CN107828715A - A kind of plant root edge cell processing method for being used to deposit nano silicon - Google Patents
A kind of plant root edge cell processing method for being used to deposit nano silicon Download PDFInfo
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- CN107828715A CN107828715A CN201711128644.9A CN201711128644A CN107828715A CN 107828715 A CN107828715 A CN 107828715A CN 201711128644 A CN201711128644 A CN 201711128644A CN 107828715 A CN107828715 A CN 107828715A
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- root edge
- processing method
- plant root
- nano silicon
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- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12N—MICROORGANISMS OR ENZYMES; COMPOSITIONS THEREOF; PROPAGATING, PRESERVING, OR MAINTAINING MICROORGANISMS; MUTATION OR GENETIC ENGINEERING; CULTURE MEDIA
- C12N5/00—Undifferentiated human, animal or plant cells, e.g. cell lines; Tissues; Cultivation or maintenance thereof; Culture media therefor
- C12N5/04—Plant cells or tissues
Abstract
The invention discloses a kind of plant root edge cell processing method for being used to deposit nano silicon, it is comprised the technical steps that：1) plant seedlings root border cell is collected in CaCl2Cell collection liquid is obtained in solution；2) cell collection liquid is moved in PE pipes, supernatant is abandoned after centrifugal treating, add the diallyl dimethyl ammoniumchloride solution that concentration is 0.002g/L, fully absorption；3) toward poly- (4 SSS) solution is added in step 2) resulting solution, fully absorption；4) repeat the above steps as needed 2) and step 3) makes cell surface form PDADMAC/PSS)XPDADMAC self-assembled multilayer films；5) nano-silicon dioxide particle adsorption treatment is carried out, obtains finished product.The present invention is by the way that electrostatic self-assembled technology is combined with simulation biomineralization process, effectively self-assembled multilayer film can be formed on plant root edge cell surface and deposit nano silicon dioxide layer, so as to provide technical foundation to improve plant root edge cell aluminum-resistant poison ability.
Description
Technical field
The present invention relates to plant cell process field, more particularly to a kind of plant root edge cell processing method.
Background technology
By the difference at removing toxic substances position, the physiological mechanism of plant aluminum-resistant poison is divided into outside repel and two major classes of internal tolerance.
The former detoxifies position in apoplast, and the latter is symplast.Repel mechanism including fixation of the cell membrane to aluminium, plasma membrane to aluminium in outside
Selection permeability, induction caused by barrier, sequestration ligand and it is phosphatic secretion, " gone out by active transport extracellular etc..It is and internal
Mechanism is resistant to mainly including organic acid, protein and other organic ligands in kytoplasm to the chelant of aluminium, the compartmentation of vacuole, aluminum-resistant
The induction of enzyme and the raising of enzymatic activity etc..In the past, the measure of aluminium poison, which is mitigated or eliminated, mainly includes liming, using calcium and magnesium phosphorus
Fertilizer and administration organic matter etc. improve soil to reduce the activity of aluminium in the soil liquid, and good environment is provided for plant growth, but
It is the aluminium poison that these measures can only solve the problems, such as table soil, the soil to heart bottom is difficult to play a role.Aluminium poison is widely regarded as
In acid soil (pH ＜ 5) an important factor for limiting plant growth.Result of study shows that root border cell is in protection plant root tip
It is important from having served during aluminium toxicity.
Cell induction SiO2The biomineralization process of nanostructure is self-assembly of, for many years always thing scholar and material
Expect chemist's problem very interested, it is for template with a small amount of organic macromolecule (protein, glycoprotein or polysaccharide), is carried out
Molecule manipulation, so as to be combined into the process of inorganic material with controlling the nucleation of mineral facies and growth and high-sequential.Current nanometer
Technology is being carried out in application agriculturally, and one of them is exactly to utilize to simulate biosynthesis strategy, develops new chemical preparation,
To understand and improve the anti-adversity ability of plant, and layer-by-layer (layer-by-layer self-as-sembly
Technique, LbL) it has been widely used in the association areas such as the surface modification of biology, but using just in biological husbantry
Starting, thus by electrostatic self-assembled technology apply with simulation biomineralization process will be very significant.
Many researchs show that silicon is used as plant beneficial element, can alleviate plant aluminum poison, and are deposited on cell membrane, carefully
Silica in intercellular space and cellular vessel, due to can induce SiO with the presence of various hydrophilic mediums2It is self-assembly of SiO2Receive
Rice structure, the effect of this deposition raising cell membrane resistance external force, but the SiO of nanostructured2How to be effectively deposited on
Root border cell, the more preferable aluminum-resistant poison ability of plant root edge cell is assigned, still needs to be probed into.
The content of the invention
It is an object of the invention to for above-mentioned the deficiencies in the prior art, there is provided a kind of to be used to deposit nano silicon
Plant root edge cell processing method.
The technical solution used in the present invention is：A kind of plant root edge cell processing method for effectively alleviating aluminium poison, its
Comprise the technical steps that：
1) plant seedlings root border cell is collected in CaCl2Cell collection liquid is obtained in solution；
2) cell collection liquid is moved in PE pipes, supernatant is abandoned after centrifugal treating, it is the poly- of 0.002g/L to add concentration
Diallyldimethylammonium chloride solution, fully absorption, centrifugal treating remove excessive diallyl dimethyl ammoniumchloride,
CaCl2Solution cleans 1~2 time；
3) toward poly- (4- SSSs) solution is added in step 2) resulting solution, fully absorption, centrifugal treating removes
Excessive poly- (4- SSSs), CaCl2Solution cleans 1~2 time；
4) repeat the above steps as needed 2) and step 3) makes cell surface form PDADMAC/PSS)X- PDADMAC is certainly
Multilayer film is assembled, X is the assembling number of plies；
5) nano-silicon dioxide particle adsorption treatment is carried out.
As the further improvement of such scheme, the diallyl dimethyl ammoniumchloride solution described in step 2) be by
Diallyl dimethyl ammoniumchloride is dissolved in the CaCl that concentration is 0.5mmol/L2The solution formed in the aqueous solution, its pH are
7.0。
As the further improvement of such scheme, the pH of poly- (4- SSSs) solution described in step 3) is
7.0。
As the further improvement of such scheme, the centrifugation time of centrifugal treating described in step 2) and step 3) is 0.5
~1.5min.
As the further improvement of such scheme, time for fully being adsorbed described in step 2) and step 3) for 8~
12min。
As the further improvement of such scheme, the cell collection liquid described in step 1) is to take the tip of a root of 1cm plant seedlings
It is placed in the CaCl that concentration is 2mmol/L2Stirred in solution with glass bar obtained by 1~2min.
As the further improvement of such scheme, adsorption treatment described in step 5) is that will contain 1wt% nanometer titanium dioxides
The concentration of silicon particle is 0.5mM CaCl2The aqueous solution is added in step 4) resulting solution to abundant absorption.
The beneficial effects of the invention are as follows：The present invention is by the way that electrostatic self-assembled technology and simulation biomineralization process are mutually tied
Close, effectively can form self-assembled multilayer film on plant root edge cell surface and deposit nano silicon dioxide layer, so as to be to carry
High plant root edge cell aluminum-resistant poison ability provides technical foundation.
Brief description of the drawings
Fig. 1 is influence of the present invention to cytoactive；
Fig. 2 is the effect that rear cell processed by the invention alleviates aluminium poison under aluminium.
Embodiment
The present invention is specifically described with reference to embodiment, in order to art personnel to the present invention
Understand.It is necessary that herein the present invention will be further described it is emphasized that embodiment is only intended to, it is impossible to be interpreted as to this
The limitation of invention protection domain, art person skilled in the art, the non-intrinsically safe made according to foregoing invention content to the present invention
The modifications and adaptations of property, should still fall within protection scope of the present invention.Simultaneously following mentioned raw materials are unspecified, are
Commercially available prod；The processing step or preparation method not referred in detail be processing step known to a person skilled in the art or
Preparation method.
A kind of plant root edge cell processing method for effectively alleviating aluminium poison, it is comprised the technical steps that：
1) plant seedlings root border cell is collected in CaCl2Cell collection liquid is obtained in solution；
2) cell collection liquid is moved in PE pipes, supernatant is abandoned after centrifugal treating, it is the poly- of 0.002g/L to add concentration
Diallyldimethylammonium chloride solution, fully absorption, centrifugal treating remove excessive diallyl dimethyl ammoniumchloride,
CaCl2Solution cleans 1~2 time；
3) toward poly- (4- SSSs) solution is added in step 2) resulting solution, fully absorption, centrifugal treating removes
Excessive poly- (4- SSSs), CaCl2Solution cleans 1~2 time；
4) repeat the above steps as needed 2) and step 3) makes cell surface form PDADMAC/PSS)X- PDADMAC is certainly
Multilayer film is assembled, X is the assembling number of plies；
5) nano-silicon dioxide particle adsorption treatment is carried out.
Specifically, cell surface forms PDADMAC/PSS)X- PDADMAC self-assembled multilayer films (X is the assembling number of plies), greatly
Accelerate the sedimentation rate of nano silicon greatly and improve the stability of nanometer titanium dioxide silicon deposition layer, so as to assign plant
The excellent aluminum-resistant poison ability of root border cell.
Be further used as preferred embodiment, the diallyl dimethyl ammoniumchloride solution described in step 2) be by
Diallyl dimethyl ammoniumchloride is dissolved in the CaCl that concentration is 0.5mmol/L2The solution formed in the aqueous solution, its pH are
7.0.Specifically, diallyl dimethyl ammoniumchloride solution handles the substrate layer and superficial layer as self-assembled multilayer film.
Preferred embodiment is further used as, the pH of poly- (4- SSSs) solution described in step 3) is
7.0.Specifically, poly- (4- SSSs) solution handles the intermediate layer as self-assembled multilayer film.
Preferred embodiment is further used as, the centrifugation time of centrifugal treating described in step 2) and step 3) is 0.5
~1.5min.
Be further used as preferred embodiment, the time fully adsorbed described in step 2) and step 3) for 8~
12min。
Preferred embodiment is further used as, the cell collection liquid described in step 1) is to take the tip of a root of 1cm plant seedlings
It is placed in the CaCl that concentration is 2mmol/L2Stirred in solution with glass bar obtained by 1~2min.
Embodiment
A kind of plant root edge cell processing method for effectively alleviating aluminium poison, it is comprised the technical steps that：
1) tip of a root of 1cm plant seedlings is taken to be placed in the CaCl that concentration is 2mmol/L2In solution with glass bar stirring 1~
2min, obtain cell collection liquid；
2) cell collection liquid is moved in PE pipes, through centrifugal treating, centrifugation time 1min, abandons supernatant, add concentration
For 0.002g/L diallyl dimethyl ammoniumchloride solution, (diallyl dimethyl ammoniumchloride is dissolved in into concentration is
0.5mmol/L CaCl2The solution formed in the aqueous solution, its pH remove 7.0), fully to adsorb 10min, centrifugal treating 1min
Excessive diallyl dimethyl ammoniumchloride, CaCl2Solution cleans 2 times；
3) toward poly- (4- SSSs) solution (pH 7.0) is added in step 2) resulting solution, fully absorption
10min, centrifugal treating 1min, remove excessive poly- (4- SSSs), CaCl2Solution cleans 2 times；
4) repeat the above steps as needed 2) and step 3) makes cell surface form PDADMAC/PSS)2- PDADMAC is certainly
Assemble five tunics；
5) nano-silicon dioxide particle adsorption treatment is carried out.
Above-described embodiment processing gained cell collection liquid is subjected to cytoactive and alleviates the dependence test of aluminium poison ability, its
As shown in Figures 1 and 2, wherein CK is that nothing does any processing to test result；PE-coated represents to form self-assembled multilayer film
Cladding handles but without the cell of absorption silicon, and Si-coated, which represents to be formed after self-assembled multilayer film cladding is handled, carries out nano-silica
The cell of SiClx adsorption treatment, it can be obtained by the data of accompanying drawing 1 and accompanying drawing 2, it was demonstrated that processing method of the invention is not influenceing cell
The harmful effect of aluminium poison is effectively alleviated on the premise of activity.
Above-described embodiment is the preferred embodiments of the present invention, all with similar technique of the invention and the equivalence changes made,
The protection category of the present invention all should be belonged to.
Claims (7)
1. a kind of plant root edge cell processing method for being used to deposit nano silicon, it is characterised in that including following work
Skill step：
1) plant seedlings root border cell is collected in CaCl2Cell collection liquid is obtained in solution；
2) cell collection liquid is moved in PE pipes, supernatant is abandoned after centrifugal treating, add the polydiene that concentration is 0.002g/L
Diallyidimethylammonium chloride solution, fully absorption, centrifugal treating remove excessive diallyl dimethyl ammoniumchloride, CaCl2
Solution cleans 1~2 time；
3) toward poly- (4- SSSs) solution is added in step 2) resulting solution, fully absorption, centrifugal treating removes excessive
Poly- (4- SSSs), CaCl2Solution cleans 1~2 time；
4) repeat the above steps as needed 2) and step 3) makes cell surface form PDADMAC/PSS)X- PDADMAC self assemblies
Multilayer film, X are the assembling number of plies；
5) nano-silicon dioxide particle adsorption treatment is carried out.
2. a kind of plant root edge cell processing method for being used to deposit nano silicon according to claim 1, its
It is characterised by：Diallyl dimethyl ammoniumchloride solution described in step 2) is that diallyl dimethyl ammoniumchloride is molten
Solution is in the CaCl that concentration is 0.5mmol/L2The solution formed in the aqueous solution, its pH are 7.0.
3. a kind of plant root edge cell processing method for being used to deposit nano silicon according to claim 1, its
It is characterised by：The pH of poly- (4- SSSs) solution described in step 3) is 7.0.
4. a kind of plant root edge cell processing method for being used to deposit nano silicon according to claim 1, its
It is characterised by：The centrifugation time of centrifugal treating is 0.5~1.5min described in step 2) and step 3).
5. a kind of plant root edge cell processing method for being used to deposit nano silicon according to claim 1, its
It is characterised by：The time fully adsorbed described in step 2) and step 3) is 8~12min.
6. a kind of plant root edge cell processing method for being used to deposit nano silicon according to claim 1, its
It is characterised by：Cell collection liquid described in step 1) is that the tip of a root for taking 1cm plant seedlings is placed in the CaCl that concentration is 2mmol/L2
Stirred in solution with glass bar obtained by 1~2min.
7. a kind of plant root edge cell processing method for being used to deposit nano silicon according to claim 1, its
It is characterised by：It by the concentration containing 1wt% nano-silicon dioxide particles is 0.5mM's that adsorption treatment described in step 5), which is,
CaCl2The aqueous solution is added in step 4) resulting solution to abundant absorption.
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|---|---|---|---|
| CN201711128644.9A CN107828715A (en) | 2017-11-15 | 2017-11-15 | A kind of plant root edge cell processing method for being used to deposit nano silicon |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109729963A (en) * | 2019-02-01 | 2019-05-10 | 佛山科学技术学院 | A kind of nanometer siliceous deposits barrier heavy metal method based on rice material |
Citations (4)
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| WO1999047253A1 (en) * | 1998-03-19 | 1999-09-23 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Fabrication of multilayer-coated particles and hollow shells via electrostatic self-assembly of nanocomposite multilayers on decomposable colloidal templates |
| CN103127886A (en) * | 2013-03-05 | 2013-06-05 | 南京大学 | Hollow magnetic meso pore SiO2 nano-material and preparation method |
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| WO1999047253A1 (en) * | 1998-03-19 | 1999-09-23 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Fabrication of multilayer-coated particles and hollow shells via electrostatic self-assembly of nanocomposite multilayers on decomposable colloidal templates |
| CN103127886A (en) * | 2013-03-05 | 2013-06-05 | 南京大学 | Hollow magnetic meso pore SiO2 nano-material and preparation method |
| CN103497340A (en) * | 2013-09-25 | 2014-01-08 | 上海新安纳电子科技有限公司 | Preparation method of water-soluble polystyrene-silicon dioxide core-shell type composite particle |
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| JUNO LEE等: "Cytoprotective silica coating of individual mammalian cells through bioinspired silicification", 《ANGEW. CHEM. INT. ED.》 * |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109729963A (en) * | 2019-02-01 | 2019-05-10 | 佛山科学技术学院 | A kind of nanometer siliceous deposits barrier heavy metal method based on rice material |
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