CN113909198B - Cleaning device for wafer semiconductor processing - Google Patents
Cleaning device for wafer semiconductor processing Download PDFInfo
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- CN113909198B CN113909198B CN202111038667.7A CN202111038667A CN113909198B CN 113909198 B CN113909198 B CN 113909198B CN 202111038667 A CN202111038667 A CN 202111038667A CN 113909198 B CN113909198 B CN 113909198B
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- Prior art keywords
- fixedly connected
- cleaning
- side wall
- transmission shaft
- gear
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/041—Cleaning travelling work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a cleaning device for wafer semiconductor processing, which comprises a supporting base, wherein the upper end surface of the supporting base is fixedly connected with a filter box, the upper end surface of the filter box is communicated with a cleaning box, the upper end surface of the cleaning box is provided with a cover plate, the upper end surface of the cover plate is fixedly connected with a mounting base, the upper end surface of the mounting base is fixedly connected with a driving motor, a transmission shaft is connected in the cover plate in a penetrating and rotating manner, the output shaft of the driving motor is fixedly connected with a transmission shaft, and a rotating pipe is connected on the transmission shaft in a rotating manner. According to the invention, the driving mechanism and the transmission mechanism are arranged, and the wafer placed on the placing frame is driven by the transmission shaft to drive the rotary pipe to reversely rotate by utilizing the meshing driving of the multiple gears, so that the contact rate of the wafer and the cleaning liquid in the cleaning process is increased, and meanwhile, the self-rotation of the placing frame in the cleaning box is realized, and the multi-angle cleaning of the wafer and the convenient impurity separation are realized.
Description
Technical Field
The invention relates to the technical field of wafer production, in particular to a cleaning device for wafer semiconductor processing.
Background
Semiconductor (semiconductor) refers to a material having conductivity between that of a conductor and an insulator at normal temperature. A semiconductor refers to a material whose conductivity can be controlled, ranging from an insulator to a conductor. The importance of semiconductors is enormous, both from a technological and an economic point of view. Common semiconductor materials are silicon, germanium, gallium arsenide, etc., and silicon is one of the most influential in commercial applications among various semiconductor materials.
The wafer can remain certain cutting raw materials and the impurity that produces in the cutting process at the surface in-process of production, consequently the wafer need wash the wafer before carrying out further processing, and current belt cleaning device is when using, because only wash impurity on the wafer surface through the washing flow and wash and lead to the cleaning performance relatively poor, and can't realize the circulation use of washing liquid in actual use and lead to wastage and excessive consumption of washing liquid in the cleaning process.
Disclosure of Invention
The invention aims to solve the defects in the prior art and provides a cleaning device for wafer semiconductor processing.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
the utility model provides a belt cleaning device for wafer semiconductor processing, includes the support base, the up end fixedly connected with rose box of support base, the up end intercommunication of rose box has the wash box, the up end of wash box is equipped with the apron, the up end fixedly connected with installation base of apron, the up end fixedly connected with driving motor of installation base, run through in the apron and rotate and be connected with the transmission shaft, driving motor's output shaft fixedly connected with transmission shaft, it is connected with the dwang to rotate on the transmission shaft, be equipped with the actuating mechanism who is used for realizing the reverse rotation drive of dwang between transmission shaft and the dwang, fixedly connected with a plurality of installation sleeve pipes on the lateral wall of dwang, circumferential direction is connected with a plurality of racks on the lateral wall of installation sleeve pipe, be equipped with the drive mechanism who is used for the rack to rotate in-process on the lateral wall of dwang, a plurality of dwang, the indent internal being equipped with of rotating is used for placing the board, be equipped with the fixed mechanism to the wafer in the washing process, be equipped with in the rose box and be used for circulating mechanism to circulation and filtration.
Preferably, the driving mechanism comprises a driving gear fixedly connected to the side wall of the transmission shaft, the lower end face of the cover plate is fixedly connected with a connecting frame, the tail end of the lower end of the connecting frame is fixedly connected with a transition gear, the upper end face of the rotating tube is fixedly connected with a transmission gear, the transition gear is meshed with the driving gear and the transmission gear, the driving gear and the transition gear are all skewed in teeth.
Preferably, the transmission mechanism comprises a plurality of power gears fixedly connected to the side wall of the rotating pipe, a connecting gear is fixedly connected to the side wall of the rotating shaft of the placing frame, the connecting gear is meshed with the power gears, and the connecting gear and the power gears are bevel gears.
Preferably, the fixing mechanism comprises a mounting groove formed in the placing plate, the front end side wall of the placing plate is rotationally connected with a rotating plate, a plurality of circumferentially arranged drain holes are circumferentially formed in the side wall of the rotating plate, a mounting ring is formed in the front end side wall of the rotating plate, a plurality of circumferentially arranged fixing plates are fixedly connected in the mounting ring, a plurality of circumferentially arranged valves are fixedly connected to the inner side wall of the mounting ring, a plurality of valves form a circle, and the valves are arranged at the rear side position of the fixing plate.
Preferably, the circulation mechanism comprises two symmetrically arranged water pumps fixedly connected to the upper end face of the supporting base, a water inlet and a water outlet of the water pumps are respectively communicated with the filter tank and the cleaning tank, a filter screen is arranged at the communicating position of the filter tank and the cleaning tank, and the lower end part of the transmission shaft extends into the filter tank and is fixedly connected with fan blades at the bottom.
Preferably, a plurality of limiting plates are fixedly connected to the circumference of the lower end face of the cover plate, a plurality of limiting grooves are circumferentially formed in the side wall of the cleaning box, the limiting plates are slidably connected in the limiting grooves, a limiting ring is fixedly connected to the side wall of the cleaning box, and a plurality of lower end faces of the limiting plates extend into the limiting ring.
Preferably, the connecting plate is fixedly connected to the inner side wall of the limiting plate, two symmetrically arranged iron cores are fixedly connected to the side wall of the connecting plate, a plurality of coils are wound on the side wall of the iron core, a plurality of circumferentially arranged contact blocks are fixedly connected to the side wall of the limiting groove of the cleaning box, sliding contact pieces are fixedly connected to the side wall of the left end and the right end of the limiting plate, the sliding contact pieces are electrically connected with the contact blocks at the left side and the right side, and the sliding contact pieces are electrically connected with the coils.
Preferably, a plurality of circumferentially arranged magnetic blocks are fixedly connected to the side wall of the front end of the placement plate, and the magnetic poles of the magnetic blocks are opposite to those of the inner side end of the iron core.
Compared with the prior art, the invention has the beneficial effects that:
1. through setting up actuating mechanism and drive mechanism, utilize the meshing drive of many gears to realize placing the wafer on the rack and drive the reverse rotation of rotation pipe under the drive of transmission shaft to increase the wafer in the cleaning process with the contact rate of washing liquid, realize the rack simultaneously and rinse the self-rotation of incasement, realize the multi-angle of wafer and wash and convenient impurity breaks away from.
2. Through setting up structures such as rotor plate, collar, fixed plate and valve, realize that the washing liquid is the flow mode of unidirection entering and unidirection outflow with the in-process of wafer contact, when convenient impurity clearance, keep the single flow direction of washing liquid to improve the cleaning efficiency of wafer impurity.
3. Through setting up circulation mechanism, utilize the filter screen to separate abluent impurity at the washing incasement to through the upper end that the water pump circulated the washing liquid to the washing case, realize the circulation of washing liquid and use, accelerate the circulation of washing liquid at the washing incasement simultaneously, improve clean efficiency.
Drawings
FIG. 1 is a schematic view showing a lifting state of a cover plate of a cleaning device for wafer semiconductor processing according to the present invention;
FIG. 2 is a front view of a cleaning apparatus for wafer semiconductor processing according to the present invention;
fig. 3 is a schematic diagram illustrating the installation of an iron core of a cleaning device for wafer semiconductor processing according to the present invention;
fig. 4 is a schematic view showing a structure of a fixing mechanism of a cleaning device for wafer semiconductor processing according to the present invention
FIG. 5 is an enlarged schematic view of the cleaning apparatus for wafer semiconductor processing according to the present invention;
FIG. 6 is an enlarged schematic view of the cleaning apparatus for wafer semiconductor processing according to the present invention;
fig. 7 is a schematic diagram of the internal structure of a filter box of a cleaning device for wafer semiconductor processing according to the present invention.
In the figure: 1 supporting base, 2 cleaning box, 3 apron, 4 lug, 5 installation base, 6 driving motor, 7 limiting plate, 8 contact block, 9 smooth contact piece, 10 spacing ring, 11 rose box, 12 spacing groove, 13 water pump, 14 conveyer pipe, 15 connecting plate, 16 iron cores, 17 rotation pipe, 18 rack, 19 place the board, 20 magnet, 21 mounting groove, 22 rotation board, 23 collar, 24 fixed plate, 25 valve, 26 drive gear, 27 transmission shaft, 28 drive gear, 29 transition gear, 30 link, 31 installation sleeve pipe, 32 connecting gear, 33 power gear, 34 flabellum, 35 filter screen.
Detailed Description
In order that the above objects, features and advantages of the invention will be readily understood, a more particular description of the invention will be rendered by reference to the appended drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The invention may be embodied in many other forms than described herein and similarly modified by those skilled in the art without departing from the spirit or scope of the invention, which is therefore not limited to the specific embodiments disclosed below.
It will be understood that when an element is referred to as being "fixed to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like are used herein for illustrative purposes only and are not meant to be the only embodiment.
Referring to fig. 1-7, a cleaning device for wafer semiconductor processing comprises a supporting base 1, wherein the upper end surface of the supporting base 1 is fixedly connected with a filter box 11, the upper end surface of the filter box 11 is communicated with a cleaning box 2, the upper end surface of the cleaning box 2 is provided with a cover plate 3, the lower end surface of the cover plate 3 is fixedly connected with a plurality of limiting plates 7 in the circumferential direction, the side wall of the cleaning box 2 is provided with a plurality of limiting grooves 12 in the circumferential direction, the limiting plates 7 are slidably connected in the limiting grooves 12, the side wall of the cleaning box 2 is fixedly connected with a limiting ring 10, and the lower end surfaces of the limiting plates 7 extend into the limiting ring 10;
the inner side walls of the limiting plates 7 are fixedly connected with connecting plates 15, the side walls of the connecting plates 15 are fixedly connected with two symmetrically arranged iron cores 16, a plurality of strands of coils are wound on the side walls of the iron cores 16, a plurality of circumferentially arranged contact blocks 8 are fixedly connected on the side walls of the limiting grooves 12 where the cleaning boxes 2 are arranged, the side walls of the left and right ends of the limiting plates 7 are fixedly connected with sliding contact pieces 9, the sliding contact pieces 9 on the left and right sides are electrically connected with the contact blocks 8, and the sliding contact pieces 9 are electrically connected with the coils;
the up end fixedly connected with installation base 5 of apron 3, the up end fixedly connected with driving motor 6 of installation base 5, run through in the apron 3 and rotate and be connected with transmission shaft 27, the output shaft fixedly connected with transmission shaft 27 of driving motor 6, rotationally be connected with pivoted tube 17 on the transmission shaft 27, be equipped with the actuating mechanism who is used for realizing pivoted tube 17 reverse rotation drive between transmission shaft 27 and the pivoted tube 17, actuating mechanism includes the drive gear 28 of fixed connection on transmission shaft 27 lateral wall, the lower terminal surface fixedly connected with link 30 of apron 3, the terminal fixedly connected with transition gear 29 of lower extreme of link 30, the up end fixedly connected with drive gear 26 of pivoted tube 17, transition gear 29 and drive gear 28, transmission gear 26 all mesh, and drive gear 26, drive gear 28 and the equal helical tooth of transition gear 29.
The side wall of the rotating pipe 17 is fixedly connected with a plurality of mounting sleeves 31, the side wall of the mounting sleeve 31 is connected with a plurality of placing racks 18 in a circumferential rotation mode, a transmission mechanism used for rotating in the rotating process of the placing racks 18 is arranged on the side wall of the rotating pipe 17 and comprises a plurality of power gears 33 fixedly connected to the side wall of the rotating pipe 17, a connecting gear 32 is fixedly connected to the side wall of the rotating shaft of the placing racks 18, the connecting gear 32 is meshed with the power gears 33, and the connecting gear 32 and the power gears 33 are bevel gears.
The rack 18 is provided with a plurality of rotating grooves, the rotating grooves are rotationally connected with a placing plate 19, a fixing mechanism used for fixing the wafer in the cleaning process is arranged in the placing plate 19, the fixing mechanism comprises a mounting groove 21 arranged in the placing plate 19, the front end side wall of the placing plate 19 is rotationally connected with a rotating plate 22, the side wall of the rotating plate 22 is circumferentially provided with a plurality of circumferentially arranged drain holes, the front end side wall of the rotating plate 22 is provided with a mounting ring 23, a plurality of circumferentially arranged fixing plates 24 are fixedly connected in the mounting ring 23, the inner side wall of the mounting ring 23 is fixedly connected with a plurality of circumferentially arranged valves 25, the valves 25 form a circle, and the valves 25 are arranged at the rear side position of the fixing plate 24.
A plurality of circumferentially arranged magnetic blocks 20 are fixedly connected to the front end side wall of the placement plate 19, and the magnetic poles of the magnetic blocks 20 are opposite to those of the inner side end of the iron core 16.
Be equipped with in the rose box 11 and be used for circulating and filterable circulation mechanism to the washing liquid, circulation mechanism includes two water pumps 13 that symmetry set up of fixed connection at supporting base 1 up end, and the water inlet and the delivery port of water pump 13 communicate rose box 11 and washs case 2 respectively, and the intercommunication department of rose box 11 and washs case 2 is equipped with filter screen 35, and the lower extreme tip of transmission shaft 27 extends to in the rose box 11 and bottom fixedly connected with flabellum 34.
The invention can explain its functional principle by the following modes of operation: as shown in fig. 1-7, firstly, the rotating plate 22 is opened to place a wafer in the mounting groove 21, then the rotating plate 22 is closed, then a certain amount of cleaning liquid is added into the cleaning box 2, the driving motor 6 is started to drive the transmission shaft 27 to rotate, in the process, the driving gear 28 on the transmission shaft 27 is meshed with the transition gear 29, the power transmission is realized to drive the rotation of the transmission gear 26, the rotation driving of the rotating tube 17 is realized along with the rotation of the transmission gear 26, then the rotating tube 17 drives the plurality of placing frames 18 to rotate, at the moment, the rotating direction of the placing frames 18 is opposite to the rotating direction of the transmission shaft 27, and simultaneously, the self-rotation of the placing frames 18 is driven under the meshing transmission of the power gear 33 on the rotating tube 17 and the connecting gear 32;
in the process, the cleaning liquid enters the mounting groove 21 from the mounting ring 23, unidirectional circulation of the cleaning liquid is realized under the action of the valve 25 and the fixing plate 24, after the cleaning liquid enters the mounting groove 21 to be contacted with the wafer, the surface of the wafer is cleaned, and then the cleaned cleaning liquid is discharged from the plurality of drain holes, and the pressure of the cleaning liquid entering the mounting groove 21 from the valve 25 is larger than the pressure of the cleaning liquid entering the drain holes, so that the cleaning liquid cannot be injected into the mounting groove 21 from the drain Kong Fanxiang, and the unidirectional circulation of the cleaning liquid in the mounting groove 21 is realized;
when the cover plate 3 falls to the limit plate 7 to be attached to the limit ring 10, the sliding contact piece 9 is in contact with the contact block 8 at the moment, the coil on the iron core 16 is electrified, the end face of the iron core 16, which is close to one side of the cleaning box 2, generates a magnetic pole opposite to the magnetic block 20, and the relative rotation between the placing plate 19 and the placing frame 18 is driven at the moment, so that the contact probability of a wafer on the placing plate 19 and cleaning liquid is increased, and the cleaning effect of the wafer is improved;
the circulating cleaning fluid flows into the filter tank 11, the water pump 13 pumps the cleaning fluid and re-conveys the cleaning fluid into the cleaning tank 2 through the conveying pipe 14, and the circulating cleaning fluid is subjected to a filtration and impurity removal process by the filter screen 35 in the process, so that the recycling and impurity cleaning processes of the cleaning fluid are realized.
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical scheme of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.
Claims (1)
1. The utility model provides a cleaning device for wafer semiconductor processing, includes support base (1), its characterized in that, the up end fixedly connected with rose box (11) of support base (1), the up end intercommunication of rose box (11) has washs case (2), the up end of washs case (2) is equipped with apron (3), the up end fixedly connected with installation base (5) of apron (3), the up end fixedly connected with driving motor (6) of installation base (5), run through in apron (3) and rotate and be connected with transmission shaft (27), the output shaft fixedly connected with transmission shaft (27) of driving motor (6), rotate on transmission shaft (27) and be connected with slewing pipe (17), be equipped with the actuating mechanism that is used for realizing slewing pipe (17) reverse rotation drive between transmission shaft (27) and the slewing pipe (17), fixedly connected with a plurality of installation sleeve (31) on the lateral wall of slewing pipe (17), circumference is connected with a plurality of racks (18) on the lateral wall of installation sleeve (31), be equipped with on the lateral wall of slewing pipe (17) and be used for rotating in the slewing pipe (18) and set up in the slewing pipe (17) and rotate in the groove (18), a fixing mechanism for fixing the wafer in the cleaning process is arranged in the placing plate (19), and a circulating mechanism for circulating and filtering the cleaning liquid is arranged in the filter box (11);
the driving mechanism comprises a driving gear (28) fixedly connected to the side wall of a transmission shaft (27), a connecting frame (30) is fixedly connected to the lower end face of the cover plate (3), a transition gear (29) is fixedly connected to the tail end of the lower end of the connecting frame (30), a transmission gear (26) is fixedly connected to the upper end face of the rotating tube (17), the transition gear (29) is meshed with the driving gear (28) and the transmission gear (26), the driving gear (28) and the transition gear (29) are inclined gears;
the transmission mechanism comprises a plurality of power gears (33) fixedly connected to the side wall of the rotating pipe (17), a connecting gear (32) is fixedly connected to the side wall of the rotating shaft of the placing frame (18), the connecting gear (32) is meshed with the power gears (33), and the connecting gear (32) and the power gears (33) are bevel gears;
the fixing mechanism comprises a mounting groove (21) formed in a placing plate (19), a rotating plate (22) is rotatably connected to the side wall of the front end of the placing plate (19), a plurality of circumferentially arranged drain holes are circumferentially formed in the side wall of the rotating plate (22), a mounting ring (23) is formed in the side wall of the front end of the rotating plate (22), a plurality of circumferentially arranged fixing plates (24) are fixedly connected in the mounting ring (23), a plurality of circumferentially arranged valves (25) are fixedly connected to the inner side wall of the mounting ring (23), a plurality of valves (25) form a circle, and the valves (25) are arranged at the rear side position of the fixing plates (24);
the circulating mechanism comprises two symmetrically arranged water pumps (13) fixedly connected to the upper end face of the supporting base (1), a water inlet and a water outlet of each water pump (13) are respectively communicated with the filtering box (11) and the cleaning box (2), a filter screen (35) is arranged at the communication position of the filtering box (11) and the cleaning box (2), the lower end part of the transmission shaft (27) extends into the filtering box (11), and fan blades (34) are fixedly connected to the bottom of the transmission shaft;
the lower end face of the cover plate (3) is fixedly connected with a plurality of limiting plates (7) in the circumferential direction, a plurality of limiting grooves (12) are formed in the side wall of the cleaning box (2) in the circumferential direction, the limiting plates (7) are slidably connected in the limiting grooves (12), a limiting ring (10) is fixedly connected to the side wall of the cleaning box (2), and the lower end faces of the limiting plates (7) extend into the limiting ring (10);
the inner side walls of the limiting plates (7) are fixedly connected with connecting plates (15), the side walls of the connecting plates (15) are fixedly connected with two symmetrically arranged iron cores (16), a plurality of strands of coils are wound on the side walls of the iron cores (16), a plurality of circumferentially arranged contact blocks (8) are fixedly connected on the side walls of the limiting grooves (12) of the cleaning box (2), sliding contact pieces (9) are fixedly connected on the side walls of the left end and the right end of the limiting plates (7), the sliding contact pieces (9) are electrically connected with the contact blocks (8) on the left side and the right side, and the sliding contact pieces (9) are electrically connected with the coils;
the front end side wall of the placing plate (19) is fixedly connected with a plurality of circumferentially arranged magnetic blocks (20), and the magnetic poles of the magnetic blocks (20) are opposite to those of the inner side end of the iron core (16).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111038667.7A CN113909198B (en) | 2021-09-06 | 2021-09-06 | Cleaning device for wafer semiconductor processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111038667.7A CN113909198B (en) | 2021-09-06 | 2021-09-06 | Cleaning device for wafer semiconductor processing |
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| Publication Number | Publication Date |
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| CN113909198A CN113909198A (en) | 2022-01-11 |
| CN113909198B true CN113909198B (en) | 2023-09-01 |
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| CN202111038667.7A Active CN113909198B (en) | 2021-09-06 | 2021-09-06 | Cleaning device for wafer semiconductor processing |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115365222B (en) * | 2022-10-24 | 2023-02-28 | 浙江晶睿电子科技有限公司 | Cleaning device for semiconductor etching |
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| KR20110137016A (en) * | 2010-06-16 | 2011-12-22 | 박민혜 | Ginseng washer |
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| KR20160111746A (en) * | 2015-03-17 | 2016-09-27 | 주식회사 대호기연 | Washing device of empty cartridge |
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| CN208466655U (en) * | 2018-05-17 | 2019-02-05 | 河源职业技术学院 | A kind of portable air-conditioning cleaning device |
| CN109261611A (en) * | 2018-11-30 | 2019-01-25 | 汪涛 | A method of ore is cleaned using ore cleaning device |
| CN209935375U (en) * | 2019-04-30 | 2020-01-14 | 朱耀祖 | Neurosurgical instrument cleaning equipment |
| CN210300757U (en) * | 2019-05-28 | 2020-04-14 | 中山市维意智能科技有限公司 | Magnetic rotation type fruit and vegetable cleaning machine |
| CN210692489U (en) * | 2019-09-20 | 2020-06-05 | 湖南晶博太阳能科技发展有限公司 | Cleaning equipment with silicon wafer separation structure for polycrystalline silicon wafers |
| CN111229711A (en) * | 2020-01-19 | 2020-06-05 | 浙江蓝特光学股份有限公司 | Novel wafer semiconductor production auxiliary assembly |
| CN111293060A (en) * | 2020-02-21 | 2020-06-16 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Wafer cleaning and fixing device and wafer cleaning equipment |
| CN211866033U (en) * | 2020-02-28 | 2020-11-06 | 福州德森精工有限公司 | Spraying type ultrasonic cleaning machine |
| CN212494242U (en) * | 2020-05-23 | 2021-02-09 | 苏州君德驰海纺织整理有限公司 | Cloth belt cleaning device |
| CN111804651A (en) * | 2020-07-10 | 2020-10-23 | 砀山海升果胶有限责任公司 | Raw and other materials belt cleaning device is used in pectin processing |
| CN112024519A (en) * | 2020-09-01 | 2020-12-04 | 赣州市业润自动化设备有限公司 | Silicon chip box on convertible cleaning machine |
| CN112827924A (en) * | 2020-12-31 | 2021-05-25 | 聂麒曌 | Device for cleaning silicon material to be recycled |
| CN113130355A (en) * | 2021-04-14 | 2021-07-16 | 华丽 | Silicon wafer cleaning machine for photovoltaic cell production |
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