CN107230775B - Substrate processing apparatus and substrate processing method - Google Patents
Substrate processing apparatus and substrate processing method Download PDFInfo
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- CN107230775B CN107230775B CN201710181468.9A CN201710181468A CN107230775B CN 107230775 B CN107230775 B CN 107230775B CN 201710181468 A CN201710181468 A CN 201710181468A CN 107230775 B CN107230775 B CN 107230775B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/139—Processes of manufacture
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/058—Construction or manufacture
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0402—Methods of deposition of the material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/04—Processes of manufacture in general
- H01M4/0471—Processes of manufacture in general involving thermal treatment, e.g. firing, sintering, backing particulate active material, thermal decomposition, pyrolysis
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Drying Of Solid Materials (AREA)
- Advancing Webs (AREA)
- Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Battery Electrode And Active Subsutance (AREA)
Abstract
The invention relates to a substrate processing apparatus and a substrate processing method, which can suppress wrinkles generated in a dried substrate and process the substrate in a good state. The conveying unit has a conveying member provided downstream of the drying unit along a conveying path and conveying the substrate through the gas layer. Therefore, the contact area between the substrate heated by the drying section and the conveyance member at normal temperature is reduced. As a result, wrinkles generated in the base material can be suppressed.
Description
Technical Field
The present invention relates to a technique for processing a substrate having a main surface supplied with a processing liquid.
Background
For example, in the production of a lithium secondary battery, there is known a technique of supplying a coating liquid such as an electrode liquid to one main surface of a substrate such as an aluminum foil, and then drying the coating liquid on the substrate while conveying the substrate.
Patent document 1: japanese laid-open patent publication No. 2012-202600
Generally, the temperature of the substrate after passing through the drying section is higher than normal temperature. Therefore, when a normal-temperature roller located downstream of the conveyance path of the drying section comes into contact with a substrate having a temperature higher than that of the roller, the substrate may shrink due to the temperature difference, and wrinkles may occur in the substrate.
Disclosure of Invention
The present invention has been made in view of the above problems, and an object thereof is to provide a technique capable of treating a substrate in a good state while suppressing wrinkles generated in the substrate after drying.
In order to solve the above problem, a substrate processing apparatus according to a first aspect includes: a conveying unit that conveys a substrate having a main surface to which a coating liquid is supplied along a conveying path, and a drying unit that dries the coating liquid supplied to the main surface by applying a process including a heating process to the substrate conveyed by the conveying unit; the conveying part comprises: and a second conveying member provided on the downstream side of the drying section along the conveying path and conveying the substrate through a gas layer.
A substrate processing apparatus according to a second aspect is the substrate processing apparatus according to the first aspect, wherein the conveyance unit further includes a third conveyance member provided on a downstream side of the drying unit along the conveyance path, and a contact area between the third conveyance member and the substrate is larger than a contact area between the second conveyance member and the substrate; the third conveying member is located on the downstream side of the second conveying member along the conveying path.
A substrate processing apparatus according to a third aspect is the substrate processing apparatus according to the first aspect, wherein the second conveyance member includes a roller rotatable about an axis parallel to the main surface and extending in a crossing direction crossing a conveyance direction of the substrate; the apparatus further includes a driving unit configured to rotate the roller so that a peripheral speed of the roller is greater than a conveyance speed of the substrate conveyed by the conveying unit.
A substrate processing apparatus according to a fourth aspect is the substrate processing apparatus according to the first aspect, wherein the conveyance unit includes a plurality of rollers that are rotatable about axes extending in the intersecting direction on a downstream side of the drying unit to convey the substrate, and that are arranged in a section of the conveyance path; the angular difference in the extending direction of the conveyance path before and after the one section is a total value obtained by adding the angles of the plurality of rollers with respect to the base material.
A substrate processing apparatus according to a fifth aspect is the substrate processing apparatus according to the first aspect, wherein the second conveyance member includes an air supply roller that is rotatable about an axis parallel to the main surface and extending in a cross direction intersecting with a conveyance direction of the substrate, the air supply roller having an outer peripheral portion provided with an air supply port and an air supply path connected to the air supply port; and a gas supply unit for supplying gas to the gas supply path.
A substrate processing apparatus according to a sixth aspect is the substrate processing apparatus according to the fifth aspect, wherein the temperature of the gas is lower than a temperature of a portion of the substrate conveyed by the gas supply roller.
A substrate processing apparatus according to a seventh aspect is the substrate processing apparatus according to any one of the first to sixth aspects, wherein the drying unit performs a cooling process of cooling the substrate heated by the heating process, after performing the heating process on the substrate conveyed by the conveying unit, to dry the coating liquid supplied to the main surface.
A substrate processing apparatus according to an eighth aspect includes: a conveying unit that conveys a substrate having a main surface to which a coating liquid is supplied along a conveying path, and a drying unit that dries the coating liquid supplied to the main surface by applying a process including a heating process to the substrate conveyed by the conveying unit; the conveying section includes a roller provided on a downstream side of the drying section along the conveying path, rotatable about an axis parallel to the main surface and extending in a cross direction crossing the conveying direction of the substrate; the apparatus further includes a driving unit configured to rotate the roller so that a peripheral speed of the roller is greater than a conveyance speed of the substrate conveyed by the conveying unit.
A substrate processing method according to a ninth aspect includes: a drying step of drying the coating liquid supplied to the main surface by performing a treatment including a heating treatment on the base material having the main surface supplied with the coating liquid; and a conveying step of conveying the substrate subjected to the drying step with a conveying member through a gas layer.
In any of the substrate processing apparatus according to the first to eighth aspects and the substrate processing method according to the ninth aspect, the contact area between the member for conveying the dried substrate and the substrate can be reduced, and the occurrence of wrinkles can be suppressed.
Drawings
Fig. 1 is a diagram showing the overall configuration of a base material processing apparatus 1.
Fig. 2 is a diagram showing a schematic internal configuration of the heating unit 42.
Fig. 3 is a diagram showing peripheral portions of the second roller 82 and the third roller 83.
Fig. 4 is a diagram showing a state in which the second roller 82 conveys the base material 5.
Fig. 5 is a diagram showing a state in which the roller 821 of the comparative example conveys the base material 5.
Fig. 6 is a diagram showing a roller 822 according to a modification.
Fig. 7 is a diagram showing a state in which the rollers 822 of the modified example convey the substrate 5.
Wherein the reference numerals are as follows:
1: substrate processing apparatus
5: base material
11: coating nozzle
40: drying section
41: preheating section
42: heating part
43: cooling part
80: conveying part
81: first roller
82: second roll
83: third roller
90: control unit
100. 101: gas layer
820: driving part
821. 822; roller
S1: major face
V: speed of conveyance
V2: peripheral speed
Detailed Description
Hereinafter, embodiments will be described with reference to the drawings. In the drawings, the same reference numerals are given to portions having the same structure and function, and redundant description is omitted. The following embodiments are merely examples embodying the present invention, and the technical scope of the present invention is not limited thereto. In the drawings, the size and number of each portion may be enlarged or simplified. In the drawings, XYZ orthogonal coordinate axes are sometimes indicated for explaining the directions. The + Z direction of the coordinate axis is the vertical upper direction, and the XY plane is the horizontal plane.
First embodiment
< 1.1 Structure of the substrate treating apparatus 1 >
Fig. 1 is a diagram showing the overall configuration of a substrate processing apparatus 1 according to the present embodiment.
The substrate processing apparatus 1 supplies a coating liquid to one main surface of a substrate 5, which is a metal foil, and then performs a drying process of the coating liquid, thereby forming a coating film on the substrate 5. Thus, for example, an electrode for a lithium ion secondary battery is produced.
The base material 5 is composed of, for example, a material used as a current collector of a lithium ion secondary battery. When the substrate processing apparatus 1 manufactures a positive electrode of a lithium ion secondary battery, aluminum foil (Al) may be used as the substrate 5. In the case where the substrate processing apparatus 1 manufactures a negative electrode of a lithium ion secondary battery, a copper foil (Cu) may be used as the substrate 5.
The base material 5 is a long sheet-like (long strip-like) metal foil, and the width and thickness thereof are not particularly limited. For example, a substrate having a width of about 600 to 700mm and a thickness of about 10 to 20 μm can be used. In this specification, a principal surface on which the coating liquid is supplied, of the two principal surfaces of the substrate 5, may be particularly referred to as a principal surface S1.
The base material processing apparatus 1 mainly includes: a conveying unit 80 for conveying the base material 5 along the conveying path; an application section including an application nozzle 11; a drying unit 40 for drying the coating liquid on the conveyed substrate 5; and a control unit 90 for controlling the respective units of the apparatus.
The conveying unit 80 includes: a winding-out roller 88 for winding out the base material 5; and a winding roller 89 that winds the base material 5; the base material 5 is conveyed from the unwinding roller 88 toward the winding roller 89. The conveying unit 80 includes three first rollers 81, second rollers 82, third rollers 83, and support rollers 87 between the unwinding roller 88 and the winding roller 89.
In the present specification, the conveyance path refers to a passage path of the substrate 5 conveyed by the conveying unit 80. The unwinding roller 88 side in the conveyance path may be referred to as the conveyance upstream side, and the winding roller 89 side in the conveyance path may be referred to as the conveyance downstream side. The conveyance direction is a direction in which the substrate 5 moves in a certain section of the conveyance path. For example, in a section between the wind-out roller 88 and the first roller 81 located on the upstream side of conveyance, the conveyance direction is the arrow direction shown in fig. 1.
Each roller of the conveying unit 80 is configured to be rotatable about an axis parallel to the main surface S1 of the substrate 5 and extending in the intersecting direction intersecting the conveying direction of the substrate 5. In the present embodiment, the intersecting direction coincides with the Y direction, but the intersecting direction may be slightly inclined with respect to the Y direction.
At least a part of the rollers (for example, the second roller, the unwinding roller 88, and the winding roller 89) included in the conveying unit 80 is provided with a driving unit for driving these rollers. On the other hand, the other rollers (for example, the first roller 81 and the third roller 83) of the conveying unit 80 are not provided with a driving unit. Therefore, the rollers of the part are actively rotated by the driving force of the driving unit, and the substrate 5 is conveyed along the conveying path. The other rollers also rotate by friction with the base material 5. By rotating the rollers of the conveying unit 80, the substrate 5 is conveyed along the conveying path in the X direction and the Z direction.
In the present description, the conveying members (rollers in the present embodiment) of the conveying unit 80 may be conceptually distinguished.
The member for conveying the base 5, which is provided on the upstream side of the drying unit 40 along the conveying path, may be referred to as a first conveying member. In the present embodiment, the first roller 81, the support roller 87, and the unwinding roller 88 are included in the first conveying means.
The member that is provided downstream of the drying unit 40 along the conveyance path and conveys the substrate 5 through the gas layer may be referred to as a second conveyance member. In the present embodiment, the second roller 82 is included in the second conveying member.
The member that is provided downstream of the drying unit 40 along the conveyance path and has a larger contact area with the substrate 5 than the second conveyance member may be referred to as a third conveyance member. In the present embodiment, the third roller 83 and the winding roller 89 are included in the third conveyance member.
The coating nozzle 11 is a slit nozzle having a slit opening along the width direction of the base material 5 (Y-axis direction in fig. 1). The coating nozzle 11 discharges the coating liquid delivered by the pump unit 15 from the slit opening and supplies the coating liquid to the main surface of the substrate 5.
A support roller 87 is provided on the opposite side of the coating nozzle 11 across the conveyance path. In this way, the coating liquid can be supplied to the portion of the substrate 5 supported by the support roller 87, and thus fluctuation of the substrate 5 due to the liquid pressure at the time of supplying the coating liquid can be prevented. The substrate 5 is conveyed along the conveying path in parallel with the operation of supplying the coating liquid to the main surface by the coating nozzle 11. Thereby, a liquid film (coating film) of the coating liquid is applied to the main surface S1.
As the coating liquid, a liquid (electrode paste) containing an active material as an electrode material can be used. In the case where the substrate processing apparatus 1 is used to manufacture a positive electrode, for example, lithium cobaltate (LiCoO) as a positive electrode active material can be used as the coating liquid2) A mixture of carbon (C) as a conductive additive, polyvinylidene fluoride (PVDF) as a binder, and N-methyl-2-pyrrolidone (NMP) as an organic solvent. The specific type of the coating liquid is not limited to this. For example, lithium nickelate (LiNiO) may be used2) Lithium manganate (LiMn)2O4) Lithium iron phosphate (LiFePO)4) As the positive electrode active material, lithium cobaltate was replaced.
On the other hand, when the negative electrode is manufactured by the substrate processing apparatus 1, a mixed solution of graphite (graphite) as a negative electrode active material, PVDF as a binder, and NMP as an organic solvent may be used as the coating liquid. The specific type of the coating liquid is not limited to this. For example, hard carbon and lithium titanate (Li) may be used4Ti5O12) Silicon alloy, tin alloy, etc. as the negative electrode active material instead of graphite. When styrene-butadiene rubber (SBR) is used as the binder instead of PVDF in the coating liquid for both the positive electrode material and the negative electrode material, water may be used as the solvent instead of NMP.
The drying section 40 is connected in series to a preheating section 41, a heating section 42, and a cooling section 43 along the conveyance path. The substrate 5 passes through the interior of the preheating section 41, the heating section 42, and the cooling section 43 in this order while being conveyed along the conveying path. The drying unit 40 is a portion that applies a process including a heating process to the substrate 5 conveyed by the conveying unit 80 and dries the coating liquid supplied to the main surface S1.
The preheating section 41, the heating section 42, and the cooling section 43 are common in that air is supplied and exhausted from the chamber to dry the coating liquid. Hereinafter, the heating unit 42 will be described in detail. Hereinafter, the preheating section 41 and the cooling section 43 will be described with the common portions with the heating section 42 omitted.
Fig. 2 is an XZ side view showing a schematic internal structure of the heating unit 42. In fig. 2, the gas flow within the chamber 410 is schematically represented by arrows.
The heating unit 42 is mainly provided with a gas supply unit 45, a gas supply unit 55, an intake unit 46, and an intake unit 56 inside the chamber 410.
The chamber 410 is a frame body having a transfer port 411 formed on the upstream side of the conveyance and a transfer port 412 formed on the downstream side of the conveyance, and is shown by a chain line in fig. 2. The transfer path is a path passing through the chamber 410 via the transfer port 411 and the transfer port 412. The length of the chamber 410 is not particularly limited, and is 3000mm in the present embodiment. Although the sizes of the carry-in port 411 and the carry-out port 412 are not particularly limited, in the present embodiment, a space of about 5mm can be secured above and below the carrying path (that is, the size in the vertical direction is about 10 mm).
A plurality of (five in the present embodiment) gas supply units 45 and a plurality of (six in the present embodiment) gas suction units 46 are alternately arranged along the conveyance path on the upper side of the conveyance path inside the chamber 410. A rectifying plate 47 is provided below each of the five gas supply portions 45. The flow regulating plate 47 is a plate-shaped member provided parallel to the conveyance path. The rectifying plate 47 is provided with a slit-shaped air supply port extending in the width direction (Y direction) of the substrate 5, and the air supply port is opened toward the main surface S1 of the substrate 5 being conveyed.
The gas supply unit 45 is connected to the air guide duct 35, and ejects the hot air supplied through the air guide duct 35 from the air supply port of the rectifying plate 47 toward the substrate 5 in the conveyance path. The proximal end of the air guide duct 35 is connected to the gas supply source 34, and the distal end of the air guide duct 35 is branched into five branches and connected to the gas supply unit 45. Flow rate regulating valves 36 are inserted into the five branched air guide pipes 35, respectively. The gas supply source 34 includes a heater and a blower, and supplies heated air as hot air to the gas supply unit 45. The flow rate of the hot air to be supplied to each gas supply unit 45 is individually adjusted by the corresponding flow rate adjustment valve 36. The hot air supplied to the gas supply portion 45 through the air guide duct 35 is ejected from the air supply port of the rectifying plate 47 toward the liquid film P (coating film) of the coating liquid on the main surface S1.
Six gas suction units 46 are provided for the five gas supply units 45, and the gas supply units 45 are provided between the gas suction units 46 arranged adjacent to each other in the X direction. An intake port extending in the width direction of the substrate 5 is provided on the lower surface of each intake portion 46. Each intake port 46 is connected to an exhaust portion 58 through an exhaust pipe 57. That is, the base end side of the exhaust pipe 57 is connected to the exhaust unit 58, and the tip end side of the exhaust pipe 57 is branched into six and connected to each of the intake units 46. Flow rate adjustment valves 91 are inserted into the exhaust pipes 57 branched into six. The exhaust unit 58 includes a blower for suction, and supplies a negative pressure to the suction unit 46 via the exhaust pipe 57. Thereby, the air intake portion 46 sucks the ambient air around the air intake port and discharges the ambient air to the exhaust pipe 57. The flow rate sucked by each suction unit 46 is individually adjusted by the corresponding flow rate adjustment valve 91.
On the other hand, a plurality of (five in the present embodiment) gas supply units 55 and a plurality of (two in the present embodiment) suction units 56 are disposed below the conveyance path inside the chamber 410.
Each of the five gas supply portions 55 has a plurality of ejection holes, not shown, which face upward. The gas supply portion 55 is connected to the gas supply source 53 via the air guide duct 52. That is, the proximal end side of the air guide duct 52 is connected to the gas supply source 53, and the distal end side of the air guide duct 52 is branched into five and connected to the gas supply portion 55. Flow rate regulating valves 54 are inserted into the five branched air guide pipes 52, respectively. The gas supply source 53 includes a heater and a blower, and supplies heated air as hot air to the gas supply portion 55. The flow rate of the hot air supplied to each gas supply unit 55 is individually adjusted by the corresponding flow rate adjustment valve 54. The hot air supplied to the gas supply portion 55 through the air guide duct 52 is ejected from the ejection holes toward the lower main surface of the substrate 5 to be conveyed.
Further, two air suction portions 56 are provided for the five gas supply portions 55. An intake port extending in the width direction of the substrate 5 is provided on the upper surface of each intake portion 56. Each intake port 56 is connected to an exhaust unit 93 via an exhaust pipe 92. That is, the base end side of the exhaust duct 92 is connected to the exhaust unit 93, and the tip end side of the exhaust duct 92 is branched into two and connected to the intake unit 56. Flow rate adjustment valves 94 are inserted into the exhaust pipes 92 branched into two. The exhaust unit 93 includes a blower for suction, and supplies a negative pressure to the intake unit 56 through the exhaust pipe 92. In this way, the intake unit 56 sucks the ambient air around the upper intake port and discharges the ambient air to the exhaust pipe 92. The flow rate sucked by each suction unit 56 is individually adjusted by the corresponding flow rate adjustment valve 94.
The gas supply unit 45 blows hot air from above the substrate 5, thereby directly heating the liquid film P applied to the main surface S1 of the substrate 5. As shown in fig. 2, the hot air blown from the gas supply unit 45 onto the upper surface of the substrate 5 flows along the X direction between the flow regulating plate 47 provided in parallel with the conveyance path and the substrate 5, and is collected by the suction units 46 provided on both sides of the gas supply unit 45. Since the hot air flows between the rectifying plate 47 and the base material 5, the liquid film P on the base material 5 is continuously in contact with the hot air having a low humidity, and the liquid film P is efficiently dried. The gas supply unit 55 blows hot air from below the substrate 5, thereby directly heating the substrate 5, and heats the liquid film P by heat conduction from the substrate 5. The hot air blown from the gas supply portion 55 toward the lower surface of the substrate 5 is collected by the suction portion 56.
The five gas supply portions 55 blow hot air upward from below the substrate 5, thereby indirectly heating the liquid film P, and also raise the substrate 5 by the wind pressure of the hot air. Therefore, even if a roller is not provided in the chamber 410, the substrate 5 can be prevented from being bent greatly.
The preheating section 41 is provided upstream of the heating section 42 in the conveyance direction. The preheating section 41 also promotes drying of the liquid film P on the substrate 5 by supplying a gas into the chamber, similarly to the heating section 42. In the preheating section 41, the temperature of the gas supplied to the substrate 5 is set to be higher than the normal temperature and lower than the temperature of the hot air supplied to the heating section 42, for example. As another example, the preheating section 41 may heat the substrate 5 by ultraviolet irradiation as described in patent document 1. In either case, by preheating the substrate 5 by the preheating section 41 before heating the substrate 5 by the heating section 42, not only the surface layer of the coating liquid on the substrate 5 but also the inside of the substrate 5 can be dried.
The cooling unit 43 is provided on the conveyance downstream side of the heating unit 42. The cooling unit 43 also promotes drying of the liquid film P on the substrate 5 by supplying a gas into the chamber, similarly to the heating unit 42. In the cooling unit 43, for example, dry air at normal temperature is supplied to the substrate 5.
The substrate is cooled by supplying dry air, but it is not necessary to cool the substrate 5 to normal temperature inside the cooling section 43. The substrate 5 may reach normal temperature until the substrate is finally collected by the winding roller 89, and to achieve this, the cooling section 43 functions to cool the substrate 5 to a specific temperature (a temperature lower than the temperature immediately after heating by the heated section 42 and higher than normal temperature).
The substrate 5 subjected to the drying process in the drying unit 40 is conveyed by the second conveying member and the third conveying member provided downstream of the drying unit 40 along the conveying path (conveying process).
Specifically, the substrate 5 passing through the drying section 40 is conveyed through the second roller 82 and the third roller 83, and then is collected by the winding roller 89. The collected substrate 5 is conveyed to a processing unit (not shown) outside the substrate processing apparatus 1, cut into a desired size in the processing unit, and then processed into an electrode plate.
The control unit 90 controls the mechanisms provided in the respective units of the substrate processing apparatus 1, and has the same hardware configuration as a general computer. That is, the control unit 90 includes: a CPU for performing various arithmetic processes; a ROM as a read-only memory for storing a basic program; a RAM as a freely readable and writable memory for storing various information; and a magnetic disk storing control software, data, and the like. The processing of the substrate processing apparatus 1 is performed by causing the CPU of the control section 90 to execute a predetermined processing program.
< 1.2 relationship between device size and occurrence of wrinkles in base material 5 >
Here, the relationship between the finishing device size and the wrinkling of the base material occurs.
As described above, the cooler 43 plays a role of cooling the substrate 5 to the above-described specific temperature, and does not play a role of cooling the substrate 5 to the normal temperature. When the cooling unit 43 is provided to function to cool the substrate 5 to the normal temperature, the size of the cooling unit 43 in the conveyance direction increases, and the substrate processing apparatus 1 further increases in size.
However, the embodiment in which the cooling unit 43 cools the substrate 5 only to a specific temperature makes the substrate 5 more likely to wrinkle than the other embodiment in which the cooling unit 43 cools the substrate 5 to a normal temperature.
This is based on the following principle. When the substrate 5 having a high temperature is cooled, a contraction force acts on the substrate 5 due to a temperature change thereof. At this time, since the tension of the conveying portion 80 is applied in the extending direction of the substrate 5, the substrate 5 is contracted particularly in the width direction. For example, when the base member 5 is transported by flow (flow) as in the cooling portion 43, the base member 5 is bent by a contraction force acting on the base member 5. At this time, when a force for stretching the base material 5 in the width direction is applied in a subsequent step, the base material 5 can be restored to the state before bending. On the other hand, as another example, in a state where the substrate 5 is conveyed in contact with a roller at normal temperature, if the frictional force acting between the roller and the substrate 5 and the contraction force acting on the substrate 5 resist, wrinkles may be generated in the substrate 5. At this time, even if a force for stretching the base material 5 in the width direction is applied in a subsequent process, the base material 5 does not return to the state before bending, and there is a possibility that a crease may be left on the base material 5.
As described above, in the present specification, the wrinkle refers to a fold line that is difficult to remove even if tension is applied in the width direction after the wrinkle occurs. The base material 5 having wrinkles often becomes a defective product in the product stage, and it is necessary to suppress the wrinkles from the viewpoint of yield.
Further, wrinkles caused by cooling the substrate 5 tend to occur particularly at the upstream side position (i.e., the position in a high-temperature state immediately after the substrate 5 is heated) in the section on the conveyance downstream side of the drying unit 40 (i.e., the section after the substrate 5 is heated).
Hereinafter, a technique for suppressing the occurrence of wrinkles by the substrate transfer process will be described in detail.
< 1.3 detailed description of handling Process of substrate >
Fig. 3 is an XZ side view schematically showing peripheral portions of the second roller 82 and the third roller 83. Fig. 4 is a YZ side view schematically showing a state where the second roller 82 conveys the base material 5. Fig. 5 is a YZ side view schematically showing a state where the roller 821 of the comparative example conveys the base material 5.
In fig. 3, the conveyance direction of the substrate 5 and the rotation directions of the second roller 82 and the third roller 83 are indicated by arrows. Further, in fig. 3, fan-shaped regions for expressing the angles (enclosed angles, corners き) of the second and third rollers 82 and 83 with respect to the base material 5 are respectively shown by thin lines.
The base material processing apparatus 1 includes a driving portion 820 (e.g., a motor) for rotating the second roller 82. The controller 90 controls the driving unit 820 so that the peripheral speed V2 of the second roller 82 is higher than the conveyance speed V of the substrate 5. Here, for example, the relationship between the conveyance speed V and the peripheral speed V2 is set to V < V2 ≦ 1.03V. Therefore, as a specific example, when the conveying speed V is 10 (m/min), 10 < V2 ≦ 10.3 (m/min) is satisfied. The conveying speed of each conveying member other than the second rollers 82 (specifically, the peripheral speed of each roller) is substantially the same as the conveying speed V of the substrate 5. For example, the peripheral speed of the third roller 83 is substantially the same as the conveyance speed V. Hereinafter, such control for relatively rapidly rotating the second roller 82 is sometimes referred to as traction control (ドロ control).
Thereby, sliding occurs between the outer peripheral surface of the second roller 82 that moves relatively fast and the back surface (the surface on the opposite side to the main surface S1 side) of the substrate 5 that moves relatively slow. The reason why the slip occurs in this manner is that a boundary layer of air is generated in the vicinity of the outer peripheral surface of the second roller 82 in association with the rotation of the second roller 82, and the boundary layer applies buoyancy to the base material 5. As a result, as shown in fig. 4, the second roller 82 conveys the substrate 5 through the gas layer 100.
On the other hand, in the comparative example shown in fig. 5, it is assumed that a roller 821 which rotates at the same circumferential speed as the conveying speed V is provided instead of the second roller 82 in the present embodiment. In this case, sliding is less likely to occur between the outer peripheral surface of the second roller 82 moving at a constant speed and the back surface of the base 5. Further, since the peripheral speed of the roller 821 is lower than the peripheral speed V2 of the second roller 82, the buoyancy applied to the substrate 5 by the boundary layer also has a small value. As a result, in the comparative example shown in fig. 5, the roller 821 conveys the substrate 5 in a state where the contact area between the outer peripheral surface of the roller 821 and the back surface of the substrate 5 is larger than that in the case of the present embodiment shown in fig. 4.
In the present embodiment, a second conveyance member (specifically, the second roller 82) that conveys the substrate 5 through the gas layer 100 is provided downstream of the drying unit 40. Therefore, the contact area between the substrate 5 heated by the drying unit 40 and the second roller 82 at normal temperature is reduced, and the frictional force is also reduced. As a result, the occurrence of wrinkles in the base material 5 can be suppressed.
In the case where the traction control is performed (fig. 4), the contact area between the base material 5 and the second roller 82 becomes smaller than that in the case where the traction control is not performed (fig. 5). In this specification, such a layer of gas generated due to a reduction in contact area is referred to as a gas layer 100. Therefore, the gas layer 100 is a concept including not only a layer formed on the entire back surface side of the base 5 (fig. 7 described later) but also a layer formed on a part of the back surface side of the base 5 (fig. 4). In the example shown in fig. 4, the gas layer 100 includes a portion having a large width on the-Y side and a portion having a small width on the + Y side.
In the present embodiment, the third conveyance member is provided downstream of the second conveyance member along the conveyance path. This makes it possible to convey the substrate 5 through the gas layer 100 at a position where wrinkles are particularly likely to occur (a portion of the substrate 5 immediately after the substrate 5 is heated in a section in which the substrate 5 is heated), and thus the occurrence of wrinkles can be effectively suppressed.
In the present embodiment, the conveying unit 80 includes a plurality of rollers (specifically, the second roller 82 and the third roller 83), and the plurality of rollers (specifically, the second roller 82 and the third roller 83) are arranged in a section of the conveying path so as to be capable of conveying the substrate 5 by rotating about axes extending in the intersecting direction. The angle θ 2 of the second roller 82 with respect to the base material 5 and the angle θ 3 of the third roller 83 with respect to the base material 5 are set to be equal to or less than a threshold value (for example, 30 degrees). The difference in the angle in the extending direction of the conveyance path before and after the section is the total value (θ 2+ θ 3) of the angles between the second roller 82 and the third roller 83.
As described above, when the substrate 5 having a high temperature is cooled, a contraction force due to the temperature change acts on the substrate 5, and wrinkles are likely to occur in the substrate 5. In the present embodiment, the included angle can be shared by the plurality of rollers arranged on the downstream side of the drying section 40, and the included angle of each roller with respect to the high-temperature substrate 5 can be made small (and further, the contact area between the high-temperature substrate 5 and each roller can be made small), thereby suppressing the occurrence of wrinkles.
In the present embodiment, the upstream conveying member (i.e., the member that conveys the substrate 5 having the highest temperature) of the conveying member set that shares the included angle is the second conveying member. Therefore, the substrate 5 can be conveyed through the gas layer 100 at a position where wrinkles are likely to occur due to a temperature difference between the substrate 5 and the conveying member, and the occurrence of wrinkles can be effectively suppressed. In the present embodiment, the conveyance member on the downstream side (i.e., the member that conveys the substrate 5 having a relatively low temperature) of the group of conveyance members that share the included angle is the third conveyance member. Therefore, by conveying the substrate 5 by the third conveying member at a position where the temperature difference between the substrate 5 and the conveying member is small, wrinkles are not easily generated even if the substrate 5 is not conveyed by the third conveying member through the gas layer 100.
In the present embodiment, the second conveying member is a portion that applies a force to the base 5 in the conveying direction. Therefore, the present embodiment can achieve a reduction in the size of the apparatus as compared with a comparative example (not shown) having a float support portion for supporting the substrate 5 by supplying air to the back surface side of the substrate 5 instead of the second roller 82. As in the comparative example, providing the floating support portion on the downstream side of the cooling portion 43 is equivalent to enlarging the dimension of the cooling portion 43 in the conveying direction, which leads to an increase in the size of the apparatus.
(modification example 2)
The embodiments of the present invention have been described above, and various modifications other than those described above can be made without departing from the scope of the present invention.
Fig. 6 is a perspective view schematically showing a roller 822 of a modification. Fig. 7 is a YZ side view schematically showing a state in which the roller 822 of the modification conveys the substrate 5.
The roller 822 includes: a body 823 formed in a cylindrical shape; an outer peripheral portion 824 provided with an air supply port for supplying air to the substrate 5; and an inner peripheral portion 825 having an opening connected to the air supply port of the outer peripheral portion 824. In fig. 6 and 7, a plurality of air supply ports of the outer peripheral portion 824 and a plurality of openings of the inner peripheral portion 825 are shown in a dotted pattern.
Therefore, when gas is supplied from a gas supply unit, not shown, into the cylinder space of the roller 822, the gas flows from the plurality of openings of the inner peripheral portion 825 toward the plurality of gas supply ports of the outer peripheral portion 824, and the gas is supplied from the plurality of gas supply ports toward the back surface of the substrate 5. In this way, the roller 822 functions as an air supply roller including an outer peripheral portion 824 provided with an air supply port and an air supply path connected to the air supply port.
In this modification, a roller 822 is provided in the substrate processing apparatus 1 instead of the second roller 82 of the above embodiment. More specifically, the roller 822 is provided in the substrate processing apparatus 1 so as to be rotatable about an axis parallel to the main surface S1 and extending in the intersecting direction intersecting the conveying direction of the substrate 5. Then, the roller 822 is rotated in a direction for conveying the substrate 5 by a driving unit not shown. As a result, as shown in fig. 7, the roller 822 conveys the substrate 5 through the gas layer 101 by the supply gas. Unlike the gas layer 100 of the above embodiment, the gas layer 101 is formed on the entire back surface side of the base material 5.
In the present modification, the roller 822 functions as a second conveying member, and the contact area between the substrate 5 heated in the drying section 40 and the roller 822 is reduced, thereby suppressing the occurrence of wrinkles in the substrate 5. In this way, in addition to the traction control of the above embodiment, various mechanisms can be used as the second conveyance member. Further, a plurality of types of second conveying members (for example, the second roller 82 and the roller 822) having different principles of conveying the substrate 5 through the gas layer may be combined and installed in the substrate processing apparatus 1.
In the present modification, the temperature of the supplied gas is set to be lower than the temperature of the portion of the substrate 5 conveyed by the roller 822. In this case, the substrate 5 can be cooled in accordance with the conveyance process of the substrate 5, and the device can be downsized.
In the above-described embodiment, the description has been given of the mode in which the third conveyance member is located on the conveyance downstream side of the second conveyance member, but the second conveyance member may be located on the conveyance downstream side of the third conveyance member.
In the above embodiment, the description has been given of the embodiment in which the conveying unit 80 includes the third roller 83, and the second roller 82 and the third roller 83 share the angle with respect to the base material 5, but the third roller 83 is provided on the downstream side of the second roller 82 in a section of the conveying path, and the present invention is not limited thereto. As a method of sharing an included angle by a plurality of rollers arranged in a section on the downstream side of the drying section 40, three or more rollers (for example, one second roller 82 and two or more third rollers 83) may be used. Further, a plurality of conveyance members other than the rollers may be arranged in a line in a section on the downstream side of the drying section 40, and the angle of the substrate 5 may be shared by these conveyance members. Further, such a sharing technique may not be used.
In the above embodiment, the embodiment has been described in which the substrate 5 is subjected to the heating process by the heating unit 42, and then the cooling process is performed in which the substrate 5 heated by the heating process is cooled by the cooling unit 43. For example, the drying unit 40 may not have the cooling unit 43 and may not perform the cooling process.
In the above embodiment, the description has been given of the mode of applying the coating liquid to the one main surface S1 of the substrate 5, but a mode of applying the coating liquid to both main surfaces of the substrate 5 may be adopted.
The liquid film P to be dried is not limited to the example of the above embodiment (electrode material film of lithium ion secondary battery). The liquid film to be dried may be, for example, a thin film of a solar cell material, a protective film of an electronic material, a liquid film of a pigment or an adhesive, or the like.
The supply method of the coating liquid to the main surface S1 of the substrate 5 is not particularly limited. In addition to the method of supplying the coating liquid to the main surface S1 using the slit nozzle as in the above-described embodiment, for example, a method of supplying the coating liquid to the main surface S1 of the substrate 5 using a spray nozzle (so-called spray coating) may be employed. In addition to the method of supplying the coating liquid from one slit opening to one region of the main surface S1 as in the above-described embodiment, for example, a method of supplying the coating liquid from a plurality of slit openings provided at intervals in the width direction of the substrate 5 to a plurality of regions on the main surface S1 (so-called stripe coating) may be employed.
The types of the conveying members, the number of the conveying members, and the arrangement of the conveying members provided in the conveying unit 80 are not limited to the examples of the above embodiments, and may be appropriately changed as needed.
The substrate processing apparatus and the substrate processing method according to the embodiment and the modification have been described above, but these are examples of preferred embodiments of the present invention and are not intended to limit the scope of the present invention. The present invention can freely combine the respective embodiments, or change any constituent member of the respective embodiments, or increase or decrease any constituent member of the respective embodiments within the scope of the present invention.
Claims (8)
1. A substrate processing apparatus, wherein,
comprising:
a conveying section for conveying the substrate having the coating liquid supplied to the main surface along a conveying path,
a drying unit that dries the coating liquid supplied to the main surface by applying a process including a heating process to the substrate conveyed by the conveying unit;
the conveying part comprises:
a first conveying member provided on an upstream side of the drying section along the conveying path and conveying the base material, and,
a second conveying member provided downstream of the drying section along the conveying path and conveying the substrate through a gas layer,
the conveying direction of the conveying part to the substrate positioned in the drying part is different from the conveying direction of the conveying part to the substrate positioned at the downstream side of the drying part,
the second conveying member conveys the substrate while having an angle with respect to the substrate.
2. The base material processing apparatus according to claim 1,
the conveying unit further includes a third conveying member provided on a downstream side of the drying unit along the conveying path and having a contact area with the substrate larger than a contact area with the substrate,
the third conveying member is located on the downstream side of the second conveying member along the conveying path.
3. The base material processing apparatus according to claim 1,
the second conveyance member includes a roller rotatable about an axis parallel to the main surface and extending in a direction intersecting the conveyance direction of the substrate,
the apparatus further includes a driving unit configured to rotate the roller so that a peripheral speed of the roller is greater than a conveyance speed of the substrate conveyed by the conveying unit.
4. The base material processing apparatus according to claim 1,
the conveying unit includes a plurality of rollers that are rotatable around axes parallel to the main surface and extending in a direction intersecting a conveying direction of the substrate, and that are arranged in a section of the conveying path,
the angular difference in the extending direction of the conveyance path before and after the one section is a total value obtained by adding the angles of the plurality of rollers with respect to the base material.
5. The base material processing apparatus according to claim 1,
the second conveyance member includes an air supply roller rotatable about an axis parallel to the main surface and extending in a direction intersecting the conveyance direction of the substrate, the air supply roller having an outer peripheral portion provided with an air supply port and an air supply path connected to the air supply port,
and a gas supply unit for supplying gas to the gas supply path.
6. The base material processing apparatus according to claim 5,
the temperature of the gas is lower than the temperature of the portion of the base material conveyed by the gas supply roller.
7. The base material processing apparatus according to any one of claims 1 to 6,
the drying unit performs the heating process on the substrate conveyed by the conveying unit and then performs a cooling process of cooling the substrate heated by the heating process to dry the coating liquid supplied to the main surface.
8. A method for treating a base material, wherein,
the method comprises the following steps:
a drying step of drying the coating liquid supplied to the main surface by performing a treatment including a heating treatment on the base material having the main surface supplied with the coating liquid; and the number of the first and second groups,
a conveying step of conveying the substrate subjected to the drying step with a conveying member through a gas layer,
the carrying direction of the substrate in the drying step is different from the carrying direction of the substrate in a step subsequent to the drying step,
the conveying member conveys the substrate while having an angle with respect to the substrate.
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| JP2016-061246 | 2016-03-25 | ||
| JP2016061246A JP6808338B2 (en) | 2016-03-25 | 2016-03-25 | Base material processing equipment and base material processing method |
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| CN107230775B true CN107230775B (en) | 2020-09-18 |
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| CN108470885B (en) * | 2018-03-15 | 2020-07-24 | 合肥国轩高科动力能源有限公司 | Suspension wrinkle removing device for lithium battery pole piece |
| JP7010183B2 (en) * | 2018-09-11 | 2022-01-26 | トヨタ自動車株式会社 | Band-shaped electrode plate manufacturing method, battery manufacturing method, and electrode plate manufacturing equipment |
| JP2020123526A (en) * | 2019-01-31 | 2020-08-13 | 三洋電機株式会社 | Non-aqueous electrolyte secondary battery and manufacturing method for electrode thereof |
| CN110228276A (en) * | 2019-05-27 | 2019-09-13 | 浙江美声智能***有限公司 | Air-flotation type print drying system |
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| JP6808338B2 (en) | 2021-01-06 |
| CN107230775A (en) | 2017-10-03 |
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