CN108344778A - 显影液的成分浓度测定装置及显影液管理装置 - Google Patents

显影液的成分浓度测定装置及显影液管理装置 Download PDF

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Publication number
CN108344778A
CN108344778A CN201711232431.0A CN201711232431A CN108344778A CN 108344778 A CN108344778 A CN 108344778A CN 201711232431 A CN201711232431 A CN 201711232431A CN 108344778 A CN108344778 A CN 108344778A
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CN
China
Prior art keywords
developer solution
concentration
value
characteristic value
constituent concentration
Prior art date
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Pending
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CN201711232431.0A
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English (en)
Chinese (zh)
Inventor
中川俊元
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hirama Rika Kenkyusho Ltd
Hirama Laboratories Co Ltd
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Hirama Rika Kenkyusho Ltd
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Application filed by Hirama Rika Kenkyusho Ltd filed Critical Hirama Rika Kenkyusho Ltd
Publication of CN108344778A publication Critical patent/CN108344778A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/06—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN201711232431.0A 2017-01-23 2017-11-29 显影液的成分浓度测定装置及显影液管理装置 Pending CN108344778A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017009830A JP2018120893A (ja) 2017-01-23 2017-01-23 現像液の成分濃度測定装置、及び現像液管理装置
JP2017-009830 2017-01-23

Publications (1)

Publication Number Publication Date
CN108344778A true CN108344778A (zh) 2018-07-31

Family

ID=62962091

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201711232431.0A Pending CN108344778A (zh) 2017-01-23 2017-11-29 显影液的成分浓度测定装置及显影液管理装置

Country Status (4)

Country Link
JP (1) JP2018120893A (ja)
KR (1) KR20180087118A (ja)
CN (1) CN108344778A (ja)
TW (1) TW201828333A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023022177A1 (ja) * 2021-08-18 2023-02-23 旭化成株式会社 予測装置、現像装置、予測方法、および、予測プログラム

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002107948A (ja) * 2000-09-27 2002-04-10 Dainippon Printing Co Ltd 現像液のアルカリ濃度推定方法及び装置
JP2003004706A (ja) * 2001-06-25 2003-01-08 Matsushita Environment Airconditioning Eng Co Ltd 濃度測定装置及び濃度測定方法
JP2003295470A (ja) * 2002-03-29 2003-10-15 Matsushita Environment Airconditioning Eng Co Ltd アルカリ現像液の濃度測定方法および現像液調製装置
JP2008283162A (ja) * 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp 現像液の濃度調節方法および調製装置ならびに現像液
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
CN104122905A (zh) * 2013-04-28 2014-10-29 天津市德堡印刷有限公司 一种印刷用显影液浓度调控装置
JP2016028807A (ja) * 2014-07-17 2016-03-03 株式会社平間理化研究所 固体粒子回収除去装置、液体管理装置及びエッチング液管理装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62186265A (ja) * 1986-02-12 1987-08-14 Canon Inc 現像装置
JPH067910B2 (ja) * 1987-02-10 1994-02-02 日立プラント建設株式会社 現像原液の希釈装置
JP2561578B2 (ja) * 1991-08-07 1996-12-11 株式会社平間理化研究所 現像液管理装置
JP2000105465A (ja) * 1998-09-29 2000-04-11 Fuji Photo Film Co Ltd 処理液感度補正装置
JP3686822B2 (ja) * 2000-05-19 2005-08-24 東京エレクトロン株式会社 現像処理装置および現像処理方法
JP4281439B2 (ja) * 2003-07-30 2009-06-17 三菱化学エンジニアリング株式会社 現像液の供給装置
JP2006268023A (ja) * 2005-02-23 2006-10-05 Fuji Photo Film Co Ltd 感光性平版印刷版自動現像装置の現像制御方法及びその自動現像装置
WO2010016110A1 (ja) * 2008-08-05 2010-02-11 富士通株式会社 重回帰分析による予測モデルの作成方法、作成システムおよび作成プログラム
JP2012225709A (ja) * 2011-04-18 2012-11-15 Toshiba Corp 二酸化炭素濃度測定装置、二酸化炭素濃度測定方法、及び二酸化炭素回収システム
JP6721157B2 (ja) * 2015-07-22 2020-07-08 株式会社平間理化研究所 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6736087B2 (ja) * 2017-01-23 2020-08-05 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002107948A (ja) * 2000-09-27 2002-04-10 Dainippon Printing Co Ltd 現像液のアルカリ濃度推定方法及び装置
JP2003004706A (ja) * 2001-06-25 2003-01-08 Matsushita Environment Airconditioning Eng Co Ltd 濃度測定装置及び濃度測定方法
JP2003295470A (ja) * 2002-03-29 2003-10-15 Matsushita Environment Airconditioning Eng Co Ltd アルカリ現像液の濃度測定方法および現像液調製装置
JP2008283162A (ja) * 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp 現像液の濃度調節方法および調製装置ならびに現像液
CN103852978A (zh) * 2006-11-30 2014-06-11 三菱化学工程株式会社 显影液的浓度调节方法、调制装置和显影液
JP2011128455A (ja) * 2009-12-18 2011-06-30 Nagase & Co Ltd 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法
CN104122905A (zh) * 2013-04-28 2014-10-29 天津市德堡印刷有限公司 一种印刷用显影液浓度调控装置
JP2016028807A (ja) * 2014-07-17 2016-03-03 株式会社平間理化研究所 固体粒子回収除去装置、液体管理装置及びエッチング液管理装置

Also Published As

Publication number Publication date
TW201828333A (zh) 2018-08-01
JP2018120893A (ja) 2018-08-02
KR20180087118A (ko) 2018-08-01

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Application publication date: 20180731