CN106646997A - Baffle identifier of color resistance layer manufactured through Canon photomask and use method of baffle identifier - Google Patents
Baffle identifier of color resistance layer manufactured through Canon photomask and use method of baffle identifier Download PDFInfo
- Publication number
- CN106646997A CN106646997A CN201611225177.7A CN201611225177A CN106646997A CN 106646997 A CN106646997 A CN 106646997A CN 201611225177 A CN201611225177 A CN 201611225177A CN 106646997 A CN106646997 A CN 106646997A
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- CN
- China
- Prior art keywords
- color blocking
- blocking layer
- layer
- canon
- color resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7007—Alignment other than original with workpiece
- G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The invention relates to a baffle identifier of a color resistance layer manufactured through a Canon photomask and a use method of the baffle identifier and relates to the technical field of liquid crystal display. The baffle identifier comprises a front manufacturing process layer and the color resistance layer, a scaleplate is formed on the front manufacturing process layer, and at least one part of the scaleplate is overlapped with the color resistance layer. The color resistance layer is of parallel stripe structures arranged at intervals, and projections of the adjacent stripes in the horizontal direction are connected and/or partially overlapped. After the color resistance layer is manufactured, the covering condition of the color resistance layer on the scaleplate in the front manufacturing process layer is observed, and therefore whether the sheltering distance of a baffle when the color resistance layer is manufactured is reasonable or not and whether compensation is needed or not can be judged. In addition, the color resistance layer in the baffle identifier is of the parallel stripe structures arranged at intervals, the projections of the adjacent strips in the horizontal direction are connected and/or partially overlapped, at least one part of the color resistance layer can be overlapped with the scaleplate on the front manufacturing process layer, and the problem that the color resistance exposure resolution is low is solved.
Description
Technical field
The invention belongs to technical field of liquid crystal display, and in particular to a kind of baffle plate of Canon's light shield manufacture colour cell layer mark and
Its using method.
Background technology
Liquid crystal indicator (LCD, Liquid Crystal Display) has thin fuselage, power saving, radiationless etc. numerous
Advantage, is widely used.Liquid crystal indicator on existing market is most of for backlight liquid crystal indicator, its bag
Include display panels and backlight module (backlight module).Generally display panels by color membrane substrates (CF,
Color Filter), thin film transistor base plate (TFT, Thin Film Transistor), be sandwiched in color membrane substrates and film crystal
Liquid crystal (LC, Liquid Crystal) and the sealing frame glue'' (Sealant) composition between pipe substrate.
CF substrates are LCD for realizing the main devices of colored display, and it constitutes and generally includes substantially：It is glass substrate, black
Colour moment battle array, colored color blocking layer etc..The light that backlight sends incides CF substrates through the modulation of liquid crystal molecule, by CF substrates
The filter action of the red color resistance, green color blocking and blue color blocking of color blocking layer of enameling, shows respectively three kinds of light of red, green, blue
Line, the light of the respectively transmitted corresponding color wave band of color blocking of different colours, so as to realize that the colored of display shows.
Light shield (Mask), is also called photomask blank, mask plate, is, as substrate, one to be plated in the above by quartz glass
The photosensitive material of layer crome metal and photoresists.The circuitous pattern for having designed is exposed on photoresists by electronic laser equipment
On, the region being exposed developed out can form circuitous pattern on crome metal, become the photomask of egative film after similar exposure
Version, is then applied to the projective iteration of integrated circuit, and photoetch is carried out to the circuit for being projected by IC etching machine.It is raw
Producing manufacturing procedure is：Exposure, development, removes photoresists, is finally applied to photoetch.
The aligning accuracy of Canon's light shield is higher, when using Canon's light shield manufacture color blocking layer, due to the development precision of color blocking
It is relatively low, if applying mechanically the conventional baffle plate mark of Canon's light shield, can cause the details such as digital, little live width scale in the mark cannot be into
Type, thus the conventional baffle plate mark of Canon's light shield cannot be used normally.If the mark can not be used normally, can cause the baffle plate cannot
Corresponding regulation is carried out, the control and compensation of color blocking exposure range is affected.
The content of the invention
The technical problem to be solved is to provide a kind of Canon's light shield manufacture colour cell for the deficiencies in the prior art
The baffle plate mark of layer and its using method, the baffle plate mark for being not used to color blocking making originally is substituted using the mark, can be right
The scope of blocking of baffle plate is estimated, and then the exposure range to color blocking is controlled and compensates.
For this purpose, the invention provides a kind of baffle plate mark of Canon's light shield manufacture color blocking layer, it includes front process layer and color
Resistance layer, is formed with graduated scale in described front process layer, and the graduated scale is at least part of Chong Die with color blocking layer.
In some embodiments of the invention, described color blocking layer is spaced parallel stripes structure, and adjacent strip
Band projection in the horizontal direction connects and/or partly overlaps.
In other embodiments of the present invention, described front process layer is metal level or black matrix.
Present invention also offers a kind of using method of the baffle plate mark of Canon's light shield manufacture color blocking layer, it includes following step
Suddenly：
Step A：The front process layer with graduated scale is formed on substrate using the graduated scale figure on Canon's light shield；
Step B：Color blocking layer is formed using the color blocking layer pattern on another Canon's light shield in front process layer；
Step C：By the reading for reading color blocking layer and front process layer high scale overlapping scales part, judge prepared by color blocking layer
When baffle plate whether block scope reasonable.
In some embodiments of the invention, graduated scale in the front process layer is at least part of with color blocking layer weight
It is folded.
In other embodiments of the present invention, the color blocking layer pattern is spaced parallel stripes, and adjacent strip
Band projection in the horizontal direction connects and/or partly overlaps.
In some embodiments of the invention, described front process layer is metal level or black matrix.
In other embodiments of the present invention, described substrate is glass substrate.
Due to the exposure resolution of color blocking material it is relatively low, when using Canon's light shield manufacture colour cell layer, if applying mechanically Canon's light
The conventional graduated scale of cover is identified as baffle plate, and the details such as digital, the little live width scale in the mark can be made to be molded so that
The conventional graduated scale baffle plate mark of Canon's light shield cannot be used normally, and then cause baffle plate to carry out corresponding regulation, shadow
Ring the control and compensation of color blocking exposure range.
The graduated scale that Canon's light shield is commonly used is etched in the good front process layer of exposure resolution so that in front process layer
The graduated scale of structural integrity is formed with, then again by color blocking layer preparation in front process layer, and processing procedure before color blocking layer is covered
Graduated scale on layer, color blocking layer passes through covering feelings of the observation color blocking layer to process layer graduated scale before lower section after completing
Condition, whether baffle plate blocks apart from reasonable when can just judge that color blocking layer makes, if need compensation.The present invention is based on above-mentioned
What method was made.
Beneficial effects of the present invention are：After color blocking layer completes, by observing color blocking layer to the scale in front process layer
The coverage condition of scale, whether baffle plate blocked apart from reasonable when both can determine whether that color blocking layer makes, if need compensation.Using this
Mark substitutes the baffle plate mark for being not used to color blocking making originally, and then the exposure range to color blocking layer is controlled and compensates.
In addition, the color blocking layer in the baffle plate mark is spaced parallel stripes structure, adjacent ribbons throwing in the horizontal direction
Shade connects and/or partly overlaps, and at least a portion of color blocking layer can be made Chong Die with the graduated scale in front process layer, overcomes again
The low problem of color blocking exposure resolution.
Description of the drawings
The present invention is illustrated below in conjunction with accompanying drawing.
Fig. 1 is the graduated scale figure on Canon's light shield.
Fig. 2 is that the baffle plate of Canon's light shield manufacture color blocking layer of the present invention identifies the baffle plate mark formed on substrate
Top view；The implication of reference is as follows in figure：1 is formed with quarter using the graduated scale figure on Canon's light shield on substrate
The metal level of anale settting scale；2 color blocking layers formed on the metal layer using the color blocking layer pattern on another Canon's light shield.
Fig. 3 is that the baffle plate of Canon's light shield manufacture color blocking layer of the present invention identifies the baffle plate mark formed on substrate
Top view；The implication of reference is as follows in figure：3 are formed with quarter using the graduated scale figure on Canon's light shield on substrate
The black matrix of anale settting scale；4 color blocking layers formed in black matrix using the color blocking layer pattern on another Canon's light shield.
Specific embodiment
To make the present invention easy to understand, the present invention is described in detail below in conjunction with drawings and Examples, these embodiments
Only play illustrative effect, it is not limited to the range of application of the present invention.If the raw material or component used in the present invention is without special
Illustrate to be obtained by commercial sources or conventional method.
Specific embodiment one：
A kind of baffle plate mark of Canon's light shield manufacture color blocking layer：
The baffle plate mark of Canon's light shield manufacture color blocking layer includes front process layer and color blocking layer, in described front process layer
Graduated scale is formed with, and the graduated scale is at least part of Chong Die with color blocking layer.
Graduated scale figure such as Fig. 1 on Canon's light shield.
In certain embodiments, described color blocking layer is spaced parallel stripes structure, and adjacent ribbons are in level
Projection on direction connects and/or partly overlaps.
In certain embodiments, described front process layer is metal level or black matrix.
In certain embodiments, described substrate is glass substrate.
Specific embodiment two
Fig. 2 is that the baffle plate of Canon's light shield manufacture color blocking layer of the present invention identifies the baffle plate mark formed on substrate
Top view, the using method of the baffle plate mark of Canon's light shield manufacture color blocking layer is comprised the following steps：
(1) formed on the glass substrate with graduated scale using the graduated scale figure (as shown in Figure 1) on Canon's light shield
The metal level 1 of chi.
(2) the color blocking layer pattern on another Canon's light shield is formed in color blocking layer 2, and the metal level 1 on metal level 1
Graduated scale is at least part of overlap with color blocking layer 2；Color blocking layer pattern on Canon's light shield is spaced parallel
Band, and adjacent ribbons projection in the horizontal direction connects or partly overlaps；Top view such as Fig. 2 institutes of the baffle plate mark of formation
Show.
(3) by reading color blocking layer 2 and the number of degrees of the high scale overlapping scales part of metal level 1, when prepared by interpretation color blocking layer
Baffle plate whether block scope reasonable.
Specific embodiment three
The using method of the baffle plate mark of Canon's light shield manufacture color blocking layer is comprised the following steps：
(1) formed on the glass substrate with graduated scale using the graduated scale figure (as shown in Figure 1) on Canon's light shield
The black matrix 3 of chi.
(2) the color blocking layer pattern on another Canon's light shield is formed in color blocking layer 4, and the black matrix 3 in black matrix 3
Graduated scale is at least part of overlap with color blocking layer 4；Color blocking layer pattern on Canon's light shield is spaced parallel
Band, and adjacent ribbons projection section in the horizontal direction connects or partly overlaps；The top view of the baffle plate mark of formation is such as
Shown in Fig. 3.
(3) by reading color blocking layer 4 and the number of degrees of the high scale overlapping scales part of black matrix 3, when prepared by interpretation color blocking layer
Baffle plate whether block scope reasonable.
It should be noted that embodiment described above is only used for explaining the present invention, do not constitute to any of the present invention
Limit.By referring to exemplary embodiments, invention has been described, it should be appreciated that word wherein used is descriptive
With explanatory vocabulary, rather than limited vocabulary.By regulation the present invention can be made within the scope of the claims
Modification, and the present invention is revised in without departing substantially from scope and spirit of the present invention.Although the present invention described in it is related to
And specific method, material and embodiment, it is not intended that the present invention is limited to wherein disclosed particular case, conversely, this
It is bright to can be extended to other all methods and applications with identical function.
Claims (8)
1. a kind of baffle plate of Canon's light shield manufacture color blocking layer is identified, and it includes front process layer and color blocking layer, described front process layer
On be formed with graduated scale, and the graduated scale is at least part of Chong Die with color blocking layer.
2. baffle plate according to claim 1 is identified, it is characterised in that described color blocking layer is spaced parallel stripes
Structure, and adjacent ribbons projection in the horizontal direction connects and/or partly overlaps.
3. baffle plate according to claim 1 is identified, it is characterised in that described front process layer is metal level or black matrix.
4. a kind of using method of baffle plate mark described in any one of claim 1-3, comprises the following steps：
Step A：The front process layer with graduated scale is formed on substrate using the graduated scale figure on Canon's light shield；
Step B：Color blocking layer is formed using the color blocking layer pattern on another Canon's light shield in front process layer；
Step C：By the reading for reading color blocking layer and front process layer high scale overlapping scales part, keep off when judging prepared by color blocking layer
Plate whether block scope reasonable.
5. preparation method according to claim 4, it is characterised in that the graduated scale at least in the front process layer
Part is Chong Die with color blocking layer.
6. preparation method according to claim 4, it is characterised in that the color blocking layer pattern is spaced parallel strip
Band, and adjacent ribbons projection in the horizontal direction connects and/or partly overlaps.
7. preparation method according to claim 4, it is characterised in that described front process layer is metal level or black matrix.
8. preparation method according to claim 4, it is characterised in that described substrate is glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611225177.7A CN106646997A (en) | 2016-12-27 | 2016-12-27 | Baffle identifier of color resistance layer manufactured through Canon photomask and use method of baffle identifier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611225177.7A CN106646997A (en) | 2016-12-27 | 2016-12-27 | Baffle identifier of color resistance layer manufactured through Canon photomask and use method of baffle identifier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106646997A true CN106646997A (en) | 2017-05-10 |
Family
ID=58833049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201611225177.7A Pending CN106646997A (en) | 2016-12-27 | 2016-12-27 | Baffle identifier of color resistance layer manufactured through Canon photomask and use method of baffle identifier |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106646997A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1905166A (en) * | 2006-08-16 | 2007-01-31 | 广辉电子股份有限公司 | Film transistor array substrate and mfg. method thereof |
| CN104317158A (en) * | 2014-11-14 | 2015-01-28 | 京东方科技集团股份有限公司 | Mask, mask group, colored film substrate and display device |
| CN105074570A (en) * | 2013-03-15 | 2015-11-18 | 富士胶片株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, color pattern formation method, method for producing color filter, solid-state imaging element, and liquid crystal display device |
| CN105487333A (en) * | 2016-01-04 | 2016-04-13 | 重庆京东方光电科技有限公司 | Mask group, color film substrate and manufacturing method therefor, detection apparatus, and display apparatus |
-
2016
- 2016-12-27 CN CN201611225177.7A patent/CN106646997A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1905166A (en) * | 2006-08-16 | 2007-01-31 | 广辉电子股份有限公司 | Film transistor array substrate and mfg. method thereof |
| CN105074570A (en) * | 2013-03-15 | 2015-11-18 | 富士胶片株式会社 | Colored radiation-sensitive composition, colored cured film, color filter, color pattern formation method, method for producing color filter, solid-state imaging element, and liquid crystal display device |
| CN104317158A (en) * | 2014-11-14 | 2015-01-28 | 京东方科技集团股份有限公司 | Mask, mask group, colored film substrate and display device |
| CN105487333A (en) * | 2016-01-04 | 2016-04-13 | 重庆京东方光电科技有限公司 | Mask group, color film substrate and manufacturing method therefor, detection apparatus, and display apparatus |
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| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170510 |