process, an exposure process is included, which is to place a mask with a pattern over a wafer, and then to irradiate a wafer through the mask by using an exposure light source. After that, the wafer is immersed in a developing solution, so that the pattern of the photomask can be seen on the wafer.
The mask has a mask protective film thereon, which can prevent the mask from being scratched. In addition, since the mask film is attached with contaminants (contaminant particles), chemicals, etc. due to static electricity, the mask film needs to be cleaned so as not to affect the yield of the semiconductor process. However, the dust removal effect and dust removal efficiency of the existing mask protection film still need improvement. In addition, during the process of taking out the photomask, external contaminant particles are also easily attached to the photomask protective film.
Therefore, it is worth thinking by those skilled in the art how to improve the above-mentioned problems.
Disclosure of Invention
The present invention is directed to a mask cleaning apparatus which has an excellent dust removing effect on a mask and can prevent external contaminant particles from adhering to the mask during the process of taking out the mask.
The invention relates to a photomask cleaning device which is applied to a photomask box, wherein the photomask box comprises an upper cover and a chassis, a photomask is accommodated on the chassis, the photomask is provided with a photomask protecting film, the photomask cleaning device comprises a main shell, a primary shell, a photomask uncapping device, a conveying device and at least one air knife device, and the secondary shell is connected with the main shell. The cover opening device comprises a lifting element and a cover opening element, wherein the cover opening element comprises a back connecting part and a cover part, and the lifting element is used for lifting the back connecting part and the cover part. In addition, the cover part is embedded in the secondary shell, the cover part and the back connecting part form a photomask inlet, and the upper cover is propped against the cover part. In addition, the conveying device comprises a sliding rail and a photomask box carrying platform. The mask box carrying platform moves to the mask inlet through the sliding rail, and the chassis is arranged on the mask box carrying platform. In addition, the air knife device is used for generating an air flow to the mask protecting film. When the lifting element lifts the cover opening element, the upper cover, the cover part, the main shell and the secondary shell form a closed space.
The above-mentioned photomask cleaning apparatus, wherein the air knife device comprises an azimuth adjusting element and an air knife nozzle, and the air knife nozzle is connected with the azimuth adjusting element.
In the above-mentioned photomask cleaning apparatus, the orientation adjusting element includes a first axis, the air knife nozzle includes a second axis, and the first axis is perpendicular to the second axis.
In the above-mentioned photomask cleaning apparatus, the number of the air knife devices is plural, and the air knife devices are arranged in a n-shape.
The above-mentioned mask cleaning apparatus further comprises an electrostatic neutralizing device, wherein the electrostatic neutralizing device produces a plurality of charged particles from a plurality of alpha particles, and the charged particles are transferred to the mask via a clean gas.
In the above-mentioned photomask cleaning apparatus, the chassis includes a rotary switch, and the photomask carrier includes a rotary unit corresponding to the rotary switch.
The above-mentioned mask cleaning apparatus further comprises an ultrasonic resonance device for generating an ultrasonic wave to the mask.
The above-described reticle cleaning apparatus further comprises at least one flow control device for controlling the flow of air into the air knife nozzle.
In the above-described mask cleaning apparatus, the frequency of the ultrasonic wave is not less than 20kHz.
In the above-mentioned mask cleaning apparatus, the ultrasonic resonance device includes a height adjustment platform and an ultrasonic oscillation head, and the ultrasonic oscillation head is connected to the height adjustment platform.
The above-mentioned photomask cleaning apparatus further comprises a photomask protecting film monitoring device for monitoring the amplitude of the photomask protecting film.
The above-mentioned mask cleaning apparatus further comprises at least one air filtering device for filtering the contaminant particles in the main housing.
Another object of the present invention is to provide a method for cleaning a photomask, which has an excellent dust removing effect on a photomask and can prevent external contaminant particles from adhering to the photomask during the process of taking out the photomask.
The photomask cleaning method of the invention is applied to the photomask cleaning equipment, and comprises the following steps. First, a mask box is placed at the mask inlet, the mask box includes an upper cover and a chassis, and a mask is accommodated on the chassis. And then separating the upper cover from the chassis so that the photomask box carrying platform only carries the chassis and the photomask. Then, the chassis and the photomask are moved into the main housing. Then, an air flow is generated to a mask protecting film of the mask. The chassis and the mask are then returned to the mask inlet. And then, the upper cover and the chassis are combined so as to enable the photomask to be contained in the photomask box.
The above-mentioned method further comprises an electrostatic neutralization step for producing a plurality of charged particles from a plurality of alpha particles, and the charged particles are transferred to the mask film via a clean gas.
The above-mentioned method for cleaning a mask further comprises an ultrasonic resonance step for generating an ultrasonic wave to the mask.
The invention has the following advantages: has excellent dust removing effect, and can prevent external pollution particles from adhering to the mask protecting film in the process of taking out the mask.
The invention will now be described in more detail with reference to the drawings and specific examples, which are not intended to limit the invention thereto.
Drawings
FIG. 1A is a schematic view of an air knife device, a conveying device, an ultrasonic resonance device, an electrostatic neutralization device and a flow control device in a main housing;
FIG. 1B is a perspective view of a reticle cleaning device;
FIG. 1C is a perspective view of the upper cover and bottom plate of the reticle pod;
FIG. 1D is a schematic view of the bottom surface of the reticle pod;
FIG. 2A is a schematic diagram of a mask opening device;
FIG. 2B is a schematic view of the cover opening device when the cover opening device is lifted;
FIG. 3A is a schematic diagram of a conveyor;
FIG. 3B is a schematic diagram of a reticle pod inserted into a reticle inlet;
FIG. 3C is a schematic view of the cover opening device opening the cover;
FIG. 3D is a schematic view of the chassis disposed on the reticle pod carrier;
FIG. 4 is a schematic view of the chassis and the mask moving into the main housing;
FIG. 5 is a schematic diagram of three sets of air knife devices;
FIG. 6 is a schematic diagram of an electrostatic neutralization apparatus;
FIG. 7 is a schematic diagram of an ultrasonic resonance apparatus;
FIG. 8 is a flowchart illustrating a mask cleaning method according to the present embodiment;
FIG. 9 is a flowchart of another embodiment of a method for cleaning a mask.
Wherein reference numerals are used to refer to
10: photomask cleaning apparatus
11: main shell
12: secondary housing
13: cover opening device for photomask
131: lifting element
132: cover opening element
132B: back connecting part
132C: cover cap part
132E: mask inlet
14: conveying device
141: sliding rail
142: photomask box carrying platform
142S: rotary unit
15: air knife device
151: direction adjusting element
151A: first axle center
152: air knife nozzle
152A: second hub 152A
16: static neutralization device
161: ion nozzle
162: alpha ionizer
17: ultrasonic resonance device
171: height adjusting platform
172: ultrasonic oscillation head
18: flow control device
19: mask protection film monitoring device
21: air filter
8: photomask box
81: upper cover
81T: tenon seat
82: chassis
82T: clamping tenon
82S: rotary switch
83: photomask with a mask pattern
83F: mask protecting film
S1-S8: step (a)
Detailed Description
The structural and operational principles of the present invention are described in detail below with reference to the accompanying drawings:
referring to fig. 1A, 1B, 1C and 1D, fig. 1A is a schematic view of the air knife device 15, the conveying device 14, the ultrasonic resonance device 17, the static electricity neutralization device 16 and the flow control device 18 in the main housing 11, fig. 1B is a perspective view of the mask cleaning apparatus 10, fig. 1C is a perspective view of the upper cover 81 and the bottom plate 82 of the mask box 8, and fig. 1D is a schematic view of the bottom surface of the mask box 8. The mask cleaning apparatus 10 of the present embodiment is applied to a mask box 8, the mask box 8 includes an upper cover 81 and a bottom plate 82, the upper cover 81 includes a plurality of latch seats 81T, the side edge of the bottom plate 82 includes a plurality of latches 82T, and adjacent latches 82T correspond to one latch seat 81T. And, the bottom surface of the chassis 82 includes a rotary switch 82S. When the upper cover 81 is combined with the bottom plate 82, the bottom plate 82 is covered by the upper cover 8, and the latch 82T is embedded in the corresponding latch seat 81T. In addition, a mask 83 is disposed above the chassis 82, and a mask protection film 83F is disposed on the mask 83. .
The mask cleaning apparatus 10 of the present embodiment includes a main housing 11, a sub-housing 12, a mask opening device 13, a carrying device 14, three sets of air knife devices 15, an electrostatic neutralizing device 16, an ultrasonic resonance device 17, a plurality of flow rate control devices 18, a mask protecting film monitoring device 19, and a plurality of air filtering devices 21, wherein the sub-housing 12 is connected to the main housing 11, and the sub-housing 12 is in communication with the main housing 11. The air knife device 15, the static electricity neutralization device 16, the ultrasonic resonance device 17, the flow control device 18 and the mask protecting film monitoring device 19 are arranged in the main shell 11, and the conveying device 14 is arranged at a position crossing the main shell 11 and the sub-shell 12.
Referring to fig. 1B again and fig. 2A and 2B simultaneously, fig. 2A is a schematic view of the mask opening device 13, and fig. 2B is a schematic view of the opening device 132 when it is lifted. The mask opening device 13 includes a lifting element 131 and an opening element 132, the opening element 132 includes a back connection portion 132B and a cover portion 132C, the back connection portion 132B is connected to the cover portion 132C, and the cover portion 132C has a reverse-U-shaped partition. Note that the lifting element 131 is used to raise or lower the back connecting portion 132B and the cover portion 132C. In addition, the cover portion 132C of the mask opening device 13 is embedded in the sub-housing 12, and the cover portion 132C and the back connection portion 132B form a mask inlet 132E, and the mask inlet 132E is a location area where the mask box 8 is placed.
Referring to fig. 3A and 3B, fig. 3A is a schematic view of the conveying device 14, and fig. 3B is a schematic view of the mask box 8 being embedded in the mask inlet 132E. The carrying device 14 includes a slide rail 141 and a reticle cassette carrier 142, one end of the slide rail 141 is disposed in the main housing 11, the other end of the slide rail 141 is disposed in the sub-housing 12, and the reticle cassette carrier 142 includes a rotating unit 142S, and the rotating unit 142S corresponds to the rotating switch 82S of the chassis 82. In detail, when the rotary unit 142S turns the rotary switch 82S, the latch 82T is retracted into the chassis 82, and is not inserted into the corresponding latch seat 81T. In this way, the upper cover 81 and the bottom plate 82 of the reticle pod 8 can be separated.
In addition, the reticle stage 142 is movably connected to the slide rail 141, so that the reticle stage 142 can be moved to the reticle entrance 132E by the slide rail 141. Specifically, when the reticle stage 142 moves into the sub-housing 12 via the slide rail 141, the reticle stage 142 is exposed to the reticle inlet 132E (see fig. 1B again). Thus, the reticle pod 8 can be mounted on the pod stage 142 (the reticle pod 8 is mounted on the pod stage 142 via the chassis 82).
Referring to fig. 3C, fig. 3C is a schematic diagram showing that the cover opening element 132 opens the upper cover 81, and when the reticle pod 8 is disposed on the pod carrier 142, the upper cover 81 of the reticle pod 8 abuts against the cover portion 132C. Therefore, when the mask cleaning apparatus 10 is to expose the mask 83 from the mask box 8, the rotating unit 142S turns the rotating switch 82S, and the lifting member 131 immediately lifts the back connecting portion 132B, so that the upper cover 81 lifts up along with the cover portion 132C. Thereafter, the upper cover 81 is separated from the chassis 82, and the reticle cassette stage 142 now only carries the chassis 82 and the reticle 83 above the chassis 82 (see fig. 3D).
Referring again to fig. 3C and also to fig. 4, fig. 4 is a schematic view of the chassis 82 and the mask 83 moving into the main housing 11. It should be noted that, when the lifting element 131 lifts the back connection portion 132B, the carrier 14 also moves the chassis 82 and the mask 83 into the main housing 11 via the mask box carrier 142, that is, moves the mask 83 to the position below the air knife device 15, the electrostatic neutralizing device 16 and the ultrasonic resonance device 17. When the upper cover 81 and the cover portion 132C of the reticle pod 8 are lifted up, the upper cover 81, the cover portion 132C, the main housing 11, and the sub-housing 12 form a closed space. Thus, the mask cleaning apparatus 10 can prevent external contaminant particles from adhering to the mask protecting film 83F during the process of taking out the mask 83. In addition, even when the mask 83F is cleaned, the mask 83F can be secured in the sealed space.
Referring again to fig. 4 and simultaneously to fig. 5, fig. 5 is a schematic diagram of three sets of air knife devices 15. The air knife device 15 includes an orientation adjusting element 151 and an air knife nozzle 152, and the air knife nozzle 152 is connected to the orientation adjusting element 151. The azimuth adjusting element 151 includes a first axis 151A, and the air knife nozzle 152 includes a second axis 152A, wherein the first axis 151A is perpendicular to the second axis 152A. Therefore, the air knife nozzle 152 can be moved up and down, moved left and right and rotated through the first axis 151A and the second axis 152A, so as to adjust the height, left and right position and rotation angle of the air knife device 15.
In addition, the air knife device 152 is used for generating an air flow to the mask 83F so as to blow the pollutant particles away from the mask 83F by the air flow. Specifically, the air flow is ejected from the air knife nozzle 152, and the air knife nozzle 152 can change the ejection angle of the air flow via the azimuth adjusting element 151. Therefore, the air knife device 152 can be adjusted according to the thickness of the mask 83 (i.e. the position of the mask 83F) to achieve the best dust removal effect.
In addition, the mask cleaning apparatus 10 of the present embodiment has three sets of air knife devices 15, and the three sets of air knife devices 15 are arranged in a n-shape. In this way, the two sets of lateral air knife devices 15 have an excellent dust removing effect on objects with lateral vertical surfaces.
In addition, each flow control device 18 corresponds to one air knife nozzle 152, and the flow control device 18 is configured to control the amount of air flow entering the air knife nozzle 152. In this way, the air knife nozzle 152 is advantageously used to remove dust with the best air flow, so as to achieve the best dust removal effect.
Referring again to fig. 4 and concurrently to fig. 6, fig. 6 is a schematic diagram of the electrostatic neutralizing device 16. The electrostatic neutralizing device 16 includes an alpha ionizer 162 and a plurality of ion nozzles 161, wherein the alpha ionizer 162 is used for generating a plurality of alpha particles. Then, the electrostatic neutralizing device 16 produces a plurality of charged particles via the α particles, and the charged particles are transferred to the mask 83F via the ion nozzle 161, so that the contaminant particles are easily separated from the mask 83F. The static electricity neutralization device 16 uses wind power (clean gas) to quickly reach the surface of the mask protecting film 83F, so that static electricity can be effectively removed compared with the conventional static electricity neutralization device.
Referring again to fig. 4 and simultaneously to fig. 7, fig. 7 is a schematic diagram of the ultrasonic resonance device 17. The ultrasonic resonance device 17 includes a height adjustment stage 171 and an ultrasonic vibration head 172, wherein the ultrasonic vibration head 172 is connected to the height adjustment stage 171, and the height adjustment stage 171 is used for adjusting the height position of the ultrasonic vibration head 172. In the present embodiment, the ultrasonic resonance device 17 generates an ultrasonic wave to the mask 83F through the ultrasonic oscillation head 172, so that the mask 83F and the contaminant particles attached to the mask 83F resonate. In this way, the contaminant particles easily fall out of the mask 83F. In the above, the frequency of the ultrasonic wave is not less than 20kHz, and the optimal frequency of the ultrasonic wave is about 35kHz.
In addition, the air knife device 15, the electrostatic neutralization device 16 and the ultrasonic resonance device 17 are all located above the mask box stage 142, so that the air knife device 15, the electrostatic neutralization device 16 and the ultrasonic resonance device 17 can simultaneously remove dust from the mask protective film 83F. In addition, the mask carrier 142 moves back and forth on the slide rail 141, so that the effect of cleaning the mask 83F can be further improved.
The mask monitor 19 is disposed beside the ultrasonic resonance device 17. It should be noted that the mask monitor 19 is used to monitor the amplitude of the mask 83F. Thus, the mask 83F is prevented from being damaged due to excessive vibration of the mask 83F caused by ultrasonic vibration.
In addition, an air filter 21 is provided beside the flow control device 18, the air filter 21 being configured to filter the contaminant particles to reduce contaminants within the reticle cleaning device 10.
In this embodiment, when the mask 83F completes the cleaning process, the conveyor 14 also returns the chassis 82 with the mask 83 to the mask inlet 132E, i.e. the cover opening of the mask box 8. Then, the mask opening device 13 further couples the upper cover 81 with the chassis 82, and the rotation unit 142S locks the rotation switch 82S to store the mask 83 in the mask box 8 again.
In summary, the mask cleaning apparatus 10 has an excellent dust removal effect on the mask 83F through the air knife device 15, the electrostatic neutralizing device 16 and the ultrasonic resonance device 17, and can prevent external contaminant particles from adhering to the mask 83F during the process of taking out the mask 83 and accommodating the mask 83.
Referring to fig. 8, fig. 8 is a flowchart illustrating a mask cleaning method according to the present embodiment. The mask cleaning method of the present embodiment is applied to the mask cleaning apparatus 10, and includes the following steps. First, referring to fig. 1C, 3B and step S1, a mask box 8 is placed to the mask inlet 132E, the mask box 8 includes a top cover 81 and a bottom plate 82, and a mask 83 is accommodated on the bottom plate 82.
Thereafter, referring to fig. 3C, 3D and step S2, the upper cover 81 is separated from the chassis 82, so that the reticle cassette stage 142 only loads the chassis 82 and the reticle 83. In detail, the upper cover 81 and the bottom plate 82 are opened and separated by the cover opening member 132.
Thereafter, referring to fig. 4 and step S3, the chassis 82 and the mask 83 are moved into the main housing 11 by the conveyor 14.
Thereafter, referring to fig. 6 and step S4, step S4 corresponds to an electrostatic neutralization step, in which a plurality of charged particles are produced from a plurality of α particles by the electrostatic neutralization device 16, and the charged particles are transferred to a mask 83F of the mask 83 through a clean gas, so that the contaminant particles are easily separated from the mask 83F.
Then, referring to fig. 7 and step S5, step S5 corresponds to an ultrasonic resonance step, in which an ultrasonic wave is generated from the ultrasonic resonance device 17 to the mask 83F, so that the mask 83F and the contaminant particles attached to the mask 83F resonate. Therefore, the contaminant particles easily fall out from the mask protective film 83F. .
Then, referring to fig. 5 and step S6, an air flow is generated to the mask 83F by the air knife devices 15 to blow the contaminant particles away from the mask 83F.
Thereafter, referring to step S7, the chassis 82 and the mask 83 are returned to the mask inlet 132E via the conveying device 14.
Then, referring to step S8, the cover 81 and the chassis 82 are combined via the cover opening element 132 to allow the mask 83 to be accommodated in the mask box 8.
In the above-mentioned mask cleaning method, step S4, step S5 and step S6 are sequentially performed. However, in other embodiments, the steps S4, S5 and S6 can be performed simultaneously (see fig. 9). Specifically, the air knife device 15, the electrostatic neutralizing device 16, and the ultrasonic resonance device 17 can simultaneously remove dust from the mask film 83F, and need not be separately executed in order. In other embodiments, the reticle stage 142 may be moved back and forth in the main housing 11 several times. In this way, the steps S4, S5 and S6 are repeated a plurality of times, which is more beneficial to cleaning the mask 83F.
In summary, the method for cleaning a mask according to the present embodiment has an excellent dust removal effect on the mask film 83F by the air knife device 15, the static electricity neutralization device 16 and the ultrasonic resonance device 17 of the mask cleaning apparatus 10, and the method also accommodates the cleaned mask 83 back into the original mask box 8.
Of course, the present invention is capable of other various embodiments and its several details are capable of modification and variation in light of the present invention, as will be apparent to those skilled in the art, without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (15)
1. A photomask cleaning apparatus for a photomask box, the photomask box comprising an upper cover and a chassis, the chassis being provided with a photomask, the photomask having a photomask protection film, the photomask cleaning apparatus comprising:
a main housing;
a primary housing connected to the main housing;
a photomask uncapping device, comprising:
a lifting element; a kind of electronic device with high-pressure air-conditioning system
A cover opening element, provided with:
a back connecting part, the lifting element is used for lifting the back connecting part; a kind of electronic device with high-pressure air-conditioning system
A cover part embedded in the sub-shell, wherein the cover part and the back connecting part form a photomask inlet, and the upper cover is propped against the cover part;
a conveyor apparatus, comprising:
a slide rail; a kind of electronic device with high-pressure air-conditioning system
A mask box carrying platform which moves to the mask inlet through the sliding rail, and the chassis is arranged on the mask box carrying platform; and
at least one air knife device for generating an air flow to the mask protection film;
when the lifting element lifts the back connecting part and the cover part, the upper cover, the cover part, the main shell and the secondary shell form a closed space.
2. The reticle cleaning device of claim 1, wherein the air knife assembly comprises:
an orientation adjustment element; a kind of electronic device with high-pressure air-conditioning system
An air knife nozzle connected with the orientation adjusting element for adjusting the angle of the air knife nozzle.
3. The reticle cleaning device of claim 2 wherein the orientation adjustment element comprises a first axis, the air knife nozzle comprises a second axis, and the first axis is perpendicular to the second axis.
4. A photomask cleaning apparatus according to claim 1 or 2, wherein the number of the air knife devices is plural, and the air knife devices are arranged in a U-shape.
5. The reticle cleaning apparatus of claim 1, further comprising an electrostatic neutralization device that produces charged particles from alpha particles and the charged particles are transferred to the reticle pellicle via a clean gas.
6. The reticle cleaning apparatus of claim 1, wherein the chassis comprises a rotary switch, the reticle pod stage comprising a rotary unit, the rotary unit corresponding to the rotary switch.
7. The apparatus of claim 5, further comprising an ultrasonic resonance device for generating an ultrasonic wave to the mask.
8. The reticle cleaning device of claim 2, further comprising at least one flow control device for controlling the amount of air flow into the air knife nozzle.
9. The mask cleaning apparatus of claim 7, wherein the ultrasonic wave has a frequency of not less than 20kHz.
10. The mask cleaning apparatus of claim 7, wherein the ultrasonic resonance device comprises:
a height adjustment platform; a kind of electronic device with high-pressure air-conditioning system
An ultrasonic oscillation head connected to the height adjustment platform.
11. The reticle cleaning apparatus of claim 7, further comprising a reticle pellicle monitoring device for monitoring an amplitude of the reticle pellicle.
12. The reticle cleaning device of claim 1, further comprising at least one air filtration device for filtering contaminant particles within the main housing.
13. A method of cleaning a photomask applied to the photomask cleaning apparatus according to claim 7, comprising:
placing a mask box to the mask inlet, wherein the mask box comprises an upper cover and a chassis, and the chassis is used for accommodating a mask;
separating the upper cover from the chassis to enable the mask box carrying platform to carry only the chassis and the mask;
moving the chassis and the photomask into the main housing;
generating an air flow to a mask protecting film of the mask;
returning the chassis and the mask to the mask inlet; a kind of electronic device with high-pressure air-conditioning system
The upper cover and the chassis are combined to enable the photomask to be contained in the photomask box.
14. The method of claim 13, further comprising an electrostatic neutralization step, wherein a plurality of charged particles are produced from a plurality of α particles by the electrostatic neutralization step, and wherein the charged particles are transferred to the mask via a clean gas.
15. The method of claim 13, further comprising an ultrasonic resonance step of generating an ultrasonic wave to the mask via the ultrasonic resonance step.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW110108171A TWI760133B (en) | 2021-03-08 | 2021-03-08 | Photomask cleaning apparatus and method |
| TW110108171 | 2021-03-08 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN115026060A CN115026060A (en) | 2022-09-09 |
| CN115026060B true CN115026060B (en) | 2023-12-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110614930.6A Active CN115026060B (en) | 2021-03-08 | 2021-06-02 | Mask cleaning apparatus and mask cleaning method |
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| Country | Link |
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| CN (1) | CN115026060B (en) |
| TW (1) | TWI760133B (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW202236005A (en) | 2022-09-16 |
| CN115026060A (en) | 2022-09-09 |
| TWI760133B (en) | 2022-04-01 |
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