CN113355649B - Method for preparing periodic vertically-oriented multi-walled carbon nanotube array based on nanosphere template without photoetching - Google Patents

Method for preparing periodic vertically-oriented multi-walled carbon nanotube array based on nanosphere template without photoetching Download PDF

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CN113355649B
CN113355649B CN202110645892.0A CN202110645892A CN113355649B CN 113355649 B CN113355649 B CN 113355649B CN 202110645892 A CN202110645892 A CN 202110645892A CN 113355649 B CN113355649 B CN 113355649B
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walled carbon
carbon nanotube
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CN113355649A (en
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陈瑞婷
薛亚飞
杨荟
楼姝婷
水玲玲
周国富
王新
迈克尔·吉尔森
埃泽尔·马丁·阿金诺古
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Zhaoqing South China Normal University Optoelectronics Industry Research Institute
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Abstract

The invention belongs to the technical field of nano materials, and particularly relates to a method for preparing a periodic vertically-oriented multi-walled carbon nanotube array based on a nanosphere template without photoetching. The method comprises the steps of adopting a silicon dioxide microsphere periodic array template covered with hexagonal close arrangement as a substrate, plating a metal catalyst on the surface of the silicon dioxide microsphere array template, and preparing a highly-ordered hexagonal vertical oriented multi-walled carbon nanotube periodic array on the silicon dioxide microsphere array template by adopting a plasma enhanced chemical vapor deposition method. The preparation method is simple to operate, does not need photoetching or stripping, is suitable for large-scale production of the vertically-oriented multi-walled carbon nanotube array similar to the surface appearance of the cicada wing, and is used for industrial production of the antibacterial surface.

Description

Method for preparing periodic vertically-oriented multi-walled carbon nanotube array based on nanosphere template without photoetching
Technical Field
The invention belongs to the technical field of nano materials, and particularly relates to a method for preparing a periodic vertically-oriented multi-walled carbon nanotube array based on a nanosphere template without photoetching.
Background
Many insects in nature have superhydrophobic surfaces that have self-cleaning properties that limit bacterial contamination, providing inspiration for developing and manufacturing antimicrobial surfaces for medical and industrial use. The water drop adhesive force of the super-hydrophobic surface of the insect is very low, and when the water drop slides and rolls on the surface of the water drop, pollution particles such as dust can be removed. For example, cicada wing has a highly hydrophobic surface and excellent self-cleaning ability. The inner side and the outer side of the front wing and the rear wing of the cicada are covered with hexagonal nanorod periodic array structures, the nanorod structures on the surface of the cicada wing can penetrate through bacterial cells attached to the surface of the cicada wing, the bacterial cells are killed within about 3 minutes, and the purpose of keeping the surface of the cicada wing clean is achieved through effective sterilization. The sterilization effect is mainly realized based on the physical surface structure of the cicada wing, the similar surface appearance manufactured by the technologies of photoetching, self-assembly and the like has great significance for the production of antibacterial materials, however, the suitable materials for preparing the surfaces of the similar cicada wings are very limited.
Many techniques are currently used to fabricate the physical structures of biomimetic insect surfaces, such as photolithographic processes, however, these fabrication techniques are costly to produce. The periodic array of the vertically-oriented multi-walled carbon nanotubes is prepared based on a photoetching process, electron beam photoetching or nanosphere photoetching is mainly adopted for manufacturing the multi-walled carbon nanotube growth orientation sites on the metal catalyst film, fussy photoetching stripping and other process steps are needed, and the problems that the metal catalyst film or nanosphere template is incompletely stripped and the stripped metal catalyst film is difficult to remove due to the redeposition of scraps exist.
Disclosure of Invention
The invention aims to provide a method for preparing a periodic vertically-oriented multi-walled carbon nanotube array based on a nanosphere template without photoetching, aiming at solving the problems that the conventional method for preparing the periodic vertically-oriented multi-walled carbon nanotube array based on a photoetching process needs complicated photoetching stripping and other process steps, the stripping of a metal catalyst film or the nanosphere template is incomplete, and the scraps of the stripped metal catalyst film are deposited and difficult to remove.
The technical scheme of the invention is as follows: a method for preparing a periodic vertically-oriented multi-walled carbon nanotube array based on a nanosphere template without photoetching comprises the following steps:
(1) Preparing a silicon dioxide microsphere array template: obtaining a silicon dioxide microsphere periodic array structure which is in hexagonal close arrangement by adopting a silicon dioxide microsphere through a self-assembly method; plating a metal catalyst on the silicon dioxide microsphere array template to obtain a silicon dioxide microsphere array template substrate;
(2) Preparing a periodic vertically-oriented multi-walled carbon nanotube array: placing the silicon dioxide microsphere array template substrate obtained in the step (1) in the center of a negative electrode in a plasma enhanced chemical vapor deposition chamber, closing the chamber, vacuumizing, introducing reducing gas, adjusting the pressure, and starting a heater to raise the temperature to the growth temperature of the multi-wall carbon nanotube; after the temperature is stable, adjusting the gas flow of the reducing gas, starting a direct current power supply, simultaneously introducing a carbon source gas, controlling the pressure in the chamber, immediately closing the direct current power supply and the carbon source gas inlet after the carbon nano tube grows, reducing the gas flow of the reducing gas, slowly cooling, closing the reducing gas inlet after the temperature is reduced to 300 ℃, completely opening a main valve, vacuumizing until the temperature of the chamber is reduced to room temperature, and thus obtaining the vertically oriented multi-walled carbon nano tube array based on the silicon dioxide microsphere array, which is ordered in height and consistent in length-diameter ratio.
The diameter range of the silicon dioxide microspheres in the step (1) is 160-600 nm; the thickness of the metal catalyst is 5-30 nm. The space between the vertically-oriented multi-walled carbon nanotube arrays based on the silica microsphere array template can be adjusted by the diameter of the adopted silica microspheres.
The diameters of the silicon dioxide microspheres in the step (1) are respectively 160nm, 200nm, 380nm and 400nm, and the thickness of the corresponding metal catalyst is 10nm; the diameter of the silicon dioxide microsphere is 500nm, and the thickness of the corresponding metal catalyst is 25nm; the diameter of the silicon dioxide microsphere is 600nm, and the thickness of the corresponding metal catalyst is 30nm.
In the step (1), a metal catalyst is plated on the silicon dioxide microsphere array template in advance through electron beam evaporation or magnetron sputtering.
The metal catalyst in the step (1) is one of nickel, cobalt and iron.
In the step (2), vacuum pumping is carried out until the vacuum pressure is 8.0 x 10 -4 Introducing reducing gas of 50sccm under Pa, and adjusting the pressure to 200Pa; the growth temperature is 600-900 ℃, and the temperature is raised to 700 ℃ within 1 hour; adjusting the gas flow of the reducing gas to 200sccm, and setting the power of a direct current power supply to be 20-60W; introducing 50sccm carbon source gas, and controlling the pressure in the chamber to be 300-1000 Pa; the growth time is 10-40 min.
And (3) the carbon source gas in the step (2) is acetylene, and the reducing gas is ammonia or hydrogen.
The flow ratio of the carbon source gas to the reducing gas in the step (2) is 1 to 3, so as to adjust the carbon concentration inside the chamber.
The prepared periodic vertically-oriented multi-walled carbon nanotube array is of a surface physical structure similar to a cicada wing.
The prepared periodic vertically-oriented multi-walled carbon nanotube array is used for industrial production of antibacterial surfaces.
The beneficial effects of the invention are as follows: in order to realize the periodic array of the vertically-oriented multi-walled carbon nanotubes, the invention adopts a silicon dioxide microsphere periodic array template covered with hexagonal close arrangement as a substrate, metal catalysts are plated on the surface of the silicon dioxide microsphere array template, a highly-ordered hexagonal arrangement periodic array of the vertically-oriented multi-walled carbon nanotubes is prepared on the silicon dioxide microsphere array template by adopting a plasma enhanced chemical vapor deposition method, the decomposition rate of carbon source gas is improved by utilizing plasma, the growth temperature of the multi-walled carbon nanotubes is reduced, and the multi-walled carbon nanotubes are grown into the vertically-oriented multi-walled carbon nanotubes along the plasma direction under the action of an electric field. In the process of plasma enhanced chemical vapor deposition of the vertically oriented multi-walled carbon nanotube array, carbon source gas is decomposed into carbon atoms under the action of high temperature and plasma, a catalyst is also in an island shape under the action of high temperature, plasma and reducing gas, the carbon atoms are deposited on the surface of the catalyst and diffuse towards the inside of the catalyst, the carbon atoms diffuse towards the outer surface of the catalyst after the concentration of the carbon atoms in the catalyst reaches saturation, and the multi-walled carbon nanotubes are vertically and directionally grown under the action of an electric field. Compared with other chemical vapor deposition methods for growing the carbon nano-tube, the temperature of the plasma enhanced chemical vapor deposition method for growing the multi-walled carbon nano-tube needs high temperature of 700-1200 ℃ and the directional growth is difficult to realize, the temperature of the plasma enhanced chemical vapor deposition method for growing the multi-walled carbon nano-tube can be as low as 450 ℃, meanwhile, the growth direction of the multi-walled carbon nano-tube can be effectively controlled, and the formation of the vertically-oriented multi-walled carbon nano-tube is promoted.
The controllable growth of the periodic vertically-oriented multi-walled carbon nanotube array with different length-diameter ratios is realized by using different vertically-oriented multi-walled carbon nanotube growth parameters in the plasma enhanced chemical vapor deposition process. Compared with the prior art, the method for preparing the periodic vertically-oriented multi-walled carbon nanotube array based on the silicon dioxide microsphere array does not have a photoetching process. The obtained vertical orientation multi-wall carbon nano tube periodic array has consistent length-diameter ratio and fixed interval, is highly ordered, has good stability and has a physical structure similar to the surface of a cicada wing.
Drawings
FIG. 1 is an SEM image of a monolayer array of self-assembled silica microspheres of different sizes, (a) 160nmSiO 2 ；(b)200nmSiO 2 ；(c)360nmSiO 2 ；(d)400nmSiO 2 ；(e)500nmSiO 2 ；(f)600nmSiO 2 。
FIG. 2 is an SEM image of vertically aligned multi-walled carbon nanotube arrays prepared based on different size silica microsphere templates and different thickness of metallic nickel catalysts, (a) 160nmSiO 2 -10Ni；(b)200nmSiO 2 -10Ni；(c)360nmSiO 2 -10Ni；(d)400nmSiO 2 -10Ni；(e)500nmSiO 2 -25Ni；(f)600nmSiO 2 -30Ni。
FIG. 3 is a flow chart of the preparation of vertically oriented multi-walled carbon nanotube arrays based on nanosphere arrays (a) nanosphere self-assembly; (b) evaporating metal nickel; (c) nickel nanoparticle formation; and (d) vertically aligning the carbon nanotube growth.
FIG. 4 is a cross-sectional SEM image of a sample at each step of a vertically oriented multi-walled carbon nanotube array, (a) an array of silica microspheres with a diameter of 160 nm; (b) A silicon dioxide microsphere array with the diameter of 160nm after 10nm of metal nickel is evaporated; (c) Forming catalytic particles by a metal nickel film on the top of the silicon dioxide microsphere with the diameter of 160 nm; (d) A vertically-oriented multi-walled carbon nanotube array prepared on the basis of a silicon dioxide microsphere array with the diameter of 160 nm.
Detailed Description
The invention is further described with reference to the following drawings and detailed description.
The method for preparing the periodic vertically-oriented multi-walled carbon nanotube array based on the nanosphere template without photoetching comprises the following steps of:
(1) Preparing a silicon dioxide microsphere array template: obtaining a silicon dioxide microsphere periodic array structure which is in hexagonal close arrangement by adopting a silicon dioxide microsphere through a self-assembly method; plating a metal nickel film on the silicon dioxide microsphere array template by adopting electron beam evaporation equipment to obtain a silicon dioxide microsphere array template substrate; wherein the self-assembly is specifically: the silica microsphere mixed solution is prepared by dispersing silica microspheres in n-butanol solution at a concentration of 100mg/ml, and performing ultrasonic treatment in an ultrasonic instrument for 10 min. Taking an elbow dropper to absorb a proper amount of silicon dioxide microsphere solution, contacting an elbow part with a liquid level, adjusting the inclination angle of the elbow dropper and the contact area of the elbow dropper with the liquid level to control the flow rate of the silicon dioxide microsphere solution, lifting the dropper after the spreading range of the silicon dioxide microspheres on the liquid level reaches a certain degree to obtain a stable silicon dioxide microsphere single-layer membrane structure, taking tweezers to dip a small amount of peanut oil to drive the silicon dioxide microsphere single-layer membrane to the center of the liquid level along the edge of a vessel, standing for 30min, finally fishing up the silicon dioxide microsphere single-layer membrane structure by using a silicon substrate after cleaning treatment and hydrophilic treatment, or extracting water in the vessel until the liquid level is contacted with the substrate which is put into the vessel in advance and is subjected to cleaning treatment and hydrophilic treatment, transferring the silicon dioxide microsphere single-layer membrane structure onto the substrate, baking the substrate at a low temperature of 30 ℃, and finally obtaining the highly ordered silicon dioxide microsphere array template which is tightly stacked into a hexagonal structure. Cleaning treatment: soaking the silicon wafer by using ethanol and carrying out ultrasonic treatment for about 10min to remove impurities possibly existing on the surface of the substrate. Hydrophilic treatment: and etching the silicon wafer by using the oxygen plasma for 90s at a power of 30W and a gas flow rate of 5sccm under a pressure of 32Pa, and soaking the silicon wafer by using deionized water after etching.
(2) Preparing a periodic vertically-oriented multi-walled carbon nanotube array: placing the silicon dioxide microsphere array template substrate obtained in the step (1) in the center of a negative electrode in a plasma enhanced chemical vapor deposition chamber, closing the chamber, and vacuumizing to 8.0 multiplied by 10 -4 Introducing 50sccm ammonia gas after Pa, adjusting the pressure to 200Pa, and starting a heater to raise the temperature to the growth temperature of the multi-wall carbon nanotube within 1 hour; after the temperature is stable, adjusting the flow of ammonia gas to 200sccm, starting a direct current power supply, setting the power to be 40W, simultaneously introducing 50sccm acetylene, adjusting an air inlet valve and a main valve, controlling the pressure in the chamber to be stable at 1.0kPa, observing that glow covers the surface of the negative electrode, growing for 30min, immediately closing the direct current power supply and the acetylene air inlet after the carbon nano tube is grown, reducing the flow of ammonia gas, slowly cooling, closing the ammonia gas inlet after the temperature is reduced to 300 ℃, and completely opening the main valve for vacuumizing until the temperature of the chamber is reduced to room temperature. Finally, the vertically oriented multi-walled carbon nanotube array which is based on the close packing silica microsphere array and has ordered height and consistent length-diameter ratio is obtained. The diameter and length of the obtained vertically oriented multi-walled carbon nanotube are changed according to the size of the silica microspheres, and the specific table is shown in table 1.
Table 1: the diameters and the heights of the vertically oriented multi-wall carbon nanotubes corresponding to the diameters of the silica microspheres and the thicknesses of the metal catalysts are different.
Figure BDA0003109576330000051

Claims (10)

1. A method for preparing a periodic vertically-oriented multi-walled carbon nanotube array based on a nanosphere template without photoetching is characterized by comprising the following steps of:
(1) Preparing a silicon dioxide microsphere array template: obtaining a silicon dioxide microsphere periodic array structure which is in hexagonal close arrangement by adopting a silicon dioxide microsphere through a self-assembly method; plating a metal catalyst on the silicon dioxide microsphere array template to obtain a silicon dioxide microsphere array template substrate;
(2) Preparing a periodic vertically-oriented multi-walled carbon nanotube array: placing the silicon dioxide microsphere array template substrate obtained in the step (1) in the center of a negative electrode in a plasma enhanced chemical vapor deposition chamber, closing the chamber, vacuumizing, introducing reducing gas, adjusting the pressure, and starting a heater to raise the temperature to the growth temperature of the multi-wall carbon nanotube; after the temperature is stable, adjusting the gas flow of the reducing gas, starting a direct current power supply, introducing a carbon source gas, controlling the pressure in the chamber, immediately closing the direct current power supply and the carbon source gas inlet after the carbon nano tube grows, reducing the gas flow of the reducing gas, slowly cooling, closing the reducing gas inlet after the temperature is reduced to 300 ℃, completely opening a main valve for vacuumizing until the temperature of the chamber is reduced to room temperature, and thus obtaining the vertically-oriented multi-walled carbon nano tube array based on the silica microsphere array, which is highly ordered and has consistent length-diameter ratio.
2. The method for preparing periodic vertically aligned multi-walled carbon nanotube array based on nanosphere template without lithography according to claim 1, wherein the diameter of the silica microspheres in step (1) is in the range of 160-600 nm; the thickness of the metal catalyst is 5-30 nm.
3. The method for the non-photolithographic preparation of periodic vertically aligned multi-walled carbon nanotube arrays based on nanosphere templates as claimed in claim 2, wherein in said step (1) silica microspheres have diameters of 160nm, 200nm, 380nm and 400nm, respectively, corresponding to a metal catalyst thickness of 10nm; the diameter of the silicon dioxide microsphere is 500nm, and the thickness of the corresponding metal catalyst is 25nm; the diameter of the silicon dioxide microsphere is 600nm, and the thickness of the corresponding metal catalyst is 30nm.
4. The method for preparing the periodic vertically-oriented multi-walled carbon nanotube array based on the nanosphere template without lithography according to claim 1, wherein in the step (1), the silica microsphere array template is plated with the metal catalyst in advance by electron beam evaporation or magnetron sputtering.
5. The method for preparing the periodic vertically aligned multi-walled carbon nanotube array based on nanosphere templates without lithography according to claim 1, wherein the metal catalyst in step (1) is one of nickel, cobalt and iron.
6. The method for lithographically preparing periodic arrays of vertically aligned multi-walled carbon nanotubes based on nanosphere templates as claimed in claim 1, wherein in step (2) the vacuum is applied to 8.0 x 10 -4 Introducing reducing gas of 50sccm under Pa, and adjusting the pressure to 200Pa; the growth temperature is 600-900 ℃; adjusting the gas flow of the reducing gas to 200sccm, and setting the power of the direct-current power supply to be 20-60W; introducing 50sccm carbon source gas, and controlling the pressure in the chamber to be 300-1000 Pa; the growth time is 10-40 min.
7. The method for preparing the periodic vertically aligned multi-walled carbon nanotube array based on the nanosphere template without lithography according to claim 1, wherein the carbon source gas in step (2) is acetylene and the reducing gas is ammonia or hydrogen.
8. The method for the non-photolithographic preparation of periodic vertically aligned multi-walled carbon nanotube arrays based on nanosphere templates as claimed in claim 1, wherein the flow ratio of carbon source gas to reducing gas in step (2) is 1.
9. The method for lithographically preparing periodic vertically-aligned multi-walled carbon nanotube arrays based on nanosphere templates as claimed in claim 1, wherein the prepared periodic vertically-aligned multi-walled carbon nanotube array has a physical structure similar to the surface of cicada's wing.
10. The method for preparing the periodic vertically-aligned multi-walled carbon nanotube array based on the nanosphere template without lithography according to claim 1, wherein the prepared periodic vertically-aligned multi-walled carbon nanotube array is used for industrial production of antibacterial surfaces.
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