CN109951942B - Dust plasma generating system - Google Patents
Dust plasma generating system Download PDFInfo
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- CN109951942B CN109951942B CN201910348396.1A CN201910348396A CN109951942B CN 109951942 B CN109951942 B CN 109951942B CN 201910348396 A CN201910348396 A CN 201910348396A CN 109951942 B CN109951942 B CN 109951942B
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- dust
- gas
- dust plasma
- plasma jet
- personal computer
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- 239000000428 dust Substances 0.000 title claims abstract description 110
- 238000001514 detection method Methods 0.000 claims abstract description 18
- 239000010453 quartz Substances 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 239000000523 sample Substances 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 8
- 210000002381 plasma Anatomy 0.000 abstract 12
- 239000007789 gas Substances 0.000 description 44
- 238000005315 distribution function Methods 0.000 description 5
- 239000002775 capsule Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000005433 ionosphere Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Abstract
The invention discloses a dust plasma generating system, and belongs to the field of dust plasmas. The dust plasma generating system comprises a dust plasma jet device; the dust plasma jet device is respectively connected with a gas device for jetting gas inside the dust plasma jet device to the dust plasma jet device, an ionization device for ionizing the gas entering the dust plasma jet device, a dust device for jetting dust inside the dust plasma jet device to be mixed with the ionized gas flowing through the dust plasma jet device to form dust plasma, and a density detection device for carrying out electronic density detection on the dust plasma; the gas device, the ionization device, the dust device and the density detection device are respectively connected with the control device.
Description
Technical Field
The invention relates to the field of dust plasma, in particular to a dust plasma generating system.
Background
The research on the propagation and scattering characteristics of electromagnetic waves in dust plasma and the interaction between dust plasma and electromagnetic waves is the basis and key content of interstellar medium exploration, the understanding of earth ionosphere and medium-high atmospheric phenomena and the research on nano-science and microelectronic processing. Since the electron density and dust concentration distribution in the space dust plasma have obvious layered structures, the influence of the space dust plasma environment on the electromagnetic wave propagation can be regarded as a wave propagation problem in a random medium with parallel plane boundaries, the dust plasma can be treated in layers according to the electron density, and the electron density is uniform and stable in each layer. Therefore, the electronic density and dust concentration of the dust plasma can be controlled to be stable on a specific distribution function for a long time, which is helpful for researching the electromagnetic wave of the dust plasma.
The existing ground dust plasma generating device mainly comprises a steady-state device and a dust plasma experimental device which can not generate dust plasma under atmospheric pressure, so that the application process is complex and the dust plasma is difficult to obtain.
Disclosure of Invention
In view of the above-mentioned disadvantages of the prior art, the present invention aims to provide a dust plasma generation system capable of generating dust plasma at atmospheric pressure.
In order to achieve the purpose of the invention, the invention adopts the technical scheme that:
a dust plasma generating system is provided, which comprises a dust plasma jet device; the dust plasma jet device is respectively connected with a gas device for jetting gas inside the dust plasma jet device to the dust plasma jet device, an ionization device for ionizing the gas entering the dust plasma jet device, a dust device for jetting dust inside the dust plasma jet device to be mixed with the ionized gas flowing through the dust plasma jet device to form dust plasma, and a density detection device for carrying out electronic density detection on the dust plasma; the gas device, the ionization device, the dust device and the density detection device are respectively connected with the control device.
Further, the control device comprises an input unit and an industrial personal computer connected with the input unit.
Further, the dust plasma jet device comprises a plurality of quartz tubes which are distributed in parallel and the tail ends of the quartz tubes are positioned on the same plane.
Further, the gas device includes the gas pitcher, the gas pump be connected with the gas pitcher and all the many gas conduits who is connected with the gas pump, and every gas conduit's the other end all is connected with the head end of a quartz capsule, all is provided with the valve of being connected with the industrial computer on every gas conduit, and the gas pump is connected with the industrial computer.
Furthermore, the ionization device comprises a voltage adjusting unit connected with the industrial personal computer through optical fibers, the voltage adjusting unit is respectively connected with the electrodes, and all the electrodes are respectively positioned on the outer wall of one quartz tube.
Further, the dust device comprises a dust storage tank and a plurality of sprayers which are connected with the dust storage tank; all around being provided with a plurality of sprayers on the terminal outer wall of every quartz capsule, the axle of all sprayers all is parallel with the axle of quartz capsule, and all sprayers all are connected with the industrial computer.
Furthermore, the density detection device comprises a photoelectric conversion unit and a probe driving unit which are respectively connected with the industrial personal computer through optical fibers; the probe driving unit is provided with a probe connected with the photoelectric conversion unit.
Further, the probe driving unit is a robot arm.
The invention has the beneficial effects that:
the electron density of the dust plasma at a specific position is directly measured by the density detection device, so that errors caused by indirect derivation of the electron density between power or electrode voltage are eliminated, and the measurement accuracy of the electron density of the dust plasma is greatly improved. The control device is combined to control the output voltage of the ionization device (namely the ionization voltage of the gas), the gas jet flow of the gas device and the dust jet flow of the dust device, so that the feedback continuous adjustment control of the electron density of the dust plasma is realized, and the electron density of the dust plasma at a specific position is enabled to accord with a specific value, thereby conforming with a target electron density distribution function set in the control device.
The electron density of the dust plasma generated by the dust plasma generating system is controllable, the control precision is high, and the electron density of the dust plasma at a specific position can be stable for a long time by maintaining the states of the gas device, the ionization device and the dust device, so that various experimental requirements are met. And the state of the dust can be observed from the side.
Meanwhile, the application environment of the dust plasma generating system does not need low air pressure, and the dust plasma generating system can be applied in an atmospheric environment, so that the application process is simple, and the dust plasma is easy to obtain.
Drawings
FIG. 1 is a block diagram of the connections of a dust plasma generation system in an exemplary embodiment;
FIG. 2 is a schematic diagram of a quartz tube and injector configuration in accordance with an exemplary embodiment;
FIG. 3 is a schematic diagram of a quartz tube and injector configuration in accordance with an exemplary embodiment;
FIG. 4 is a graph showing the electron density distribution at a position 2cm from the orifice of a quartz tube where the row direction of a single row of quartz tubes arranged in a 16-square array is the X axis;
FIG. 5 is a graph showing the electron density distribution at a position 2cm from the orifice of a quartz tube having the row direction of the single row of quartz tubes distributed in a 32 rectangular array as the X axis;
101, a quartz tube; 2. a density detection device; 201. a photoelectric conversion unit; 202. a probe driving unit; 203. a probe; 3. a control device; 301. an input unit; 302. an industrial personal computer; 401. a voltage regulating unit; 403. an electrode; 501. a gas pump; 5. a gas device; 502. a gas tank; 503. a valve; 504. a gas conduit; 601. a dust storage tank; 602. an ejector.
Detailed Description
The following detailed description of the present invention will be provided in conjunction with the accompanying drawings to facilitate the understanding of the present invention by those skilled in the art. It should be understood that the embodiments described below are only some embodiments of the invention, and not all embodiments. All other embodiments obtained by a person skilled in the art without any inventive step, without departing from the spirit and scope of the present invention as defined and defined by the appended claims, fall within the scope of protection of the present invention.
As shown in fig. 1, the dust plasma generation system includes a dust plasma jet device; the dust plasma jet device is respectively connected with a gas device 5 for jetting gas inside the dust plasma jet device to the dust plasma jet device, an ionization device for ionizing the gas entering the dust plasma jet device, a dust device for jetting dust inside the dust plasma jet device and mixing the ionized gas flowing through the dust plasma jet device to form dust plasma, and a density detection device 2 for performing electronic density detection on the dust plasma; the gas device 5, the ionization device, the dust device, and the density detection device 2 are connected to the control device 3, respectively.
As to how the control means controls: before application, a large amount of relevant data are artificially collected and led into a control device to be used as a basis for controlling the change of ionization voltage, gas jet flow and dust jet flow. The control device responds according to the imported relevant data, and the electron density of the dust plasma at the specific position is converged to a set value through continuous adjustment and continuous feedback. Such as: if the electron density at a specific position is smaller than the set value, the ionization voltage influencing the electron density at the position is increased, the gas ejection flow rate is increased or the dust ejection flow rate is reduced according to the measured mass data.
In implementation, the preferred control device 3 of the present scheme includes an input unit 301 and an industrial personal computer 302 connected to the input unit 301, where the input unit 301 is a touch display screen for setting a target electron density distribution function, and the model of the industrial personal computer 302 is WLT _ 043L.
The dust plasma jet device comprises a plurality of quartz tubes 101 which are distributed in parallel and the tail ends of the quartz tubes are positioned on the same plane. The number of the quartz tubes 101 is not limited, and they may be distributed in a square or rectangular array, or may be distributed in an irregular shape. As shown in fig. 2, the number of the quartz tubes 101 is 16, and all the quartz tubes 101 are arranged in a square array. As shown in fig. 3, the number of the quartz tubes 101 is 32, and all the quartz tubes 101 are arranged in a rectangular array.
The gas device 5 comprises a gas tank 502, a gas pump 501 connected with the gas tank 502 and a plurality of gas guide pipes 504 connected with the gas pump 501, the other end of each gas guide pipe 504 is connected with the head end of one quartz tube 101, a valve 503 connected with the industrial personal computer 302 is arranged on each gas guide pipe 504, and the gas pump 501 is connected with the industrial personal computer 302. The gas pump 501 and the valve 503 are controlled by the industrial personal computer 302, so that the gas injection flow of each gas conduit 504 is independently adjusted. Wherein, the model of the gas pump 501 is 3023, the gas tank 502 is filled with helium or nitrogen, and the valve 503 is a high-precision SUS stainless steel ball valve needle valve.
The ionization device comprises a voltage adjusting unit 401 connected with the industrial personal computer 302 through optical fibers, the voltage adjusting unit 401 is respectively connected with a plurality of electrodes 403, and all the electrodes 403 are respectively positioned on the outer wall of one quartz tube 101. The adjustment of the voltage on the electrode 403 is achieved by the control of the voltage adjustment unit 401 by the control unit. The ionization device is isolated by the optical fiber connection mode, so that the safety of operators and equipment is ensured. The model number of the voltage regulating unit 401 is TP3090, and the electrode 403 is an annular copper tube, which is sleeved on the outer wall of the quartz tube 101.
The dust device includes a dust storage tank 601 and a plurality of sprayers 602 each connected to the dust storage tank 601; a plurality of injectors 602 are arranged on the outer wall of the tail end of each quartz tube 101 in a surrounding mode, the axes of all the injectors 602 are parallel to the axis of the quartz tube 101, and all the injectors 602 are connected with the industrial personal computer 302. The power of the ejector 602 is controlled by the industrial personal computer 302, so that the dust ejection flow at the tail end of each quartz tube 101 is adjusted. The size of the dust ejected from the ejector 602 can be adjusted by changing the size of the filter screen of the ejector 602, so as to adjust the size of the dust in the dust plasma.
The density detection device 2 comprises a photoelectric conversion unit 201 and a probe driving unit 202 which are respectively connected with an industrial personal computer 302 through optical fibers; the probe driving unit 202 is provided with a probe 203 connected to the photoelectric conversion unit 201. The density detection device 2 is isolated by the optical fiber connection mode, so that the safety of operators and equipment is ensured. The probe driving unit 202 is controlled by the industrial personal computer 302 to move, the probe 203 is moved to a specific position, the measurement of electron density of dust plasma at the specific position is realized, and the probe 203 transmits the measured electron density to the industrial personal computer 302 through the photoelectric conversion unit 201. The industrial personal computer 302 compares the electron density with the electron density required at the corresponding specific position in the electron density distribution function, and controls the voltage on the gas pump 501 and the valve 503, the electrode 403 and the power of the injector 602 according to the comparison result. Thus, the feedback adjustment is continued until the electron density of the dust plasma at the specific position meets the specific value, thereby meeting the target electron density distribution function set inside the control device 3. As shown in fig. 4 and 5, the electron density can be quasi-sinusoidal by the control adjustment. The photoelectric conversion unit 201 is a UT-277SM photoelectric converter, the probe driving unit 202 is a mechanical arm, and the probe 203 is an ESPION.
Claims (5)
1. The dust plasma generating system is characterized by comprising a dust plasma jet device; the dust plasma jet device is respectively connected with a gas device (5) for jetting gas inside the dust plasma jet device to the dust plasma jet device, an ionization device for ionizing the gas entering the dust plasma jet device, a dust device for jetting dust inside the dust plasma jet device and mixing the ionized gas flowing through the dust plasma jet device to form dust plasma, and a density detection device (2) for performing electron density detection on the dust plasma; the gas device (5), the ionization device, the dust device and the density detection device (2) are respectively connected with the control device (3);
the control device (3) comprises an input unit (301) and an industrial personal computer (302) connected with the input unit (301);
the dust plasma jet device comprises a plurality of quartz tubes (101) which are distributed in parallel and the tail ends of which are positioned on the same plane;
the dust device comprises a dust storage tank (601) and a plurality of sprayers (602) which are connected with the dust storage tank (601); the outer wall of the tail end of each quartz tube (101) is provided with a plurality of injectors (602) in a surrounding mode, the axes of all the injectors (602) are parallel to the axis of the quartz tube (101), and all the injectors (602) are connected with the industrial personal computer (302).
2. The system according to claim 1, characterized in that the gas device (5) comprises a gas tank (502), a gas pump (501) connected with the gas tank (502), and a plurality of gas conduits (504) connected with the gas pump (501), wherein the other end of each gas conduit (504) is connected with the head end of a quartz tube (101), each gas conduit (504) is provided with a valve (503) connected with the industrial personal computer (302), and the gas pump (501) is connected with the industrial personal computer (302).
3. The system according to claim 1, characterized in that the ionization device comprises a voltage regulation unit (401) connected with the industrial personal computer (302) through optical fibers, the voltage regulation unit (401) is respectively connected with a plurality of electrodes (403), and all the electrodes (403) are respectively positioned on the outer wall of one quartz tube (101).
4. The system according to any one of claims 1 to 3, characterized in that the density detection device (2) comprises a photoelectric conversion unit (201) and a probe driving unit (202) respectively connected with the industrial personal computer (302) through optical fibers; the probe driving unit (202) is provided with a probe (203) connected with the photoelectric conversion unit (201).
5. The system of claim 4, wherein the probe drive unit (202) is a robotic arm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910348396.1A CN109951942B (en) | 2019-04-28 | 2019-04-28 | Dust plasma generating system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910348396.1A CN109951942B (en) | 2019-04-28 | 2019-04-28 | Dust plasma generating system |
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| CN109951942A CN109951942A (en) | 2019-06-28 |
| CN109951942B true CN109951942B (en) | 2020-12-01 |
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| CN111182708B (en) * | 2020-01-13 | 2021-08-31 | 电子科技大学 | Device for generating neutral dust particle flow by combining ultraviolet radiation |
| CN113597078B (en) * | 2021-08-24 | 2022-06-28 | 上海交通大学 | Multi-channel capacitive coupling type plasma jet device and working method |
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| US7517558B2 (en) * | 2005-06-06 | 2009-04-14 | Micron Technology, Inc. | Methods for positioning carbon nanotubes |
| CN1837402A (en) * | 2006-04-14 | 2006-09-27 | 大连理工大学 | Apparatus for depositing silicon carbide film by dust plasma under normal temperature |
| CN109600900A (en) * | 2019-01-23 | 2019-04-09 | 电子科技大学 | A kind of plasma jet array inhomogeneous plasma generation device |
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