CN108344778A - 显影液的成分浓度测定装置及显影液管理装置 - Google Patents
显影液的成分浓度测定装置及显影液管理装置 Download PDFInfo
- Publication number
- CN108344778A CN108344778A CN201711232431.0A CN201711232431A CN108344778A CN 108344778 A CN108344778 A CN 108344778A CN 201711232431 A CN201711232431 A CN 201711232431A CN 108344778 A CN108344778 A CN 108344778A
- Authority
- CN
- China
- Prior art keywords
- developer solution
- concentration
- value
- characteristic value
- constituent concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/06—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017009830A JP2018120893A (ja) | 2017-01-23 | 2017-01-23 | 現像液の成分濃度測定装置、及び現像液管理装置 |
JP2017-009830 | 2017-01-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN108344778A true CN108344778A (zh) | 2018-07-31 |
Family
ID=62962091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711232431.0A Pending CN108344778A (zh) | 2017-01-23 | 2017-11-29 | 显影液的成分浓度测定装置及显影液管理装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2018120893A (ja) |
KR (1) | KR20180087118A (ja) |
CN (1) | CN108344778A (ja) |
TW (1) | TW201828333A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023022177A1 (ja) * | 2021-08-18 | 2023-02-23 | 旭化成株式会社 | 予測装置、現像装置、予測方法、および、予測プログラム |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002107948A (ja) * | 2000-09-27 | 2002-04-10 | Dainippon Printing Co Ltd | 現像液のアルカリ濃度推定方法及び装置 |
JP2003004706A (ja) * | 2001-06-25 | 2003-01-08 | Matsushita Environment Airconditioning Eng Co Ltd | 濃度測定装置及び濃度測定方法 |
JP2003295470A (ja) * | 2002-03-29 | 2003-10-15 | Matsushita Environment Airconditioning Eng Co Ltd | アルカリ現像液の濃度測定方法および現像液調製装置 |
JP2008283162A (ja) * | 2006-11-30 | 2008-11-20 | Mitsubishi Chemical Engineering Corp | 現像液の濃度調節方法および調製装置ならびに現像液 |
JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
CN104122905A (zh) * | 2013-04-28 | 2014-10-29 | 天津市德堡印刷有限公司 | 一种印刷用显影液浓度调控装置 |
JP2016028807A (ja) * | 2014-07-17 | 2016-03-03 | 株式会社平間理化研究所 | 固体粒子回収除去装置、液体管理装置及びエッチング液管理装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62186265A (ja) * | 1986-02-12 | 1987-08-14 | Canon Inc | 現像装置 |
JPH067910B2 (ja) * | 1987-02-10 | 1994-02-02 | 日立プラント建設株式会社 | 現像原液の希釈装置 |
JP2561578B2 (ja) * | 1991-08-07 | 1996-12-11 | 株式会社平間理化研究所 | 現像液管理装置 |
JP2000105465A (ja) * | 1998-09-29 | 2000-04-11 | Fuji Photo Film Co Ltd | 処理液感度補正装置 |
JP3686822B2 (ja) * | 2000-05-19 | 2005-08-24 | 東京エレクトロン株式会社 | 現像処理装置および現像処理方法 |
JP4281439B2 (ja) * | 2003-07-30 | 2009-06-17 | 三菱化学エンジニアリング株式会社 | 現像液の供給装置 |
JP2006268023A (ja) * | 2005-02-23 | 2006-10-05 | Fuji Photo Film Co Ltd | 感光性平版印刷版自動現像装置の現像制御方法及びその自動現像装置 |
WO2010016110A1 (ja) * | 2008-08-05 | 2010-02-11 | 富士通株式会社 | 重回帰分析による予測モデルの作成方法、作成システムおよび作成プログラム |
JP2012225709A (ja) * | 2011-04-18 | 2012-11-15 | Toshiba Corp | 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム |
JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
JP6736087B2 (ja) * | 2017-01-23 | 2020-08-05 | 株式会社平間理化研究所 | 現像液の濃度監視装置、及び現像液管理装置 |
-
2017
- 2017-01-23 JP JP2017009830A patent/JP2018120893A/ja active Pending
- 2017-11-29 CN CN201711232431.0A patent/CN108344778A/zh active Pending
- 2017-11-29 KR KR1020170161403A patent/KR20180087118A/ko not_active Application Discontinuation
- 2017-11-30 TW TW106141768A patent/TW201828333A/zh unknown
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002107948A (ja) * | 2000-09-27 | 2002-04-10 | Dainippon Printing Co Ltd | 現像液のアルカリ濃度推定方法及び装置 |
JP2003004706A (ja) * | 2001-06-25 | 2003-01-08 | Matsushita Environment Airconditioning Eng Co Ltd | 濃度測定装置及び濃度測定方法 |
JP2003295470A (ja) * | 2002-03-29 | 2003-10-15 | Matsushita Environment Airconditioning Eng Co Ltd | アルカリ現像液の濃度測定方法および現像液調製装置 |
JP2008283162A (ja) * | 2006-11-30 | 2008-11-20 | Mitsubishi Chemical Engineering Corp | 現像液の濃度調節方法および調製装置ならびに現像液 |
CN103852978A (zh) * | 2006-11-30 | 2014-06-11 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
CN104122905A (zh) * | 2013-04-28 | 2014-10-29 | 天津市德堡印刷有限公司 | 一种印刷用显影液浓度调控装置 |
JP2016028807A (ja) * | 2014-07-17 | 2016-03-03 | 株式会社平間理化研究所 | 固体粒子回収除去装置、液体管理装置及びエッチング液管理装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201828333A (zh) | 2018-08-01 |
JP2018120893A (ja) | 2018-08-02 |
KR20180087118A (ko) | 2018-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI700561B (zh) | 顯影液的成分濃度測定方法及裝置、與顯影液管理方法及裝置 | |
JP6713658B2 (ja) | 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法 | |
TWI676086B (zh) | 顯影液之管理方法及裝置 | |
CN108344778A (zh) | 显影液的成分浓度测定装置及显影液管理装置 | |
JP6712415B2 (ja) | 現像液管理装置 | |
CN108345184A (zh) | 显影装置 | |
CN108345182A (zh) | 显影液的浓度监视装置及显影液管理装置 | |
CN207502917U (zh) | 显影液的浓度管理装置以及基板的显影处理*** | |
JP6624762B2 (ja) | 現像液の管理方法及び装置 | |
CN108344662A (zh) | 显影液的二氧化碳浓度显示装置及显影液管理装置 | |
CN108345186A (zh) | 显影液管理装置 | |
KR20180087126A (ko) | 현상 장치 | |
CN108345168A (zh) | 显影装置 | |
CN108345185A (zh) | 显影液的浓度监视装置及显影液管理装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
WD01 | Invention patent application deemed withdrawn after publication | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180731 |