CN109531424A - Polishing disk envelop-type dressing method and its device - Google Patents
Polishing disk envelop-type dressing method and its device Download PDFInfo
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- CN109531424A CN109531424A CN201910019569.5A CN201910019569A CN109531424A CN 109531424 A CN109531424 A CN 109531424A CN 201910019569 A CN201910019569 A CN 201910019569A CN 109531424 A CN109531424 A CN 109531424A
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- polishing disk
- trimmer
- finishing
- envelop
- guide rail
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- 238000005498 polishing Methods 0.000 title claims abstract description 135
- 238000000034 method Methods 0.000 title claims abstract description 48
- 238000006073 displacement reaction Methods 0.000 claims description 12
- 238000005259 measurement Methods 0.000 claims description 12
- 239000010432 diamond Substances 0.000 claims description 11
- 230000003750 conditioning effect Effects 0.000 claims description 10
- 229910003460 diamond Inorganic materials 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 9
- 238000009966 trimming Methods 0.000 claims description 9
- 239000011435 rock Substances 0.000 claims 1
- 239000004429 Calibre Substances 0.000 abstract description 7
- 230000003287 optical effect Effects 0.000 abstract description 4
- 238000003801 milling Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/02—Devices or means for dressing or conditioning abrasive surfaces of plane surfaces on abrasive tools
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
The present invention provides the envelop-type dressing method and its device of a kind of polishing disk high-efficiency high-accuracy finishing of achievable heavy-calibre planar polishing machine, biggish cutting data is selected quickly to remove polishing disk first, the form error for removing surface large scale, makes surface shape error≤30 μm of polishing disk；Then the vertical compensation rate that Z axis in dressing process is adjusted according to the disk shape after finishing further increases the form accuracy of polishing disk to≤10 μm；Fine even sliding finishing finally is carried out to polishing panel surface, and reaches the form accuracy for meeting requirement.The present invention is based on ultraprecise Milling Principles, polishing disk is modified using the conditioner discs of small-bore formula, its motion mode combines the advantages of unified formula dressing method and small tool formula dressing method, realize the high-precision finishing of meter level plane polishing disk, not only increase dressing accuracy, dressing efficiency is also improved, provides a kind of effective control method for the face shape convergence of heavy-calibre planar optical elements.
Description
Technical field
The present invention relates to optical processing technology field more particularly to a kind of polishing disk finishing sides of heavy-calibre planar polishing machine
Method and its device.
Background technique
The polishing process of optical element relies primarily on relative motion and chemical erosion effect reality between polishing disk and element
Existing material removal, therefore, the characteristic and form accuracy of polishing disk have conclusive influence to element material removal.With polishing
The phenomenon that constantly progress, the polishing disk of the materials such as polyurethane has surface layer blockage of the micro orifice and glazing, it is unfavorable for polished surface quality
And processing efficiency needs periodically to modify polishing disk for the long period working ability for keeping polishing disk.
The polishing disk dressing method of traditional heavy-calibre planar polishing machine has two classes, one is unified formula dressing method,
Polishing disk is modified using diamond truer equal or slightly large-sized with polishing disk radius, the structure of conditioning system
Rigidity is good, can quickly remove and reach stable finishing effect, but this method is limited to the spatial attitude accuracy of trimmer, modifies
There is intrinsic tilt angle between device and polishing disk, the surface shape precision after finishing is poor, and controllability is low, is unfavorable for engineering
It is further increased using with machining accuracy；Another method is small tool formula dressing method, that is, uses small-bore diamond disk
Local removal is carried out to polishing disk, and passes through the moving interpolation of small tool and polishing disk, realizes that the global certainty of polishing disk is repaired
Whole, the dressing accuracy of this method depends on trajectory planning, improves polishing disk precision relative to the finishing of unified formula, but should
The irregular cunning of method polishing disk distribution of shapes and inefficient.
Summary of the invention
Technical problem to be solved by the invention is to provide a kind of polishing disk of achievable heavy-calibre planar polishing machine is efficient
The envelop-type dressing method and its device of high-precision finishing.
The technical proposal for solving the technical problem of the invention is: polishing disk envelop-type dressing method assumes initially thatIt is 0, biggish cutting data is then selected quickly to remove polishing disk, removes the form error of surface large scale,
Reach the surface shape error of polishing diskThen according to the disk shape after finishingTo adjust dressing process
The vertical compensation rate of middle Z axis, the form accuracy for further increasing polishing disk arriveFinally polishing panel surface is carried out
Fine even sliding finishing, and reach the form accuracy for meeting requirement
Polishing disk envelop-type dressing method, method includes the following steps:
1) it detects to obtain polishing disk envelop-type trimming device of the invention using two-frequency laser interferometer or other equipment
The straightness error of first guide railAnd first guide rail and polishing disk parallelism error
2) polishing disk is quickly modified, polishing disk uniform rotation when finishing, and trimmer high-speed rotation, and along the side X
To slow translation；
3) form accuracy of polishing disk is obtained using laser displacement sensor measurement
4) refine is carried out to polishing disk, polishing disk uniform rotation when refine, trimmer high-speed rotation, and in X direction slowly
Translation, trimmer move up and down while translation along Z-direction, to compensate the volumetric position error of the first guide railWith
The form error of polishing diskThe amount of moving up and downWherein apFor to knife value；
5) form accuracy of polishing disk is obtained using laser displacement sensor measurement
6) refine is carried out to polishing disk, polishing disk uniform rotation when refine, trimmer high-speed rotation, and in X direction slowly
Translation, trimmer move up and down while translation along Z-direction, to compensate the volumetric position error of the first guide railWith
The form error of polishing diskThe amount of moving up and downWherein apFor to knife value；
7) form accuracy of polishing disk is obtained using laser displacement sensor measurementAnd judge whether it meets use and want
It asks, stops modifying if meeting, if be unsatisfactory for return step 4 carries out refine again.
Further, the speed of uniform rotation described in step 2, step 4 and step 6 is 1-10rpm；The high speed
The speed of rotation is 100-200rpm；The speed slowly translated is that the distance of one circle translation of trimmer rotation is less than or waits
In the diameter of trimmer.
Further, the cutting output of step 2 is set as 40-60 μm；The cutting output of step 4 is set as being no more than 10 μm；Step
Rapid 6 cutting output is set as being no more than 5 μm.
Further, upper dressing track of each diamond particles relative to polishing disk on trimmer are as follows:
In above formula, r is distance of the diamond particles apart from trimmer axis of rotation, and s is the revolving speed of trimmer, and C is polishing
The revolving speed of disk, f are the translation feed speed of trimmer, apIt is trimmer to knife value,It is missed for the spatial position of the first guide rail
Difference,For the form error of polishing disk.
The trimming device of polishing disk envelop-type dressing method, including support base, crossbeam, the first guide rail, the first screw rod, first
Motor, the crossbeam are arranged on two support bases, and the first guide rail, the first screw rod and the first electricity are provided on the crossbeam
Machine further includes conditioning system, and the conditioning system includes the second guide rail, the second screw rod, the second motor, finishing axle box and finishing
Device, second guide rail are arranged on the first screw rod, and drive the rotation of the first screw rod to drive conditioning system edge by first motor
The first guide rail or so translational motion；The second screw rod and the second motor, the finishing axle box are provided on second guide rail
It is arranged on the second screw rod, and drives finishing axle box along sagging on the second guide rail by the rotation of second the second screw rod of motor driven
Straight movement；The finishing axle box lower end is provided with trimmer, the trimmer is driven by the high-speed motor inside finishing axle box
It is dynamic, multiple diamond particles are provided on the trimmer.
The beneficial effects of the present invention are: the present invention is based on ultraprecise Milling Principle, using the conditioner discs of small-bore formula to throwing
The advantages of CD is modified, and motion mode combines unified formula dressing method and small tool formula dressing method, trimmer
It is fixed on finishing axle box, dressing accuracy is mainly related with the precision of lathe and movement control mode；Envelop-type of the invention is repaired
Adjusting method realizes the high-precision finishing of meter level plane polishing disk, not only increases dressing accuracy, also improves dressing efficiency, is
The face shape convergence of heavy-calibre planar optical elements provides a kind of effective control method；The present invention is for the poly- of diameter 1700mm
Urethane polishing disk can be trimmed to 8 μm within a few hours；The quick finishing of plane polishing disk may be implemented in the present invention, can adapt to
The finishing requirement of different size polishing disks, finishing operation is simple, and stability is good.
Detailed description of the invention
Fig. 1 is the perspective view of apparatus of the present invention.
Fig. 2 is the main view of apparatus of the present invention.
Fig. 3 is the side view of Fig. 2.
Fig. 4 is the schematic diagram of the method for the present invention.
Fig. 5 is the flow chart of the method for the present invention.
Fig. 6 is the original shape figure of the polishing disk of the embodiment of the present invention.
Fig. 7 is the straightness error for the first guide rail that the step 1 of the embodiment of the present invention measures
Fig. 8 is the parallelism error for the polishing disk that the step 1 of the embodiment of the present invention measures
Fig. 9 is the shape graph after step 3 polishing disk of the embodiment of the present invention is quickly modified.
Figure 10 is the amount of the moving up and down Z value of step 4 trimmer of the embodiment of the present invention.
Figure 11 is the shape graph after the refine of the polishing disk of the embodiment of the present invention.
Figure 12 is the amount of the moving up and down Z value of step 6 trimmer of the embodiment of the present invention.
Figure 13 is the shape graph after the completion of the finishing of the polishing disk of the embodiment of the present invention.
Specific embodiment
As shown in Figure 1-3, polishing disk envelop-type trimming device of the invention include support base 1, crossbeam 2, the first guide rail 3,
First screw rod 4, first motor 5 and conditioning system, wherein crossbeam 2 is arranged on two support bases 1, and the is provided on crossbeam 2
One guide rail 3, the first screw rod 4 and first motor 5；Conditioning system includes the second guide rail 6, the second screw rod 7, the second motor 8, dresser shaft
Case 9 and trimmer 10, wherein the second guide rail 6 is arranged on the first screw rod 4, and drives the rotation of the first screw rod 4 by first motor 5
Turn to drive conditioning system whole along 3 or so the translational motion of the first guide rail；The second screw rod 7 is provided on the second guide rail 6
It with the second motor 8, modifies axle box 9 and is arranged on the second screw rod 7, and drive the rotation of the second screw rod 7 to band by the second motor 8
Dynamic finishing axle box 9 moves vertically along the second about 6 guide rail, and the repetitive positioning accuracy of movement reaches micron order；In finishing axle box 9
Lower end is provided with trimmer 10, and trimmer 10 is driven by the high-speed motor inside finishing axle box 9, is provided on trimmer 10 more
A diamond particles, 10 diameter of trimmer are generally 100mm, can the polishing disk 11 to lower section modify.
The above-mentioned trimming device structure high using rigidity, the dressing process of polishing disk 11 are considered as the milling of ultraprecise
Journey, the motion profile enveloping surface of each diamond particles on trimmer 10 are the polishing disk working face after modifying.The present invention is logical
The motion profile of control trimmer 10 is crossed to realize the active control of polishing disk shape.The schematic diagram of the method for the present invention such as Fig. 4 institute
Show, 10 on trimmer on dressing track of each diamond particles relative to polishing disk 11 are as follows:
In above formula, r is distance of the diamond particles apart from 10 axis of rotation of trimmer, and s is the revolving speed of trimmer 10, and C is
The revolving speed of polishing disk 11, f are the translation feed speed (speed i.e.: in X direction) of trimmer 10, apIt is trimmer 10 to knife
Value,For the volumetric position error of the first guide rail 3, it may be assumed that the straightness error of the first guide rail 3And first guide rail 3 and polishing
The parallelism error of disk 11The sum of For the form error of polishing disk 11.
The method of the present invention assumes initially thatIt is 0, biggish cutting data is then selected quickly to remove polishing disk 11
It removes, removes the form error of surface large scale, reach the surface shape error of polishing disk 11 Then basis is repaired
Disk shape after wholeIt adjusts the vertical compensation rate of Z axis in dressing process, further increases the form accuracy of polishing disk 11
It arrivesFine even sliding finishing finally is carried out to 11 surface of polishing disk, and reaches the form accuracy for meeting requirementAs shown in Figure 5.
Envelop-type dressing method of the invention the following steps are included:
1) it detects to obtain polishing disk envelop-type trimming device of the invention using two-frequency laser interferometer or other equipment
The straightness error of first guide rail 3And first guide rail 3 and polishing disk 11 parallelism error
2) polishing disk 11 is quickly modified, 11 uniform rotation of polishing disk when finishing, uniform rotation speed is preferably 1-
10rpm, and 10 high-speed rotation of trimmer, high-speed rotation speed are preferably 100-200rpm, and slowly translation in X direction, slowly
Translational velocity is that the distance of one circle translation of the rotation of trimmer 10 is less than or equal to the diameter of trimmer 10, and cutting output is generally settable
It is 40-60 μm；
3) form accuracy of polishing disk 11 is obtained using laser displacement sensor measurement
4) refine is carried out to polishing disk 11,11 uniform rotation of polishing disk when refine, uniform rotation speed is preferably 1-
10rpm, 10 high-speed rotation of trimmer, high-speed rotation speed is preferably 100-200rpm, and slowly translation in X direction, slowly flat
The diameter that the distance that speed is one circle translation of the rotation of trimmer 10 is less than or equal to trimmer 10 is moved, trimmer 10 is in the same of translation
When moved up and down along Z-direction, with compensate the first guide rail 3 volumetric position errorWith the form error of polishing disk 11The amount of moving up and downWherein apFor to knife value, apSetting to guarantee cutting output be no more than 10 μ
m；
5) form accuracy of polishing disk 11 is obtained using laser displacement sensor measurementSpecific measurement method can use
Method disclosed in 103954237A；
6) refine is carried out to polishing disk 11,11 uniform rotation of polishing disk when refine, uniform rotation speed is preferably 1-
10rpm, 10 high-speed rotation of trimmer, high-speed rotation speed is preferably 100-200rpm, and slowly translation in X direction, slowly flat
The diameter that the distance that speed is one circle translation of the rotation of trimmer 10 is less than or equal to trimmer 10 is moved, trimmer 10 is in the same of translation
When moved up and down along Z-direction, with compensate the first guide rail 3 volumetric position errorWith the form error of polishing disk 11The amount of moving up and downWherein apFor to knife value, apSetting to guarantee that cutting output does not surpass
Cross 5 μm；
7) form accuracy of polishing disk 11 is obtained using laser displacement sensor measurementAnd judge whether it meets use
It is required that stopping modifying if meeting, if be unsatisfactory for return step 4 carries out refine again.
Embodiment:
Polishing disk 11 is modified using envelop-type dressing method of the invention, the original shape PV of the polishing disk 11 is
106 μm, as shown in fig. 6, finishing the following steps are included:
1) it detects to obtain polishing disk envelop-type trimming device of the invention using two-frequency laser interferometer or other equipment
The straightness error of first guide rail 3And first guide rail 3 and polishing disk 11 parallelism errorAs Figure 7-8；
2) polishing disk 11 is quickly modified, polishing disk 11 is with the speed uniform rotation of 1rpm when finishing, and trimmer
10 with the speed high-speed rotation of 200rpm, and is slowly translated with 80mm/min in X direction, and cutting output is set as 40 μm；
3) form accuracy of polishing disk 11 is obtained using laser displacement sensor measurementIt is 30 μm, as shown in Figure 9；
4) refine is carried out to polishing disk 11, when refine polishing disk 11 with the speed uniform rotation of 1rpm, trimmer 10 with
The speed high-speed rotation of 100rpm, and slowly translated with 60mm/min in X direction, trimmer 10 is while translation along Z-direction
It moves up and down, to compensate the volumetric position error of the first guide rail 3With the form error of polishing disk 11It moves up and down
AmountAs shown in Figure 10, wherein apFor to knife value, cutting output is 10 μm；
5) form accuracy of polishing disk 11 is obtained using laser displacement sensor measurementIt is 8 μm, as shown in figure 11；
6) refine is carried out to polishing disk 11, when refine polishing disk 11 with the speed uniform rotation of 1rpm, trimmer 10 with
The speed high-speed rotation of 100rpm, and slowly translated with 60mm/min in X direction, trimmer 10 is while translation along Z-direction
It moves up and down, to compensate the volumetric position error of the first guide rail 3With the form error of polishing disk 11It moves up and down
AmountAs shown in figure 12, wherein apFor to knife value, cutting output is 4 μm；
7) form accuracy of polishing disk 11 is obtained using laser displacement sensor measurementIt is 8 μm, as shown in figure 13, meets
Requirement stops finishing.
The present invention provides a kind of envelop-type trimming device of heavy-calibre planar polishing disk and its methods, by controlling osculum
The motion profile of diameter trimmer realizes the actively controllable of finishing shape, and the dressing accuracy of plane polishing disk, which realizes, significantly to be mentioned
It is high.
Claims (10)
1. polishing disk envelop-type dressing method, which is characterized in that assume initially thatIt is 0, then selects biggish cutting data
Polishing disk (11) is quickly removed, the form error of surface large scale is removed, makes the surface shape error of polishing disk (11)
ReachThen according to the disk shape after finishingThe vertical compensation rate of Z axis in dressing process is adjusted, into one
The form accuracy that step improves polishing disk (11) arrives Fine even sliding finishing finally is carried out to polishing disk (11) surface,
And reach the form accuracy for meeting requirement
2. polishing disk envelop-type dressing method, which is characterized in that method includes the following steps:
1) it detects to obtain the first of polishing disk envelop-type trimming device of the invention using two-frequency laser interferometer or other equipment
The straightness error of guide rail (3)And first guide rail (3) and polishing disk (11) parallelism error
2) polishing disk (11) is quickly modified, polishing disk (11) uniform rotation when finishing, and trimmer (10) high-speed rotation,
And slowly translation in X direction；
3) form accuracy of polishing disk (11) is obtained using laser displacement sensor measurement
4) refine is carried out to polishing disk (11), polishing disk (11) uniform rotation when refine, trimmer (10) high-speed rotation, and along X
Direction slowly translates, and trimmer (10) moves up and down while translation along Z-direction, to compensate the sky of the first guide rail (3)
Between location errorWith the form error of polishing disk (11)The amount of moving up and downWherein apIt is right
Knife value；
5) form accuracy of polishing disk (11) is obtained using laser displacement sensor measurement
6) refine is carried out to polishing disk (11), polishing disk (11) uniform rotation when refine, trimmer (10) high-speed rotation, and along X
Direction slowly translates, and trimmer (10) moves up and down while translation along Z-direction, to compensate the sky of the first guide rail (3)
Between location errorWith the form error of polishing disk (11)The amount of moving up and downWherein ap
For to knife value；
7) form accuracy of polishing disk (11) is obtained using laser displacement sensor measurementAnd judge whether it meets use and want
It asks, stops modifying if meeting, if be unsatisfactory for return step 4 carries out refine again.
3. polishing disk envelop-type dressing method as claimed in claim 2, which is characterized in that institute in step 2, step 4 and step 6
The speed for the uniform rotation stated is 1-10rpm.
4. polishing disk envelop-type dressing method as claimed in claim 2, which is characterized in that institute in step 2, step 4 and step 6
The speed for the high-speed rotation stated is 100-200rpm.
5. polishing disk envelop-type dressing method as claimed in claim 2, which is characterized in that institute in step 2, step 4 and step 6
The speed slowly translated stated is that the distance of one circle translation of trimmer (10) rotation is less than or equal to the diameter of trimmer (10).
6. polishing disk envelop-type dressing method as claimed in claim 2, which is characterized in that the cutting output of step 2 is set as 40-
60μm。
7. polishing disk envelop-type dressing method as claimed in claim 2, which is characterized in that the cutting output of step 4 is set as not
More than 10 μm.
8. polishing disk envelop-type dressing method as claimed in claim 2, which is characterized in that the cutting output of step 6 is set as not
More than 5 μm.
9. polishing disk envelop-type dressing method as claimed in claim 1 or 2, which is characterized in that (10) Shang Gejin on trimmer
Dressing track of the hard rock particle relative to polishing disk (11) are as follows:
In above formula, r is distance of the diamond particles apart from trimmer (10) axis of rotation, and s is the revolving speed of trimmer (10), and C is
The revolving speed of polishing disk (11), f are the translation feed speed of trimmer (10), apIt is trimmer (10) to knife value,It is first
The volumetric position error of guide rail (3),For the form error of polishing disk (11).
10. the trimming device of polishing disk envelop-type dressing method, including support base (1), crossbeam (2), the first guide rail (3), first
Screw rod (4), first motor (5), the crossbeam (2) are arranged on two support bases (1), and the is provided on the crossbeam (2)
One guide rail (3), the first screw rod (4) and first motor (5), which is characterized in that further include conditioning system, the conditioning system includes
Second guide rail (6), the second screw rod (7), the second motor (8), finishing axle box (9) and trimmer (10), second guide rail (6) set
It sets on the first screw rod (4), and drives conditioning system to lead along first by first motor (5) driving the first screw rod (4) rotation
Rail (3) left and right translational motion；The second screw rod (7) and the second motor (8), the finishing are provided on second guide rail (6)
Axle box (9) is arranged on the second screw rod (7), and drives finishing axle box by the second motor (8) driving the second screw rod (7) rotation
(9) it moves vertically up and down along the second guide rail (6)；Finishing axle box (9) lower end is provided with trimmer (10), the finishing
Device (10) the high-speed motor driving internal by finishing axle box (9), is provided with multiple diamonds on the trimmer (10)
Grain.
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| CN201910019569.5A CN109531424B (en) | 2019-01-09 | 2019-01-09 | Envelope type dressing method and device for polishing disk |
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|---|---|---|---|
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111090910A (en) * | 2019-11-26 | 2020-05-01 | 武汉理工大学 | Enveloping die compensation method for improving space enveloping forming precision of conical thin-wall high-rib component |
| CN112077742A (en) * | 2020-09-21 | 2020-12-15 | 北京烁科精微电子装备有限公司 | Polishing pad dresser and chemical mechanical planarization equipment |
| CN112405215A (en) * | 2020-11-11 | 2021-02-26 | 中国工程物理研究院激光聚变研究中心 | Off-line dressing device and method for polishing disk |
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