CN107621720A - A kind of color membrane substrates and preparation method thereof - Google Patents
A kind of color membrane substrates and preparation method thereof Download PDFInfo
- Publication number
- CN107621720A CN107621720A CN201710755807.XA CN201710755807A CN107621720A CN 107621720 A CN107621720 A CN 107621720A CN 201710755807 A CN201710755807 A CN 201710755807A CN 107621720 A CN107621720 A CN 107621720A
- Authority
- CN
- China
- Prior art keywords
- layer
- membrane substrates
- color membrane
- exposure region
- spacer material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Filters (AREA)
Abstract
The invention discloses a kind of preparation method of color membrane substrates, and the hyaline layer being made up of photoresist is first formed in black-matrix layer and chromatic filter layer, and prebake conditions are reacted by preliminary heat cross-linking, and photoresist has certain anti-etching intensity on whole substrate；Then face exposure is carried out to the hyaline layer from the top of underlay substrate, development, by removing for the site portion not being exposed on hyaline layer, and then obtains flatness layer and the major and minor spacer material on flatness layer simultaneously；High-temperature baking is finally carried out on the basis of the above, solidifies material complete stability.The flatness layer and spacer material portion strong bonded on color membrane substrates made by the present invention, and there is preferable intensity.
Description
Technical field
The present invention relates to LCD Technology field, more particularly to a kind of color film base being assemblied on liquid crystal display panel
Plate.
Background technology
Thin Film Transistor-LCD (Thin Film Transistor Liquid Crystal Display, TFT-
LCD) compared the features such as relatively low and radiationless by its low in energy consumption, manufacturing cost, have become the main flow of flat display field
Technology.TFT-LCD is formed by color membrane substrates and array base palte to box, color membrane substrates mainly by backlight be filtered into it is red, green and
Primary colors light, realize different color displays.
Fringe field switching (Fringe Filed Switching, FFS) type TFT-LCD wide viewing angle technology is due in big chi
Application in very little, fine definition tabletop display and LCD TV, and receive more and more attention.FFS technologies pass through same
Electrode produces fringe field between pixel in plane, makes the aligned liquid-crystal molecule between electrode and directly over electrode can be (parallel
Substrate) in-plane rotates conversion, so as to improve the light transmission efficiency of liquid crystal layer.Therefore, the flatness of color membrane substrates needs
Reach higher standard.The profile of color membrane substrates prepared by prior art is as shown in figure 1, it includes underlay substrate 100, formed
In the black matrix" 101 on underlay substrate 100, the chromatic filter layer 102 being distributed among black matrix" 101, it is covered in black
Flatness layer 103 on matrix 101 and chromatic filter layer 102, the main spacer material 104 being formed on flatness layer 103 and secondary spacer material
105.Wherein flatness layer 103 is heat curing process, and main spacer material 104, secondary spacer material 105 are photocuring and heat curing process.By
Be fabricated separately in flatness layer and spacer material, it is necessary to which two production lines are successively completed, Production Time is longer, take the resources of production also compared with
More, cost is higher.
The content of the invention
It is an object of the invention to provide a kind of new color membrane substrates preparation method, by new technique and design of material,
So that flatness layer technique can be made with spacer material together with, process is saved.
To achieve the above object, the present invention provides a kind of preparation method of color membrane substrates, comprises the following steps：
S1, black matrix" is formed on underlay substrate；
S2：Chromatic filter layer is formed on the basis of S1 is formed；
S3：On the basis of S2 is formed, the hyaline layer that the photoresist containing crosslinking agent is formed is covered；
S4：Prebake conditions are carried out to hyaline layer, while crosslinking agent promotes the acrylic resin in photoresist to carry out preliminary heat
Cross-linking reaction；
S5：The hyaline layer on the basis of forming S4 is exposed using mask plate, develops, forms flatness layer, main spacer material
With secondary spacer material；
S6：High-temperature baking is carried out on the basis of the above, solidifies photoresist complete stability.
Embodiments of the invention provide a kind of color membrane substrates and preparation method thereof, by forming black matrix and colored filter
In the case of photosphere, the hyaline layer being made up of the photoresist containing crosslinked at low temperature agent is initially formed, is exposed after prebake conditions, by
It is different in the transmitance of mask plate different zones, after development, form required flatness layer, main spacer material and secondary spacer material.Therefore,
Flatness layer and spacer material portion Integral design, are formed simultaneously, greatly save process, and have good intensity.
Brief description of the drawings
Fig. 1 is the profile of color membrane substrates in the prior art；
Fig. 2 is the profile of the color membrane substrates of the embodiment of the present invention；
Fig. 3 is that the present invention carries out the schematic diagram after light blockage coating on black matrix" and chromatic filter layer；
Fig. 4 is the schematic diagram that prebake conditions (low temperature heat cross-linking) are carried out to the hyaline layer shown in Fig. 3；
Fig. 5 is the schematic diagram that (light reaction) is exposed to the hyaline layer after processed shown in Fig. 4；
Fig. 6 is the schematic diagram to be developed after being exposed to Fig. 5；
Fig. 7 is the schematic diagram that (high temperature heat cross-linking) is toasted after being carried out after developing to Fig. 6.
Embodiment
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, control is illustrated below
The embodiment of the present invention.It should be evident that drawings in the following description are only some embodiments of the present invention, for
For those of ordinary skill in the art, on the premise of not paying creative work, other can also be obtained according to these accompanying drawings
Accompanying drawing, and obtain other embodiments.
To make simplified form, part related to the present invention is only schematically show in each figure, they are not represented
Its practical structures as product.In addition, so that simplified form readily appreciates, there is identical structure or function in some figures
Part, one of those is only symbolically depicted, or only marked one of those.
Fig. 2 is the structural representation of color membrane substrates embodiment of the present invention, as shown in Fig. 2 the color membrane substrates include a substrate
Substrate 100, the black matrix" 101 being formed on underlay substrate 100 and chromatic filter layer 102 and it is formed at black matrix" 101
With the hyaline layer 103 on chromatic filter layer 102, the hyaline layer is formed by the photoresist containing crosslinking agent, and hyaline layer 103 wraps
Include a flatness layer 104, main spacer material 105 and secondary spacer material 106.
Flatness layer 104 is covered on black matrix" 101 and chromatic filter layer 102, main spacer material 105 and secondary spacer material 106
On flatness layer 104.Flatness layer 104, main spacer material 105 and secondary spacer material 106 are integrally formed.
Photoresist is added with the crosslinking agent of low temperature polymerization wherein used in hyaline layer 103, and this crosslinking agent is used for saturating
Bright layer promotes acrylic resin to carry out preliminary heat cross-linking reaction in 60~130 DEG C of prebake conditions.
Synthesis technology of acrylic is simple, low-cost, while also has the advantages of contrast and high resolution, therefore
It is a kind of conventional photoresist film-forming resin, i.e., there is acrylic resin in photoresist.
Crosslinking agent is that one kind can be in intermolecular bridging action of line style, so that multiple linear molecules are mutually bonded and are cross-linked into
The material of network structure.Crosslinking agent has different calls in different industries, such as：It is referred to as " vulcanizing agent " in rubber industry custom；
It is referred to as " curing agent ", " curing agent ", " curing agent " in plastic industry；It is referred to as " curing agent ", " hardening in adhesive or coating industry
Agent " etc..
In the present invention, by adding crosslinking agent in photoresist, the acrylic resin of photoresist is allowed in low temperature feelings
Heat cross-linking reaction occurs for (60~130 DEG C) of condition.
The color membrane substrates of the embodiment of the present invention are made using following methods, are comprised the following steps：
S1, black matrix" 101 is formed on underlay substrate 100；
S2：Chromatic filter layer 102 is formed on the basis of S1 is formed；
S3：On the basis of S2 is formed, the hyaline layer 103 that the photoresist containing crosslinking agent is formed is covered, such as Fig. 3 institutes
Show；
S4：Prebake conditions are carried out to hyaline layer 103, while crosslinking agent promotes the acrylic resin in photoresist to carry out tentatively
Heat cross-linking reacts；
S5：The hyaline layer 103 on the basis of forming S4 is exposed using mask plate, developed, forms flatness layer 104, master
Spacer material 105 and secondary spacer material 106；
S6：High-temperature baking is carried out on the basis of the above, solidifies photoresist complete stability.
Wherein, in the S1, black matrix" photoresist is coated on underlay substrate 100, passes through the mask with figure
Plate is exposed to the photoresist and develops to obtain black matrix" 101.
In the S2, chromatic filter layer 102 is made using black matrix" identical method is formed with S1 steps.
As shown in figure 4, the S4's is specially：To completing step under selected temperature (the present embodiment is 60~130 DEG C)
S3 hyaline layer carries out the baking of seclected time, and now photoresistance carries out preliminary heat cross-linking reaction, so that photoresist is in whole base
There is certain anti-etching intensity on plate.
As illustrated in figs. 5-7, S5 is specifically included：On the basis of completing step S4, hyaline layer 103 is exposed by mask plate
Light, as shown in figure 5, forming the first exposure region, the second exposure region and the 3rd exposure region, the first exposure region forms flatness layer 104, the
Two exposure regions form secondary spacer material 106, and the 3rd exposure region forms main spacer material 105, and the first exposure region transmitance is 0, is non-exposure
Light area, the second exposure region transmitance are less than the 3rd exposure region, and the 3rd exposure region transmitance is 100%.
Then by developing process, required flatness layer 104, main spacer material 105 and secondary spacer material 106 are formed, such as Fig. 6 institutes
Show.Wherein by the parameter fluid temperature in the etch process that develops, concentration, spray pressure etc., come control flatness layer 104, it is main every
The height of underbed 105 and secondary spacer material 106.
Using the present invention, the manufacture craft of color membrane substrates can be saved, it is cost-effective, while in the color membrane substrates produced
Flat part and spacer material strong bonded, and flat part and spacer material are formed by the photoresist containing crosslinking agent, are had
Preferable intensity.
It should be noted that above-described embodiment can independent assortment as needed.Described above is only the preferred of the present invention
Embodiment, it is noted that for those skilled in the art, do not departing from the premise of the principle of the invention
Under, some improvements and modifications can also be made, these improvements and modifications also should be regarded as protection scope of the present invention.
Claims (8)
1. a kind of preparation method of color membrane substrates, it is characterised in that comprise the following steps：
S1：Black matrix" (101) is formed on underlay substrate (100)；
S2：Chromatic filter layer (102) is formed on the basis of S1 is formed；
S3：On the basis of S2 is formed, the hyaline layer (103) that the photoresist containing crosslinking agent is formed is covered；
S4：Prebake conditions are carried out to hyaline layer (103), while crosslinking agent promotes the acrylic resin in photoresist to carry out preliminary heat
Cross-linking reaction；
S5：The hyaline layer (103) on the basis of forming S4 is exposed using mask plate, developed, forms flatness layer (104), master
Spacer material (105) and secondary spacer material (106).
2. the preparation method of color membrane substrates as claimed in claim 1, it is characterised in that：Described prebake conditions temperature be 60~
130 DEG C, this temperature is suggested range, but is not strictly limited to this scope.
3. the preparation method of color membrane substrates as claimed in claim 1, it is characterised in that：In the S2, using with S1 step shapes
Chromatic filter layer is made into black matrix" identical method.
4. the preparation method of color membrane substrates as claimed in claim 1, it is characterised in that：S5 is specifically included：Complete step S4's
On the basis of, hyaline layer is exposed by mask plate, the first exposure region of formation, the second exposure region and the 3rd exposure region, first
Exposure region forms flatness layer, and the second exposure region forms secondary spacer material, and the 3rd exposure region forms main spacer material.
5. the preparation method of color membrane substrates as claimed in claim 4, it is characterised in that：First exposure region transmitance is 0, is non-
Exposure region, the second exposure region transmitance are less than the 3rd exposure region, and the 3rd exposure region transmitance is 100%.
6. the preparation method of color membrane substrates as claimed in claim 1, it is characterised in that：Also comprise the following steps：
S6：High-temperature baking is carried out on the basis of the above, solidifies photoresist complete stability.
A kind of 7. color membrane substrates, it is characterised in that：Including black matrix" (101), chromatic filter layer (102) and it is formed at black
Hyaline layer in colour moment battle array (101) and chromatic filter layer (102)；The hyaline layer (103) include a flatness layer (104), it is main every
Underbed (105) and secondary spacer material (106), the hyaline layer are formed by the photoresist containing crosslinking agent.
8. color membrane substrates according to claim 7, it is characterised in that：The flatness layer (104), main spacer material (105) and
Secondary spacer material (106) is integrally formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710755807.XA CN107621720A (en) | 2017-08-29 | 2017-08-29 | A kind of color membrane substrates and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710755807.XA CN107621720A (en) | 2017-08-29 | 2017-08-29 | A kind of color membrane substrates and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107621720A true CN107621720A (en) | 2018-01-23 |
Family
ID=61089142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710755807.XA Pending CN107621720A (en) | 2017-08-29 | 2017-08-29 | A kind of color membrane substrates and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107621720A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108832027A (en) * | 2018-06-07 | 2018-11-16 | 广州市得胜光电科技有限公司 | A kind of raising WOLED+COA manufacture of substrates |
| CN109633991A (en) * | 2019-01-09 | 2019-04-16 | 惠科股份有限公司 | Display panel and display device |
| CN110058498A (en) * | 2019-05-22 | 2019-07-26 | 深圳市华星光电技术有限公司 | Color film exposure machine |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104254806A (en) * | 2012-04-27 | 2014-12-31 | 富士胶片株式会社 | Production method for permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device using same |
| CN105093640A (en) * | 2015-07-28 | 2015-11-25 | 武汉华星光电技术有限公司 | Color filter and manufacturing method thereof |
-
2017
- 2017-08-29 CN CN201710755807.XA patent/CN107621720A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104254806A (en) * | 2012-04-27 | 2014-12-31 | 富士胶片株式会社 | Production method for permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device using same |
| CN105093640A (en) * | 2015-07-28 | 2015-11-25 | 武汉华星光电技术有限公司 | Color filter and manufacturing method thereof |
Non-Patent Citations (3)
| Title |
|---|
| 方秀敏: "水溶性热固型丙烯酸涂料", 《芜湖联合大学学报》 * |
| 荣新山等: "改性三聚氰胺交联剂对丙烯酸酯乳液及其应用性能的影响", 《化工新型材料》 * |
| 袁月等: "后交联型聚丙烯酸/丙烯酰胺高吸水性树脂的研究", 《化工新型材料》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108832027A (en) * | 2018-06-07 | 2018-11-16 | 广州市得胜光电科技有限公司 | A kind of raising WOLED+COA manufacture of substrates |
| CN109633991A (en) * | 2019-01-09 | 2019-04-16 | 惠科股份有限公司 | Display panel and display device |
| CN110058498A (en) * | 2019-05-22 | 2019-07-26 | 深圳市华星光电技术有限公司 | Color film exposure machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9097931B2 (en) | Color filter substrate and liquid crystal display | |
| CN106324880B (en) | The production method of crystal liquid substrate | |
| US10509256B2 (en) | Manufacturing method of color filter substrate | |
| CN103246154B (en) | Manufacturing method of mask plate for solidifying and shielding sealing frame glue | |
| CN104865735A (en) | Color film substrate and manufacturing method thereof and liquid crystal display panel | |
| CN106842687B (en) | Color membrane substrates and preparation method thereof | |
| CN209590464U (en) | A kind of color membrane substrates and display device | |
| CN109116617A (en) | Barrier wall structure, color membrane array substrate and liquid crystal display panel | |
| CN107621720A (en) | A kind of color membrane substrates and preparation method thereof | |
| CN104698521A (en) | Color filter sheet, manufacturing method for color filter sheet and liquid crystal display device | |
| CN103149730A (en) | Color film substrate and manufacturing method thereof, as well as liquid crystal display screen | |
| CN104614893A (en) | Display substrate and manufacturing method thereof as well as display device | |
| CN102707355A (en) | Transreflective color filter and manufacturing method thereof | |
| CN102866532A (en) | Color filter substrate and relevant manufacturing method thereof | |
| CN104087315B (en) | A kind of composition, oriented layer and preparation method thereof, liquid crystal aligning unit, display panels | |
| CN104102042A (en) | Color film base plate, manufacturing method thereof, and display device | |
| CN106371243A (en) | Display substrate and manufacturing method thereof | |
| CN104865729A (en) | Colored film baseplate and manufacture method of same, manufacture method of spacer and display device | |
| US9513413B2 (en) | Display device, color filter substrate and manufacturing method thereof | |
| CN104280805A (en) | Method for manufacturing color filter with pixel end difference height improved through half tone mask | |
| CN105652512A (en) | Color filter and manufacturing method thereof | |
| US20200174311A1 (en) | Liquid crystal display panel and manufacturing method thereof | |
| CN102650757B (en) | Color-film substrate, preparation method thereof and liquid crystal display panel | |
| CN106226960A (en) | A kind of color membrane substrates and manufacture method thereof and display device | |
| CN105652510A (en) | Display panel and manufacture method thereof as well as display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| TA01 | Transfer of patent application right | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20200907 Address after: No.7 Tianyou Road, Qixia District, Nanjing City, Jiangsu Province Applicant after: NANJING CEC PANDA FPD TECHNOLOGY Co.,Ltd. Address before: Nanjing Crystal Valley Road in Qixia District of Nanjing City Tianyou 210033 Jiangsu province No. 7 Applicant before: NANJING CEC PANDA FPD TECHNOLOGY Co.,Ltd. Applicant before: NANJING CEC PANDA LCD TECHNOLOGY Co.,Ltd. Applicant before: Nanjing East China Electronic Information Technology Co.,Ltd. |
|
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180123 |