CN111850621A - Trivalent chromium electroplating solution and preparation method thereof - Google Patents
Trivalent chromium electroplating solution and preparation method thereof Download PDFInfo
- Publication number
- CN111850621A CN111850621A CN202010687509.3A CN202010687509A CN111850621A CN 111850621 A CN111850621 A CN 111850621A CN 202010687509 A CN202010687509 A CN 202010687509A CN 111850621 A CN111850621 A CN 111850621A
- Authority
- CN
- China
- Prior art keywords
- content
- electroplating solution
- sulfate
- trivalent chromium
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
Abstract
The invention provides a trivalent chromium electroplating solution and a preparation method thereof, wherein the components of the electroplating solution comprise chromium sulfate, a buffering agent, a catalyst, acetic acid, citric acid, conductive salt and water, wherein: the concentration of the chromium sulfate is 10-20 g/L; the content of the buffer is 100-300 g/L; the content of the catalyst is 20-80 g/L; the content of acetic acid is 10-20 g/L; the content of the citric acid is 1-10 g/L; the content of the conductive salt is 50-100 g/L. The invention has low pollution to the environment by preparing the components of the solution; the solution of the invention has reasonable dosage ratio and good stability; the thickness of the electroplated chromium coating obtained by the process provided by the invention is stable, and the surface is smooth.
Description
Technical Field
The invention relates to the field of electroplating, in particular to a trivalent chromium electroplating solution and a preparation method thereof.
Background
Electroplating hard chrome is typically applied to the surface of the product site of the mold. After the chromium electroplating treatment, the die and the workpiece have the advantages of smooth and clean surface, easy demoulding, no rustiness and the like. Electroplating hard chrome is typically applied to the surface of the product site of the mold.
The prior chromium electroplating solution has the technical problems of low covering bonding strength, slow crystallization speed, complex electroplating process and the like.
Disclosure of Invention
In view of the deficiencies in the prior art, it is an object of the present invention to provide a trivalent chromium electroplating solution.
According to the trivalent chromium electroplating solution provided by the invention, the components of the electroplating solution comprise chromium sulfate, a buffering agent, a catalyst, acetic acid, citric acid, conductive salt and water, wherein:
the concentration of the chromium sulfate is 10-20 g/L;
the content of the buffer is 100-300 g/L;
the content of the catalyst is 20-80 g/L;
the content of acetic acid is 10-20 g/L;
the content of citric acid is 1-10g/L
The content of the conductive salt is 50-100 g/L.
Preferably, the conductive salt comprises potassium sulfate and/or sodium sulfate.
Preferably, the catalyst comprises any one or more of sodium fluoride, potassium bromide and sodium bromide.
Preferably, the buffer comprises any one or more of boric acid, glycine, sodium citrate, aluminium sulphate, magnesium sulphate.
Preferably, the buffer comprises boric acid and magnesium sulfate, and the boric acid and the magnesium sulfate are mixed according to a mass ratio of 1: 0.05-0.15.
Preferably, the water is deionized water.
According to the invention, the preparation method of the trivalent chromium electroplating solution comprises the following steps:
step S1: dissolving a buffering agent, a catalyst, acetic acid, citric acid and conductive salt in water, heating to 100 ℃, reacting for 2-4h, and standing for 24 h;
Step S2: adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2。
Step S3: measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
Compared with the prior art, the invention has the following beneficial effects:
1. the invention has low pollution to the environment by preparing the components of the solution;
2. the solution of the invention has reasonable dosage ratio and good stability;
3. the thickness of the electroplated chromium coating obtained by the process provided by the invention is stable, and the surface is smooth.
Detailed Description
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. It should be noted that it would be obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit of the invention. All falling within the scope of the present invention.
Example 1
The trivalent chromium electroplating solution of the embodiment comprises chromium sulfate, boric acid, magnesium sulfate, sodium fluoride, acetic acid, citric acid, potassium sulfate and water, wherein the concentration of the chromium sulfate is 10 g/L; the content of boric acid and magnesium sulfate is 100 g/L; the content of sodium fluoride is 20 g/L; the content of acetic acid is 10 g/L; the content of citric acid is 1 g/L; the content of potassium sulfate is 50 g/L.
The trivalent chromium electroplating solution of the embodiment 1 is used as electroplating solution, boric acid, magnesium sulfate, sodium fluoride, acetic acid, citric acid and potassium sulfate are dissolved in water, heated to 100 ℃, reacted for 2-4h and placed for 24 h; adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2. Measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
Example 2
The trivalent chromium electroplating solution of the embodiment comprises chromium sulfate, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid, potassium sulfate and water, wherein the concentration of the chromium sulfate is 20 g/L; the content of boric acid and magnesium sulfate is 200 g/L; the content of potassium fluoride is 50 g/L; the content of acetic acid is 15 g/L; the content of citric acid is 10 g/L; the content of potassium sulfate is 80 g/L.
The trivalent chromium electroplating solution of the embodiment 2 is used as electroplating solution, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid and potassium sulfate are dissolved in water, heated to 100 ℃, reacted for 2-4h and placed for 24 h; adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2. Measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
Example 3
The trivalent chromium electroplating solution of the embodiment comprises chromium sulfate, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid, potassium sulfate and water, wherein the concentration of the chromium sulfate is 20 g/L; the content of boric acid and magnesium sulfate is 300 g/L; the content of potassium fluoride is 80 g/L; the content of acetic acid is 20 g/L; the content of citric acid is 5 g/L; the content of potassium sulfate is 70 g/L.
The trivalent chromium electroplating solution of the embodiment 3 is used as electroplating solution, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid and potassium sulfate are dissolved in water, the temperature is heated to 100 ℃, the reaction lasts for 2 to 4 hours, and the mixture is placed for 24 hours; adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2. Measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
The invention has low pollution to the environment by preparing the components of the solution; the solution of the invention has reasonable dosage ratio and good stability; the thickness of the electroplated chromium coating obtained by the process provided by the invention is stable, and the surface is smooth.
The foregoing description of specific embodiments of the present invention has been presented. It is to be understood that the present invention is not limited to the specific embodiments described above, and that various changes or modifications may be made by one skilled in the art within the scope of the appended claims without departing from the spirit of the invention. The embodiments and features of the embodiments of the present application may be combined with each other arbitrarily without conflict.
Claims (7)
1. A trivalent chromium plating solution, wherein the plating bath composition comprises chromium sulfate, a buffer, a catalyst, acetic acid, citric acid, a conductive salt, and water, wherein:
the concentration of the chromium sulfate is 10-20 g/L;
the content of the buffer is 100-300 g/L;
the content of the catalyst is 20-80 g/L;
the content of acetic acid is 10-20 g/L;
the content of the citric acid is 1-10 g/L;
the content of the conductive salt is 50-100 g/L.
2. The trivalent chromium electroplating solution according to claim 1, wherein the conductive salt comprises potassium sulfate and/or sodium sulfate.
3. The trivalent chromium electroplating solution according to claim 1, wherein the catalyst comprises any one or more of sodium fluoride, potassium bromide, and sodium bromide.
4. The trivalent chromium electroplating solution according to claim 1, wherein the buffer comprises any one or more of boric acid, glycine, sodium citrate, aluminum sulfate, magnesium sulfate.
5. The trivalent chromium electroplating solution according to claim 4, wherein the buffer comprises boric acid and magnesium sulfate in a mass ratio of 1: 0.05-0.15.
6. The trivalent chromium electroplating solution according to claim 1, wherein the water is deionized water.
7. A method of preparing a trivalent chromium electroplating solution according to any one of claims 1-6, characterized by the steps of:
step S1: dissolving a buffering agent, a catalyst, acetic acid, citric acid and conductive salt in water, heating to 100 ℃, reacting for 2-4h, and standing for 24 h;
step S2: adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2。
Step S3: measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010687509.3A CN111850621A (en) | 2020-07-16 | 2020-07-16 | Trivalent chromium electroplating solution and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010687509.3A CN111850621A (en) | 2020-07-16 | 2020-07-16 | Trivalent chromium electroplating solution and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111850621A true CN111850621A (en) | 2020-10-30 |
Family
ID=72983215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010687509.3A Pending CN111850621A (en) | 2020-07-16 | 2020-07-16 | Trivalent chromium electroplating solution and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111850621A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101660182A (en) * | 2009-09-10 | 2010-03-03 | 中国科学院宁波材料技术与工程研究所 | Trivalent chromium electroplate liquid stabilizer and electroplate liquid thereof |
| CN101792917A (en) * | 2010-03-31 | 2010-08-04 | 哈尔滨工业大学 | Preparation method and electroplating method of normal-temperature environment-friendly sulfate trivalent chromium electroplating liquid |
| CN102433574A (en) * | 2011-11-18 | 2012-05-02 | 吉林大学 | Chloride decorative trivalent chromium plating solution |
| CN102443825A (en) * | 2011-12-07 | 2012-05-09 | 黄石振华化工有限公司 | High-concentration chromium sulfate-ammonium fluoride trivalent chromium electroplating solution and preparation method thereof |
| CN105063676A (en) * | 2015-08-17 | 2015-11-18 | 内蒙古第一机械集团有限公司 | Method for electroplating hard chromium by using trivalent chromium |
| CN105386089A (en) * | 2015-12-25 | 2016-03-09 | 武汉迪赛环保新材料股份有限公司 | Trivalent chromium hard chromium electroplating solution and application of trivalent chromium hard chromium electroplating solution in hard chromium electroplating |
-
2020
- 2020-07-16 CN CN202010687509.3A patent/CN111850621A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101660182A (en) * | 2009-09-10 | 2010-03-03 | 中国科学院宁波材料技术与工程研究所 | Trivalent chromium electroplate liquid stabilizer and electroplate liquid thereof |
| CN101792917A (en) * | 2010-03-31 | 2010-08-04 | 哈尔滨工业大学 | Preparation method and electroplating method of normal-temperature environment-friendly sulfate trivalent chromium electroplating liquid |
| CN102433574A (en) * | 2011-11-18 | 2012-05-02 | 吉林大学 | Chloride decorative trivalent chromium plating solution |
| CN102443825A (en) * | 2011-12-07 | 2012-05-09 | 黄石振华化工有限公司 | High-concentration chromium sulfate-ammonium fluoride trivalent chromium electroplating solution and preparation method thereof |
| CN105063676A (en) * | 2015-08-17 | 2015-11-18 | 内蒙古第一机械集团有限公司 | Method for electroplating hard chromium by using trivalent chromium |
| CN105386089A (en) * | 2015-12-25 | 2016-03-09 | 武汉迪赛环保新材料股份有限公司 | Trivalent chromium hard chromium electroplating solution and application of trivalent chromium hard chromium electroplating solution in hard chromium electroplating |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6004448A (en) | Deposition of chromium oxides from a trivalent chromium solution containing a complexing agent for a buffer | |
| JP5322083B2 (en) | Trivalent chromium plating bath and manufacturing method thereof | |
| JPS6056084A (en) | Zinc and zinc alloy electrodeposition bath and process | |
| EP0498436A2 (en) | Process for zinc electroplating of aluminum strip | |
| EP0497302B1 (en) | Process for direct zinc electroplating of aluminum strip | |
| CN111676494A (en) | Trivalent chromium electroplating solution, preparation method and application | |
| WO2009139384A1 (en) | Copper‑zinc alloy electroplating bath and plating method using same | |
| US4411965A (en) | Process for high speed nickel and gold electroplate system and article having improved corrosion resistance | |
| CN111850621A (en) | Trivalent chromium electroplating solution and preparation method thereof | |
| CN114232038A (en) | Cyanide-free electrogilding formula applied to wafer-level packaging and electrogilding process thereof | |
| CN107119292A (en) | A kind of nickel plating solution and the method for nickel plating | |
| US3505183A (en) | Process and compositions for electroplating chromium | |
| US4035249A (en) | Electrode position of tin-containing alloys and bath therefor | |
| JP2010270374A (en) | Copper-tin-zinc alloy electroplating bath, and method for producing alloy plating film using the same | |
| JPS6033910B2 (en) | Electrolytic coloring bath for aluminum or its alloys | |
| JP5299994B2 (en) | Copper-zinc alloy electroplating bath and steel cord wire with copper-zinc alloy plating | |
| CN110607544A (en) | Aqueous electroplating solution for preparing titanium nitride coating film and preparation method and application thereof | |
| CN111188069A (en) | Tin-plated bismuth alloy solution and preparation method thereof | |
| JPH03120390A (en) | Low stress nickel plating bath | |
| US3457147A (en) | Chromium plating bath and process | |
| US4206019A (en) | Novel low concentration decorative chromium plating baths and method | |
| RU2184800C2 (en) | Electrolyte for deposition of zinc coat | |
| JPS6393879A (en) | Production of zinc-nickel alloy electroplated steel sheet having superior suitability to chemical treatment | |
| RU2365683C1 (en) | Sulphosalicylate electrolyte for sedimentation of copper-nickel alloy | |
| SU540946A1 (en) | Electrolyte for steel plating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201030 |
|
| RJ01 | Rejection of invention patent application after publication |