CN111676494A - Trivalent chromium electroplating solution, preparation method and application - Google Patents
Trivalent chromium electroplating solution, preparation method and application Download PDFInfo
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- CN111676494A CN111676494A CN202010686646.5A CN202010686646A CN111676494A CN 111676494 A CN111676494 A CN 111676494A CN 202010686646 A CN202010686646 A CN 202010686646A CN 111676494 A CN111676494 A CN 111676494A
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- electroplating solution
- trivalent chromium
- sulfate
- chromium electroplating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
Abstract
The invention provides a trivalent chromium electroplating solution, a preparation method and an application thereof, wherein the components of the electroplating solution comprise chromium sulfate, a buffering agent, a catalyst, acetic acid, citric acid, conductive salt, an organic additive and water, wherein: the concentration of the chromium sulfate is 10-20 g/L; the content of the buffer is 100-300 g/L; the content of the catalyst is 20-80 g/L; the content of acetic acid is 10-20 g/L; the content of the citric acid is 1-10 g/L; the content of the conductive salt is 50-100g/L, and the content of the organic additive is 5-40 g/L. The invention has low pollution to the environment by preparing the components of the solution; the solution of the invention has reasonable dosage ratio and good stability; the thickness of the electroplated chromium coating obtained by the process provided by the invention is stable, and the surface is smooth.
Description
Technical Field
The invention relates to the field of electroplating, in particular to a trivalent chromium electroplating solution and a preparation method thereof.
Background
Electroplating hard chrome is typically applied to the surface of the product site of the mold. After the chromium electroplating treatment, the die and the workpiece have the advantages of smooth and clean surface, easy demoulding, no rustiness and the like. Electroplating hard chrome is typically applied to the surface of the product site of the mold.
The prior chromium electroplating solution has the technical problems of low covering bonding strength, slow crystallization speed, complex electroplating process and the like.
Disclosure of Invention
In view of the deficiencies in the prior art, it is an object of the present invention to provide a trivalent chromium electroplating solution.
According to the trivalent chromium electroplating solution provided by the invention, the components of the electroplating solution comprise chromium sulfate, a buffering agent, a catalyst, acetic acid, citric acid, conductive salt, an organic additive and water, wherein:
the concentration of the chromium sulfate is 10-20 g/L;
the content of the buffer is 100-300 g/L;
the content of the catalyst is 20-80 g/L;
the content of acetic acid is 10-20 g/L;
the content of citric acid is 1-10g/L
The content of the organic additive is 5-40 g/L;
the content of the conductive salt is 50-100 g/L.
Preferably, the conductive salt comprises potassium sulfate and/or sodium sulfate.
Preferably, the catalyst comprises any one or more of sodium fluoride, potassium bromide and sodium bromide.
Preferably, the buffer comprises any one or more of boric acid, glycine, sodium citrate, aluminium sulphate, magnesium sulphate.
Preferably, the buffer comprises boric acid and magnesium sulfate, and the boric acid and the magnesium sulfate are mixed according to a mass ratio of 1: 0.05-0.15.
Preferably, the water is deionized water.
Preferably, the organic additive comprises any one or more of polyethylene glycol, polyvinyl alcohol, butynediol.
According to the invention, the preparation method of the trivalent chromium electroplating solution comprises the following steps:
step S1: dissolving a buffering agent, a catalyst, acetic acid, citric acid and conductive salt in water, heating to 100 ℃, reacting for 2-4h, and standing for 24 h;
step S2: adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2。
Step S3: measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
The invention also provides an application of the trivalent chromium electroplating solution in hard chromium electroplating.
The invention also provides an application of the preparation method of the trivalent chromium electroplating solution in hard chromium electroplating.
Compared with the prior art, the invention has the following beneficial effects:
1. the invention has low pollution to the environment by preparing the components of the solution;
2. the solution of the invention has reasonable dosage ratio and good stability;
3. the organic additive is added, so that the brightness and hardness of the coating can be increased;
4. the thickness of the electroplated chromium coating obtained by the process provided by the invention is stable, and the surface is smooth.
Detailed Description
The present invention will be described in detail with reference to specific examples. The following examples will assist those skilled in the art in further understanding the invention, but are not intended to limit the invention in any way. It should be noted that it would be obvious to those skilled in the art that various changes and modifications can be made without departing from the spirit of the invention. All falling within the scope of the present invention.
Example 1
The trivalent chromium electroplating solution of the embodiment comprises chromium sulfate, boric acid, magnesium sulfate, sodium fluoride, acetic acid, citric acid, polyethylene glycol, potassium sulfate and water, wherein the concentration of the chromium sulfate is 10 g/L; the content of boric acid and magnesium sulfate is 100 g/L; the content of sodium fluoride is 20 g/L; the content of acetic acid is 10 g/L; the content of citric acid is 1 g/L; the content of potassium sulfate is 50g/L, and the content of polyethylene glycol is 5 g/L.
The trivalent chromium electroplating solution of the embodiment 1 is used as electroplating solution, boric acid, magnesium sulfate, sodium fluoride, acetic acid, citric acid, potassium sulfate and polyethylene glycol are dissolved in water, the temperature is heated to 100 ℃, the reaction lasts for 2-4h, and the mixture is placed for 24 h; adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2. Measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
Example 2
The trivalent chromium electroplating solution of the embodiment comprises chromium sulfate, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid, potassium sulfate, polyethylene glycol and water, wherein the concentration of the chromium sulfate is 20 g/L; the content of boric acid and magnesium sulfate is 200 g/L; the content of potassium fluoride is 50 g/L; the content of acetic acid is 15 g/L; the content of citric acid is 10 g/L; the content of potassium sulfate is 80g/L, and the content of polyethylene glycol is 20 g/L.
The trivalent chromium electroplating solution of the embodiment 2 is used as electroplating solution, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid, potassium sulfate and polyethylene glycol are dissolved in water, the temperature is heated to 100 ℃, the reaction lasts for 2-4h, and the mixture is placed for 24 h; adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2. Measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
Example 3
The trivalent chromium electroplating solution of the embodiment comprises chromium sulfate, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid, potassium sulfate, polyethylene glycol and water, wherein the concentration of the chromium sulfate is 20 g/L; the content of boric acid and magnesium sulfate is 300 g/L; the content of potassium fluoride is 80 g/L; the content of acetic acid is 20 g/L; the content of citric acid is 5 g/L; the content of potassium sulfate is 70g/L, and the content of polyethylene glycol is 40 g/L.
The trivalent chromium electroplating solution of the embodiment 3 is used as electroplating solution, boric acid, magnesium sulfate, potassium fluoride, acetic acid, citric acid, potassium sulfate and polyethylene glycol are dissolved in water, the temperature is heated to 100 ℃, the reaction lasts for 2-4h, and the mixture is placed for 24 h; adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2. Measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
The invention has low pollution to the environment by preparing the components of the solution; the solution of the invention has reasonable dosage ratio and good stability; the organic additive is added, so that the brightness and hardness of the coating can be increased; the thickness of the electroplated chromium coating obtained by the process provided by the invention is stable, and the surface is smooth.
The foregoing description of specific embodiments of the present invention has been presented. It is to be understood that the present invention is not limited to the specific embodiments described above, and that various changes or modifications may be made by one skilled in the art within the scope of the appended claims without departing from the spirit of the invention. The embodiments and features of the embodiments of the present application may be combined with each other arbitrarily without conflict.
Claims (10)
1. A trivalent chromium plating solution, wherein the plating bath composition comprises chromium sulfate, a buffer, a catalyst, acetic acid, citric acid, a conductive salt, an organic additive, and water, wherein:
the concentration of the chromium sulfate is 10-20 g/L;
the content of the buffer is 100-300 g/L;
the content of the catalyst is 20-80 g/L;
the content of acetic acid is 10-20 g/L;
the content of the citric acid is 1-10 g/L;
the content of the organic additive is 5-40 g/L;
the content of the conductive salt is 50-100 g/L.
2. The trivalent chromium electroplating solution according to claim 1, wherein the conductive salt comprises potassium sulfate and/or sodium sulfate.
3. The trivalent chromium electroplating solution according to claim 1, wherein the catalyst comprises any one or more of sodium fluoride, potassium bromide, and sodium bromide.
4. The trivalent chromium electroplating solution according to claim 1, wherein the buffer comprises any one or more of boric acid, glycine, sodium citrate, aluminum sulfate, magnesium sulfate.
5. The trivalent chromium electroplating solution according to claim 4, wherein the buffer comprises boric acid and magnesium sulfate in a mass ratio of 1: 0.05-0.15.
6. The trivalent chromium electroplating solution according to claim 1, wherein the water is deionized water.
7. The trivalent chromium electroplating solution according to claim 1, wherein the organic additive comprises any one or more of polyethylene glycol, polyvinyl alcohol, butynediol.
8. A method of preparing a trivalent chromium electroplating solution according to any one of claims 1-7, characterized by the steps of:
step S1: dissolving a buffering agent, a catalyst, acetic acid, citric acid and conductive salt in water, heating to 100 ℃, reacting for 2-4h, and standing for 24 h;
step S2: adding chromium sulfate, stirring for 3-4 hr, adding water, and electrolyzing at cathode current density of 20-30A/dm2。
Step S3: measuring the pH value of the trivalent chromium electroplating solution, and if the pH value is 2.5-3.5, finishing the preparation; if the pH value is not 2.5-3.5, the pH value is adjusted by acid or alkali.
9. Use of a trivalent chromium electroplating solution according to any one of claims 1 to 7 in hard chromium electroplating.
10. Use of a method of preparing a trivalent chromium electroplating solution according to claim 8 in hard chromium electroplating.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN115838947A (en) * | 2023-02-20 | 2023-03-24 | 山东裕航特种合金装备有限公司 | Electroplating solution for electroplating chromium-nickel alloy and preparation method thereof |
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Application publication date: 20200918 |