CN114008248A - 用于电解的电极 - Google Patents
用于电解的电极 Download PDFInfo
- Publication number
- CN114008248A CN114008248A CN202080046784.5A CN202080046784A CN114008248A CN 114008248 A CN114008248 A CN 114008248A CN 202080046784 A CN202080046784 A CN 202080046784A CN 114008248 A CN114008248 A CN 114008248A
- Authority
- CN
- China
- Prior art keywords
- ruthenium
- ytterbium
- electrode
- electrolysis
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005868 electrolysis reaction Methods 0.000 title claims abstract description 60
- 239000011247 coating layer Substances 0.000 claims abstract description 35
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910003454 ytterbium oxide Inorganic materials 0.000 claims abstract description 15
- 229940075624 ytterbium oxide Drugs 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims description 32
- 239000002243 precursor Substances 0.000 claims description 32
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 31
- 229910052707 ruthenium Inorganic materials 0.000 claims description 31
- 239000011248 coating agent Substances 0.000 claims description 30
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 29
- 239000008199 coating composition Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 26
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 25
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims description 25
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 14
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 14
- 239000010410 layer Substances 0.000 claims description 12
- 239000000654 additive Substances 0.000 claims description 10
- 230000000996 additive effect Effects 0.000 claims description 10
- 229910001924 platinum group oxide Inorganic materials 0.000 claims description 10
- 239000012695 Ce precursor Substances 0.000 claims description 9
- 229910052684 Cerium Inorganic materials 0.000 claims description 9
- 150000001412 amines Chemical class 0.000 claims description 9
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 9
- 238000001035 drying Methods 0.000 claims description 9
- FBEIPJNQGITEBL-UHFFFAOYSA-J tetrachloroplatinum Chemical compound Cl[Pt](Cl)(Cl)Cl FBEIPJNQGITEBL-UHFFFAOYSA-J 0.000 claims description 8
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 7
- BIXNGBXQRRXPLM-UHFFFAOYSA-K ruthenium(3+);trichloride;hydrate Chemical compound O.Cl[Ru](Cl)Cl BIXNGBXQRRXPLM-UHFFFAOYSA-K 0.000 claims description 7
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 6
- IBMCQJYLPXUOKM-UHFFFAOYSA-N 1,2,2,6,6-pentamethyl-3h-pyridine Chemical group CN1C(C)(C)CC=CC1(C)C IBMCQJYLPXUOKM-UHFFFAOYSA-N 0.000 claims description 5
- 229910009112 xH2O Inorganic materials 0.000 claims description 5
- -1 ytterbium carboxylates Chemical class 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 claims description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 4
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 claims description 4
- 239000004202 carbamide Substances 0.000 claims description 4
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 claims description 4
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 239000011591 potassium Substances 0.000 claims description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 claims description 4
- LJZVDOUZSMHXJH-UHFFFAOYSA-K ruthenium(3+);triiodide Chemical compound [Ru+3].[I-].[I-].[I-] LJZVDOUZSMHXJH-UHFFFAOYSA-K 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 3
- KUBYTSCYMRPPAG-UHFFFAOYSA-N ytterbium(3+);trinitrate Chemical class [Yb+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O KUBYTSCYMRPPAG-UHFFFAOYSA-N 0.000 claims description 3
- CKLHRQNQYIJFFX-UHFFFAOYSA-K ytterbium(III) chloride Chemical class [Cl-].[Cl-].[Cl-].[Yb+3] CKLHRQNQYIJFFX-UHFFFAOYSA-K 0.000 claims description 3
- 229920000877 Melamine resin Polymers 0.000 claims description 2
- 229910019029 PtCl4 Inorganic materials 0.000 claims description 2
- 229910021603 Ruthenium iodide Inorganic materials 0.000 claims description 2
- DOSXDVYWNFUSBU-UHFFFAOYSA-N [O-][N+](=O)[Pt][N+]([O-])=O Chemical compound [O-][N+](=O)[Pt][N+]([O-])=O DOSXDVYWNFUSBU-UHFFFAOYSA-N 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- MEXSQFDSPVYJOM-UHFFFAOYSA-J cerium(4+);disulfate;tetrahydrate Chemical compound O.O.O.O.[Ce+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O MEXSQFDSPVYJOM-UHFFFAOYSA-J 0.000 claims description 2
- 150000004985 diamines Chemical class 0.000 claims description 2
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 claims description 2
- 150000004687 hexahydrates Chemical class 0.000 claims description 2
- 150000004677 hydrates Chemical class 0.000 claims description 2
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 2
- FJDUDHYHRVPMJZ-UHFFFAOYSA-N nonan-1-amine Chemical compound CCCCCCCCCN FJDUDHYHRVPMJZ-UHFFFAOYSA-N 0.000 claims description 2
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 claims description 2
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 claims description 2
- NHWBVRAPBLSUQQ-UHFFFAOYSA-H ruthenium hexafluoride Chemical group F[Ru](F)(F)(F)(F)F NHWBVRAPBLSUQQ-UHFFFAOYSA-H 0.000 claims description 2
- OJLCQGGSMYKWEK-UHFFFAOYSA-K ruthenium(3+);triacetate Chemical compound [Ru+3].CC([O-])=O.CC([O-])=O.CC([O-])=O OJLCQGGSMYKWEK-UHFFFAOYSA-K 0.000 claims description 2
- WYRXRHOISWEUST-UHFFFAOYSA-K ruthenium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Ru+3] WYRXRHOISWEUST-UHFFFAOYSA-K 0.000 claims description 2
- PMMMCGISKBNZES-UHFFFAOYSA-K ruthenium(3+);tribromide;hydrate Chemical compound O.Br[Ru](Br)Br PMMMCGISKBNZES-UHFFFAOYSA-K 0.000 claims description 2
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 claims description 2
- KPZSTOVTJYRDIO-UHFFFAOYSA-K trichlorocerium;heptahydrate Chemical compound O.O.O.O.O.O.O.Cl[Ce](Cl)Cl KPZSTOVTJYRDIO-UHFFFAOYSA-K 0.000 claims description 2
- JCDQGOSXWGXOQQ-UHFFFAOYSA-H ytterbium(3+);tricarbonate Chemical class [Yb+3].[Yb+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O JCDQGOSXWGXOQQ-UHFFFAOYSA-H 0.000 claims description 2
- XASAPYQVQBKMIN-UHFFFAOYSA-K ytterbium(iii) fluoride Chemical class F[Yb](F)F XASAPYQVQBKMIN-UHFFFAOYSA-K 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000012267 brine Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 5
- 239000011149 active material Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000002585 base Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052747 lanthanoid Inorganic materials 0.000 description 4
- 150000002602 lanthanoids Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- LHBNLZDGIPPZLL-UHFFFAOYSA-K praseodymium(iii) chloride Chemical compound Cl[Pr](Cl)Cl LHBNLZDGIPPZLL-UHFFFAOYSA-K 0.000 description 4
- ALJCLXGXZFZGEM-UHFFFAOYSA-K ytterbium(3+);triacetate;tetrahydrate Chemical compound O.O.O.O.[Yb+3].CC([O-])=O.CC([O-])=O.CC([O-])=O ALJCLXGXZFZGEM-UHFFFAOYSA-K 0.000 description 4
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 3
- 238000001994 activation Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 239000003014 ion exchange membrane Substances 0.000 description 3
- 238000005488 sandblasting Methods 0.000 description 3
- 238000000550 scanning electron microscopy energy dispersive X-ray spectroscopy Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 2
- 229910000457 iridium oxide Inorganic materials 0.000 description 2
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- ISYHNFHKZXAPHG-UHFFFAOYSA-N ClO.[Ir] Chemical compound ClO.[Ir] ISYHNFHKZXAPHG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000003843 chloralkali process Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005485 electric heating Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000001523 electrospinning Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910000487 osmium oxide Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- JIWAALDUIFCBLV-UHFFFAOYSA-N oxoosmium Chemical compound [Os]=O JIWAALDUIFCBLV-UHFFFAOYSA-N 0.000 description 1
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- JQPTYAILLJKUCY-UHFFFAOYSA-N palladium(ii) oxide Chemical compound [O-2].[Pd+2] JQPTYAILLJKUCY-UHFFFAOYSA-N 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910003450 rhodium oxide Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- WGKCQSFQBYKUTC-UHFFFAOYSA-K trichloroytterbium;hydrate Chemical compound O.Cl[Yb](Cl)Cl WGKCQSFQBYKUTC-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- PHWPQNTXTCAARQ-UHFFFAOYSA-K ytterbium(3+);triacetate;hydrate Chemical compound O.[Yb+3].CC([O-])=O.CC([O-])=O.CC([O-])=O PHWPQNTXTCAARQ-UHFFFAOYSA-K 0.000 description 1
- FIXNOXLJNSSSLJ-UHFFFAOYSA-N ytterbium(III) oxide Inorganic materials O=[Yb]O[Yb]=O FIXNOXLJNSSSLJ-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
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Abstract
本发明涉及一种用于电解的电极,该电极具有包含氧化镱的涂层,其中本发明的用于电解的电极的特征在于显示出优异的耐久性和改善的过电压。
Description
技术领域
相关申请的交叉引用
本申请要求于2019年12月19日提交的韩国专利申请No.10-2019-0170676的优先权,该申请的公开内容通过引用并入本说明书中。
本发明涉及一种可以改善过电压的用于电解的电极及其制备方法。
背景技术
通过电解低成本的盐水例如海水来制备氢氧化物、氢气和氯气的技术广为人知。这种电解工艺也称为氯-碱工艺,并且可以认为是数十年来在商业运营中已经证明其性能和技术可靠性的工艺。
关于盐水的电解,离子交换膜法是目前最广泛使用的方法,其将离子交换膜安装在电解槽中以将电解槽分成阳离子室和阴离子室,使用盐水作为电解液以在阳极得到氯气,在阴极得到氢气和苛性钠。
盐水的电解通过下面的电化学反应式中所示的反应来进行。
阳极反应:2Cl-→Cl2+2e-(E0=+1.36V)
阴极反应:2H2O+2e-→2OH-+H2(E0=-0.83V)
总反应:2Cl-+2H2O→2OH-+Cl2+H2(E0=-2.19V)
在盐水的电解中,对于电解电压,除了盐水电解所需要的理论电压之外,还必须考虑阳极的过电压、阴极的过电压、由于离子交换膜的电阻引起的电压、以及由于阳极与阴极之间的距离引起的电压,在这些电压中由电极引起的过电压是一个重要变量。
因此,已经研究了能够降低电极的过电压的方法,其中,例如,已经开发了称为DSA(尺寸稳定的阳极)的贵金属类电极用作阳极,并且对于阴极需要开发具有耐久性和低的过电压的优异材料。
作为阴极主要使用不锈钢或镍,并且,近年来,为了降低过电压,已经研究了使用不锈钢或镍,通过用氧化镍、镍和锡的合金、活性炭和氧化物的组合、氧化钌或铂涂布其一个表面的方法。
此外,为了通过控制活性材料的组成来提高阴极的活性,还研究了通过使用铂族元素,例如钌,和镧系元素,例如铈来控制组成的方法。然而,发生了过电压现象,并且发生了由于反向电流引起的劣化问题。
现有技术文件
(专利文件1)JP2003-277967A
发明内容
技术问题
本发明的一个方面提供一种通过改善电极表面涂层的电性能可以降低过电压的用于电解的电极。
技术方案
根据本发明的一个方面,提供一种用于电解的电极,该用于电解的电极包括金属基底层,和包含氧化钌和氧化镱的涂层,其中所述涂层形成在所述基底层的至少一个表面上。
根据本发明的另一方面,提供一种用于电解的电极的制备方法,该制备方法包括以下步骤:将涂层组合物涂覆在金属基底的至少一个表面上,并且通过干燥和热处理其上涂覆有所述涂层组合物的所述金属基底形成涂层,其中,所述涂层组合物包含钌前体和镱前体。
有益效果
因为在涂层中包含的氧化镱改善了导电性,因此本发明的用于电解的电极表现出优异的过电压,并且还具有优异的基本耐久性。
具体实施方式
在下文中,将更详细地描述本发明。
应当理解,在说明书和权利要求书中使用的词语或术语不应该解释为在常用词典中定义的含义。还应该理解,基于发明人可以适当地定义词语或术语的含义以最好地解释发明的原则,词语或术语应该解释为具有与它们在相关领域的背景和本发明的技术构思中的含义一致的含义。
用于电解的电极
本发明提供一种用于电解的电极,该用于电解的电极包括金属基底层,和包含氧化钌和氧化镱的涂层,其中所述涂层形成在所述基底层的至少一个表面上。
所述金属基底可以是镍、钛、钽、铝、铪、锆、钼、钨、不锈钢或它们的合金,并且在这些金属中,所述金属基底可以优选是镍。在本发明的用于电解的电极中,在使用上述类型的金属基底的情况下,可以将优异的耐久性和机械强度提供给电极。
在本发明的用于电解的电极中,所述涂层包含氧化钌。氧化钌作为活性材料在向涂层提供钌元素中发挥作用,其中,在用于电解的电极的涂层中使用氧化钌的情况下,电极性能随时间的变化小,同时改善过电压现象,并且,后续的单独活化过程可以最小化。氧化钌包括其中钌元素和氧原子结合的所有类型的氧化物,并且特别地,可以是二氧化物或四氧化物。
在本发明的用于电解的电极中,所述涂层包含氧化镱。由于氧化镱具有优异的电导率值并且与氧化钌结合,因此可以提高涂层的导电性,相应地,可以改善最终的用于电解的电极的过电压。氧化镱包括其中镱元素和氧原子结合的所有类型的氧化物,并且特别地,可以是氧化镱(III)(Yb2O3)。
在所述涂层中包含的钌元素和镱元素之间的摩尔比可以在100:5至100:30,例如,100:10至100:20的范围内。在所述涂层中包含的钌元素和镱元素之间的摩尔比在上述范围内的情况下,可以使改善涂层导电性的效果最大化。
在本发明的用于电解的电极中,所述涂层还可以包含铂族氧化物。铂族氧化物是指铂族元素中除前述的钌以外的其余元素的氧化物,并且,具体地,可以是氧化铑、氧化钯、氧化锇、氧化铱或氧化铂。由铂族氧化物提供的铂族元素可以如钌元素一样作为活性材料,并且,在铂族氧化物和氧化钌一起包含在涂层中的情况下,在电极的耐久性和过电压方面可以表现出更好的效果。铂族氧化物包括铂族元素和氧原子结合的所有类型的氧化物,并且特别地,可以是二氧化物或四氧化物,并且理想的是铂族氧化物是氧化铂或氧化铱。
在所述涂层中包含的钌元素和铂族元素之间的摩尔比可以在100:2至100:20,例如,100:5至100:15的范围内。在涂层中包含的钌元素和铂族元素之间的摩尔比在上述范围内的情况下,在改善耐久性和过电压方面是理想的,其中,在铂族元素的含量小于上述范围的情况下,耐久性和过电压会退化,并且,在铂族元素的含量大于上述范围的情况下,在经济效益方面是不利的。
在本发明的用于电解的电极中,催化剂层还可以包含氧化铈,氧化铈在将镧系元素提供给用于电解的电极的涂层中发挥作用。由氧化铈提供的铈元素可以通过改善用于电解的电极的耐久性,在活化或电解过程中使用于电解的电极的催化剂层中作为活性材料的钌元素的损失最小化。
具体地,在用于电解的电极活化或电解过程中,在催化剂层中包含钌元素的粒子在不改变其结构的情况下成为金属元素,或者部分水合并还原为活性物质。此外,由于在催化剂层中包含镧系元素的粒子将其结构变为针状,因此这些粒子充当防止在催化剂层中包含钌元素的粒子物理脱离的保护材料,并且,因此,可以改善用于电解的电极的耐久性以防止涂层中的钌元素损失。氧化铈包括铈元素和氧原子结合的所有类型的氧化物,特别地,可以是(II)、(III)或(IV)的氧化物。
在所述涂层中包含的钌元素和铈元素之间的摩尔比可以在100:5至100:30,例如,100:10至100:20的范围内。在涂层中包含的钌元素和铈元素之间的摩尔比在上述范围内的情况下,用于电解的电极的耐久性和导电性之间的平衡可以是优异的。
用于电解的电极的制备方法
本发明提供一种用于电解的电极的制备方法,该制备方法包括以下步骤:将涂层组合物涂覆在金属基底的至少一个表面上,并且通过干燥和热处理其上涂覆有所述涂层组合物的所述金属基底形成涂层,
其中,所述涂层组合物包含钌前体和镱前体。
在本发明的用于电解的电极的制备方法中,所述金属基底可以与前述的用于电解的电极的金属基底相同。
在本发明的用于电解的电极的制备方法中,所述涂层组合物可以包含钌前体和镱前体。钌前体和镱前体通过在涂覆后的热处理步骤中被氧化而转化为氧化物。
钌前体可以在没有具体限制的情况下使用,只要其是能够形成氧化钌的化合物即可,例如,可以是钌的水合物、氢氧化物、卤化物或氧化物,并且可以具体地是选自六氟化钌(RuF6)、氯化钌(III)(RuCl3)、水合氯化钌(III)(RuCl3·xH2O)、溴化钌(III)(RuBr3)、水合溴化钌(III)(RuBr3·xH2O)、碘化钌(RuI3)和乙酸钌中的至少一种。当使用上面列出的钌前体时,可以容易形成氧化钌。
镱前体可以在没有具体限制的情况下使用,只要其是能够形成氧化镱的化合物即可,并且,例如,镱前体可以是选自羧酸镱、硝酸镱、碳酸镱、氯化镱、氟化镱、氧化镱、磺酸镱和它们的水合物中的至少一种。具体地,可以使用硝酸镱、乙酸镱、水合乙酸镱、氯化镱或水合氯化镱。当使用上面列出的镱前体时,可以容易形成氧化镱。
所述涂层组合物还可以包含用于形成涂层中的铂族氧化物的铂族前体。铂族前体可以在没有具体限制的情况下使用,只要其是能够形成铂族氧化物的化合物即可,可以是,例如,铂族元素的水合物、氢氧化物、卤化物或氧化物,并且具体地可以是选自六水合氯铂酸(H2PtCl6·6H2O)、二胺二硝基铂(Pt(NH3)2(NO)2)、氯化铂(IV)(PtCl4)、氯化铂(II)(PtCl2)、四氯铂酸钾(K2PtCl4)和六氯铂酸钾(K2PtCl6)中的至少一种铂前体,或者可以是铱前体,例如氯化铱或水合氯化铱(IrCl3·xH2O)。当使用上面列出的铂族前体时,可以容易形成铂族氧化物。
所述涂层组合物还可以包含用于形成涂层中的氧化铈的铈前体。铈前体可以在没有具体限制的情况下使用,只要其是能够形成氧化铈的化合物即可,可以是,例如,铈元素的水合物、氢氧化物、卤化物或氧化物,并且可以具体地是选自六水合硝酸铈(III)(Ce(NO3)3·6H2O)、四水合硫酸铈(IV)(Ce(SO4)2·4H2O)和七水合氯化铈(III)(CeCl3·7H2O)中的至少一种铈前体。当使用上面列出的铈前体时,可以容易形成氧化铈。
在本发明的用于电解的电极的制备方法中,所述涂层组合物还可以包含胺类添加剂以在涂层和金属基底之间提供强粘附力。具体地,胺类添加剂可以改善涂层中包含的钌元素、铂族元素和镱元素之间的结合力,并且可以控制包含钌元素的粒子的氧化态以制备更适合反应的形式的电极。
在本发明中使用的胺类添加剂由于其在水中的高溶解度同时具有胺基,因此特别适用于形成涂层。可以在本发明中使用的胺类添加剂包括三聚氰胺、氨、尿素、1-丙胺、1-丁胺、1-戊胺、1-庚胺、1-辛胺、1-壬胺或1-十二胺,并且可以使用选自其中的至少一种。
在本发明的用于电解的电极中,涂层的钌元素和胺类添加剂可以以100:10至100:50,例如100:25至100:35的摩尔比被包含。在包含小于上述摩尔比范围的胺类添加剂的情况下,通过该添加剂改善结合力的效果不明显,并且,在包含超过上述摩尔比范围的胺类添加剂的情况下,由于在涂层液中可以容易地产生沉淀物,因此不仅会降低涂层的均匀性,而且还会阻碍氧化钌的功能。
在本发明的用于电解的电极的制备方法中,可以使用醇类溶剂作为涂层组合物的溶剂。在使用醇类溶剂的情况下,上述组分容易溶解,并且即使在涂覆涂层组合物之后形成涂层的步骤中,也可以保持各组分的结合力。优选地,可以使用异丙醇和丁氧基乙醇中的至少一种作为溶剂,并且,更优选地,可以使用异丙醇和丁氧基乙醇的混合物。在混合使用异丙醇和丁氧基乙醇的情况下,与单独使用异丙醇和丁氧基乙醇的情况相比,可以进行均匀涂布。
在本发明的制备方法中,所述制备方法可以包括在进行涂布之前对金属基底进行预处理的步骤。
所述预处理可以包括通过化学蚀刻、喷砂或热喷涂在金属基底的表面上形成不规则度。
所述预处理可以通过对金属基底的表面进行喷砂以形成细小的不规则度,并进行盐或酸处理来进行。例如,预处理可以以如下方式进行,金属基底的表面用氧化铝喷砂以形成不规则度,浸入硫酸水溶液中,清洗并干燥以在金属基底的表面上形成细小的不规则度。
对涂覆没有特别地限制只要可以将催化剂组合物均匀地涂覆在金属基底上并且可以通过本领域已知的方法进行即可。
涂覆可以通过选自刮板(doctor blading)、模铸、逗号刮刀涂布(commacoating)、丝网印刷、喷涂、静电纺丝、辊涂和刷涂中的任何一种方法来进行。
干燥可以在50℃至300℃下进行5分钟至60分钟,并且可以优选地在50℃至200℃下进行5分钟至20分钟。
当满足上述条件时,可以在充分除去溶剂的同时使能耗最小化。
热处理可以在400℃至600℃下进行1小时以下,并且可以优选地在450℃至550℃下进行5分钟至30分钟。
当满足上述条件时,不会影响金属基底的强度,同时容易除去催化剂层中的杂质。
涂布可以通过依次重复涂覆、干燥和热处理来进行,使得每单位面积(m2)的金属基底的氧化钌的量为10g以上。即,在将催化剂组合物涂覆在金属基底的至少一个表面上、干燥并热处理之后,根据本发明的另一实施方案的制备方法可以通过反复涂覆、干燥和热处理涂覆有第一催化剂组合物的金属基底的所述一个表面来进行。
在下文中,将根据实施例和实验例更详细地描述本发明,但是,本发明不限于这些实施例和实验例。然而,本发明可以包含很多不同的形式并且不应当理解为限于此处列出的实施方案。相反,提供这些实施方案以使本说明书全面和完整,并且将向本领域技术人员完全传达本发明的范围。
材料
在本实施例中,使用由Ildong Gold Mesh制造的镍网基底(镍纯度为99%以上,200μm)作为金属基底,使用水合氯化钌(III)(RuCl3·nH2O)作为钌前体,使用氯化铂(IV)作为铂族前体,使用六水合硝酸铈(III)(Ce(NO3)3·6H2O)作为铈前体,以及使用四水合乙酸镱(Yb(CH3COO)3·4H2O)作为镱前体。使用尿素作为胺类添加剂。
此外,使用2.375ml的异丙醇和2.375ml的2-丁氧基乙醇的混合物作为涂层组合物的溶剂。
金属基底的预处理
在金属基底上形成涂层之前,用氧化铝(白色氧化铝,F120)在0.4MPa的压力下对基底的表面喷砂之后,将基底放入加热到80℃的5M H2SO4水溶液中处理3分钟,然后用蒸馏水洗涤以完成预处理。
实施例1
将2.41mmol的水合氯化钌(III)、0.1928mmol的氯化铂(IV)、和0.482mmol的四水合乙酸镱充分溶解于上述材料的混合溶剂中1小时,并添加0.045g的尿素并混合以制备涂层组合物。使用刷子将涂层组合物涂布在先前预处理过的金属基底上,并且将涂布的金属基底置于对流干燥烘箱中并在180℃下干燥10分钟。此后,将其放入500℃的电加热炉中并进一步热处理10分钟,并且在重复上述涂布、干燥和热处理过程9次之后,通过在500℃下进行最终热处理1小时来最终制备用于电解的电极。
实施例2
除了将0.241mmol的六水合硝酸铈(III)进一步添加到实施例1中的涂层组合物中并且添加0.241mmol的四水合乙酸镱之外,以相同方式制备用于电解的电极。
实施例3
除了不将氯化铂(IV)添加到实施例1中的涂层组合物中之外,以相同方式制备用于电解的电极。
实施例4
除了不将氯化铂(IV)添加到实施例2中的涂层组合物中之外,以相同方式制备用于电解的电极。
实施例5
除了在实施例2中添加0.3615mmol的铈前体和0.1205mmol的镱前体外,以相同方式制备用于电解的电极。
实施例6
除了在实施例2中添加0.1205mmol的铈前体和0.3615mmol的镱前体之外,以相同方式制备用于电解的电极。
比较例1
除了在实施例2中不添加四水合乙酸镱而是添加0.482mmol的六水合硝酸铈(III)之外,以相同方式制备用于电解的电极。
比较例2
除了不将氯化铂(IV)添加到比较例1中的涂层组合物中之外,以相同方式制备用于电解的电极。
比较例3
除了在实施例2中添加0.241mmol的氯化镨(III)(PrCl3)代替所述镱前体之外,以相同方式制备用于电解的电极。
比较例4
除了不将氯化铂(IV)添加到比较例1中的涂层组合物中,并且添加0.482mmol的氯化镨(III)(PrCl3)代替所述铈前体之外,以相同方式制备用于电解的电极。
在实施例和比较例中制备的电极涂层的组分的摩尔比总结在下面的表1中。
[表1]
实验例1.电极的涂层的SEM-EDX分析
使用扫描电子显微镜-能量色散X射线光谱(SEM-EDX)分析在实施例2和比较例1中制备的电极涂层的组分,其结果显示在下面表2中。
[表2]
Ni(重量%) | Ru(重量%) | Ce(重量%) | Pt(重量%) | Yb(重量%) | |
实施例2 | 10.16 | 43.27 | 12.88 | 12.08 | 21.62 |
比较例1 | 24.83 | 42.14 | 15.21 | 15.14 | - |
根据上述结果,在涂层组合物中包含镱前体的实施例2中,镱组分顺利地形成电极涂层,但是,对于使用不包含镱前体的涂层组合物进行涂布的比较例,确认在电极涂层中未检测到镱成分。
实验例2.制备的用于电解的电极的性能检查
为了确认在实施例和比较例中制备的电极的性能,使用氯-碱电解中的半电池进行阴极电压测量试验。使用32%的NaOH水溶液作为电解液,使用铂(Pt)丝作为对电极,以及使用Hg/HgO电极作为参比电极。将制备的电极放入电解液中后,在-0.62A/cm2的恒定电流密度下激活电极1小时,然后将每个电极的性能与第1个小时的电位值进行比较。其结果总结在下面表3中。
[表3]
从上述结果确认,当在涂层中还包含氧化镱时,出现了改善过电压的效果。具体地,当在涂层中包含氧化镱时,确认可以实现具有优异耐久性的用于电解的电极,同时由于氧化镱的优异导电性抑制了性能劣化。
特别是,关于使用与镱相同对应于镧系元素的镨的比较例3和比较例4,发现性能比实施例差,并且在实施例中,其中以最高比率使用具有优异导电性的镱的实施例6的性能特别优异。然而,关于实施例6,由于镱的量增加,铈的量较小,因此在耐久性方面比其它实施例差,并且确认在电解过程之后部分涂层剥落。
Claims (14)
1.一种用于电解的电极,该电极包括:
金属基底层;和
包含氧化钌和氧化镱的涂层,
其中,所述涂层形成在所述基底层的至少一个表面上。
2.根据权利要求1所述的用于电解的电极,其中,在所述涂层中包含的钌元素与镱元素的摩尔比在100:5至100:30的范围内。
3.根据权利要求1所述的用于电解的电极,其中,所述涂层还包含铂族氧化物。
4.根据权利要求3所述的用于电解的电极,其中,在所述涂层中包含的钌元素与铂族元素的摩尔比在100:2至100:20的范围内。
5.根据权利要求1所述的用于电解的电极,其中,所述涂层还包含氧化铈。
6.根据权利要求5所述的用于电解的电极,其中,在所述涂层中包含的钌元素与铈元素的摩尔比在100:5至100:30的范围内。
7.一种用于电解的电极的制备方法,该制备方法包括:
将涂层组合物涂覆在金属基底的至少一个表面上;和
通过干燥和热处理其上涂覆有所述涂层组合物的所述金属基底形成涂层,
其中,所述涂层组合物包含钌前体和镱前体。
8.根据权利要求7所述的制备方法,其中,所述涂层组合物还包含铂族前体。
9.根据权利要求7所述的制备方法,其中,所述涂层组合物还包含铈前体。
10.根据权利要求7所述的制备方法,其中,所述钌前体是选自六氟化钌(RuF6)、氯化钌(III)(RuCl3)、水合氯化钌(III)(RuCl3·xH2O)、溴化钌(III)(RuBr3)、水合溴化钌(III)(RuBr3·xH2O)、碘化钌(RuI3)和乙酸钌中的至少一种。
11.根据权利要求7所述的制备方法,其中,所述镱前体是选自羧酸镱、硝酸镱、碳酸镱、氯化镱、氟化镱、氧化镱、磺酸镱、以及它们的水合物中的至少一种。
12.根据权利要求8所述的制备方法,其中,所述铂族前体是选自六水合氯铂酸(H2PtCl6·6H2O)、二胺二硝基铂(Pt(NH3)2(NO)2)、氯化铂(IV)(PtCl4)、氯化铂(II)(PtCl2)、四氯铂酸钾(K2PtCl4)和六氯铂酸钾(K2PtCl6)中的至少一种。
13.根据权利要求9所述的制备方法,其中,所述铈前体是选自六水合硝酸铈(III)(Ce(NO3)3·6H2O)、四水合硫酸铈(IV)(Ce(SO4)2·4H2O)和七水合氯化铈(III)(CeCl3·7H2O)中的至少一种。
14.根据权利要求7所述的制备方法,其中,所述涂层组合物还包含选自三聚氰胺、氨、尿素、1-丙胺、1-丁胺、1-戊胺、1-庚胺、1-辛胺、1-壬胺和1-十二胺中的至少一种胺类添加剂。
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