CN108472834A - 用于加成法制造的经改进的不含锑的可辐射固化组合物及其在熔模铸造工艺中的应用 - Google Patents
用于加成法制造的经改进的不含锑的可辐射固化组合物及其在熔模铸造工艺中的应用 Download PDFInfo
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- CN108472834A CN108472834A CN201680066978.5A CN201680066978A CN108472834A CN 108472834 A CN108472834 A CN 108472834A CN 201680066978 A CN201680066978 A CN 201680066978A CN 108472834 A CN108472834 A CN 108472834A
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B22C9/02—Sand moulds or like moulds for shaped castings
- B22C9/04—Use of lost patterns
- B22C9/043—Removing the consumable pattern
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
- C08G65/18—Oxetanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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Abstract
Description
扫描数 | 4 |
分辨率 | 4 |
数据收集类型 | 实时 |
轮廓类型 | 斜坡 |
时序 | 保存200秒 |
使用重复时间(秒) | 5 |
官能团 | 方法 | 高度或面积(cm-1) | 基线(cm-1) |
脂环族环氧 | 高度 | 787.791 | 856.253-778.149 |
氧杂环丁烷 | 面积 | 998.962-943.999 | 998.962-943.999 |
Claims (28)
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US201562256389P | 2015-11-17 | 2015-11-17 | |
US62/256,389 | 2015-11-17 | ||
PCT/US2016/062440 WO2017087614A1 (en) | 2015-11-17 | 2016-11-17 | Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes |
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CN108472834A true CN108472834A (zh) | 2018-08-31 |
CN108472834B CN108472834B (zh) | 2021-05-25 |
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EP (2) | EP3827955A1 (zh) |
JP (1) | JP2018536731A (zh) |
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Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6204420B2 (ja) | 2015-08-07 | 2017-09-27 | 株式会社ダイセル | 硬化性組成物、及びそれを用いた光学素子 |
JP6603127B2 (ja) * | 2015-12-29 | 2019-11-06 | サンアプロ株式会社 | 感光性組成物 |
SE540734C2 (en) * | 2017-05-30 | 2018-10-23 | Perstorp Ab | A PROCESS FOR ADDITIVE MANUFACTURING |
JP2019099666A (ja) * | 2017-12-01 | 2019-06-24 | サンアプロ株式会社 | 光学的立体造形用樹脂組成物 |
US11180594B2 (en) * | 2017-12-29 | 2021-11-23 | Covestro (Netherlands) B.V. | Compositions and articles for additive fabrication and methods of using the same |
WO2019173966A1 (en) * | 2018-03-13 | 2019-09-19 | Hitachi Chemical Company, Ltd. | Photosensitizer, photosensitive resin composition, photosensitive element, and method of producing wiring board |
US20190309629A1 (en) * | 2018-04-05 | 2019-10-10 | United Technologies Corporation | Turbine blades and vanes for gas turbine engine |
US11638950B2 (en) | 2018-07-18 | 2023-05-02 | Arkema France | Articles prepared using curable compositions based on polymerizable ionic species |
US11167375B2 (en) | 2018-08-10 | 2021-11-09 | The Research Foundation For The State University Of New York | Additive manufacturing processes and additively manufactured products |
WO2020142131A2 (en) | 2018-10-19 | 2020-07-09 | Inkbit, LLC | High-speed metrology |
US11354466B1 (en) | 2018-11-02 | 2022-06-07 | Inkbit, LLC | Machine learning for additive manufacturing |
AU2019374148A1 (en) | 2018-11-02 | 2021-05-27 | Inkbit, LLC | Intelligent additive manufacturing |
EP3856481A2 (en) | 2018-11-16 | 2021-08-04 | Inkbit, LLC | Inkjet 3d printing of multi-component resins |
WO2020146481A1 (en) * | 2019-01-08 | 2020-07-16 | Inkbit, LLC | Reconstruction of surfaces for additive manufacturing |
WO2020146490A1 (en) | 2019-01-08 | 2020-07-16 | Inkbit, LLC | Depth reconstruction in additive fabrication |
US11608452B2 (en) | 2019-02-20 | 2023-03-21 | Adhesives Research, Inc. | UV light curable adhesive and device with UV light curable adhesive |
US11712837B2 (en) | 2019-11-01 | 2023-08-01 | Inkbit, LLC | Optical scanning for industrial metrology |
US10994477B1 (en) | 2019-11-01 | 2021-05-04 | Inkbit, LLC | Optical scanning for industrial metrology |
US10994490B1 (en) | 2020-07-31 | 2021-05-04 | Inkbit, LLC | Calibration for additive manufacturing by compensating for geometric misalignments and distortions between components of a 3D printer |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1356965A (zh) * | 1999-04-23 | 2002-07-03 | Dsm有限公司 | 液体可固化树脂组合物及固化产品 |
CN101300527A (zh) * | 2005-10-27 | 2008-11-05 | 亨斯迈先进材料(瑞士)有限公司 | 含有包括环丁二醇的聚酯和均质聚酰胺共混物的透明、多层制品的制备 |
CN101384958A (zh) * | 2006-03-30 | 2009-03-11 | Dsmip财产有限公司 | 阳离子组合物及其制备和应用方法 |
CN102317258A (zh) * | 2009-02-20 | 2012-01-11 | 三亚普罗股份有限公司 | 锍盐、光酸产生剂及光敏性树脂组合物 |
CN102725689A (zh) * | 2010-01-22 | 2012-10-10 | 帝斯曼知识产权资产管理有限公司 | 能固化成具有选择性视觉效果的层的液体可辐射固化树脂及其使用方法 |
WO2015148613A1 (en) * | 2014-03-26 | 2015-10-01 | Dsm Ip Assets B.V. | Color and/or opacity changing liquid radiation curable resins for additive fabrication |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4575330A (en) | 1984-08-08 | 1986-03-11 | Uvp, Inc. | Apparatus for production of three-dimensional objects by stereolithography |
US5047568A (en) | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
US5380923A (en) | 1993-04-29 | 1995-01-10 | Minnesota Mining And Manufacturing Company | Polymeric sulfonium salts and method of preparation thereof |
US5665792A (en) | 1995-06-07 | 1997-09-09 | E. I. Du Pont De Nemours And Company | Stabilizers for use with photoacid precursor formulations |
JP4204113B2 (ja) | 1997-12-04 | 2009-01-07 | 株式会社Adeka | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
KR100629923B1 (ko) | 1998-09-30 | 2006-09-29 | 돗빤호무즈가부시기가이샤 | 도전성페이스트와 도전성페이스트의 경화방법, 및 도전성페이스트를 이용한 비접촉형 데이터송수신체용 안테나의 형성방법과, 비접촉형 데이터송수신체 |
EP2308865B1 (en) | 2002-09-25 | 2013-08-07 | Adeka Corporation | Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape |
WO2004058699A2 (en) | 2002-12-23 | 2004-07-15 | Aprilis, Inc. | Fluoroarylsulfonium photoacid generators |
US7230122B2 (en) | 2003-11-04 | 2007-06-12 | National Starch And Chemical Investment Holding Corporation | Sulfonium salt photinitiators and use thereof |
US20060172230A1 (en) * | 2005-02-02 | 2006-08-03 | Dsm Ip Assets B.V. | Method and composition for reducing waste in photo-imaging applications |
KR101376401B1 (ko) * | 2005-10-27 | 2014-03-27 | 3디 시스템즈 인코오퍼레이티드 | 무-안티몬 광경화성 수지 조성물 및 3차원 물품 |
US7678528B2 (en) | 2005-11-16 | 2010-03-16 | Az Electronic Materials Usa Corp. | Photoactive compounds |
EP2007834B1 (en) | 2006-04-13 | 2015-11-04 | Basf Se | Sulphonium salt initiators |
CN101631832A (zh) | 2007-03-14 | 2010-01-20 | 亨斯迈先进材料(瑞士)有限公司 | 用于制备类似abs的制品的可光固化组合物 |
KR101721254B1 (ko) | 2007-04-13 | 2017-03-29 | 3디 시스템즈 인코오퍼레이티드 | 이중 광개시제, 광경화성 조성물, 그것의 용도 및 3차원 물품의 제조방법 |
JP5304977B2 (ja) | 2007-10-04 | 2013-10-02 | セイコーエプソン株式会社 | 光硬化組成物を用いた硬化物の形成方法およびその硬化物 |
WO2009069428A1 (ja) | 2007-11-28 | 2009-06-04 | Sumitomo Seika Chemicals Co., Ltd. | 光酸発生剤および光反応性組成物 |
JP5208573B2 (ja) | 2008-05-06 | 2013-06-12 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体 |
EP2349993B1 (en) | 2008-10-20 | 2012-12-12 | Basf Se | Sulfonium derivatives and the use therof as latent acids |
BR112012014900B1 (pt) * | 2009-12-17 | 2019-09-10 | Dsm Ip Assets Bv | processo para fabricação de aditivo com base em substrato |
JP6056032B2 (ja) * | 2013-11-05 | 2017-01-11 | ディーエスエム アイピー アセッツ ビー.ブイ. | 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物 |
JP6530937B2 (ja) * | 2015-03-19 | 2019-06-12 | 富士フイルム株式会社 | 偏光板保護フィルム、偏光板、液晶表示装置、及び偏光板保護フィルムの製造方法、 |
-
2016
- 2016-11-17 US US15/774,034 patent/US11332625B2/en active Active
- 2016-11-17 EP EP21150525.0A patent/EP3827955A1/en active Pending
- 2016-11-17 CN CN201680066978.5A patent/CN108472834B/zh active Active
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-
2022
- 2022-03-15 US US17/694,786 patent/US20220228010A1/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1356965A (zh) * | 1999-04-23 | 2002-07-03 | Dsm有限公司 | 液体可固化树脂组合物及固化产品 |
CN101300527A (zh) * | 2005-10-27 | 2008-11-05 | 亨斯迈先进材料(瑞士)有限公司 | 含有包括环丁二醇的聚酯和均质聚酰胺共混物的透明、多层制品的制备 |
CN101384958A (zh) * | 2006-03-30 | 2009-03-11 | Dsmip财产有限公司 | 阳离子组合物及其制备和应用方法 |
CN102317258A (zh) * | 2009-02-20 | 2012-01-11 | 三亚普罗股份有限公司 | 锍盐、光酸产生剂及光敏性树脂组合物 |
CN102725689A (zh) * | 2010-01-22 | 2012-10-10 | 帝斯曼知识产权资产管理有限公司 | 能固化成具有选择性视觉效果的层的液体可辐射固化树脂及其使用方法 |
WO2015148613A1 (en) * | 2014-03-26 | 2015-10-01 | Dsm Ip Assets B.V. | Color and/or opacity changing liquid radiation curable resins for additive fabrication |
Non-Patent Citations (1)
Title |
---|
R.盖希特: "《塑料添加剂手册》", 31 March 1992 * |
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EP3377291A1 (en) | 2018-09-26 |
US20180320006A1 (en) | 2018-11-08 |
EP3827955A1 (en) | 2021-06-02 |
US20220228010A1 (en) | 2022-07-21 |
JP2018536731A (ja) | 2018-12-13 |
US11332625B2 (en) | 2022-05-17 |
EP3377291B1 (en) | 2021-11-03 |
CN108472834B (zh) | 2021-05-25 |
EP3377291A4 (en) | 2019-10-09 |
WO2017087614A1 (en) | 2017-05-26 |
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