CN103730314A - Gas ion source gas inlet real-time control system - Google Patents
Gas ion source gas inlet real-time control system Download PDFInfo
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- CN103730314A CN103730314A CN201210385269.7A CN201210385269A CN103730314A CN 103730314 A CN103730314 A CN 103730314A CN 201210385269 A CN201210385269 A CN 201210385269A CN 103730314 A CN103730314 A CN 103730314A
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Abstract
The invention discloses a structure of a high-pressure ion source gas inlet real-time control system. The system comprises a feedback signal generating and transmitting part, a signal processing and controlling part and a controlling, transmitting and executing part, an ion saturated flow sensor stretches into an ion source, a controllable gas valve is mounted on the side face of the ion source, according to the difference value between ion saturated flow signals measured by the ion saturated flow sensor and set reference signals, the gas inlet quantity of the ion source is adjusted, so that the difference value is reduced, and voltages at the two ends of the controllable gas valve are controlled to enable lead-out flow to be gradually close to the reference value. According to the system, the working mode of the ion source is simple, the reliability and the stability of the ion source system are improved, due to the adjustment of the gas inlet quantity, charging is carried out on plasmas as needed, burdens of vacuum air exhaust by the system are reduced, stable and even plasma density can be obtained, and the system can lead out high-quality beam currents.
Description
Technical field
The present invention relates to various gas ion sources and gaseous plasma device.
Background technology
Ion source is the device that produces high energy ion beam.It is the core component of various particle particle boosters, is also the critical component of the electron gun of neutral beam injector.No matter be ion beam implanter or neutral beam injector, ion source all should provide stable and the satisfactory ion beam of quality is drawn occasion to be applied to various ion beam.
In ion source plasma starting the arc discharge process, if adopt constant voltage, constant current and stable air inflow condition, in very short time, will make arc power overload, form power supply overcurrent protection or plasma unstable and even break.At present for the technology of controlling ionogenic striking current mainly: adopt instrument transformer to record arc current loop current size, compare with the size of current and the target current that record, according to comparative result, regulate arc voltage.This method has following shortcoming: first, can not reflect exactly the stability of ionogenic ion current density using arc power loop current as feedback signal, the arc stream ion concentration possibility skewness therefore obtaining, affects line and draw quality; Secondly, the arc power design of the method application is more complicated, and in application process, investment of production is large, and difficult in maintenance.
Summary of the invention
The object of this invention is to provide and need a kind of ion source in gas real-time control system and control method, in the time of can realizing ion source discharge, obtain stable plasma and uniform ion current density.In ion source discharge process, it is stable that other condition keeps, ion current in ion source or other reference signal value and standard value are compared, comparative result is used for regulating ion source in gas amount, thereby realize, keep the stable and uniform target of ion current density of educt beaming flow.
Technical scheme of the present invention is: ion source in gas real-time control system, includes the parts such as ion source, plasma or air pressure detector, gas-flow rate controller, electric voltage frequency modular converter, optical fiber, voltage to frequency modular converter, master control instrument.
Ion source in gas real-time control method, it is characterized in that comprising the following steps: (a), plasma or air pressure detector measurement ion source plasma state or air pressure, then by electric voltage frequency conversion equipment, measuring-signal is become to optical fiber frequency signal and is transferred to the frequency pressure conversion device of receiving terminal, be transferred to again supervisory control desk, control desk is according to the size of these signal determining ion source input air-flows, control signal, through electric voltage frequency, conversion becomes light signal, by optical fiber, pass to high-voltage connecting receiving end, through overfrequency pressure conversion, become again the control signal of gas flowmeter, flowmeter is controlled, to ion source, carry gas.
Accompanying drawing explanation
The real-time air intake control system of Fig. 1 gas ion source
Embodiment
Below in conjunction with accompanying drawing, technical scheme provided by the present invention is further elaborated.
Embodiment 1: as shown in Figure 1, a kind of gas ion source, supplies gas to it by a road gas flowmeter, and a Langmuir probe plasma measuring instrument is deep into ion source discharge chamber interior from ion source outside.In ion source when work,, plasma measurement instrument measuring-signal passes to control desk by optical fiber, and control desk judges the size of air inflow according to measuring-signal, then by the air inlet of optical fiber control gas flowmeter number.
Embodiment 2: as shown in Figure 1, a kind of gas ion source, supplies gas to it by Liang Dao tri-road gas flowmeters, and a Langmuir probe plasma measuring instrument is deep into ion source discharge chamber interior from ion source outside.In ion source when work,, plasma measurement instrument measuring-signal passes to control desk by optical fiber, and control desk judges the size of air inflow according to measuring-signal, then by optical fiber control respectively each gas flowmeter air inlet number.
Embodiment 3: as shown in Figure 1, a kind of gas ion source, supplies gas to it by a road gas flowmeter, and a Faraday cup is collected educt beaming flow after ion source fairlead.Ion source when work, educt beaming flow signal is passed to control desk, control desk judges the size of air inflow according to measuring-signal, then by optical fiber control respectively each gas flowmeter air inlet number.
Claims (2)
1. ion source in gas real-time control system, include ion source, it is characterized in that plasma density measurement transducer extend into ion source inside, the output of ion current transducer is connected with the input of sample circuit, the output of sample circuit with by optical fiber, be connected with signal receiving end, by optical fiber, the effectively impact of isolated high-voltage on bottom control appliance; Control desk adopts industrial control computer, and it is connected by pci bus with A/D acquisition module, mixed-media network modules mixed-media and D/A output module; D/A output module outputs a control signal to the input of electric voltage/frequency converter, the output of electric voltage/frequency converter is connected by optical fiber with the input of frequency/voltage converter, the output of frequency/voltage converter is connected to gas flowmeter electric power driving module, the size of gas flowmeter power supply electric power driving module control gas ion source air inflow.
2. ion source in gas real-time control method, is characterized in that comprising the following steps:
(a), plasma density measurement transducer extend into ion source inside, the signal that plasma density measurement transducer provides is transported to supervisory control desk by change-over circuit;
(b), by pci bus, be connected between control desk industrial control computer and A/D acquisition module, mixed-media network modules mixed-media and D/A output module, and manage these modules;
(C), industrial control computer is by the reference signal comparison of feedback signal and mixed-media network modules mixed-media setting, control result is converted to control signal Vc by D/A output module, through electric voltage/frequency converter, optical fiber and frequency/voltage converter, be transferred to air valve electric power driving module and realize with the optical fiber of industrial control computer and isolating, air valve electric power driving module to being arranged on can control valve both end voltage regulate in real time on ion source, and then is realized real-time adjusting to ion source in gas amount according to control signal Vc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210385269.7A CN103730314A (en) | 2012-10-12 | 2012-10-12 | Gas ion source gas inlet real-time control system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210385269.7A CN103730314A (en) | 2012-10-12 | 2012-10-12 | Gas ion source gas inlet real-time control system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103730314A true CN103730314A (en) | 2014-04-16 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201210385269.7A Pending CN103730314A (en) | 2012-10-12 | 2012-10-12 | Gas ion source gas inlet real-time control system |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108521707A (en) * | 2018-04-19 | 2018-09-11 | 哈尔滨工业大学 | The two-stage of plasma density regulates and controls method and system |
| CN112906875A (en) * | 2021-04-29 | 2021-06-04 | 常州高凯电子有限公司 | Control system and method for precise gas flow valve |
| CN113113283A (en) * | 2021-04-08 | 2021-07-13 | 中国科学院光电技术研究所 | Plasma density distribution regulation and control method based on air inlet distribution control |
| US11781171B1 (en) | 2011-01-31 | 2023-10-10 | Roche Sequencing Solutions, Inc. | Methods of identifying multiple epitopes in cells |
-
2012
- 2012-10-12 CN CN201210385269.7A patent/CN103730314A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11781171B1 (en) | 2011-01-31 | 2023-10-10 | Roche Sequencing Solutions, Inc. | Methods of identifying multiple epitopes in cells |
| CN108521707A (en) * | 2018-04-19 | 2018-09-11 | 哈尔滨工业大学 | The two-stage of plasma density regulates and controls method and system |
| CN108521707B (en) * | 2018-04-19 | 2020-05-26 | 哈尔滨工业大学 | Two-stage regulation and control method and system for plasma density |
| CN113113283A (en) * | 2021-04-08 | 2021-07-13 | 中国科学院光电技术研究所 | Plasma density distribution regulation and control method based on air inlet distribution control |
| CN112906875A (en) * | 2021-04-29 | 2021-06-04 | 常州高凯电子有限公司 | Control system and method for precise gas flow valve |
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| C06 | Publication | ||
| PB01 | Publication | ||
| DD01 | Delivery of document by public notice |
Addressee: WUXI HUIMING ELECTRONIC TECHNOLOGY CO., LTD. Document name: Notification of before Expiration of Request of Examination as to Substance |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140416 |