CN109343315A - The developer solution concentration of lye control system and method for developing machine - Google Patents
The developer solution concentration of lye control system and method for developing machine Download PDFInfo
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- CN109343315A CN109343315A CN201811437612.1A CN201811437612A CN109343315A CN 109343315 A CN109343315 A CN 109343315A CN 201811437612 A CN201811437612 A CN 201811437612A CN 109343315 A CN109343315 A CN 109343315A
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- developer solution
- concentration
- lye
- storage tank
- developing machine
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The present invention provides the developer solution concentration of lye control system and method for a kind of developing machine.The developer solution concentration of lye control system of the developing machine includes developer solution storage tank, stores tank connected measurement of concetration module and liquid supply module with the developer solution and feed the control module that module is all connected with the measurement of concetration module and liquid, when developing machine is in idle condition, when the concentration of lye of the developer solution in developer solution storage tank deteriorates to less than a preset concentration threshold, the control module control liquid supply module provides development stoste within a preset first time and gives developer solution storage tank；When the concentration of lye of the developer solution in developer solution storage tank rises to equal to a preset upper limit of concentration threshold value, control liquid supply module provides dilution within preset second time and gives developer solution storage tank, reduce developing machine concentration of lye waving interval in idle state, developing machine delay machine frequency is reduced, production capacity is promoted.
Description
Technical field
The present invention relates to the developer solution concentration of lye control systems and side of field of display technology more particularly to a kind of developing machine
Method.
Background technique
Thin film transistor (TFT) (Thin Film Transistor, TFT) is current liquid crystal display device (Liquid Crystal
Display, LCD) and active matrix drive type organic electroluminescence display device and method of manufacturing same (ActiveMatrix Organic Light-
Emitting Diode, AMOLED) in main driving element, the display performance of direct relation panel display apparatus.
Liquid crystal display on existing market is largely backlight liquid crystal display comprising liquid crystal display panel and back
Optical mode group (backlight module).The working principle of liquid crystal display panel is in thin-film transistor array base-plate (Thin
Film Transistor Array Substrate, TFT Array Substrate) and colored filter (Color
Filter, CF) liquid crystal molecule is poured between substrate, and apply pixel voltage and common voltage respectively on two plate bases, pass through
The direction of rotation of the electric field controls liquid crystal molecule formed between pixel voltage and common voltage transmits the light of backlight module
Picture is generated out.
Be frequently necessary to carry out developing process in liquid crystal display panel manufacturing process, the developer solution in developing machine to substrate into
It would generally be recycled after row development.Existing developer solution is usually tetramethylammonium hydroxide (TMAH) aqueous solution, at present
Solution level control system pass through sampling pump extract developing machine developer solution storage tank in developer solution, by defoaming device
After being respectively delivered to absorbance meter and TMAH densimeter progress measurement of concetration after deaeration, it is being transmitted back to developer solution storage tank.But
There are some problems for current solution level control system:
1, when developing machine enters working condition from idle (idle) state, the decline of TMAH concentration；
Reason includes the photoresist that different number degree can be carried after 1.1, developer solution develops to substrate, by different photoresists
The developer solution of concentration recycles, and making the solution level in developer solution storage tank that large change occur, (photoresist increases, TMAH concentration
Decline)；
1.2, developing machine does not have developer solution to be recycled in developer solution storage tank in idle state, is fed at this time to developer solution
The 25%TMAH solution or deionized water (DIW) of storage tank are seldom；
1.3, developing machine is in working condition and when substrate carries out flow, the TMAH and photoresist mixed liquor that are covered on substrate
Body is recovered in developer solution storage tank, can not be reduced under TMAH concentration feeding 25%TMAH solution to developer solution storage tank
The speed of drop.
2, when developing machine is entered from working condition from idle state, TMAH concentration rises；Reason is developing machine in work shape
, can be to developer solution storage tank supply 25%TMAH solution with stable equilibrium's TMAH concentration when state, balance is beaten when substrate stops flow
Broken, the 25%TMAH solution fed leads to TMAH concentration rapid increase.
Summary of the invention
The purpose of the present invention is to provide a kind of developer solution concentration of lye control systems of developing machine, can reduce developing machine
The concentration of lye waving interval in idle state reduces developing machine delay machine frequency, promotes production capacity.
The object of the invention is also to provide a kind of developer solution concentration of lye control methods of developing machine, can reduce development
Machine concentration of lye waving interval in idle state reduces developing machine delay machine frequency, promotes production capacity.
To achieve the above object, the present invention provides a kind of developer solution concentration of lye control systems of developing machine, comprising: aobvious
Shadow liquid storage tank stores tank connected measurement of concetration module and liquid supply module with the developer solution and surveys with the concentration
The control module that amount module and liquid supply module are all connected with；
The measurement of concetration module is used to measure the concentration of lye of the developer solution in developer solution storage tank；
The control module is used for when developing machine is in idle condition, when to deteriorate to less than one preset dense for concentration of lye
When spending threshold value, control liquid supply module provides development stoste within a preset first time and gives developer solution storage tank, works as alkali
When liquid concentration is risen to equal to a preset upper limit of concentration threshold value, control liquid supply module mentions within preset second time
Developer solution storage tank is given for dilution.
The control module is equal within the preset third time in the concentration of lye of the developer solution in developer solution storage tank
When more than or equal to a preset concentration threshold, judge that developing machine is in idle condition.
The preset concentration threshold is 2.38%；The development stoste is 25%TMAH solution；The lye is TMAH；
The dilution is deionized water.
The measurement of concetration module includes storing tank connected absorbance meter and densimeter with developer solution；
The absorbance meter is used to measure the photoresist concentration in developer solution；
The densimeter is used to measure the overall density and concentration of lye of photoresist and carbanion in developer solution.
The densimeter includes the densimeter for storing tank connected inductor with developer solution and connecting with the inductor
Ontology；The inductor includes the temperature induction unit set gradually along the vertical direction, ultrasonic sensing unit and conductivity sense
Answer unit.
The present invention also provides a kind of developer solution concentration of lye control methods of developing machine, include the following steps:
Step S1, the developer solution concentration of lye control system of developing machine is provided；The developer solution concentration of lye control of the developing machine
System processed include: developer solution storage tank, store with the developer solution tank connected measurement of concetration module and liquid supply module with
And the control module being all connected with the measurement of concetration module and liquid supply module；
Step S2, the concentration of lye of the developer solution in the described measurement of concetration module measurement developer solution storage tank；The control
Module is when developing machine is in idle condition, and when concentration of lye deteriorates to less than a preset concentration threshold, control liquid is mended
Development stoste is provided within a preset first time to module and gives developer solution storage tank, when concentration of lye rises to equal to one in advance
If upper limit of concentration threshold value when, control liquid supply module is provided within preset second time dilution give developer solution storage
Tank.
In the step S2, the concentration of lye of developer solution of the control module in developer solution storage tank is preset one
When being all larger than in the third time or being equal to a preset concentration threshold, judge that developing machine is in idle condition.
The preset concentration threshold is 2.38%；The development stoste is 25%TMAH solution；The lye is TMAH；
The dilution is deionized water.
The measurement of concetration module includes storing tank connected absorbance meter and densimeter with developer solution；
Photoresist concentration in the step S2, in the absorbance meter measurement developer solution；The densimeter measures developer solution
In photoresist and carbanion overall density and concentration of lye.
The densimeter includes the densimeter for storing tank connected inductor with developer solution and connecting with the inductor
Ontology；The inductor includes the temperature induction unit set gradually along the vertical direction, ultrasonic sensing unit and conductivity sense
Answer unit.
Beneficial effects of the present invention: the developer solution concentration of lye control system of developing machine of the invention includes developer solution storage
Tank, stored with the developer solution tank connected measurement of concetration module and liquid supply module and with the measurement of concetration module and
The control module that liquid supply module is all connected with, the developer solution when developing machine is in idle condition, in developer solution storage tank
Concentration of lye when deteriorating to less than a preset concentration threshold, the control module control liquid supply module is preset one
Development stoste is provided at the first time and gives developer solution storage tank, TMAH is dense when preventing developing machine from entering working condition from idle state
Degree decline；When developing machine is in idle condition, when the concentration of lye of the developer solution in developer solution storage tank rises to equal to one
When preset upper limit of concentration threshold value, control liquid supply module provides dilution within preset second time and deposits to developer solution
Storage tank, TMAH concentration rises when preventing developing machine from entering idle state from working condition, reduces developing machine alkali in idle state
Liquid fluctuation of concentration section reduces developing machine delay machine frequency, promotes production capacity.The developer solution concentration of lye of developing machine of the invention controls
Method can reduce developing machine concentration of lye waving interval in idle state, reduce developing machine delay machine frequency, promote production capacity.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the schematic diagram of the developer solution concentration of lye control system of developing machine of the invention；
Fig. 2 is the flow chart of the developer solution concentration of lye control method of developing machine of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 1, the present invention provides a kind of developer solution concentration of lye control system of developing machine, comprising: developer solution is deposited
Storage tank 10, the measurement of concetration module 20 being connect with the developer solution storage tank 10 and liquid supply module 30 and with the concentration
The control module 40 that measurement module 20 and liquid supply module 30 are all connected with；
The measurement of concetration module 20 is used to measure the concentration of lye of the developer solution in developer solution storage tank 10；
The control module 40 is used for when developing machine is in idle condition, when to deteriorate to less than one preset for concentration of lye
When concentration threshold, control liquid supply module 30 provides development stoste within a preset first time and gives developer solution storage tank
10, when concentration of lye rises to equal to a preset upper limit of concentration threshold value, control liquid supply module 30 is one preset the
Dilution is provided in two times to developer solution storage tank 10.
It should be noted that when developing machine is in idle condition, when the lye of the developer solution in developer solution storage tank 10
When concentration deteriorates to less than a preset concentration threshold, the control module 40 controls liquid supply module 30 one preset the
Development stoste is provided in one time to developer solution storage tank 10, i.e., when developing machine enters working condition from idle state before, just
Development stoste is provided to developer solution storage tank 10, when preventing developing machine from entering working condition from idle state under TMAH concentration
Drop；When developing machine is in idle condition, when the concentration of lye of the developer solution in developer solution storage tank 10 rises to equal to one in advance
If upper limit of concentration threshold value when, control liquid supply module 30 provides dilution within preset second time and deposits to developer solution
When storage tank 10, i.e. developing machine enter idle state from working condition, dilution is provided for developer solution storage tank 10, prevents from showing
TMAH concentration rises when shadow machine enters idle state from working condition.
Specifically, the working condition of developing machine is that substrate puts into developing machine progress flow, developing machine, which sprays substrate, to develop
Liquid develops.Developer solution can carry the photoresist of different number degree after developing to substrate, be then recycled to developer solution and deposit
It is recycled in storage tank 10.
Specifically, the developer solution in the developer solution storage tank 10 after the measurement of measurement of concetration module 20 and flows into aobvious
Shadow liquid storage tank 10.
Specifically, the concentration of lye of developer solution of the control module 40 in developer solution storage tank 10 is one preset
When being all larger than in three times or being equal to a preset concentration threshold, judge that developing machine is in idle condition.
Further, the preset concentration threshold is 2.38%.
Specifically, the development stoste is 25%TMAH solution (water that ie in solution includes 25% TMAH and 75%)；Institute
Stating lye is TMAH；The dilution is deionized water.
Specifically, the control module 40 is PLC (programmable logic controller (PLC)).
Specifically, the preset first time, preset second time and preset third time can be according to realities
The concentration of lye on border needs to set.Such as preset first time is 3 minutes, when preset second time and preset third
Between be 1 second.
Specifically, the measurement of concetration module 20 includes the absorbance meter 21 and densimeter connecting with developer solution storage tank 10
22；
The absorbance meter 21 is used to measure the photoresist concentration in developer solution；
The densimeter 22 is used to measure the overall density and concentration of lye of photoresist and carbanion in developer solution.
Concentration of lye, photoresist concentration and carbon acid ion concentration can be respectively obtained by being matched by absorbance meter 21 with densimeter 22
(due to the carbon dioxide that lye constantly absorbs air cause the carbon acid ion concentration in lye constantly increase and photoresist and
Also a part of carbanion can be generated after alkaline reaction).
Specifically, the densimeter 22 include the inductor 221 being connect with developer solution storage tank 10 and with the induction
The densimeter ontology 222 that device 221 connects；The inductor 221 includes the temperature induction unit set gradually along the vertical direction
2211, ultrasonic sensing unit 2212 and conductivity sensing unit 2213.
The speed reflected ultrasonic wave due to the developer solution of various concentration is different and the conductivity of the developer solution of various concentration
Difference, the speed and lead that the densimeter ontology 222 is reflected ultrasonic wave according to the developer solution in ultrasonic sensing unit 2212
Developer solution conductivity sensing unit in electric rate sensing unit 2213 calculate to obtain the overall density of photoresist and carbanion and
Concentration of lye.In addition, by temperature induction unit 2211, ultrasonic sensing unit 2212 and conductivity sensing unit 2213 along vertical
Direction, which is set gradually, so that developer solution is flowed from the bottom up, the internal gas of developer solution is discharged, avoid gas from being attached on super
On sound wave sensing unit 2212, concentration measurement is influenced.
Specifically, the measurement of concetration module 20 further includes and developer solution storage tank 10, absorbance meter 21 and densimeter 22
The deaerator 23 being all connected with；The deaerator 23 is used to remove the bubble in developer solution, to improve the accurate of concentration measurement
Property.
Referring to Fig. 2, being based on above-mentioned developer solution concentration of lye control system, the present invention also provides a kind of developments of developing machine
Liquid alkaline liquid concentration control method, includes the following steps:
Step S1, the developer solution concentration of lye control system of developing machine is provided；The developer solution concentration of lye control of the developing machine
System processed includes: developer solution storage tank 10, the measurement of concetration module 20 connecting with the developer solution storage tank 10 and liquid supply
Module 30 and the control module 40 being all connected with the measurement of concetration module 20 and liquid supply module 30；
Step S2, the described measurement of concetration module 20 measures the concentration of lye of the developer solution in developer solution storage tank 10；It is described
Control module 40 is when developing machine is in idle condition, when concentration of lye deteriorates to less than a preset concentration threshold, control
Liquid supply module 30 provides development stoste to developer solution storage tank 10, when concentration of lye rises within a preset first time
To equal than when a preset upper limit of concentration threshold value, control liquid supply module 30 provides dilution within preset second time
To developer solution storage tank 10.
It should be noted that when developing machine is in idle condition, when the lye of the developer solution in developer solution storage tank 10
When concentration deteriorates to less than a preset concentration threshold, the control module 40 controls liquid supply module 30 one preset the
Development stoste is provided in one time to developer solution storage tank 10, i.e., when developing machine enters working condition from idle state before, just
Development stoste is provided to developer solution storage tank 10, when preventing developing machine from entering working condition from idle state under TMAH concentration
Drop；When developing machine is in idle condition, when the concentration of lye of the developer solution in developer solution storage tank 10 rises to equal to one in advance
If upper limit of concentration threshold value when, control liquid supply module 30 provides dilution within preset second time and deposits to developer solution
When storage tank 10, i.e. developing machine enter idle state from working condition, dilution is provided for developer solution storage tank 10, prevents from showing
TMAH concentration rises when shadow machine enters idle state from working condition, reduces developing machine concentration of lye wave zone in idle state
Between, developing machine delay machine frequency is reduced, production capacity is promoted.
Specifically, the working condition of developing machine is that substrate puts into developing machine progress flow, developing machine, which sprays substrate, to develop
Liquid develops.Developer solution can carry the photoresist of different number degree after developing to substrate, be then recycled to developer solution and deposit
It is recycled in storage tank 10.
Specifically, the developer solution in the developer solution storage tank 10 after the measurement of measurement of concetration module 20 and flows into aobvious
Shadow liquid storage tank 10.
Specifically, the lye of developer solution of the control module 40 in developer solution storage tank 10 is dense in the step S2
When degree is all larger than within the preset third time or is equal to a preset concentration threshold, judge that developing machine is in idle condition.
Further, the preset concentration threshold is 2.38%.
Specifically, the development stoste is 25%TMAH solution；The lye is TMAH；The dilution is deionization
Water.
Specifically, the control module 40 is PLC.
Specifically, the preset first time, preset second time and preset third time can be according to realities
The concentration of lye on border needs to set.Such as preset first time is 3 minutes, when preset second time and preset third
Between be 1 second.
Specifically, the measurement of concetration module 20 includes the absorbance meter 21 and densimeter connecting with developer solution storage tank 10
22；
In the step S2, the absorbance meter 21 measures the photoresist concentration in developer solution；The measurement of densimeter 22 is aobvious
The overall density and concentration of lye of photoresist and carbanion in shadow liquid.It is matched by absorbance meter 21 with densimeter 22
Concentration of lye, photoresist concentration and carbon acid ion concentration can be respectively obtained (since lye constantly absorbs the carbon dioxide of air
Cause the carbon acid ion concentration in lye constantly increase and photoresist and alkaline reaction after can also generate a part of carbonate from
Son).
Specifically, the densimeter 22 include the inductor 221 being connect with developer solution storage tank 10 and with the induction
The densimeter ontology 222 that device 221 connects；The inductor 221 includes the temperature induction unit set gradually along the vertical direction
2211, ultrasonic sensing unit 2212 and conductivity sensing unit 2213.
The speed reflected ultrasonic wave due to the developer solution of various concentration is different and the conductivity of the developer solution of various concentration
Difference, the speed and lead that the densimeter ontology 222 is reflected ultrasonic wave according to the developer solution in ultrasonic sensing unit 2212
Developer solution conductivity sensing unit in electric rate sensing unit 2213 calculate to obtain the overall density of photoresist and carbanion and
Concentration of lye.In addition, by temperature induction unit 2211, ultrasonic sensing unit 2212 and conductivity sensing unit 2213 along vertical
Direction, which is set gradually, so that developer solution is flowed from the bottom up, the internal gas of developer solution is discharged, avoid gas from being attached on super
On sound wave sensing unit 2212, concentration measurement is influenced.
Specifically, the measurement of concetration module 20 further includes and developer solution storage tank 10, absorbance meter 21 and densimeter 22
The deaerator 23 being all connected with；The deaerator 23 is used to remove the bubble in developer solution, to improve the accurate of concentration measurement
Property.
In conclusion the developer solution concentration of lye control system of developing machine of the invention includes developer solution storage tank and institute
Developer solution is stated to store tank connected measurement of concetration module and liquid supply module and mend with the measurement of concetration module and liquid
To the control module that module is all connected with, when developing machine is in idle condition, when the lye of the developer solution in developer solution storage tank
When concentration deteriorates to less than a preset concentration threshold, the control module control liquid supply module is at one preset first
Interior offer development stoste gives developer solution storage tank, when preventing developing machine from entering working condition from idle state under TMAH concentration
Drop；When developing machine is in idle condition, preset when the concentration of lye of the developer solution in developer solution storage tank rises to equal to one
Upper limit of concentration threshold value when, control liquid supply module is provided within preset second time dilution give developer solution storage
Tank, TMAH concentration rises when preventing developing machine from entering idle state from working condition, reduces developing machine lye in idle state
Fluctuation of concentration section reduces developing machine delay machine frequency, promotes production capacity.The developer solution concentration of lye controlling party of developing machine of the invention
Method can reduce developing machine concentration of lye waving interval in idle state, reduce developing machine delay machine frequency, promote production capacity.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (10)
1. a kind of developer solution concentration of lye control system of developing machine characterized by comprising developer solution storage tank (10), with
The measurement of concetration module (20) and liquid of developer solution storage tank (10) connection feed module (30) and survey with the concentration
The control module (40) that amount module (20) and liquid supply module (30) are all connected with；
The measurement of concetration module (20) is used to measure the concentration of lye of the developer solution in developer solution storage tank (10)；
The control module (40) is used for when developing machine is in idle condition, when to deteriorate to less than one preset dense for concentration of lye
When spending threshold value, control liquid supply module (30) provides development stoste within a preset first time and gives developer solution storage tank
(10), when concentration of lye rises to equal to a preset upper limit of concentration threshold value, control liquid supply module (30) is default one
The second time in provide dilution give developer solution storage tank (10).
2. the developer solution concentration of lye control system of developing machine as described in claim 1, which is characterized in that the control module
(40) it is all larger than within the preset third time in the concentration of lye of the developer solution in developer solution storage tank (10) or is equal to one
When preset concentration threshold, judge that developing machine is in idle condition.
3. the developer solution concentration of lye control system of developing machine as described in claim 1, which is characterized in that described preset dense
Spending threshold value is 2.38%；The development stoste is 25%TMAH solution；The lye is TMAH；The dilution is deionization
Water.
4. the developer solution concentration of lye control system of developing machine as described in claim 1, which is characterized in that the measurement of concetration
Module (20) includes the absorbance meter (21) and densimeter (22) connecting with developer solution storage tank (10)；
The absorbance meter (21) is used to measure the photoresist concentration in developer solution；
The densimeter (22) is used to measure the overall density and concentration of lye of photoresist and carbanion in developer solution.
5. the developer solution concentration of lye control system of developing machine as claimed in claim 4, which is characterized in that the densimeter
It (22) include the inductor (221) being connect with developer solution storage tank (10) and the densimeter being connect with the inductor (221)
Ontology (222)；The inductor (221) includes the temperature induction unit (2211) set gradually along the vertical direction, ultrasonic wave sense
Answer unit (2212) and conductivity sensing unit (2213).
6. a kind of developer solution concentration of lye control method of developing machine, which comprises the steps of:
Step S1, the developer solution concentration of lye control system of developing machine is provided；The developer solution concentration of lye of the developing machine controls system
System includes: that developer solution storage tank (10), the measurement of concetration module (20) connecting with the developer solution storage tank (10) and liquid are mended
To module (30) and the control module (40) being all connected with the measurement of concetration module (20) and liquid supply module (30)；
Step S2, the concentration of lye of the developer solution in described measurement of concetration module (20) measurement developer solution storage tank (10)；It is described
Control module (40) is when developing machine is in idle condition, when concentration of lye deteriorates to less than a preset concentration threshold, control
Liquid supply module (30) processed provides development stoste within a preset first time and gives developer solution storage tank (10), when lye is dense
When degree is risen to equal to a preset upper limit of concentration threshold value, control liquid supply module (30) mentions within preset second time
Developer solution storage tank (10) are given for dilution.
7. the developer solution concentration of lye control method of developing machine as claimed in claim 6, which is characterized in that the step S2
In, the control module (40) the developer solution in developer solution storage tank (10) concentration of lye within the preset third time
When being all larger than or being equal to a preset concentration threshold, judge that developing machine is in idle condition.
8. the developer solution concentration of lye control method of developing machine as claimed in claim 6, which is characterized in that described preset dense
Spending threshold value is 2.38%；The development stoste is 25%TMAH solution；The lye is TMAH；The dilution is deionization
Water.
9. the developer solution concentration of lye control method of developing machine as claimed in claim 6, which is characterized in that the measurement of concetration
Module (20) includes the absorbance meter (21) and densimeter (22) connecting with developer solution storage tank (10)；
Photoresist concentration in the step S2, in absorbance meter (21) the measurement developer solution；Densimeter (22) measurement is aobvious
The overall density and concentration of lye of photoresist and carbanion in shadow liquid.
10. the developer solution concentration of lye control method of developing machine as claimed in claim 9, which is characterized in that the densimeter
It (22) include the inductor (221) being connect with developer solution storage tank (10) and the densimeter being connect with the inductor (221)
Ontology (222)；The inductor (221) includes the temperature induction unit (2211) set gradually along the vertical direction, ultrasonic wave sense
Answer unit (2212) and conductivity sensing unit (2213).
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110083021A (en) * | 2019-04-08 | 2019-08-02 | 深圳市华星光电技术有限公司 | A kind of substrate developing method and substrate developing apparatus |
| CN110231725A (en) * | 2019-05-20 | 2019-09-13 | 深圳市华星光电半导体显示技术有限公司 | A kind of method and its control system of the thinning of lithographic glass |
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| CN110231725B (en) * | 2019-05-20 | 2022-03-08 | 深圳市华星光电半导体显示技术有限公司 | Method for thinning micro-image glass and control system thereof |
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